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1. 发明授权

US07301146B2 Probe driving method, and probe apparatus 有权
标题翻译：探头驱动方法和探头装置
公开(公告)号：US07301146B2
公开(公告)日：2007-11-27
申请号：US11201222
申请日：2005-08-11
申请人： Satoshi Tomimatsu , Hidemi Koike , Junzo Azuma , Tohru Ishitani , Aritoshi Sugimoto , Yuichi Hamamura , Isamu Sekihara , Akira Shimase
发明人： Satoshi Tomimatsu , Hidemi Koike , Junzo Azuma , Tohru Ishitani , Aritoshi Sugimoto , Yuichi Hamamura , Isamu Sekihara , Akira Shimase
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G01Q10/06 , G01N23/04 , G01N23/225 , G01R31/2886 , G01R31/311 , H01J37/28
摘要： A probe driving method and a probe apparatus for bringing a probe into contact with the surface of a sample in a safe and efficient manner by monitoring the probe height. Information about the height of the probe from the sample surface is obtained by detecting a probe shadow (54) appearing immediately before the probe contacts the sample, or based on a change in relative positions of a probe image and a sample image that are formed as an ion beam is irradiated diagonally.
摘要翻译：探针驱动方法和探针装置，用于通过监测探针高度，以安全和有效的方式使探针与样品的表面接触。通过检测在探针接触样品之前出现的探针阴影（54），或者基于探针图像和样品图像的相对位置的变化，获得关于来自样品表面的探针的高度的信息，对角线照射离子束。

2. 发明申请

US20050269511A1 Probe driving method, and probe apparatus 有权
标题翻译：探头驱动方法和探头装置
公开(公告)号：US20050269511A1
公开(公告)日：2005-12-08
申请号：US11201222
申请日：2005-08-11
申请人： Satoshi Tomimatsu , Hidemi Koike , Junzo Azuma , Tohru Ishitani , Aritoshi Sugimoto , Yuichi Hamamura , Isamu Sekihara , Akira Shimase
发明人： Satoshi Tomimatsu , Hidemi Koike , Junzo Azuma , Tohru Ishitani , Aritoshi Sugimoto , Yuichi Hamamura , Isamu Sekihara , Akira Shimase
IPC分类号： G01N1/28 , G01N1/32 , G01N23/04 , G01N23/225 , G01Q10/00 , G01Q30/02 , G01Q30/04 , G01Q30/20 , G01Q60/44 , G01R1/06 , G01R31/28 , G01R31/311 , H01J37/28 , H01L21/66 , G01N23/00 , G21K7/00
CPC分类号： G01Q10/06 , G01N23/04 , G01N23/225 , G01R31/2886 , G01R31/311 , H01J37/28
摘要： A probe driving method and a probe apparatus for bringing a probe into contact with the surface of a sample in a safe and efficient manner by monitoring the probe height. Information about the height of the probe from the sample surface is obtained by detecting a probe shadow (54) appearing immediately before the probe contacts the sample, or based on a change in relative positions of a probe image and a sample image that are formed as an ion beam is irradiated diagonally.
摘要翻译：探针驱动方法和探针装置，用于通过监测探针高度，以安全和有效的方式使探针与样品的表面接触。通过检测在探针接触样品之前出现的探针阴影（54），或者基于探针图像和样品图像的相对位置的变化，获得关于来自样品表面的探针的高度的信息，对角线照射离子束。

3. 发明授权

US06960765B2 Probe driving method, and probe apparatus 有权
标题翻译：探头驱动方法和探头装置
公开(公告)号：US06960765B2
公开(公告)日：2005-11-01
申请号：US10296887
申请日：2001-06-08
申请人： Satoshi Tomimatsu , Hidemi Koike , Junzo Azuma , Tohru Ishitani , Aritoshi Sugimoto , Yuichi Hamamura , Isamu Sekihara , Akira Shimase
发明人： Satoshi Tomimatsu , Hidemi Koike , Junzo Azuma , Tohru Ishitani , Aritoshi Sugimoto , Yuichi Hamamura , Isamu Sekihara , Akira Shimase
IPC分类号： G01N1/28 , G01N1/32 , G01N23/04 , G01N23/225 , G01Q10/00 , G01Q30/02 , G01Q30/04 , G01Q30/20 , G01Q60/44 , G01R1/06 , G01R31/28 , G01R31/311 , H01J37/28 , H01L21/66 , G01N13/16 , G01B5/28
CPC分类号： G01Q10/06 , G01N23/04 , G01N23/225 , G01R31/2886 , G01R31/311 , H01J37/28
摘要： A probe driving method and a probe apparatus for bringing a probe into contact with the surface of a sample in a safe and efficient manner by monitoring the probe height. Information about the height of the probe from the sample surface is obtained by detecting a probe shadow appearing immediately before the probe contacts the sample, or based on a change in relative positions of a probe image and a sample image that are formed as an ion beam is irradiated diagonally.
摘要翻译：探针驱动方法和探针装置，用于通过监测探针高度，以安全和有效的方式使探针与样品的表面接触。通过检测在探针接触样品之前出现的探针阴影，或者基于作为离子束形成的探针图像和样品图像的相对位置的变化，获得关于来自样品表面的探针的高度的信息对角线照射。

