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1. 发明授权

US4758864A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US4758864A
公开(公告)日：1988-07-19
申请号：US88143
申请日：1987-08-21
申请人： Kazumasa Endo , Yasuhisa Matsumoto
发明人： Kazumasa Endo , Yasuhisa Matsumoto
IPC分类号： G01B11/00 , G03B27/32 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/68 , G03B27/52 , G03B27/70
CPC分类号： G03F9/70
摘要： A projection exposure apparatus on which are placed a reticle whose pattern is comprised of an area transmitting a radiation therethrough and an area not transmitting the radiation therethrough and a substrate includes a projection optical system for projecting the pattern formed on the reticle onto the substrate, the projection optical system being telecentric on the substrate side, a device producing a radiation beam for alignment of the reticle and the substrate, an alignment device for supplying the radiation beam onto the substrate through the reticle and the projection optical system and detecting the relative positional relation between the reticle and the substrate through the projection optical system, a device for imparting displacement to the projection optical system to the position of incidence of the radiation beam onto the projection optical system by the alignment device, a device for outputting a position signal conforming to the relative position of the optic axis of the projection optical system and the position of incidence, and a deflecting device responsive to the position signal to deflect the angle of the principal ray of the radiation beam entering the projection optical system so that the telecentricity of the projection optical system on the substrate side is maintained.
摘要翻译：一种投影曝光装置，其上装有图案由透射辐射的区域和不透过辐射的区域构成的掩模版和基板，其包括用于将形成在掩模版上的图案投影到基板上的投影光学系统，投影光学系统在基板侧是远心的，产生用于对准标线片和基板的辐射束的装置，用于通过标线和投影光学系统将辐射束提供到基板上的对准装置，并且检测相对位置关系通过所述投影光学系统在所述掩模版和所述基板之间，通过所述对准装置向所述投影光学系统施加位移到所述投影光学系统的入射位置的装置，用于输出符合光轴的相对位置投影光学系统和入射位置，以及响应于位置信号的偏转装置偏转入射投影光学系统的辐射束的主光线的角度，使得投影光学系统在基板侧的远心度为保持。

2. 发明授权

US4723846A Optical path length compensating optical system in an alignment apparatus 失效
标题翻译：对准装置中的光路长度补偿光学系统
公开(公告)号：US4723846A
公开(公告)日：1988-02-09
申请号：US895953
申请日：1986-08-13
申请人： Makoto Uehara , Kazumasa Endo , Susumu Mori , Shuhei Takagi , Yukio Kakizaki
发明人： Makoto Uehara , Kazumasa Endo , Susumu Mori , Shuhei Takagi , Yukio Kakizaki
IPC分类号： G02B27/00 , G02B26/10 , G03F7/20 , G03F9/00 , G01B11/00 , G02B13/22
CPC分类号： G03F9/70
摘要： An optical path length compensating device comprises a first objective having one focus coincident with a two-dimensional plane and provided for movement along the two-dimensional plane, a second objective having one focus coincident with a predetermined focal plane, first and second reflecting means provided in the optical path between the first objective and the second objective for movement along the optical path, the first reflecting means including at least one reflecting surface for turning the optical path from the first objective by a predetermined angle in a plane parallel to the two-dimensional plane, the second reflecting means including at least one pair of reflecting surfaces for directing the light from the first reflecting means to the second objective, means for moving the first objective and the first reflecting means in operative association with each other, and means for moving the second reflecting means so that the other focus of the first objective and the other focus of the second objective are coincident with each other.
摘要翻译：光路长度补偿装置包括具有与二维平面重合并具有沿着二维平面运动的一个焦点的第一物镜，具有与预定焦平面重合的一个焦点的第二物镜，设置有第一和第二反射装置在第一物镜与第二物镜之间沿着光路移动的光路中，第一反射装置包括至少一个反射表面，用于使光路从第一物镜转动预定角度，所述第二反射装置包括用于将来自所述第一反射装置的光引导到所述第二物镜的至少一对反射表面，用于使所述第一物镜和所述第一反射装置彼此可操作地移动的装置，以及用于移动第二反射装置，使第一个目标的另一个焦点和另一个f 第二个目标的角度彼此重合。

