专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06480694B2 Oil application roller 失效
标题翻译：涂油辊
公开(公告)号：US06480694B2
公开(公告)日：2002-11-12
申请号：US09836355
申请日：2001-04-18
申请人： Kohichi Kimura , Tatsuo Takagi , Masanori Ono , Munehiko Fukase , Takeshi Kuboyama
发明人： Kohichi Kimura , Tatsuo Takagi , Masanori Ono , Munehiko Fukase , Takeshi Kuboyama
IPC分类号： G03G1520
CPC分类号： G03G15/2025 , G03G2215/2093
摘要： In an oil application roller having an oil retaining member made of a hollow cylindrical porous formed body provided with an oil application layer on the outer periphery and that supplies a fixing roll with lubricant oil retained in the oil retaining member, the porous formed body is made of an inorganic material having micro-diameter voids and pores inside, at least a part of the micro-diameter voids communicates with a surface of the porous formed body and the pores, and at least a part of the pores communicates with a surface of the porous formed body through the micro-diameter voids. Also, if permeability resistance is 100 to 6,000 Pa.s/m2, no oil leak occurs during transportation and storage, the amount of the lubricant oil supplied to the fixing roll can be controlled and a uniform amount of lubricant oil can be supplied despite its compact and simple structure, the utilization rate of the lubricant oil can be enhanced. Further, if a pressure buffer device is provided between the hollow portion and the atmosphere, ill effects from oil leak and thermal expansion can be prevented.
摘要翻译：在具有由在外周设置有油涂布层的中空圆柱形多孔成形体制成的保油件的油涂布辊中，并且为固定辊供给保留在保油件中的润滑油，制成多孔成形体的具有微小直径空隙和孔内的无机材料，所述微小直径空隙的至少一部分与所述多孔成形体和所述孔的表面连通，并且所述孔的至少一部分与所述孔的表面连通多孔成形体通过微孔直径。另外，如果耐渗透性为100〜6000Pa·s / m 2，则在运输和储存期间不会发生油泄漏，所以可以控制供给到定影辊的润滑油的量，尽管可以提供均匀的润滑油结构紧凑简单，可以提高润滑油的利用率。此外，如果在中空部分和大气之间设置压力缓冲装置，则可以防止漏油和热膨胀产生的不良影响。

2. 发明申请

US20170213754A1 ELECTROSTATIC CHUCK WITH EXTERNAL FLOW ADJUSTMENTS FOR IMPROVED TEMPERATURE DISTRIBUTION 审中-公开
公开(公告)号：US20170213754A1
公开(公告)日：2017-07-27
申请号：US15481183
申请日：2017-04-06
申请人： Matthew J. Busche , Vijay D. Parkhe , Wendell Boyd, JR. , Senh Thach , Konstantin Makhratchev , Masanori Ono
发明人： Matthew J. Busche , Vijay D. Parkhe , Wendell Boyd, JR. , Senh Thach , Konstantin Makhratchev , Masanori Ono
IPC分类号： H01L21/683 , H01L21/67
CPC分类号： H01L21/6833 , H01L21/67103 , H01L21/67109 , H01L21/6831 , H05K7/20218
摘要： An electrostatic chuck is described with external flow adjustments for improved temperature distribution. In one example, a method for adjusting coolant flow in an electrostatic chuck includes heating a dielectric puck, the dielectric puck being for electrostatically gripping a silicon wafer. Heat is detected at a plurality of locations on a top surface of the dielectric puck, the locations each being thermally coupled to at least one of a plurality of coolant chambers of the electrostatic chuck. A plurality of valves are adjusted to control coolant flow into the coolant chambers based on the detected heat.

