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1. 发明授权

US06291847B1 Semiconductor integrated circuit device and process for manufacturing the same 有权
标题翻译：半导体集成电路器件及其制造方法
公开(公告)号：US06291847B1
公开(公告)日：2001-09-18
申请号：US09159754
申请日：1998-09-24
申请人： Kiyonori Ohyu , Makoto Ohkura , Aritoshi Sugimoto , Yoshitaka Tadaki , Makoto Ogasawara , Masashi Horiguchi , Norio Hasegawa , Shinichi Fukada
发明人： Kiyonori Ohyu , Makoto Ohkura , Aritoshi Sugimoto , Yoshitaka Tadaki , Makoto Ogasawara , Masashi Horiguchi , Norio Hasegawa , Shinichi Fukada
IPC分类号： H01L27108
CPC分类号： H01L27/10897 , H01L27/10814 , H01L27/10894
摘要： A field oxide film 3 in a region where relief cells are formed is made wider than the field oxide film 3 in a region where normal memory cells are formed thereby to make a field relaxation layer 8r of the relief cells deeper than the field relaxation layer 8 of the normal cells, and the depletion layer of the sources and drains (n-type semiconductor regions) of the relief cells is widened to weaken the junction field.
摘要翻译：在形成正常存储单元的区域中，形成有浮雕单元的区域中的场氧化膜3比场氧化膜3宽，使得浮雕单元的场弛豫层8r比场弛豫层8更深的正电池，并且补充电池的源极和漏极（n型半导体区域）的耗尽层变宽以削弱结场。

2. 发明授权

US06573546B2 Semiconductor integrated circuit device and process for manufacturing the same 有权
公开(公告)号：US06573546B2
公开(公告)日：2003-06-03
申请号：US09922673
申请日：2001-08-07
申请人： Kiyonori Ohyu , Makoto Ohkura , Aritoshi Sugimoto , Yoshitaka Tadaki , Makoto Ogasawara , Masashi Horiguchi , Norio Hasegawa , Shinichi Fukada
发明人： Kiyonori Ohyu , Makoto Ohkura , Aritoshi Sugimoto , Yoshitaka Tadaki , Makoto Ogasawara , Masashi Horiguchi , Norio Hasegawa , Shinichi Fukada
IPC分类号： H01L27108
CPC分类号： H01L27/10897 , H01L27/10814 , H01L27/10894
摘要： A field oxide film 3 in a region where relief cells are formed is made wider than the field oxide film 3 in a region where normal memory cells are formed thereby to make a field relaxation layer 8r of the relief cells deeper than the field relaxation layer 8 of the normal cells, and the depletion layer of the sources and drains (n-type semiconductor regions) of the relief cells is widened to weaken the junction field.

3. 发明申请

US20060110667A1 Method of fabrication of semiconductor integrated circuit device and mask fabrication method 审中-公开
标题翻译：半导体集成电路器件的制造方法和掩模制造方法
公开(公告)号：US20060110667A1
公开(公告)日：2006-05-25
申请号：US11322232
申请日：2006-01-03
申请人： Norio Hasegawa , Toshihiko Tanaka , Tsuneo Terasawa , Aritoshi Sugimoto
发明人： Norio Hasegawa , Toshihiko Tanaka , Tsuneo Terasawa , Aritoshi Sugimoto
IPC分类号： G03C5/00 , G06K9/00
CPC分类号： G03F7/70616 , G03F1/84 , G03F3/10
摘要： An area for fabricating a photomask having light-shielding patterns each formed of an organic film, and areas for fabricating a semiconductor integrated circuit device are provided within the same clean room. A manufacturing device and an inspecting device are commonly used during the fabrication of the photomask and the fabrication of the semiconductor integrated circuit device.
摘要翻译：用于制造具有各自由有机膜形成的遮光图案的光掩模的区域和用于制造半导体集成电路器件的区域设置在相同的洁净室内。在制造光掩模和半导体集成电路器件的制造期间通常使用制造装置和检查装置。

