专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07105074B2 Substrate treating method and apparatus 有权
公开(公告)号：US07105074B2
公开(公告)日：2006-09-12
申请号：US10202279
申请日：2002-07-22
申请人： Osamu Tamada , Tsuyoshi Mitsuhashi , Minobu Matsunaga , Katsushi Yoshioka , Kenji Sugimoto , Kaoru Aoki , Moritaka Yano , Satoshi Yamamoto , Masakazu Sanada , Takashi Nagao , Mitsumasa Kodama
发明人： Osamu Tamada , Tsuyoshi Mitsuhashi , Minobu Matsunaga , Katsushi Yoshioka , Kenji Sugimoto , Kaoru Aoki , Moritaka Yano , Satoshi Yamamoto , Masakazu Sanada , Takashi Nagao , Mitsumasa Kodama
IPC分类号： B05B3/00 , B08B3/00
CPC分类号： H01L21/6715 , H01L21/31133
摘要： A substrate treating apparatus is provided for eliminating wasteful consumption of a treating solution in a treating mode in which the treating solution is delivered in a strip form to a substrate from a treating solution delivery nozzle sweeping over the substrate. In a first aspect of the invention, collecting vessels are arranged around a developing cup surrounding a wafer supported by a wafer holder. The collecting vessels collect part of a developer delivered from a discharge opening of a developer delivery nozzle outwardly of a surface of the wafer. In a second aspect of the invention, collecting vessels are arranged below a developer delivery nozzle, with collecting openings of the collecting vessels opposed to a discharge opening or openings of the delivery nozzle. The collecting vessels are moved longitudinally of the discharge openings according to a position of the developer delivery nozzle relative to the wafer.

2. 发明授权

US06832863B2 Substrate treating apparatus and method 有权
标题翻译：底物处理装置及方法
公开(公告)号：US06832863B2
公开(公告)日：2004-12-21
申请号：US10458719
申请日：2003-06-09
申请人： Kenji Sugimoto , Minobu Matsunaga , Masakazu Sanada , Katsushi Yoshioka , Kaoru Aoki , Moritaka Yano , Satoshi Yamamoto , Tsuyoshi Mitsuhashi , Takashi Nagao , Mitsumasa Kodama
发明人： Kenji Sugimoto , Minobu Matsunaga , Masakazu Sanada , Katsushi Yoshioka , Kaoru Aoki , Moritaka Yano , Satoshi Yamamoto , Tsuyoshi Mitsuhashi , Takashi Nagao , Mitsumasa Kodama
IPC分类号： G03D500
CPC分类号： H01L21/67173 , G03F7/70691 , H01L21/67178 , H01L21/67184 , H01L21/67276 , Y10S414/135 , Y10S414/14
摘要： A series of substrate transport paths for transporting substrates is arranged on upper and lower stories. Substrates are transferable between the substrate transport path on the first story and the substrate transport path on the second story. The paths include a going-only path for transporting the substrates forward, and a return-only path for transporting the substrates in the opposite direction, these paths being arranged on the upper and lower stories. An indexer connects one end of the substrate transport path on one story to one end of the substrate transport path on the other story. An interface connects the other end of the substrate transport path on one story to the other end of the substrate transport path on the other story. This construction efficiently reduces a waiting time due to interference between the substrates transported along the going-only path and the substrates transported along the return-only path.
摘要翻译：用于传送基板的一系列基板传送路径被布置在上层和下层。基底可以在第一层的基底输送路径和第二层的基底输送路径之间转移。这些路径包括用于向前传送基板的唯一路径，以及用于沿相反方向传送基板的返回路径，这些路径布置在上部和下部故事物上。分度器将另一个故事的基底传送路径的一端连接到基底传送路径的一端。一个界面将一个故事的基板传送路径的另一端连接到另一个故事的基板传送路径的另一端。这种构造有效地减少了由沿着仅路径传送的基板与沿着返回路径传送的基板之间的干涉导致的等待时间。