3. 发明授权

US09622375B2 Electrostatic chuck with external flow adjustments for improved temperature distribution 有权
公开(公告)号：US09622375B2
公开(公告)日：2017-04-11
申请号：US14145680
申请日：2013-12-31
申请人： Matthew J. Busche , Vijay D. Parkhe , Wendell Boyd, Jr. , Senh Thach , Konstantin Makhratchev , Masanori Ono
发明人： Matthew J. Busche , Vijay D. Parkhe , Wendell Boyd, Jr. , Senh Thach , Konstantin Makhratchev , Masanori Ono
IPC分类号： H01L21/683 , H05K7/20 , H01L21/67
CPC分类号： H01L21/6833 , H01L21/67103 , H01L21/67109 , H01L21/6831 , H05K7/20218
摘要： An electrostatic chuck is described with external flow adjustments for improved temperature distribution. In one example, an apparatus has a dielectric puck to electrostatically grip a silicon wafer. A cooling plate is fastened to and thermally coupled to the ceramic puck. A supply plenum receives coolant from an external source and a plurality of coolant chambers are thermally coupled to the cooling plate and receive coolant from the supply plenum. A return plenum is coupled to the cooling zones to exhaust coolant from the cooling zones and a plurality of flow control valves are positioned between the supply plenum and a respective one of the cooling zones to control the flow rate of coolant from the supply plenum to the cooling zones.

4. 发明授权

US6095754A Turbo-Molecular pump with metal matrix composite rotor and stator 失效
标题翻译：涡轮分子泵与金属基复合材料转子和定子
公开(公告)号：US6095754A
公开(公告)日：2000-08-01
申请号：US73899
申请日：1998-05-06
申请人： Masanori Ono
发明人： Masanori Ono
IPC分类号： F04D19/04 , F04D29/02 , F04D29/42 , B63H1/26
CPC分类号： F04D19/04 , F04D29/023 , F05D2300/122 , F05D2300/6032
摘要： The invention provides a vacuum processing system comprising a vacuum processing chamber and a turbo-molecular pump having a rotor and/or stator comprised of metal matrix composites. Another aspect of the invention provides a turbo-molecular pump having a rotor and/or a stator comprised of metal matrix composites. Because metal matrix composites are able to withstand higher operating temperatures than the aluminum alloys currently used in rotors and stators, the rotor vanes and the stator vanes that are made of metal matrix composites can provide a higher exhaust capacity with faster rotor rotations.
摘要翻译：本发明提供一种真空处理系统，其包括真空处理室和具有由金属基质复合材料构成的转子和/或定子的涡轮分子泵。本发明的另一方面提供了一种具有由金属基质复合材料构成的转子和/或定子的涡轮分子泵。由于金属基复合材料能够承受比当前在转子和定子中使用的铝合金更高的操作温度，所以由金属基复合材料制成的转子叶片和定子叶片可以提供更高的排气容量并且转子旋转更快。

5. 发明授权

US09520315B2 Electrostatic chuck with internal flow adjustments for improved temperature distribution 有权
标题翻译：具有内部流量调节以提高温度分布的静电吸盘
公开(公告)号：US09520315B2
公开(公告)日：2016-12-13
申请号：US14145702
申请日：2013-12-31
申请人： Vijay D. Parkhe , Matthew J. Busche , Wendell Boyd, Jr. , Senh Thach , Konstantin Makhratchev , Masanori Ono
发明人： Vijay D. Parkhe , Matthew J. Busche , Wendell Boyd, Jr. , Senh Thach , Konstantin Makhratchev , Masanori Ono
IPC分类号： H01L21/683 , H01L21/67
CPC分类号： H01L21/6831 , H01L21/67109 , Y10T137/0318
摘要： An electrostatic chuck is described with external flow adjustments for improved temperature distribution. In one example, an apparatus has a dielectric puck to electrostatically grip a silicon wafer. A cooling plate is fastened to and thermally coupled to the ceramic puck. A supply plenum receives coolant from an external source and a plurality of coolant chambers are thermally coupled to the cooling plate and receive coolant from the supply plenum. A return plenum is coupled to the cooling zones to exhaust coolant from the cooling zones. A plurality of adjustable orifices are positioned between the supply plenum and a respective one of the cooling zones to control the flow rate of coolant from the supply plenum to the cooling zones.
摘要翻译：使用外部流量调节来描述静电卡盘，以改善温度分布。在一个示例中，设备具有用于静电地夹持硅晶片的电介质盘。冷却板被固定并且热耦合到陶瓷盘。供应气室从外部源接收冷却剂，并且多个冷却剂室热耦合到冷却板并从供应气室接收冷却剂。回流室连接到冷却区以从冷却区排出冷却剂。多个可调节的孔口位于供气室和相应的一个冷却区之间，以控制从供气室到冷却区域的冷却剂流量。