4. 发明授权

US07894658B2 Pattern inspection method and apparatus 有权
标题翻译：图案检验方法及装置
公开(公告)号：US07894658B2
公开(公告)日：2011-02-22
申请号：US11931693
申请日：2007-10-31
申请人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
发明人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8854 , G01N2021/8861 , G01N2021/8864 , G01R31/311 , G03F1/86 , G06T1/0007 , G06T7/0002 , G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/28
摘要： An apparatus for processing a defect candidate image, including: an imager for taking an enlarged image of a specimen; an image processor for processing the image taken by the imager to detect defect candidates existing on the specimen and classify the detected defect candidates into one of plural defect classes; a memory for storing information of the defect candidates including the images of the defect candidates and the classified defect class data outputted from the image processor; and a display unit having a display screen for displaying information stored in the memory, wherein the display unit displays an image of the defect candidates together with the defect class data stored in the memory and the displayed defect class data is changeable on the display screen, and the memory changes the stored defect class data of the displayed defect candidate to the changed defect class data.
摘要翻译：一种用于处理缺陷候选图像的装置，包括：用于拍摄样本的放大图像的成像器; 图像处理器，用于处理由成像器拍摄的图像以检测存在于样本上的缺陷候选，并将检测到的缺陷候选分类为多个缺陷类别中的一个; 存储器，用于存储包括缺陷候选图像和从图像处理器输出的分类缺陷类别数据的缺陷候选的信息; 以及显示单元，具有用于显示存储在存储器中的信息的显示屏幕，其中所述显示单元与存储在所述存储器中的缺陷类别数据一起显示所述缺陷候选的图像，并且所显示的缺陷类别数据可在所述显示屏幕上变化，并且存储器将存储的缺陷候选的缺陷类别数据改变为改变的缺陷类别数据。

5. 发明授权

US07457453B2 Pattern inspection method and apparatus 有权
标题翻译：图案检验方法及装置
公开(公告)号：US07457453B2
公开(公告)日：2008-11-25
申请号：US11782274
申请日：2007-07-24
申请人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
发明人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8854 , G01N2021/8861 , G01N2021/8864 , G01R31/311 , G03F1/86 , G06T1/0007 , G06T7/0002 , G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/28
摘要： A pattern inspection apparatus including: an image detecting part for detecting a digital image of an object substrate; a display having a screen on which the digital image of the object substrate and/or a distribution of defect candidates in a map form are displayable; an input device for inputting information of a non-inspection region to be masked on the object substrate by defining a region on the screen on which said distribution of defect candidates is displayed in a map form; a memory part for storing coordinate data, pattern data or feature quantity data of the non-inspection region to be masked on the object substrate inputted on the screen by the input device; and a defect judging part in which the digital image detected by the image detecting part is examined in a state that a region matching with a condition stored in the memory part is masked and a defect is detected in a region other than said masked region.
摘要翻译：一种图案检查装置，包括：图像检测部，用于检测对象基板的数字图像; 具有可以显示对象基板的数字图像的屏幕和/或以地图形式的缺陷候选的分布的显示器; 输入装置，用于通过在屏幕上定义要以掩模形式显示所述缺陷候选的分布的区域来输入要被掩蔽在对象基板上的不检查区域的信息; 用于存储由输入装置输入到屏幕上的待掩蔽的待检查区域的坐标数据，图案数据或特征量数据的存储部分; 以及缺陷判断部分，其中在与存储在存储器部分中的条件匹配的区域被屏蔽并且在除了所述屏蔽区域之外的区域中检测到缺陷的状态下，检查由图像检测部分检测到的数字图像。

6. 发明授权

US07266235B2 Pattern inspection method and apparatus 有权
标题翻译：图案检验方法及装置
公开(公告)号：US07266235B2
公开(公告)日：2007-09-04
申请号：US09986577
申请日：2001-11-09
申请人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
发明人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
IPC分类号： G60K9/00
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8854 , G01N2021/8861 , G01N2021/8864 , G01R31/311 , G03F1/86 , G06T1/0007 , G06T7/0002 , G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/28
摘要： A pattern inspection method in which an image can be detected without an image detection error caused by an adverse effect to be given by such factors as ions implanted in a wafer, pattern connection/non-connection, and pattern edge formation. A digital image of an object substrate is attained through microscopic observation thereof, the attained digital image is examined to detect defects, while masking a region pre-registered in terms of coordinates, or while masking a pattern meeting a pre-registered pattern, and an image of each of the defects thus detected is displayed. Further, each of the defects detected using the digital image attained through microscopic observation is checked to determine whether its feature meets a pre-registered feature or not. Defects having a feature that meets the pre-registered feature are so displayed that they can be turned on/off, or they are so displayed as to be distinguishable from the other defects.
摘要翻译：图案检查方法，其中可以检测图像，而不会由于植入在晶片中的离子，图案连接/非连接和图案边缘形成等因素所引起的不利影响而引起图像检测误差。通过显微镜观察目标基板的数字图像，检查所获得的数字图像以检测缺陷，同时掩蔽预先登记的区域上的坐标，或者在掩蔽满足预先注册的图案的图案的同时，显示由此检测到的每个缺陷的图像。此外，检查使用通过显微镜观察获得的数字图像检测到的每个缺陷，以确定其特征是否满足预先注册的特征。具有满足预注册特征的特征的缺陷被显示为可以打开/关闭，或者它们被显示为与其他缺陷区分开。