3. 发明授权

US06558053B2 Substrate processing apparatus 有权
公开(公告)号：US06558053B2
公开(公告)日：2003-05-06
申请号：US10125229
申请日：2002-04-18
申请人： Kazuhito Shigemori , Masakazu Sanada , Minobu Matsunaga , Katsushi Yoshioka , Kenji Sugimoto , Kaoru Aoki , Moritaka Yano , Satoshi Yamamoto , Tsuyoshi Mitsuhashi , Takashi Nagao , Mitsumasa Kodama , Yukihiko Inagaki , Yoshihisa Yamada
发明人： Kazuhito Shigemori , Masakazu Sanada , Minobu Matsunaga , Katsushi Yoshioka , Kenji Sugimoto , Kaoru Aoki , Moritaka Yano , Satoshi Yamamoto , Tsuyoshi Mitsuhashi , Takashi Nagao , Mitsumasa Kodama , Yukihiko Inagaki , Yoshihisa Yamada
IPC分类号： G03D500
CPC分类号： H01L21/67161 , H01L21/6715 , H01L21/67167 , H01L21/67178
摘要： A substrate processing apparatus includes a coating section, a developing section, a heat-treating section and a transport mechanism. The coating section has first processing units each for performing a coverage process to supply a photoresist solution to a substrate and cover a surface of the substrate with the photoresist solution, a second processing unit for spinning the substrate, after the coverage process, at high speed to make the photoresist solution into a film, dry the photoresist film, and clean the substrate. All substrates are processed with the same coating conditions to suppress differences in quality among the substrates. The first and second processing units perform the respective processes concurrently to improve the throughput of substrate processing.

4. 发明授权

US5639301A Processing apparatus having parts for thermal and non-thermal treatment of substrates 失效
标题翻译：具有用于基板的热和非热处理的部件的加工装置
公开(公告)号：US5639301A
公开(公告)日：1997-06-17
申请号：US461066
申请日：1995-06-05
申请人： Shigeru Sasada , Kaoru Aoki , Mitsumasa Kodama , Kenji Sugimoto , Yoshiteru Fukutomi , Hidekazu Inoue
发明人： Shigeru Sasada , Kaoru Aoki , Mitsumasa Kodama , Kenji Sugimoto , Yoshiteru Fukutomi , Hidekazu Inoue
IPC分类号： B23P19/00 , H01L21/00 , H01L21/677 , B05C5/00
CPC分类号： H01L21/67173 , H01L21/67178 , H01L21/67276 , Y10S414/135 , Y10S414/137
摘要： An apparatus including a structure which separates a first transport robot (high temperature robot), which accesses a first processing part group including the thermal processing parts, from a second transport robot (low temperature robot) which accesses the only non-thermal processing parts. During circulating transportation of substrates to be processed, heat created at thermal processing parts is prevented from flowing into non-thermal processing parts. Semiconductor wafers are circulated one by one between the first processing part group which includes a hot plate and a second processing part group which does not include a hot plate and processed one at a time at each processing part. The high temperature robot accesses the first processing part group while the low temperature robot accesses the second processing part group. Transfer of a semiconductor wafer between the two robots is performed at a transfer part which is formed using a cool plate. Since the low temperature robot is never subjected to heat, temperatures at the non-thermal processing parts which are included in the second processing part group remain stable even when the low temperature robot accesses the non-thermal processing parts.
摘要翻译：一种包括将第一输送机器人（高温机器人）从第二输送机器人（低温机器人）访问的非热处理部分分离的装置，该第一输送机器人从高温处理部进入第一处理部。在要处理的基板的循环运送期间，防止在热处理部件产生的热量流入非热处理部件。半导体晶片在包括热板的第一处理部分组和不包括热板的第二处理部分组之间逐个循环，并且在每个处理部分一次处理半导体晶片。高温机器人访问第一处理部分组，而低温机器人访问第二处理部分组。在两个机器人之间的半导体晶片的转移是在使用冷板形成的转印部分进行的。由于低温机器人不会受到热量的影响，即使在低温机器人进入非热处理部件时，包含在第二处理部件组中的非热处理部件的温度也保持稳定。

