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1. 发明授权

US5254418A Method of manufacturing photomask 失效
标题翻译：制造光掩模的方法
公开(公告)号：US5254418A
公开(公告)日：1993-10-19
申请号：US777189
申请日：1991-10-16
申请人： Kazuya Kamon , Junji Miyazaki , Hitoshi Nagata
发明人： Kazuya Kamon , Junji Miyazaki , Hitoshi Nagata
IPC分类号： G03F1/00 , G03F1/28 , G03F1/30 , G03F9/00
CPC分类号： G03F1/28 , G03F1/30
摘要： A method of manufacturing a photomask, according to the present invention, comprises the step of entirely forming an intermediate shifter on a transparent substrate, light shielding layers and a phase shifter such that the thickness of the intermediate shifter successively varies. In edge portion of the phase shifter, thus, the phase of light is continuosly shifted from 0 to 180 degree. As in result, light intensity at the edge portion does not decrease to zero but has a relatively large value, preventing a bridge to be formed.
摘要翻译：根据本发明的制造光掩模的方法包括在透明基板，遮光层和移相器上完全形成中间移位器的步骤，使得中间移位器的厚度依次变化。因此，在移相器的边缘部分，光的相位从0到180度连续地偏移。结果，边缘部分的光强度不降低到零但具有相对较大的值，从而防止形成桥。

2. 发明授权

US5279911A Photomask 失效
标题翻译：光掩模
公开(公告)号：US5279911A
公开(公告)日：1994-01-18
申请号：US793319
申请日：1991-11-15
申请人： Kazuya Kamon , Hitoshi Nagata
发明人： Kazuya Kamon , Hitoshi Nagata
IPC分类号： G03F1/00 , G03F1/38 , G03F1/46 , G03F7/09
CPC分类号： G03F1/38 , G03F1/46 , G03F7/091
摘要： According to the inventive photomask, a light shielding pattern as well as a high reflection film are formed at one major surface side of a transparent substrate. Thus, a focal position in a resist film with respect to light directly passing through the high reflection film is separated from a focal position in the resist film with respect to light multiple-reflected by the high reflection film along the thickness direction of the resist film, whereby the depth of focus is enlarged as the result.
摘要翻译：根据本发明的光掩模，在透明基板的一个主表面侧形成遮光图案以及高反射膜。因此，相对于直接穿过高反射膜的光的抗蚀剂膜中的聚焦位置与抗蚀剂膜的厚度方向相对于高反射膜多次反射的光从抗蚀剂膜的焦点位置分离结果，焦点的深度被扩大。

3. 发明授权

US5328786A Photomask and method of manufacturing the same 失效
标题翻译：光掩模及其制造方法
公开(公告)号：US5328786A
公开(公告)日：1994-07-12
申请号：US760383
申请日：1991-09-16
申请人： Junji Miyazaki , Hitoshi Nagata
发明人： Junji Miyazaki , Hitoshi Nagata
IPC分类号： G03F1/28 , G03F1/34 , G03F1/68 , H01L21/027 , G03F9/00
CPC分类号： G03F1/34 , G03F1/28 , G03F1/30
摘要： The relations in phase between first and second phase regions which are disposed on both sides of light-blocking regions interposing between them are arranged that there is a phase difference between the lights transmitted by the first and second phase regions enough to cancel with each other because of the interference, while the relations in phase between the first and second phase regions and third phase region disposed adjacent to them are arranged that between the lights transmitted by them there is a phase difference about a half of the phase difference between the lights transmitted by the first and second phase regions. Thus, the lights transmitted by the first and second phase regions and prevailing in the back sides of the light-blocking regions cancel with each other because of the interference to enchance the accuracy of the transfer at the edge portions of the light-blocking regions. Moreover, the cancellation of the lights caused by the interference at the boundaries separating the third phase region from the first and second phase regions is weakened to an extent that it exerts no effect on the transference of the pattern. As a result, the mask pattern can be transferred with high resolution without any effect of the configurations of the light-blocking regions.
摘要翻译：布置在插入它们之间的阻光区域的两侧上的第一和第二相位区域之间的相位关系被布置成由第一和第二相位区域传输的光之间存在足够相互抵消的相位差，因为它们彼此抵消，因为当相邻的第一和第二相位区域与第三相位区域之间的相位关系被布置成在它们所传输的光线之间存在大约相差的一半的相位差第一和第二相区域。因此，由于对阻挡区域的边缘部分处的转印精度的干扰，由遮光区域的背面中的第一相位区域和第二相位区域传播的光线彼此抵消。此外，由于在将第三相位区域与第一和第二相位区域分开的边界处的干涉引起的光的消除被削弱到对图案的转移没有影响的程度。结果，可以以高分辨率转印掩模图案，而不会影响遮光区域的配置。