7. 发明申请

US20050269511A1 Probe driving method, and probe apparatus 有权
标题翻译：探头驱动方法和探头装置
公开(公告)号：US20050269511A1
公开(公告)日：2005-12-08
申请号：US11201222
申请日：2005-08-11
申请人： Satoshi Tomimatsu , Hidemi Koike , Junzo Azuma , Tohru Ishitani , Aritoshi Sugimoto , Yuichi Hamamura , Isamu Sekihara , Akira Shimase
发明人： Satoshi Tomimatsu , Hidemi Koike , Junzo Azuma , Tohru Ishitani , Aritoshi Sugimoto , Yuichi Hamamura , Isamu Sekihara , Akira Shimase
IPC分类号： G01N1/28 , G01N1/32 , G01N23/04 , G01N23/225 , G01Q10/00 , G01Q30/02 , G01Q30/04 , G01Q30/20 , G01Q60/44 , G01R1/06 , G01R31/28 , G01R31/311 , H01J37/28 , H01L21/66 , G01N23/00 , G21K7/00
CPC分类号： G01Q10/06 , G01N23/04 , G01N23/225 , G01R31/2886 , G01R31/311 , H01J37/28
摘要： A probe driving method and a probe apparatus for bringing a probe into contact with the surface of a sample in a safe and efficient manner by monitoring the probe height. Information about the height of the probe from the sample surface is obtained by detecting a probe shadow (54) appearing immediately before the probe contacts the sample, or based on a change in relative positions of a probe image and a sample image that are formed as an ion beam is irradiated diagonally.
摘要翻译：探针驱动方法和探针装置，用于通过监测探针高度，以安全和有效的方式使探针与样品的表面接触。通过检测在探针接触样品之前出现的探针阴影（54），或者基于探针图像和样品图像的相对位置的变化，获得关于来自样品表面的探针的高度的信息，对角线照射离子束。

8. 发明授权

US06960765B2 Probe driving method, and probe apparatus 有权
标题翻译：探头驱动方法和探头装置
公开(公告)号：US06960765B2
公开(公告)日：2005-11-01
申请号：US10296887
申请日：2001-06-08
申请人： Satoshi Tomimatsu , Hidemi Koike , Junzo Azuma , Tohru Ishitani , Aritoshi Sugimoto , Yuichi Hamamura , Isamu Sekihara , Akira Shimase
发明人： Satoshi Tomimatsu , Hidemi Koike , Junzo Azuma , Tohru Ishitani , Aritoshi Sugimoto , Yuichi Hamamura , Isamu Sekihara , Akira Shimase
IPC分类号： G01N1/28 , G01N1/32 , G01N23/04 , G01N23/225 , G01Q10/00 , G01Q30/02 , G01Q30/04 , G01Q30/20 , G01Q60/44 , G01R1/06 , G01R31/28 , G01R31/311 , H01J37/28 , H01L21/66 , G01N13/16 , G01B5/28
CPC分类号： G01Q10/06 , G01N23/04 , G01N23/225 , G01R31/2886 , G01R31/311 , H01J37/28
摘要： A probe driving method and a probe apparatus for bringing a probe into contact with the surface of a sample in a safe and efficient manner by monitoring the probe height. Information about the height of the probe from the sample surface is obtained by detecting a probe shadow appearing immediately before the probe contacts the sample, or based on a change in relative positions of a probe image and a sample image that are formed as an ion beam is irradiated diagonally.
摘要翻译：探针驱动方法和探针装置，用于通过监测探针高度，以安全和有效的方式使探针与样品的表面接触。通过检测在探针接触样品之前出现的探针阴影，或者基于作为离子束形成的探针图像和样品图像的相对位置的变化，获得关于来自样品表面的探针的高度的信息对角线照射。