6. 发明授权

US08747838B2 Method for isolating smooth muscle stem cells 失效
标题翻译：分离平滑肌干细胞的方法
公开(公告)号：US08747838B2
公开(公告)日：2014-06-10
申请号：US12937305
申请日：2009-04-13
申请人： Tetsuo Maruyama , Masanori Ono
发明人： Tetsuo Maruyama , Masanori Ono
IPC分类号： A01N63/00
CPC分类号： C12N5/0662 , A61L27/3834 , C12N5/0661 , C12N2500/02 , G01N33/56966 , G01N33/6887 , G01N2333/7055 , G01N2333/70589
摘要： This invention relates to a method for isolating smooth muscle stem cells derived from mammalian smooth muscle comprising bringing mammalian smooth muscle cells into contact with a fluorescence-labeled anti-CD45 antibody, anti-CD34 antibody, and anti-CD49f antibody, and isolating cells that would not bind to the anti-CD45 antibody but would bind to the anti-CD34 antibody and the anti-CD49f antibody.
摘要翻译：本发明涉及一种用于分离源自哺乳动物平滑肌的平滑肌干细胞的方法，包括使哺乳动物平滑肌细胞与荧光标记的抗CD45抗体，抗CD34抗体和抗CD49f抗体接触，并分离细胞不会结合抗CD45抗体，但会结合抗CD34抗体和抗CD49f抗体。

7. 发明授权

US06506290B1 Sputtering apparatus with magnetron device 失效
标题翻译：具有磁控管装置的溅射装置
公开(公告)号：US06506290B1
公开(公告)日：2003-01-14
申请号：US09830629
申请日：2001-04-30
申请人： Masanori Ono
发明人： Masanori Ono
IPC分类号： C23C1434
CPC分类号： H01J37/3423 , C23C14/3407 , C23C14/352 , H01J37/3405 , H01J37/3429
摘要： A sputtering apparatus is provided with a plurality of ringlike targets arranged on a concentric basis in upper part of a process chamber. A pedestal for holding a semiconductor substrate is placed inside the process chamber and a dc power supply is connected to the targets and to the pedestal. Further, the process chamber is connected to a vacuum pump for evacuating the inside thereof and a gas supply for introducing a process gas for generation of plasma, normally argon gas, into the inside of the process chamber. Sputtering yields of the targets can be adjusted by separately controlling potentials of the respective targets. This permits the apparatus to improve uniformity of deposition.
摘要翻译：溅射装置设置有在处理室的上部同心地布置的多个环状靶。用于保持半导体衬底的基座放置在处理室内部，并且直流电源连接到靶和基座。此外，处理室连接到用于抽真空其内部的真空泵和用于将用于产生等离子体（通常为氩气）的处理气体引入处理室的内部的气体供应。可以通过分别控制各个目标的电位来调整目标的溅射产率。这允许该装置改善沉积的均匀性。

8. 发明授权

US06259592B1 Apparatus for retaining a workpiece upon a workpiece support and method of manufacturing same 失效
标题翻译：用于将工件保持在工件支撑件上的装置及其制造方法
公开(公告)号：US06259592B1
公开(公告)日：2001-07-10
申请号：US09197321
申请日：1998-11-19
申请人： Masanori Ono
发明人： Masanori Ono
IPC分类号： H02N1300
CPC分类号： H02N13/00 , H01L21/6831 , Y10T279/23
摘要： Apparatus for retaining a workpiece on a workpiece support and method for manufacturing same. The apparatus contains an adhesive layer, an insulating layer made of a base material having a first resistivity, an electrode layer, a hybrid/adhesive layer and a workpiece support layer made of a base material and a dopant, the dopant having a second resistivity wherein a resistivity of the resultant workpiece support layer is lower than the first resistivity. The multi-resistivity layers establish a Johnsen-Rahbek effect for electrostatic chucking while not unduly compromising chuck strength or longevity. The method consists of the steps of disposing an adhesive layer, disposing an insulating layer, disposing an electrode layer, disposing a hybrid/adhesive layer, disposing a workpiece support layer, curing the layers and forming a plurality of grooves in the workpiece support layer.
摘要翻译：用于将工件保持在工件支架上的装置及其制造方法。该装置包含粘合剂层，由具有第一电阻率的基材制成的绝缘层，电极层，混合/粘合层和由基材和掺杂剂制成的工件支撑层，所述掺杂剂具有第二电阻率，其中所得到的工件支撑层的电阻率低于第一电阻率。多层电阻层对静电吸附建立了Johnsen-Rahbek效应，同时不会不利地影响卡盘的强度或寿命。该方法包括以下步骤：设置粘合剂层，设置绝缘层，设置电极层，设置混合/粘合剂层，设置工件支撑层，固化层并在工件支撑层中形成多个槽。