4. 发明授权

US06734687B1 Apparatus for detecting defect in device and method of detecting defect 有权
标题翻译：用于检查装置缺陷的装置和检查缺陷的方法
公开(公告)号：US06734687B1
公开(公告)日：2004-05-11
申请号：US09936941
申请日：2001-12-04
申请人： Tohru Ishitani , Hidemi Koike , Aritoshi Sugimoto , Isamu Sekihara , Kaoru Umemura , Satoshi Tomimatsu , Junzo Azuma
发明人： Tohru Ishitani , Hidemi Koike , Aritoshi Sugimoto , Isamu Sekihara , Kaoru Umemura , Satoshi Tomimatsu , Junzo Azuma
IPC分类号： G01R31302
CPC分类号： G01R31/311 , G01R31/2851 , G01R31/303
摘要： Disconnection defects, short-circuit defects and the like in wiring patters of submicron sizes within TEGs (a square of 1 to 2.5 mm for each) numerously arranged in a large chip (a square of 20 to 25 mm) can be inspected with respect to all the TEGs, with good operability, high reliability and high efficiency. A conductor probe for applying voltage to the wiring patterns by mechanical contact is composed of synchronous type conductor probe that synchronizes with movement of a sample stage (16), and fixed type conductor probe means (21) that is relatively fixed to an FIB generator (10). Positions of probe tips are superimposed to an SIM image and displayed on a display unit (19).
摘要翻译：可以检查大尺寸芯片（20〜25mm的正方形）内的TEG内的亚微米尺寸（每个为1〜2.5mm的正方形）的接线图案中的断路缺陷，短路缺陷等。所有的TEG，具有良好的可操作性，高可靠性和高效率。用于通过机械接触对布线图案施加电压的导体探针由与样品台（16）的移动同步的同步型导体探针和相对固定于FIB发生器的固定型导体探针装置（21）组成， 10）。探针尖端的位置叠加到SIM图像上并显示在显示单元上（19）。

5. 发明授权

US06970004B2 Apparatus for inspecting defects of devices and method of inspecting defects 有权
标题翻译：用于检查装置缺陷的装置和检查缺陷的方法
公开(公告)号：US06970004B2
公开(公告)日：2005-11-29
申请号：US10803932
申请日：2004-03-19
申请人： Tohru Ishitani , Hidemi Koike , Aritoshi Sugimoto , Isamu Sekihara , Kaoru Umemura , Satoshi Tomimatsu , Junzo Azuma
发明人： Tohru Ishitani , Hidemi Koike , Aritoshi Sugimoto , Isamu Sekihara , Kaoru Umemura , Satoshi Tomimatsu , Junzo Azuma
IPC分类号： G01R31/265 , G01R31/28 , G01R31/302 , G01R31/303 , G01R31/305 , G01R31/307 , G01R31/311 , H01J37/20 , H01J37/28 , G01R31/00 , G01R31/26 , H01L27/00
CPC分类号： G01R31/311 , G01R31/2851 , G01R31/303
摘要： Disconnection defects, short-circuit defects and the like in wiring patterns of submicron sizes within TEGs (a square of 1 to 2.5 mm for each) numerously arranged in a large chip (a square of 20 to 25 mm) can be inspected with respect to all the TEGs, with good operability, high reliability and high efficiency. A conductor probe for applying voltage to the wiring patterns by mechanical contact is composed of synchronous type conductor probe that synchronizes with movement of a sample stage (16), and fixed type conductor probe means (21) that is relatively fixed to an FIB generator (10). Positions of probe tips are superimposed to an SIM image and displayed on a display unit (19).
摘要翻译：可以在大芯片（20〜25mm的正方形）内大量排列的TEG（每个为1〜2.5mm的方形）内的亚微米尺寸的布线图案中的断路缺陷，短路缺陷等相对于所有的TEG，具有良好的可操作性，高可靠性和高效率。用于通过机械接触对布线图案施加电压的导体探针由与样品台（16）的移动同步的同步型导体探针和相对固定于FIB发生器的固定型导体探针装置（21）组成， 10）。探针尖端的位置叠加到SIM图像上并显示在显示单元上（19）。

