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    • 5. 发明授权
    • Method for chamfering a wafer
    • 倒角晶圆的方法
    • US06302769B1
    • 2001-10-16
    • US09290176
    • 1999-04-13
    • Kenichiro NishiShirou Murai
    • Kenichiro NishiShirou Murai
    • B24B100
    • H01L21/02021B24B9/065B24D5/02
    • In the wafer chamfering method, there is used a disk-shaped grindstone 8 which includes: a peripheral edge portion serving as a grinding surface 1; a flat portion formed in the central portion of the grinding surface 1 in the width direction thereof; and, two edge portions 5 respectively formed on the two sides of the flat portion 2 in the width direction thereof and made in the form of the shape of the valley portion of the notch portion 4 of a disk-shaped wafer 3 to be chamfered. In operation, in the wafer chamfering method, while rotating the above grindstone 8, the grindstone 8 is revolved in the thickness direction of the wafer 3 to thereby chamfer the wafer 3. Especially, the present wafer chamfering method comprises two steps: that is, a circumferential portion grinding step in which the grindstone is supported such that it stands upright or at right angles to the circumferential portion 6 of the wafer 3 at their respective mutual contact points and only the flat portion of the grindstone 8 is contacted with the mutual contact points to thereby chamfer the peripheral edge portion of the wafer 3; and, a notch portion grinding step in which the grindstone is supported such that it is inclined with respect to the diameter direction of the notch portion of the wafer 3 by an angle of about 45° in the circumferential direction of the wafer 3 and the edge portions 5 or both of the edge portions 5 and flat portion 2 are used to chamfer the notch portion 4 of the wafer 3.
    • 在晶片倒角方法中,使用盘状磨石8,其包括:作为研磨面1的周缘部; 在研磨面1的宽度方向的中央部形成的平坦部, 以及分别形成在平坦部2的宽度方向的两侧的两个边缘部5,并且形成为要倒角的圆盘状晶片3的切口部4的谷部的形状。 在操作中,在晶片倒角方法中,在旋转上述磨石8时,磨石8沿晶片3的厚度方向旋转,从而使晶片3倒角。特别地,本晶片倒角法包括两个步骤: 圆周部分磨削步骤,其中所述磨石被支撑成使得其在它们各自的相互接触点处直立或与所述晶片3的周向部分6成直角,并且所述磨石8的平坦部分仅与所述相互接触 从而使晶片3的周边部分倒角; 以及切屑部研磨工序,其中所述磨石被支撑成使得其相对于所述晶片3的所述切口部分的直径方向在所述晶片3的圆周方向上以约45°的角度倾斜,并且所述边缘 边缘部分5和平坦部分2的部分5或两者用于倒角晶片3的切口部分4。
    • 6. 发明授权
    • Discharge lamp igniting apparatus for performing a feedback control of a
discharge lamp and the like
    • 用于进行放电灯的反馈控制的放电灯点火装置等
    • US5910713A
    • 1999-06-08
    • US129848
    • 1998-08-06
    • Kenichiro NishiSatoshi NagaiKentaro EguchiTakeshi AraiJun BunyaKazutaka ShimizuKoji ShibataIsamu Ogawa
    • Kenichiro NishiSatoshi NagaiKentaro EguchiTakeshi AraiJun BunyaKazutaka ShimizuKoji ShibataIsamu Ogawa
    • H05B37/03H05B41/285H05B41/292H05B41/392G05F1/00
    • H05B41/2851H05B37/03H05B41/2855H05B41/2925H05B41/3921Y02B20/208Y10S315/04
    • A current flowing through a discharge lamp 4 is detected by a current detecting circuit 5, and the detected current is outputted as a lamp current signal A to a feedback control circuit 7 where a difference between the lamp current signal A and the dimming control signal B is obtained and amplified, and then a amplified signal D is outputted to an adder 12 which adds the amplified signal D to the dimming control signal B to constitute a control signal E. The control signal is fed back to a high frequency power supply 2. When a comparing circuit 15 detects that the light level of the dimming control signal B with respect to the full light becomes higher than or equal to 40% to 60%, the feedback circuit is disconnected by operating a switch 13 provided between an error amplifying circuit 9 and an adder 12 to stop the feedback control. When a light level of a discharge lamp 104 is smaller than or equal to a predetermined value, first and second reference voltage 108a and 108b are switched by a two-stage switching circuit 109. A comparator 107 compares a detection voltage 106 of the discharge lamp 104 with the first reference voltage 108a, or the detection voltage 106 with the second reference voltage 108b. When the voltage of the discharge lamp 104 becomes high, a control circuit 110 supplies to a high frequency power supply 102, a control signal 112 for interrupting, or reducing an output of the high frequency power supply 102.
    • 通过电流检测电路5检测流过放电灯4的电流,将检测电流作为灯电流信号A输出到反馈控制电路7,反馈控制电路7将灯电流信号A与调光控制信号B 然后将放大信号D输出到加法器12,加法器12将放大的信号D与调光控制信号B相加,构成控制信号E.控制信号反馈给高频电源2。 当比较电路15检测到调光控制信号B相对于全光的光电平变得高于或等于40%至60%时,通过操作设置在误差放大电路之间的开关13来断开反馈电路, 9和加法器12,以停止反馈控制。 当放电灯104的亮度小于或等于预定值时,第一和第二参考电压108a和108b由两级切换电路109切换。比较器107比较放电灯104的检测电压106 104具有第一参考电压108a,或具有第二参考电压108b的检测电压106。 当放电灯104的电压变高时,控制电路110向高频电源102提供控制信号112,用于中断或降低高频电源102的输出。