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    • 7. 发明授权
    • Semiconductor light-detecting device with alloyed isolating region
    • 具有合金隔离区域的半导体光检测装置
    • US4868622A
    • 1989-09-19
    • US113069
    • 1987-10-27
    • Keitaro Shigenaka
    • Keitaro Shigenaka
    • H01L31/0264H01L27/146H01L31/08H01L31/10
    • H01L27/14649Y10S257/926
    • A semiconductor light detecting device comprises a substrate, a first stacked layer of a first conductivity type formed on the substrate by alternately laminating a compound semimetal layer and a compound semiconductor layer repeatedly, a second stacked layer of a second conductivity type formed on the first stacked layer by alternately laminating the compound semimetal layer and the compound semiconductor layer repeatedly, and an isolation region formed by selectively irradiating the first and second stacked layers with an energy beam. A plurality of light detecting elements isolated from each other by the isolation region are formed on the substrate so as to provide the semiconductor light detecting device.
    • 半导体光检测装置包括:基板,通过交替地层叠复合半金属层和化合物半导体层而在基板上形成的第一导电类型的第一堆叠层,形成在第一堆叠上的第二导电类型的第二堆叠层 通过重复地交替层叠化合物半金属层和化合物半导体层,以及通过用能量束选择性地照射第一层和第二层而形成的隔离区。 在基板上形成由隔离区域彼此隔离的多个光检测元件,以提供半导体光检测装置。
    • 9. 发明授权
    • Method for manufacturing an infrared sensor device
    • 红外线传感器装置的制造方法
    • US07045785B2
    • 2006-05-16
    • US10960987
    • 2004-10-12
    • Yoshinori IidaKeitaro ShigenakaNaoya Mashio
    • Yoshinori IidaKeitaro ShigenakaNaoya Mashio
    • G01J5/20
    • G01J5/08G01J5/0853G01J5/20H01L27/14649H01L27/16
    • A method for manufacturing an infrared sensor, including preparing a substrate including a supporting member made of single crystalline silicon, a first layer made of silicon oxide formed on the supporting member, and a second layer made of single crystalline silicon formed on the first layer, embedding a silicon oxide layer over the second layer, forming an infrared detection pixel in the second layer, the infrared detection pixel having a function of converting heat into an electric signal, fanning a supporting beam line including a U-shaped electric conductor on the silicon oxide layer, while forming a gate electrode of a MOS transistor of a peripheral circuit on the second layer, the gate electrode having an electric conductor with U-shaped cross section, forming an infrared absorption layer on the second layer, the infrared absorption layer having a function of converting an infrared ray into heat, and etching the second layer to form a hole for isolating the infrared detection pixel from of the substrate and suspending the infrared detection pixel within the hole by the supporting beam line.
    • 一种制造红外线传感器的方法,包括制备包括由单晶硅制成的支撑构件的基板,形成在支撑构件上的由氧化硅制成的第一层和形成在第一层上的单晶硅制成的第二层, 在所述第二层上嵌入氧化硅层,在所述第二层中形成红外检测像素,所述红外检测像素具有将热量转换为电信号的功能,在所述硅上扇出包括U形导电体的支撑束线 氧化层,同时在第二层上形成外围电路的MOS晶体管的栅电极,栅电极具有U形横截面的导电体,在第二层上形成红外吸收层,红外线吸收层具有 将红外线转换为热的功能,以及蚀刻第二层以形成用于隔离红外线检测pi的孔 从衬底起xel并通过支撑束线将红外检测像素悬挂在孔内。