9. 发明申请

US20150187626A1 ELECTROSTATIC CHUCK WITH INTERNAL FLOW ADJUSTMENTS FOR IMPROVED TEMPERATURE DISTRIBUTION 有权
标题翻译：具有改善温度分布的内部流量调节的静电卡盘
公开(公告)号：US20150187626A1
公开(公告)日：2015-07-02
申请号：US14145702
申请日：2013-12-31
申请人： Vijay D. Parkhe , Matthew J. Busche , Wendell Boyd, JR. , Senh Thach , Konstantin Makhratchev , Masanori Ono
发明人： Vijay D. Parkhe , Matthew J. Busche , Wendell Boyd, JR. , Senh Thach , Konstantin Makhratchev , Masanori Ono
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , H01L21/67109 , Y10T137/0318
摘要： An electrostatic chuck is described with external flow adjustments for improved temperature distribution. In one example, an apparatus has a dielectric puck to electrostatically grip a silicon wafer. A cooling plate is fastened to and thermally coupled to the ceramic puck. A supply plenum receives coolant from an external source and a plurality of coolant chambers are thermally coupled to the cooling plate and receive coolant from the supply plenum. A return plenum is coupled to the cooling zones to exhaust coolant from the cooling zones. A plurality of adjustable orifices are positioned between the supply plenum and a respective one of the cooling zones to control the flow rate of coolant from the supply plenum to the cooling zones.
摘要翻译：使用外部流量调节描述静电卡盘，以改善温度分布。在一个示例中，设备具有用于静电地夹持硅晶片的电介质盘。冷却板被固定并且热耦合到陶瓷盘。供应气室从外部源接收冷却剂，并且多个冷却剂室热耦合到冷却板并从供应气室接收冷却剂。回流室连接到冷却区以从冷却区排出冷却剂。多个可调节的孔口位于供气室和相应的一个冷却区之间，以控制从供气室到冷却区的冷却剂的流量。

10. 发明申请

US20150187625A1 ELECTROSTATIC CHUCK WITH EXTERNAL FLOW ADJUSTMENTS FOR IMPROVED TEMPERATURE DISTRIBUTION 有权
标题翻译：具有改善温度分布的外部流量调节的静电卡盘
公开(公告)号：US20150187625A1
公开(公告)日：2015-07-02
申请号：US14145680
申请日：2013-12-31
申请人： Matthew J. Busche , Vijay De. Parkhe , Wendell Boyd, JR. , Senh Thach , Konstantin Makhratchev , Masanori Ono
发明人： Matthew J. Busche , Vijay De. Parkhe , Wendell Boyd, JR. , Senh Thach , Konstantin Makhratchev , Masanori Ono
IPC分类号： H01L21/683 , H05K7/20
CPC分类号： H01L21/6833 , H01L21/67103 , H01L21/67109 , H01L21/6831 , H05K7/20218
摘要： An electrostatic chuck is described with external flow adjustments for improved temperature distribution. In one example, an apparatus has a dielectric puck to electrostatically grip a silicon wafer. A cooling plate is fastened to and thermally coupled to the ceramic puck. A supply plenum receives coolant from an external source and a plurality of coolant chambers are thermally coupled to the cooling plate and receive coolant from the supply plenum. A return plenum is coupled to the cooling zones to exhaust coolant from the cooling zones and a plurality of flow control valves are positioned between the supply plenum and a respective one of the cooling zones to control the flow rate of coolant from the supply plenum to the cooling zones.
摘要翻译：使用外部流量调节来描述静电卡盘，以改善温度分布。在一个示例中，设备具有用于静电地夹持硅晶片的电介质盘。冷却板被固定并且热耦合到陶瓷盘。供应气室从外部源接收冷却剂，并且多个冷却剂室热耦合到冷却板并从供应气室接收冷却剂。回流通风室联接到冷却区域以从冷却区域排出冷却剂，并且多个流量控制阀定位在供应压力室和相应的一个冷却区域之间，以控制从供气室到冷却区的冷却剂的流量冷却区。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式