专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06821906B2 Method and apparatus for treating surface of substrate plate 失效
标题翻译：用于处理基板表面的方法和装置
公开(公告)号：US06821906B2
公开(公告)日：2004-11-23
申请号：US09988559
申请日：2001-11-20
申请人： Kenya Wada , Kazuto Kinoshita , Kazuhiko Gommori
发明人： Kenya Wada , Kazuto Kinoshita , Kazuhiko Gommori
IPC分类号： H01L2100
CPC分类号： B08B7/0057 , B08B7/0035
摘要： Method and apparatus for treating a surface of a substrate plate under irradiation of ultraviolet ray emitted from a dielectric barrier discharge lamp. Upon admission into a treating chamber, oxygen is removed from a treating surface and surrounding atmosphere of a substrate plate in order to suppress energy losses of ultraviolet ray to a minimum.
摘要翻译：用于在从电介质阻挡放电灯发射的紫外线的照射下处理基板的表面的方法和装置。进入处理室时，从基板的处理面和周围的气氛除去氧，以将紫外线的能量损失抑制到最小。

2. 发明授权

US06631726B1 Apparatus and method for processing a substrate 失效
标题翻译：用于处理衬底的装置和方法
公开(公告)号：US06631726B1
公开(公告)日：2003-10-14
申请号：US09631619
申请日：2000-08-04
申请人： Kazuto Kinoshita , Kazuhiko Gommori , Kenya Wada
发明人： Kazuto Kinoshita , Kazuhiko Gommori , Kenya Wada
IPC分类号： B08B704
CPC分类号： H01L21/67115 , B08B7/00 , B08B7/0057 , C03C23/0075 , G02F2001/1316 , G11B23/505 , H01L21/67028 , Y10S134/902
摘要： A lamp house is located face to face with a substrate which is transferred by a conveyer means. A dielectric barrier discharge lamp is provided in the lamp house to irradiate the substrate with ultraviolet light, while a moistened inert gas, consisting of an inert gas and water vapor, is supplied to a space between the substrate and the dielectric barrier discharge lamp from a moistened inert gas generating means. Under irradiation of ultraviolet light from the dielectric barrier discharge lamp, water vapor in the moistened inert gas is split into a reducing active member [H·] and an oxidative active member [·OH].
摘要翻译：一个灯座与一个由传送装置传送的基片面对面。介电阻挡放电灯设置在灯室中以紫外线照射基板，同时由惰性气体和水蒸气组成的润湿惰性气体从基板和介质阻挡放电灯之间的空间润湿惰性气体发生装置。在来自介电阻挡放电灯的紫外线照射下，湿润的惰性气体中的水蒸气被分解成还原活性成分[H]和氧化活性成分[.OH]。

3. 发明授权

US06421932B2 Method and apparatus for drying substrate plates 失效
标题翻译：干燥基板的方法和装置
公开(公告)号：US06421932B2
公开(公告)日：2002-07-23
申请号：US09780498
申请日：2001-02-12
申请人： Kazuhiko Gommori , Kazuto Kinoshita , Isamu Akiba , Masao Sugiyama
发明人： Kazuhiko Gommori , Kazuto Kinoshita , Isamu Akiba , Masao Sugiyama
IPC分类号： F26B300
CPC分类号： F26B5/14 , F26B15/12 , F26B21/004
摘要： While being transferred in substantially horizontal state along a predetermined path of transfer by a conveyer means, a substrate plate is dried by a jet of compressed air which is spurted out from a slit-like mouth of an air knife nozzle crosswise of the entire width of the substrate plate and at a predetermined angle of incidence with respect to a drying surface of the substrate plate to scrape off a liquid. The angle of incidence of jet air is made shallower as soon as the substrate on the conveyer means comes to a point of entry to an air blasting zone and is made deeper at latest when the substrate plate comes to a position immediately before a point of disengagement from the air blasting zone.
摘要翻译：当沿着预定的传送路径以大致水平的状态转移时，通过压缩空气的喷射流干燥衬底板，压缩空气从空气刀喷嘴的狭缝状口喷出，横截面为整个宽度并且相对于基板的干燥表面以预定的入射角度刮去液体。一旦输送装置上的基板进入到喷气区，喷射空气的入射角变得更浅，并且当基板刚刚脱离接合点之前立即变得更深从喷砂区。

