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1. 发明申请

US20070148594A1 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US20070148594A1
公开(公告)日：2007-06-28
申请号：US11645751
申请日：2006-12-27
申请人： Kenji Funatsu , Tomohiro Kobayashi , Koji Hasegawa , Tsunehiro Nishi
发明人： Kenji Funatsu , Tomohiro Kobayashi , Koji Hasegawa , Tsunehiro Nishi
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , C08F220/06 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0046 , Y10S430/108 , Y10S430/111
摘要： A polymer is provided comprising recurring units having formulas (1), (2), (3), (4), (5), and (6) in amounts of 1-60 mol % (1), 1-60 mol % (2), 1-50 mol % (3), 0-60 mol % (4), 0-30 mol % (5), and 0-30 mol % (6), and having a Mw of 3,000-30,000 and a Mw/Mn of 1.5-2.5. R1, R3, R4, R7, R9, and R11 are H or CH3, Y is methylene or O, R2 is CO2R10 when Y is methylene and R2 is H or CO2R10 when Y is O, R10 is C1-C15 alkyl which may be separated by O, R5 and R6 are H or OH, R8 is a tertiary ester type acid-labile protective group, and R12 is OH-containing fluoroalkyl. A resist composition comprising the polymer has a high resolution and is improved in line edge roughness and I/G bias.
摘要翻译：提供的聚合物包含具有式（1），（2），（3），（4），（5）和（6）的重复单元，其含量为1-60mol％（1），1-60mol％（2），1-50mol％（3），0-60mol％（4），0-30mol％（5）和0-30mol％（6），Mw为3,000〜 Mw / Mn为1.5-2.5。 R 1，R 3，R 4，R 7，R 9，和R 11是H或CH 3，Y是亚甲基或O，R 2是CO 2 R 2，当Y为O时，当Y为亚甲基且R 2为H或CO 2 R 10时，SUP> 10 > 10是C 1 -C 15烷基，其可以被O，R 5和R 6分开， / SUP>是H或OH，R 8是叔酯型酸不稳定保护基，R 12是含OH的氟代烷基。包含聚合物的抗蚀剂组合物具有高分辨率并且在线边缘粗糙度和I / G偏压方面得到改善。

2. 发明授权

US07718342B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07718342B2
公开(公告)日：2010-05-18
申请号：US11645751
申请日：2006-12-27
申请人： Kenji Funatsu , Tomohiro Kobayashi , Koji Hasegawa , Tsunehiro Nishi
发明人： Kenji Funatsu , Tomohiro Kobayashi , Koji Hasegawa , Tsunehiro Nishi
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0397 , C08F220/06 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0046 , Y10S430/108 , Y10S430/111
摘要： A polymer is provided comprising recurring units having formulas (1), (2), (3), (4), (5), and (6) in amounts of 1-60 mol % (1), 1-60 mol % (2), 1-50 mol % (3), 0-60 mol % (4), 0-30 mol % (5), and 0-30 mol % (6), and having a Mw of 3,000-30,000 and a Mw/Mn of 1.5-2.5. R1, R3, R4, R7, R9, and R11 are H or CH3, Y is methylene or O, R2 is CO2R10 when Y is methylene and R2 is H or CO2R10 when Y is O, R10 is C1-C15 alkyl which may be separated by O, R5 and R6 are H or OH, R8 is a tertiary ester type acid-labile protective group, and R12 is OH-containing fluoroalkyl. A resist composition comprising the polymer has a high resolution and is improved in line edge roughness and I/G bias.
摘要翻译：提供的聚合物包含具有式（1），（2），（3），（4），（5）和（6）的重复单元，其含量为1-60mol％（1），1-60mol％（2），1-50mol％（3），0-60mol％（4），0-30mol％（5）和0-30mol％（6），Mw为3,000〜 Mw / Mn为1.5-2.5。 R 1，R 3，R 4，R 7，R 9和R 11为H或CH 3，Y为亚甲基或O，当Y为亚甲基时，R 2为CO 2 R 10，当Y为O时，R 2为H或CO 2 R 10，R 10为C 1 -C 15烷基由O分隔，R 5和R 6是H或OH，R 8是叔酯型酸不稳定保护基，R 12是含OH的氟代烷基。包含聚合物的抗蚀剂组合物具有高分辨率并且在线边缘粗糙度和I / G偏压方面得到改善。