4. 发明授权

US5290647A Photomask and method of manufacturing a photomask 失效
标题翻译：光掩模和制造光掩模的方法
公开(公告)号：US5290647A
公开(公告)日：1994-03-01
申请号：US597373
申请日：1990-10-10
申请人： Junji Miyazaki , Hitoshi Nagata
发明人： Junji Miyazaki , Hitoshi Nagata
IPC分类号： G03F1/29 , G03F9/00
CPC分类号： G03F1/29
摘要： A photomask includes a transparent substrate, a predetermined pattern of a light blocking member disposed on the transparent substrate, and a phase member formed along a peripheral edge of the light blocking member and exposed by a predetermined width. The photomask manufacturing method includes forming a transparent film on a surface of a transparent substrate, forming a predetermined pattern of a light blocking member on the transparent film, forming an etching mask layer on the transparent film and light blocking member, anisotropically etching the etching mask layer to leave the etching mask layer on the transparent film and along a peripheral edge of the light blocking member, and selectively etching the transparent film with the light blocking member and the remaining etching mask layer as a mask to form a phase member of the transparent film along the peripheral edge of the light blocking member.
摘要翻译：光掩模包括透明基板，设置在透明基板上的遮光构件的预定图案，以及沿着遮光构件的周缘形成并以预定宽度曝光的相位构件。光掩模制造方法包括在透明基板的表面上形成透明膜，在透明膜上形成预定图案的遮光部件，在透明膜和遮光部件上形成蚀刻掩模层，各向异性蚀刻蚀刻掩模层，在透明膜上并沿着遮光部件的周缘留下蚀刻掩模层，并用遮光部件和剩余的蚀刻掩模层选择性地蚀刻透明膜作为掩模，以形成透明的相位部件膜沿着遮光构件的周缘。

5. 发明授权

US5427876A Method of manufacturing a photomask 失效
标题翻译：制造光掩模的方法
公开(公告)号：US5427876A
公开(公告)日：1995-06-27
申请号：US47464
申请日：1993-04-19
申请人： Junji Miyazaki , Hitoshi Nagata
发明人： Junji Miyazaki , Hitoshi Nagata
IPC分类号： G03F1/28 , G03F1/68 , G03F1/80 , H01L21/027 , G03F9/00
CPC分类号： G03F1/30 , G03F1/28
摘要： A mask pattern is transferred at a high resolution regardless of the configuration of a light shielding region. A plurality of light shielding members are disposed on a transparent substrate spaced from and parallel to each other. A main phase shifting film is formed in every other region between adjacent light shielding members on the transparent substrate in a direction along the arrangement of the light shielding members. At the periphery of the main phase shifting film, an auxiliary phase shifting film is disposed. Light through the main phase shifting film is 180 degrees out of phase from light through the transparent substrate while light through the auxiliary phase shifting film is 90 degrees out of phase from light through the transparent substrate. Due to the auxiliary phase shifting film, the intensity of transmitted light would not drop to zero at a border region between the main phase shifting film and the transparent substrate. Hence, the mask pattern is transferred at an enhanced transfer accuracy.
摘要翻译：无论遮光区域的构造如何，以高分辨率传送掩模图案。多个遮光构件设置在彼此间隔开并且彼此平行的透明基板上。在透明基板上的相邻的遮光部件之间的沿着遮光部件的配置的方向上的其他区域中形成有主相移膜。在主相移膜的周围设有辅助移相膜。通过主相移膜的光通过透明基板从光线相差180度，而通过辅助移相膜的光通过透明基板从光线相差90度。由于辅助移相膜，透射光的强度在主相移膜和透明基板之间的边界区域不会下降到零。因此，以增强的转印精度传送掩模图案。