4. 发明授权

US06418640B1 Drying apparatus for a substrate and drying method thereof 失效
标题翻译：基材干燥装置及其干燥方法
公开(公告)号：US06418640B1
公开(公告)日：2002-07-16
申请号：US09579134
申请日：2000-05-30
申请人： Hiroshi Fukuda , Yoshitomo Yasuike , Kazuhiko Gommori , Kunio Aburada
发明人： Hiroshi Fukuda , Yoshitomo Yasuike , Kazuhiko Gommori , Kunio Aburada
IPC分类号： F26B300
CPC分类号： H01L21/67034 , F26B5/14 , F26B21/004
摘要： Thin substrate plates are transferred in a horizontal or tilted posture on and by a substrate transfer means. Provided by a substrate transfer path is an air knife nozzle for scraping and drying off a liquid successively from surfaces of the substrates on the substrate transfer means. The air knife nozzle is located substantially at a uniform distance across a drying surface of a substrate plate on the transfer means. The air knife nozzle is provided with a slit-like nozzle hole to spurt jet air to the drying surface from an angular direction relative to a direction perpendicular to the substrate transfer direction and to sweep the substrate across the entire width of the drying surface and with a predetermined angle of incidence relative to the substrate transfer direction. Further, an air augmenting means is located in face to face relation with a corner portion of the substrate which is finally swept by the air knife nozzle, for increasing an amount of jet air to purge a liquid which is gathered in the comer portion as a result of the sweeping action of the air jet nozzle.
摘要翻译：薄衬底板以水平或倾斜的姿势被转移到衬底转移装置上。由基板传送路径提供的是用于从基板传送装置上的基板的表面依次刮取和干燥液体的气刀喷嘴。气刀喷嘴基本上位于传送装置上的基板的干燥表面上的均匀距离处。气刀喷嘴设置有狭缝状喷嘴孔，以从相对于垂直于基板输送方向的方向的角度方向喷射空气到干燥表面，并且在基板的整个宽度上扫掠基板，并且与相对于基板传送方向的预定入射角。此外，空气增加装置与最终被气刀喷嘴扫过的基板的角部面对面地设置，用于增加喷射空气的量以吹扫收集在角部中的液体，作为空气喷嘴的扫掠动作的结果。

5. 发明授权

US5092011A Disk washing apparatus 失效
标题翻译：磁盘清洗装置
公开(公告)号：US5092011A
公开(公告)日：1992-03-03
申请号：US684159
申请日：1991-04-12
申请人： Kazuhiko Gommori , Hisayoshi Ichikawa , Takahisa Ishida
发明人： Kazuhiko Gommori , Hisayoshi Ichikawa , Takahisa Ishida
IPC分类号： G11B23/00 , G11B23/50
CPC分类号： G11B23/505 , G11B23/00 , Y10S134/902
摘要： Described herein is a disk washing apparatus for cleaning substrate disks of memory medium, which comprises in combination: a loader section having a magazine for holding a number of disks to be washed; a working section including a washing stage arranged to wash the front and rear faces of a disk simultaneously with inner and outer peripheral surfaces thereof, a rinsing stage arranged to rinse the front and rear faces of a disk simultaneously with inner and outer peripheral surfaces thereof, and a drying stage adapted to dry a washed and rinsed disk by high speed spin drying; an unloader section having a magazine for accommodating cleaned disks; and disk transfer chucks adapted to transfer disks one after another stepwise from the loader section to the unloader section, passing the disks successively to the washing, rinsing and drying stages of the working section, the washing, rinsing, and drying stages being located in series between the loader and unloader sections.
摘要翻译：这里描述了一种用于清洁存储介质的基板盘的盘清洗装置，其特征在于：组合有一个装载部分，该装载部分具有用于保持多个要清洗的盘的盒; 一个工作部分，包括一个清洗台，用于同时清洗一个盘的内表面和外周表面;清洗台，其布置成与其内外表面同时冲洗盘的前表面和后表面; 以及适于通过高速旋转干燥干燥洗涤和冲洗的盘的干燥阶段; 具有用于容纳清洁的盘的盒的卸载器部分; 以及盘片传送卡盘，其适于将盘片从装载器部分逐步地传送到卸载器部分，将盘依次传送到工作部分的洗涤，漂洗和干燥阶段，洗涤，漂洗和干燥阶段串联在装载机和卸载器部分之间。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式