3. 发明授权

US07135270B2 Resist polymer, resist composition and patterning process 有权
标题翻译：抗蚀聚合物，抗蚀剂组成和图案化工艺
公开(公告)号：US07135270B2
公开(公告)日：2006-11-14
申请号：US10911676
申请日：2004-08-05
申请人： Takeru Watanabe , Tsunehiro Nishi , Junji Tsuchiya , Kenji Funatsu , Koji Hasegawa
发明人： Takeru Watanabe , Tsunehiro Nishi , Junji Tsuchiya , Kenji Funatsu , Koji Hasegawa
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30 , C08F124/00
CPC分类号： C08F220/18 , C08F220/26 , G03F7/0397 , Y10S430/111
摘要： A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of an acid. R1, R2, R3 and R6 are H or CH3, R4 and R5 are H or OH, X is a tertiary exo-alkyl group having a bicyclo[2.2.1]heptane framework, represented by any of formulae (X-1) to (X-4): wherein R7 is C1–C10 alkyl, and Y is a tertiary alkyl group having an adamantane structure. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and minimized proximity bias and lends itself to micropatterning with electron beams or deep UV for VLSI fabrication.
摘要翻译：包含式（1），（2），（3）和（4）的重复单元的聚合物在酸的作用下增加碱显影剂中的溶解速率。 R 1，R 2，R 3和R 6是H或CH 3 N >，R 4和R 5是H或OH，X是具有双环[2.2.1]庚烷骨架的叔外烷基，由式（X-1）至（X-4）：其中R 7为C 1 -C 10烷基，Y为叔烷基具有金刚烷结构的组。包含本发明聚合物的抗蚀剂组合物对高能量辐射具有敏感性，改进的分辨率和最小化的接近偏压，并且借助于用于VLSI制造的电子束或深UV的微图案化。

4. 发明申请

US20050282083A1 Polymer, resist composition and patterning process 审中-公开
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US20050282083A1
公开(公告)日：2005-12-22
申请号：US11155837
申请日：2005-06-20
申请人： Kenji Funatsu , Koji Hasegawa , Tsunehiro Nishi
发明人： Kenji Funatsu , Koji Hasegawa , Tsunehiro Nishi
IPC分类号： C08F220/26 , G03C1/492 , G03F7/039
CPC分类号： G03F7/0397 , C08F220/26
摘要： A polymer comprising recurring units having formulae (1) and (2) and having a weight average molecular weight of 1,000 to 50,000. In the formulae, R1 and R3 are H or CH3, R4 is alkylene, R2 is a lactone structure-containing substituent group selected from formulae (R2-1) to (R2-4) wherein Y is CH2 or O, R5 is CO2R7 when Y is CH2, or R5 is H or CO2R7 when Y is O, R6 is H or alkyl, and R7 is alkyl which may be separated by at least one oxygen atom. The polymer is used as a base resin to formulate a resist composition, especially a chemically amplified positive resist composition which has a high sensitivity, resolution and dry etch resistance and forms a resist pattern having good substrate adhesion and least roughened sidewalls.
摘要翻译：一种包含具有式（1）和（2）并且重均分子量为1,000至50,000的重复单元的聚合物。在式中，R 1和R 3是H或CH 3，R 4是亚烷基， SUP> 2 是含有内酯结构的取代基，其选自式（R 2-2-2）至（R 2-2），其中Y是CH 当Y是CH 2时，R 2是O，R 5是CO 2 R 7，当Y为O时，R 5为H或CO 2 R 7，R 6为H或烷基 R 7是可被至少一个氧原子分离的烷基。该聚合物用作基础树脂以配制抗蚀剂组合物，特别是具有高灵敏度，分辨率和耐干蚀刻性的化学放大的正性抗蚀剂组合物，并形成具有良好的底物粘附性和最小粗糙化侧壁的抗蚀剂图案。

5. 发明申请

US20050031989A1 Resist polymer, resist composition and patterning process 有权
标题翻译：抗蚀聚合物，抗蚀剂组成和图案化工艺
公开(公告)号：US20050031989A1
公开(公告)日：2005-02-10
申请号：US10911676
申请日：2004-08-05
申请人： Takeru Watanabe , Tsunehiro Nishi , Junji Tsuchiya , Kenji Funatsu , Koji Hasegawa
发明人： Takeru Watanabe , Tsunehiro Nishi , Junji Tsuchiya , Kenji Funatsu , Koji Hasegawa
IPC分类号： G03F7/004 , C08F220/18 , C08F220/26 , C08F220/28 , G03F7/039 , H01L21/027 , G03C1/76
CPC分类号： C08F220/18 , C08F220/26 , G03F7/0397 , Y10S430/111
摘要： A polymer comprising recurring units of formulae (1), (2), (3) and (4) increases a dissolution rate in an alkali developer under the action of an acid. R1, R2, R3 and R6 are H or CH3, R4 and R5 are H or OH, X is a tertiary exo-alkyl group having a bicyclo[2.2.1]heptane framework, represented by any of formulae (X-1) to (X-4): wherein R7 is C1-C10 alkyl, and Y is a tertiary alkyl group having an adamantane structure. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and minimized proximity bias and lends itself to micropatterning with electron beams or deep UV for VLSI fabrication.
摘要翻译：包含式（1），（2），（3）和（4）的重复单元的聚合物在酸的作用下增加碱显影剂中的溶解速率。 R 1，R 2，R 3和R 6是H或CH 3，R 4和R 5是H或OH，X是具有双环[ 2.2.1]庚烷骨架，由式（X-1）至（X-4）中的任一个表示：其中R 7为C 1 -C 10烷基，Y为具有金刚烷结构的叔烷基。包含本发明聚合物的抗蚀剂组合物对高能量辐射具有敏感性，改进的分辨率和最小化的接近偏压，并且借助于用于VLSI制造的电子束或深UV的微图案化。