5. 发明授权

US6099643A Apparatus for processing a substrate providing an efficient arrangement and atmospheric isolation of chemical treatment section 失效
标题翻译：用于处理衬底的装置，其提供化学处理部分的有效布置和大气隔离
公开(公告)号：US6099643A
公开(公告)日：2000-08-08
申请号：US993284
申请日：1997-12-18
申请人： Masami Ohtani , Minobu Matsunaga , Tutomu Ueyama , Ryuji Kitakado , Kaoru Aoki
发明人： Masami Ohtani , Minobu Matsunaga , Tutomu Ueyama , Ryuji Kitakado , Kaoru Aoki
IPC分类号： H01L21/00 , B05C13/00
CPC分类号： H01L21/67173 , H01L21/67017 , H01L21/67178 , Y10S414/135 , Y10S414/136 , Y10S414/141
摘要： An atmospheric conditioning unit for supplying temperature- and humidity-controlled air to a chemical processing part (spin coater) is arranged immediately above a chemical processing part, between this chemical processing part and a heat treatment part (including a hot plate and a cool plate). Namely, the chemical processing part, the atmospheric conditioning unit and the heat treatment part are vertically arranged in a stacked manner. The atmospheric conditioning unit receives external air from an opening. A closed partition is provided to block air flow between the atmospheric conditioning unit and a transport area. The temperature- and humidity-controlled air supplied from the atmospheric conditioning unit to the spin coater forms a downflow in the spin coater, and thereafter rises through an opening and joins with the air flowing from the opening, to be introduced into the atmospheric conditioning unit again and reused.
摘要翻译：用于向化学处理部件（旋转涂布机）供给温度和湿度控制的空气的大气调节单元布置在化学处理部件的正上方，该化学处理部件和热处理部件（包括热板和冷却板）。也就是说，化学处理部分，大气调节单元和热处理部分以堆叠的方式垂直布置。大气调节装置从开口接收外部空气。提供一个封闭的隔板以阻挡大气调节单元和运输区域之间的空气流动。从大气调节单元向旋转涂布机供应的温度和湿度控制的空气在旋转涂布机中形成向下流动，然后通过开口上升并与从开口流出的空气接合，以引入大气调节单元再次重复使用。

6. 发明授权

US5963753A Substrate processing apparatus 失效
标题翻译：基板加工装置
公开(公告)号：US5963753A
公开(公告)日：1999-10-05
申请号：US9100
申请日：1998-01-20
申请人： Masami Ohtani , Minobu Matsunaga , Tutomu Ueyama , Ryuji Kitakado , Kaoru Aoki , Masao Tsuji
发明人： Masami Ohtani , Minobu Matsunaga , Tutomu Ueyama , Ryuji Kitakado , Kaoru Aoki , Masao Tsuji
IPC分类号： B65G1/00 , B65G49/07 , G03F7/20 , H01L21/00 , H01L21/02 , H01L21/677 , G03D5/00
CPC分类号： H01L21/67167 , G03F7/7075 , H01L21/67173 , H01L21/67766 , H01L21/67778
摘要： A substrate processing apparatus comprises a first substrate transfer unit having a first transfer path and a second substrate transfer unit having a second transfer path. A spin coating unit and a spin developing unit are arranged along the first transfer path, and a substrate cassette is arranged along the second transfer path. A substrate transport robot of the second substrate transfer unit selectively introduces a substrate received from a substrate transport robot of the first substrate transfer unit in one of external exposure apparatuses arranged on both end portions of the second transfer path, and discharges the substrate from the exposure apparatus for transfering the same to the substrate transport robot of the first substrate transfer unit. Thereby the substrate processing apparatus can avoid or relieve reduction of operational efficiency even if its throughput is different from that of an exposure apparatus.
摘要翻译：基板处理装置包括具有第一传送路径的第一基板传送单元和具有第二传送路径的第二基板传送单元。旋转涂布单元和旋转显影单元沿着第一传送路径布置，并且沿着第二传送路径布置基板盒。第二基板转印单元的基板输送机器人选择性地将从第一基板转印单元的基板输送机器人接收的基板引导到布置在第二输送路径的两端部的外部曝光装置中的一个，并从曝光中排出基板用于将其传送到第一基板传送单元的基板输送机器人的装置。因此，即使其处理量与曝光装置的吞吐量不同，也可以避免或减轻操作效率的降低。