6. 发明授权

US07467394B2 Recording medium drive 失效
标题翻译：记录介质驱动
公开(公告)号：US07467394B2
公开(公告)日：2008-12-16
申请号：US10570953
申请日：2004-09-08
申请人： Hitoshi Nagata , Yoshimitsu Fukushima , Yuji Morita , Takeshi Kadowaki
发明人： Hitoshi Nagata , Yoshimitsu Fukushima , Yuji Morita , Takeshi Kadowaki
IPC分类号： G11B17/057 , G11B17/04
CPC分类号： G11B17/057 , G11B17/0285 , G11B17/0288
摘要： The tray 30, which can mount both of a cartridge type recording medium and a bare-disc type recording medium, includes a placing surface 31 having a detection hole 34 for detecting information of the recording medium; a rising portion 32 formed so as to rise from the placing surface 31 at a front side end. The rising portion 32 has a disc holder 35 rotatably provided for positioning the bare-disc type recording medium. Hence, the disc holder 35 can be moved to an accommodation position A for being displaced not to cover the detection hole 34 in the placing surface 31. Accordingly, an area on the placing surface 31, in which detection portions such as the detection hole 34 are formed becomes wider, so that the detection portions such as the detection hole 34 can be sufficiently formed as well as a space for providing the detection portions corresponding to a cartridge containing a variety of information can be sufficiently obtained.
摘要翻译：可以安装盒式记录介质和裸盘型记录介质两者的托盘30包括：具有检测孔34的检测孔34的放置面31，用于检测记录介质的信息; 形成为从前侧侧的载置面31上升的上升部32。上升部分32具有可旋转地设置用于定位裸盘型记录介质的盘保持器35。因此，可以将盘保持器35移动到收纳位置A，以便不会覆盖放置表面31中的检测孔34.因此，放置表面31上的诸如检测孔34 形成得更宽，从而可以充分地形成诸如检测孔34的检测部分，并且可以充分地获得用于提供与包含各种信息的盒相对应的检测部分的空间。

7. 发明授权

US07093270B2 Reproducing/recording apparatus 失效
标题翻译：再现/记录装置
公开(公告)号：US07093270B2
公开(公告)日：2006-08-15
申请号：US10663697
申请日：2003-09-17
申请人： Hitoshi Nagata , Yuji Morita
发明人： Hitoshi Nagata , Yuji Morita
IPC分类号： G11B33/02
CPC分类号： G11B17/057 , G11B17/0283 , G11B17/0285 , G11B17/0288
摘要： A reproducing/recording apparatus includes a first reproducing/recording mechanism (21) for reproducing data from and/or recording data onto a cartridge/disk combination (first disk) (1) or a bare disk (second disk) (2), the disk main body (1A) being contained in the cartridge (1B). The first reproducing/recording mechanism (21) has a traversing mechanism (50) disposed oppositely relative to the recording area of the first disk (1) or the second disk (2), a clamping mechanism (60) disposed oppositely relative to the traversing mechanism (50) with the first disk (1) or the second disk (2) interposed between them in order to clamp the first disk (1) and a keep member (64) adapted to bias the first disk (1) toward the side of the first disk tray at the time of clamping the first disk (1) by the clamping mechanism (60). The disk made to show a right attitude because the disk is pressed by the keep member (64) even when the first disk (1) is pushed up at an edge thereof by the sensor section arranged at the traversing mechanism (50).
摘要翻译：一种再现/记录装置，包括用于从数据盒/盘组合（第一盘）（1）或裸盘（第二盘）（2）再现数据和/或记录数据的第一再现/记录机构（21）盘主体（1A）被容纳在盒（1B）中。第一再现/记录机构（21）具有相对于第一盘（1）或第二盘（2）的记录区域相对设置的横动机构（50），夹持机构（60）相对于横向机构（50）与第一盘（1）或第二盘（2）插入在它们之间以便夹紧第一盘（1）和保持构件（64），适于将第一盘（1）朝向侧在第一盘（1）通过夹紧机构（60）夹持时，第一盘托盘的位置。即使当第一盘（1）在布置在横动机构（50）处的传感器部分的边缘被向上推动时，由于盘被保持构件（64）按压而使盘呈现出正确的姿态。