6. 发明授权

US06667145B1 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US06667145B1
公开(公告)日：2003-12-23
申请号：US09694369
申请日：2000-10-24
申请人： Tsunehiro Nishi , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tomohiro Kobayashi , Jun Hatakeyama
发明人： Tsunehiro Nishi , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tomohiro Kobayashi , Jun Hatakeyama
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A resist composition contains as a base resin a polymer represented by the following formula and having a Mw of 1,000-500,000. R1 is H, methyl or CO2R2, R2 is alkyl, R3 is H, methyl or CH2CO2R2, at least one of R4 to R7 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are independently H or alkyl, at least one of R8 to R11 is a monovalent hydrocarbon group of 2 to 15 carbon atoms containing a —CO2— partial structure, and the reminders are independently H or alkyl, R12 is a polycyclic hydrocarbon group or an alkyl group containing such a polycyclic hydrocarbon group, R13 is an acid labile group, Z is a divalent group of atoms to construct a 5- or 6-membered ring which contains a carboxylate, carbonate or acid anhydride therein, k is 0 or 1, x is a number from more than 0 to 1, “a” to “d” are from 0 to less than 1, x+a+b+c+d=1. The resist composition has significantly improved resolution, substrate adhesiveness, and etching resistance and is very useful in precise microfabrication.
摘要翻译：抗蚀剂组合物包含作为基础树脂的由下式表示的聚合物，其Mw为1,000-500,000.R 1是H，甲基或CO 2 R 2，R 2是烷基，R 3是 H，甲基或CH 2 CO 2 R 2，R 4至R 7中的至少一个是含羧基或羟基的一价烃基，并且提醒独立地为H或烷基，R 8， R 11是含有-CO 2 - 部分结构的2至15个碳原子的一价烃基，并且提醒独立地是H或烷基，R 12是多环烃基或含有这种多环的烷基烃基，R 13是酸不稳定基团，Z是构成其中含有羧酸酯，碳酸酯或酸酐的5-或6-元环的二价原子基团，k是0或1，x是数字从0到1，“a”到“d”从0到小于1，x + a + b + c + d = 1。抗蚀剂组合物具有显着提高的分辨率，基底粘附性和耐蚀刻性，并且在精确微细加工中非常有用。

7. 发明授权

US06794111B2 Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺，新型四氢呋喃化合物及其制备
公开(公告)号：US06794111B2
公开(公告)日：2004-09-21
申请号：US10126877
申请日：2002-04-22
申请人： Tsunehiro Nishi , Takeshi Kinsho , Seiichiro Tachibana , Takeru Watanabe , Koji Hasegawa , Tomohiro Kobayashi
发明人： Tsunehiro Nishi , Takeshi Kinsho , Seiichiro Tachibana , Takeru Watanabe , Koji Hasegawa , Tomohiro Kobayashi
IPC分类号： G03C1492
CPC分类号： G03F7/0395 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1-1) or (1-2) wherein R1, R2, R3 and R4 are H or alkyl, or R1 and R2, and R3 and R4 taken together may form a ring with each pair being alkylene, and k is 0 or 1 and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
摘要翻译：包含式（1-1）或（1-2）的重复单元的聚合物，其中R 1，R 2，R 3和R 4是H或烷基，或R 1和R 2 R 3和R 4一起可以形成一个环，每一对是亚烷基，并且k是0或1，并且具有1,000-500,000的Mw是新的。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率，耐腐蚀性和最小化的溶胀，并且使其自身具有电子束或深UV的微图形化。