6. 发明授权

US06344115B1 Pattern forming method using charged particle beam process and charged particle beam processing system 有权
标题翻译：使用带电粒子束工艺和带电粒子束处理系统的图案形成方法
公开(公告)号：US06344115B1
公开(公告)日：2002-02-05
申请号：US09417996
申请日：1999-10-13
申请人： Junzou Azuma , Akira Shimase , Yuichi Hamamura , Hidemi Koike
发明人： Junzou Azuma , Akira Shimase , Yuichi Hamamura , Hidemi Koike
IPC分类号： C23C1400
CPC分类号： H01J37/18 , C23C16/26 , H01J2237/317
摘要： A pattern forming method using an improved charged particle beam process, and a charged particle beam processing system prevent effectively the corrosion of a workpiece by a reactive gas adsorbed by and adhering to the surface of the workpiece when the workpiece is taken out into the atmosphere after pattern formation. The charged particle beam processing system comprises, as principal components, an ion beam chamber provided with an ion beam optical system, a processing chamber provided with a gas nozzle through which a reactive gas is blown against a workpiece, a load-lock chamber connected through a gate valve to the processing chamber. The load-lock chamber is capable of producing a plasma of an inert gas for processing the surface of the workpiece by sputtering. The workpiece is returned to the load-lock chamber after a pattern has been formed thereon in the processing chamber by reactive processing including irradiating the surface of the workpiece with a charged particle beam in an environment of the reactive gas, and the workpiece is subjected to a plasma process to remove the reactive gas adsorbed by the workpiece during pattern formation and adhering to the workpiece.
摘要翻译：使用改进的带电粒子束工艺的图案形成方法和带电粒子束处理系统，当工件被排出到大气中之后，通过被吸收并附着在工件表面上的反应气体有效地防止工件的腐蚀图案形成。带电粒子束处理系统作为主要部件包括设置有离子束光学系统的离子束室，设置有气体喷嘴的处理室，反应气体通过该喷嘴吹向工件，负载锁定室通过一个闸阀到处理室。负载锁定室能够产生用于通过溅射处理工件的表面的惰性气体的等离子体。在通过反应性处理在处理室中形成图案之后，工件返回到装载锁定室，包括在反应气体的环境中用带电粒子束照射工件的表面，并且对工件进行等离子体处理，以在图案形成期间去除被工件吸附的反应气体并附着到工件上。

7. 发明授权

US06794663B2 Method and apparatus for specimen fabrication 有权
公开(公告)号：US06794663B2
公开(公告)日：2004-09-21
申请号：US10699853
申请日：2003-11-04
申请人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
发明人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
IPC分类号： G21G500
CPC分类号： G01N23/20 , B23K15/0006 , B23K15/0013 , G01N1/286 , H01J2237/3114 , H01J2237/31745
摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

8. 发明授权

US06476387B1 Method and apparatus for observing or processing and analyzing using a charged beam 有权
标题翻译：使用带电束观察或处理和分析的方法和装置
公开(公告)号：US06476387B1
公开(公告)日：2002-11-05
申请号：US09311268
申请日：1999-05-14
申请人： Norimasa Nishimura , Akira Shimase , Junzou Azuma , Yuichi Hamamura , Michinobu Mizumura , Yasuhiro Koizumi , Hidemi Koike
发明人： Norimasa Nishimura , Akira Shimase , Junzou Azuma , Yuichi Hamamura , Michinobu Mizumura , Yasuhiro Koizumi , Hidemi Koike
IPC分类号： H01J3730
CPC分类号： H01J37/28 , H01J2237/0047 , H01J2237/2482
摘要： In a method for observing or processing and analyzing the surface of a sample by irradiating a charged beam on the sample covered at least partially by an insulator film, an ultraviolet light is irradiated possibly as pulse on the sample (substrate), thereby transforming the insulator into a conductive material due to the photoconductivity effect, thereby transforming the surface of the sample (substrate) into a conductive material, so that charged particles are grounded from a grounded portion in order to prevent the charged beam from being repulsed due to charged particles of the irradiated charged beam accumulated in the insulator formed on the surface of the sample (substrate).
摘要翻译：在通过在至少部分地被绝缘体膜覆盖的样品上照射带电束的样品的表面的方法中，紫外光可能作为脉冲照射在样品（衬底）上，从而将绝缘体由于光电导效应而成为导电材料，从而将样品（基板）的表面转变为导电材料，使得带电粒子从接地部分接地，以防止带电粒子由于带电粒子而被斥力被照射的带电光束积聚在形成在样品（基板）表面上的绝缘体中。

9. 发明申请

US20110114476A1 Method and apparatus for specimen fabrication 有权
公开(公告)号：US20110114476A1
公开(公告)日：2011-05-19
申请号：US12929396
申请日：2011-01-20
申请人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
发明人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
IPC分类号： C23C14/34
CPC分类号： G01N23/20 , B23K15/0006 , B23K15/0013 , G01N1/286 , H01J2237/3114 , H01J2237/31745
摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

10. 发明授权

US07268356B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US07268356B2
公开(公告)日：2007-09-11
申请号：US10898592
申请日：2004-07-26
申请人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
发明人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
IPC分类号： G21G5/00
CPC分类号： G01N23/20 , B23K15/0006 , B23K15/0013 , G01N1/286 , H01J2237/3114 , H01J2237/31745
摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.
摘要翻译：相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品通过转动样品台来控制切片。

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