9. 发明授权

US06944325B2 Inspecting method and apparatus for repeated micro-miniature patterns 失效
标题翻译：用于重复微型图案的检查方法和装置
公开(公告)号：US06944325B2
公开(公告)日：2005-09-13
申请号：US10656221
申请日：2003-09-08
申请人： Junichi Taguchi , Aritoshi Sugimoto , Masami Ikoto , Yuko Inoue , Tetsuya Watanabe , Wakana Shinke
发明人： Junichi Taguchi , Aritoshi Sugimoto , Masami Ikoto , Yuko Inoue , Tetsuya Watanabe , Wakana Shinke
IPC分类号： G01N21/956 , G06T7/00 , G06K9/00
CPC分类号： G06T7/0004 , G01N21/95607 , G06T7/001 , G06T2207/30148
摘要： An apparatus for inspecting foreign matter in repeated micro-miniature patterns formed upon a surface of an object to be inspected, comprising: an inspection light illuminating device for irradiating an inspection light directed upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; a scattered light detector for detecting scattered light of the inspection light being scattered upon the surface said object to be inspected; means for obtaining a first information related to a foreign matter attaching upon the surface of said object to be inspected, which is obtained on a basis of the detection of said scattered light by said scattered light detector; an illumination means for applying a bright field illumination upon the surface of the object to be inspected, on which the repeated micro-miniature patterns are formed; means for picking up the image of the foreign matter, under a bright field illumination by said illumination means; means for obtaining a second information related to said foreign matter, depending upon an image of said foreign matter, which is obtained on a basis of said picking up of the image by said image picking up means under the bright field illumination; and means for displaying said first information and said second information, both being related to said foreign matter, on a display screen thereof.
摘要翻译：一种用于检查形成在待检查物体的表面上的重复微型图案中的异物的装置，包括：检查光照明装置，用于照射指向被检查物体的表面的检查光，其上重复形成微型图案; 用于检测检查光的散射光的散射光检测器，散射在被检查物体的表面上; 用于根据所述散射光检测器对所述散射光的检测获得的用于获得与附着在所述被检查物体的表面上的异物有关的第一信息的装置; 照明装置，用于在其上形成有重复的微型图案的被检查物体的表面上施加明场照明; 用于在所述照明装置的明场照明下拾取异物的图像的装置; 用于根据所述异物的图像获得与所述异物相关的第二信息的装置，其基于在所述明场照明下的所述图像拾取装置的所述图像拾取而获得; 以及用于在其显示屏幕上显示与所述异物相关的所述第一信息和所述第二信息的装置。

10. 发明授权

US06895346B2 Method for test conditions 失效
标题翻译：测试条件的方法
公开(公告)号：US06895346B2
公开(公告)日：2005-05-17
申请号：US10269127
申请日：2002-10-10
申请人： Yuichi Hamamura , Takaaki Kumazawa , Hisao Asakura , Kazuyuki Tsunokuni , Aritoshi Sugimoto
发明人： Yuichi Hamamura , Takaaki Kumazawa , Hisao Asakura , Kazuyuki Tsunokuni , Aritoshi Sugimoto
IPC分类号： G01R31/28 , G06F19/00 , H01L21/00
CPC分类号： G01R31/2812 , G01R31/2818
摘要： A manufacturing method of an electronic device is to improve test efficiency using test structure and improve yield. The manufacturing method performs test using a first lead wire disposed on an insulating layer formed on a substrate and a second lead wire electrically connected to the substrate and disposed on the insulating layer and manages the electronic device on the basis of results of the test to manufacture the electronic device. The manufacturing method includes a step of testing whether the first lead wire is disconnected or not by measuring an electric resistance between both ends of the first lead wire and a step of testing whether the first and second lead wires are short-circuited or not by measuring an electric resistance between the first lead wire and the substrate.
摘要翻译：电子设备的制造方法是使用测试结构提高测试效率并提高产量。该制造方法使用设置在形成于基板上的绝缘层上的第一引线和与基板电连接并设置在绝缘层上的第二引线进行测试，并基于制造试验的结果来管理电子设备电子设备。该制造方法包括通过测量第一引线的两端之间的电阻和通过测量第一和第二引线是否短路的步骤来测试第一引线是否断开的步骤第一引线与基板之间的电阻。

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