8. 发明授权

US08921025B2 Positive resist compositions and patterning process 有权
标题翻译：正极抗蚀剂组成和图案化工艺
公开(公告)号：US08921025B2
公开(公告)日：2014-12-30
申请号：US12793284
申请日：2010-06-03
申请人： Tatsushi Kaneko , Koji Hasegawa , Tsunehiro Nishi
发明人： Tatsushi Kaneko , Koji Hasegawa , Tsunehiro Nishi
IPC分类号： G03F7/00 , G03F7/20 , G03F7/039 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041
摘要： A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. Resin component (A) is a polymer comprising recurring units of formula (1) wherein R1 is H, CH2 or CF3, R2 is an acid labile group, R3 is H or CO2CH3, X is O, S, CH2 or CH2CH2, 0.01≦a
摘要翻译：正型抗蚀剂组合物包含（A）在酸的作用下变得可溶于碱性显影剂的树脂组分和（B）酸产生剂。树脂组分（A）是包含式（1）的重复单元的聚合物，其中R 1是H，CH 2或CF 3，R 2是酸不稳定基团，R 3是H或CO 2 CH 3，X是O，S，CH 2或CH 2 CH 2，0.01＆ ; a <1和0.01＆nlE; b <1。当通过ArF光刻处理时，组合物形成具有令人满意的掩模保真度和最小LWR的图案。

9. 发明授权

US07981589B2 Fluorinated monomer, fluorinated polymer, resist composition and patterning process 有权
标题翻译：氟化单体，含氟聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07981589B2
公开(公告)日：2011-07-19
申请号：US12146375
申请日：2008-06-25
申请人： Koji Hasegawa , Takeshi Kinsho , Katsuhiro Kobayashi , Tsunehiro Nishi , Takeru Watanabe
发明人： Koji Hasegawa , Takeshi Kinsho , Katsuhiro Kobayashi , Tsunehiro Nishi , Takeru Watanabe
IPC分类号： G03F7/004 , C08F32/04 , C08F32/08
CPC分类号： C07C69/67 , C07C69/753 , C07C2601/08 , C07C2602/42 , C08F220/24 , C08F220/26 , C08F232/08 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R1 is H or monovalent C1-C20 hydrocarbon group, R2 is H, F, methyl or trifluoromethyl, R3 and R4 are H or a monovalent C1-C8 hydrocarbon group, or R3 and R4 may form an aliphatic hydrocarbon ring, and A is a divalent C1-C6 hydrocarbon group
摘要翻译：式（1）的氟化单体可用于制备用于制备辐射敏感抗蚀剂组合物的聚合物。 R1是H或一价C1-C20烃基，R2是H，F，甲基或三氟甲基，R3和R4是H或一价C1-C8烃基，或R3和R4可以形成脂族烃环，A是二价C1-C6烃基

10. 发明申请

US20070179309A1 Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process 有权
标题翻译：氟醇制备方法，氟化单体，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US20070179309A1
公开(公告)日：2007-08-02
申请号：US11699390
申请日：2007-01-30
申请人： Koji Hasegawa , Takeshi Kinsho , Tsunehiro Nishi , Masaki Ohashi , Takeru Watanabe
发明人： Koji Hasegawa , Takeshi Kinsho , Tsunehiro Nishi , Masaki Ohashi , Takeru Watanabe
IPC分类号： C07C69/63 , C07C31/34
CPC分类号： G03F7/0395 , C07C29/147 , C07C69/54 , C07C69/653 , C07C69/753 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C08F220/24 , C08F220/28 , C08F232/08 , G03F7/0046 , G03F7/0397 , C07C31/44 , C07C31/42 , C07C35/48
摘要： Fluoroalcohol compounds of formula (4) are prepared by reacting a fluorine compound of formula (1) with reducing agents or organometallic reagents of formulas (2) and (3) wherein R1 is H or a monovalent C1-C20 hydrocarbon group in which any —CH2— moiety may be replaced by —O— or —C(═O)—, R2 is H or a monovalent C1-C6 hydrocarbon group, R3 and R4 are H or a monovalent C1-C8 hydrocarbon group, and M1 is Li, Na, K, Mg, Zn, Al, B, or Si. From the fluoroalcohol compounds, fluorinated monomers can be produced in a simple and economic way, which are useful in producing polymers for the formulation of radiation-sensitive resist compositions.
摘要翻译：通式（1）的氟化合物与式（2）和（3）的还原剂或式（2）和（3）的有机金属试剂反应制备式（4）的氟化醇，其中R 1是H或单价C 其中任何-CH 2 - 部分可被-O-或-C（ - ） - 取代的 - ， - R 2是H或一价C 1 -C 6烃基，R 3和R 4 > 4是H或一价C 1 -C 8烃基，M 1是Li，Na，K， Mg，Zn，Al，B或Si。从氟代醇化合物可以以简单且经济的方式制备氟化单体，其可用于制备用于制备辐射敏感抗蚀剂组合物的聚合物。

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