8. 发明授权

US06757223B1 System for carrying and reproducing a disc 失效
标题翻译：用于携带和再现光盘的系统
公开(公告)号：US06757223B1
公开(公告)日：2004-06-29
申请号：US09197495
申请日：1998-11-23
申请人： Yuji Ikedo , Yoshimitsu Fukushima , Hitoshi Nagata , Atsushi Yamane
发明人： Yuji Ikedo , Yoshimitsu Fukushima , Hitoshi Nagata , Atsushi Yamane
IPC分类号： G11B1724
CPC分类号： G11B17/24
摘要： An annular disc holder has a plurality of partition plates for holding a plurality of discs in an upright position, and a reproducing device is provided for reproducing a desired disc. A carrying device is provided for carrying the desired disc between the disc holder and the reproducing device. The partition plates are radially arranged. The carrying means is provided for returning the desired disc to the disc holder from a large width portion between the partition plates.
摘要翻译：环形盘保持器具有用于将多个盘保持在直立位置的多个分隔板，并且提供再现装置以再现期望的盘。提供携带装置用于在盘保持器和再现装置之间承载期望的盘。分隔板径向布置。传送装置用于将所需的盘从分隔板之间的大宽度部分返回到盘保持器。

9. 发明授权

US06690627B2 System for reproducing a recorded disc 失效
标题翻译：用于再现记录盘的系统
公开(公告)号：US06690627B2
公开(公告)日：2004-02-10
申请号：US09190600
申请日：1998-11-12
申请人： Yoshimitsu Fukushima , Yuji Ikedo , Hiroyuki Watanabe , Hitoshi Nagata , Atsushi Yamane
发明人： Yoshimitsu Fukushima , Yuji Ikedo , Hiroyuki Watanabe , Hitoshi Nagata , Atsushi Yamane
IPC分类号： G11B2108
CPC分类号： G11B17/24 , G11B17/225
摘要： A disc holder is annularly provided for holding a plurality of discs, and a reproducing device is provided in a central portion of the disc holder for reproducing a desired disc. A carrying device is provided for carrying the desired disc between the disc holder and the reproducing device. The carrying device has a groove for slidably engaging with a peripheral portion of the desired disc, and a pair of inclined surfaces for separating adjacent discs on both sides of the desired disc from the desired disc.
摘要翻译：环形地设置有用于保持多个盘的盘保持器，并且在盘保持器的中心部分中设置再现装置以再现期望的盘。提供携带装置用于在盘保持器和再现装置之间承载期望的盘。承载装置具有用于与期望的盘的周边部分可滑动地接合的凹槽和用于将期望的盘的两侧上的相邻盘与期望的盘分离的一对倾斜表面。

10. 发明授权

US06586335B1 Thin film transistor and method of manufacturing the same 有权
标题翻译：薄膜晶体管及其制造方法
公开(公告)号：US06586335B1
公开(公告)日：2003-07-01
申请号：US09645981
申请日：2000-10-11
申请人： Kazuyuki Sakata , Kazunori Inoue , Takeshi Morita , Hitoshi Nagata
发明人： Kazuyuki Sakata , Kazunori Inoue , Takeshi Morita , Hitoshi Nagata
IPC分类号： H01L2972
CPC分类号： H01L29/66765 , G02B6/0006 , H01L21/28008 , H01L21/32134 , H01L29/41733 , H01L29/42384 , H01L29/458 , H01L29/4908
摘要： A thin film transistor includes: a substrate, a gate electrode, an insulating film, a semiconductor film, a source electrode, a drain electrode, wherein in at least one electrode of the gate electrode, the source electrode and the drain electrode, end portion of the at least one electrode is tapered in such a manner that a thickness decreases in a direction toward end face of the at least one electrode, the at least one electrode being composed of one electrode material, and prescribed physical property of the at least one electrode being changed in a direction perpendicular to a surface of the at least one electrode, so that an etching rate of the at least one electrode is changed in the direction.
摘要翻译：薄膜晶体管包括：基板，栅电极，绝缘膜，半导体膜，源电极，漏电极，其中在栅电极的至少一个电极中，源电极和漏极，端部所述至少一个电极的厚度在朝向所述至少一个电极的端面的方向上减小，所述至少一个电极由一个电极材料构成，并且所述至少一个电极的规定的物理性质电极在垂直于至少一个电极的表面的方向上变化，使得至少一个电极的蚀刻速率在该方向上改变。

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