7. 发明申请

US20050162777A1 MAGNETIC HEAD 失效
标题翻译：磁头
公开(公告)号：US20050162777A1
公开(公告)日：2005-07-28
申请号：US11087796
申请日：2005-03-23
申请人： Osamu Onodera , Heikichi Sato , Katsumi Sakata , Kaoru Aoki
发明人： Osamu Onodera , Heikichi Sato , Katsumi Sakata , Kaoru Aoki
IPC分类号： G11B5/187 , G11B5/31 , G11B5/53
CPC分类号： G11B5/1878 , G11B5/3106 , G11B5/53
摘要： A magnetic head having a sliding surface (120) on which a magnetic recording medium is slid, a magnetic gap g formed in the sliding surface for exchanging information signals with the magnetic recording medium, a track width controlling portion for prescribing a track width Tw of the magnetic gap g, with the track width controlling portion being formed by abutting a pair of magnetic core halves (110a, 110b) together, there being track width controlling grooves (111a to 111d) formed in each of the magnetic core halves, metal magnetic films (112a to 112f) provided in association with the magnetic gap g and with the track width controlling portion, and a groove (130) formed in at least one end of the magnetic gap g for extending substantially parallel to the sliding direction of the magnetic recording medium. A length L in μm between a first point of intersection P between the track width controlling groove (111b) formed in one of the magnetic core halves (110a) and one lateral edge of the groove (130) and a second point of intersection Q between the magnetic gap g and the other lateral edge of the groove is related with an intensity of the recording current I [mA] by L≧11.3×lnI−21.9. With the magnetic head, demagnetization produced in the recording track of the magnetic tape is prevented from being produced.
摘要翻译：一种具有滑动表面（120）的磁头，磁记录介质滑动在该磁头上，形成在滑动表面中用于与磁记录介质交换信息信号的磁隙g，轨道宽度控制部分，用于规定轨道宽度Tw 磁隙g，其中轨道宽度控制部分通过将一对磁芯半部（110a，110b）邻接在一起形成，在每个磁芯中形成有轨道宽度控制槽（111a至111d）与磁隙g和轨道宽度控制部分相关联地设置的半个金属磁性膜（112a至112f）以及形成在磁隙g的至少一端中的基本平行于磁记录介质的滑动方向。形成在磁芯半部（110a）中的一个磁道半部（110a）中的磁道宽度控制槽（111b）和沟槽（130）的一个侧边缘之间的第一交点P之间的第一交点P之间的长度L和第二交点磁隙g与槽的另一个侧边之间的Q与记录电流I [mA]的强度相关，L> = 11.3×lnI-21.9。利用磁头，防止在磁带的记录轨道中产生的退磁。

8. 发明授权

US06894868B2 Magnetic head 失效
标题翻译：磁头
公开(公告)号：US06894868B2
公开(公告)日：2005-05-17
申请号：US10381288
申请日：2002-07-23
申请人： Osamu Onodera , Heikichi Sato , Katsumi Sakata , Kaoru Aoki
发明人： Osamu Onodera , Heikichi Sato , Katsumi Sakata , Kaoru Aoki
IPC分类号： G11B5/187 , G11B5/31 , G11B5/53 , G11B5/23
CPC分类号： G11B5/1878 , G11B5/3106 , G11B5/53
摘要： A magnetic head having a sliding surface (120) on which a magnetic recording medium is slid, a magnetic gap g formed in the sliding surface for exchanging information signals with the magnetic recording medium, a track width controlling portion for prescribing a track width Tw of the magnetic gap g, with the track width controlling portion being formed by abutting a pair of magnetic core halves (110a, 110b) together, there being track width controlling grooves (111a to 111d) formed in each of the magnetic core halves, metal magnetic films (112a to 112f) provided in association with the magnetic gap g and with the track width controlling portion, and a groove (130) formed in at least one end of the magnetic gap g for extending substantially parallel to the sliding direction of the magnetic recording medium. A length L in μm between a first point of intersection P between the track width controlling groove (111b) formed in one of the magnetic core halves (110a) and one lateral edge of the groove (130) and a second point of intersection Q between the magnetic gap g and the other lateral edge of the groove is related with an intensity of the recording current I [mA] by L≧11.3×1nI−21.9. With the magnetic head, demagnetization produced in the recording track of the magnetic tape is prevented from being produced.
摘要翻译：一种具有滑动表面（120）的磁头，磁记录介质滑动在该磁头上，形成在滑动表面中用于与磁记录介质交换信息信号的磁隙g，轨道宽度控制部分，用于规定轨道宽度Tw 磁隙g，其中轨道宽度控制部分通过将一对磁芯半部（110a，110b）邻接在一起形成，在每个磁芯中形成有轨道宽度控制槽（111a至111d）与磁隙g和轨道宽度控制部分相关联地设置的半个金属磁性膜（112a至112f）以及形成在磁隙g的至少一端中的基本平行于磁记录介质的滑动方向。形成在磁芯半部（110a）中的一个磁道半部（110a）中的磁道宽度控制槽（111b）和沟槽（130）的一个侧边缘之间的第一交点P之间的第一交点P之间的长度L和第二交点磁隙g与槽的另一个侧边缘之间的Q与记录电流I [mA]的强度相关，L> = 11.3x1nI-21.9。利用磁头，防止在磁带的记录轨道中产生的退磁。

9. 发明授权

US5150511A Method for manufacturing a magnetic transducer head 失效
标题翻译：制造磁性传感器头的方法
公开(公告)号：US5150511A
公开(公告)日：1992-09-29
申请号：US708388
申请日：1991-05-31
申请人： Katsumi Sakata , Tatsuo Kumura , Atsushi Suzuki , Yoshito Ikeda , Kaoru Aoki , Naoto Kojima , Akio Mishima
发明人： Katsumi Sakata , Tatsuo Kumura , Atsushi Suzuki , Yoshito Ikeda , Kaoru Aoki , Naoto Kojima , Akio Mishima
IPC分类号： G11B5/127 , G11B5/187 , G11B5/23
CPC分类号： G11B5/232 , G11B5/1272 , G11B5/187 , Y10T29/49055
摘要： A method for manufacturing a magnetic transducer head in which a track width regulating grooves provided on both edges of a magnetic gap are filled by blowing a powder beam of nonmagnetic material having a very fine particle size to deposit the nonmagnetic material in the grooves. A pair of magnetic core members are bonded together to form a magnetic gap therebetween by providing a metal layer of a bonding surface of the core members and applying a pressure to the core members under an elevated temperature to cause a mutual diffusion of the metal to bond the core members together. Thus the magnetic transducer head can be made without using a high-temperature heat treatment.

10. 发明授权

US3949963A Bottom drain valve construction 失效
标题翻译：底部排水阀结构
公开(公告)号：US3949963A
公开(公告)日：1976-04-13
申请号：US521760
申请日：1974-11-07
申请人： Kaoru Aoki
发明人： Kaoru Aoki
IPC分类号： F16K31/363 , F16K27/02 , F16K31/122 , F16K31/38 , F16K43/00 , F16K51/00
CPC分类号： F16K43/00 , F16K27/02 , F16K31/122 , F16K51/00 , Y10T137/8242
摘要： A bottom drain valve comprises a housing with an upper tubular portion with a top drain opening and an annular valve seat around the drain opening. The drain discharge connects laterally downwardly from the lower part of the upper tubular portion. A valve rod guide and sealing portion of the housing extends below and is aligned with the upper portion and has a valve rod guide bore therethrough. A lower cylindrical portion of the housing has a bottom wall with a piston passage bore and has a first drain chamber below the valve rod guide and sealing portion and a second piston chamber below the drain chamber. A piston guide chamber is defined between the first drain chamber and the second piston chamber. An actuating piston is movable in the second piston chamber and has a central hollow tubular portion which is guided in the piston guide chamber adjacent its upper end and guided through the piston bore adjacent its lower end and out of the lower cylindrical portion. The hollow tubular portion permits draining of the leakage liquid therethrough. A valve member including a rod portion extends through at least part of the hollow tubular portion of the piston and through the valve rod guide bore and the valve rod guide sealing portion. Removable pin means connects the lower end of the valve rod to the piston. The valve member has a valve head on the rod portion engageable on the valve seat to close the opening and it is movable with said rod portion upwardly off the valve seat to open the opening.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式