3. 发明授权

US06850371B2 Optical member and method of producing the same, and projection aligner 有权
标题翻译：光学构件及其制造方法以及投影对准器
公开(公告)号：US06850371B2
公开(公告)日：2005-02-01
申请号：US10276434
申请日：2002-03-13
申请人： Hideki Obara , Kazumasa Endo
发明人： Hideki Obara , Kazumasa Endo
IPC分类号： G02B1/02 , G03F7/20 , G02B3/00 , G11B7/00
CPC分类号： C30B29/12 , C30B11/00 , G02B1/02 , G03F7/70216 , G03F7/70958
摘要： An optical member of the invention is an optical member for photolithography used together with light having a wavelength of not more than 250 nm. The optical member is made of a fluoride crystal in which a maximum diameter dmax (cm) of scattering bodies existing internally and a quantity ns of the scattering bodies per 1 cm3 satisfy a condition represented by following formula (1): 0
摘要翻译：本发明的光学构件是与波长不超过250nm的光一起使用的光刻用光学构件。光学构件由氟化物晶体制成，其中内部存在的散射体的最大直径dmax（cm）和每1cm 3的散射体的ns的数量满足下式（1）表示的条件：

4. 再颁专利

USRE37846E1 Projection optical system and exposure apparatus using the same 有权
标题翻译：投影光学系统和使用其的曝光装置
公开(公告)号：USRE37846E1
公开(公告)日：2002-09-17
申请号：US09709518
申请日：2000-11-13
申请人： Hitoshi Matsuzawa , Misako Kobayashi , Kazumasa Endo , Yutaka Suenaga
发明人： Hitoshi Matsuzawa , Misako Kobayashi , Kazumasa Endo , Yutaka Suenaga
IPC分类号： G02B964
CPC分类号： G03F7/70241 , G02B9/62 , G02B13/22 , G02B13/24
摘要： The present invention relates to an exposure apparatus using a projection optical system to realize a small size and the bitelecentricity as securing a wide exposure area and a large numerical aperture and to realize extremely good correction for aberrations, particularly for distortion. The projection optical system comprises a first lens group G1 with a positive refracting power, a second lens group G2 with a negative refracting power, a third lens group G3 with a positive refracting power, a fourth lens group G4 with a negative refracting power, a fifth lens group G5 with a positive refracting power, and a sixth lens group G6 with a positive refracting power in order from the side of the first object R, wherein the second lens group G2 comprises a front lens L2F with a negative refracting power, a rear lens L2R of a negative meniscus shape, and an intermediate lens group G2M disposed between the front lens and the rear lens, and wherein the intermediate lens group G2M has a first lens LM1 with a positive refracting power, a second lens LM2 with a negative refracting power, and a third lens LM3 with a negative refracting power in order from the side of the first object R. The system is arranged to satisfy within suitable ranges of focal lengths for the first to sixth lens groups G1-G6, based on the above arrangement.
摘要翻译：本发明涉及一种使用投影光学系统实现小尺寸和双轴偏心的曝光装置，以确保宽的曝光面积和大的数值孔径，并且特别是对于畸变而实现非常好的像差校正。投影光学系统包括具有正折射力的第一透镜组G1，具有负折射光焦度的第二透镜组G2，具有正折射光焦度的第三透镜组G3，具有负折射光焦度的第四透镜组G4，具有正折射率的第五透镜组G5和从第一对象R侧起依次具有正折射率的第六透镜组G6，其中第二透镜组G2包括具有负折射光焦度的前透镜L2F，具有负弯月形状的后透镜L2R和设置在前透镜和后透镜之间的中间透镜组G2M，并且其中中间透镜组G2M具有正折射率的第一透镜LM1，具有正折射率的第二透镜LM2 折射力的第三透镜LM3和具有负折射力的第三透镜LM3从第一物体R的侧面起依次排列。该系统被布置成满足第一至第六透镜组G1-G6，基于上述布置。

5. 发明授权

US08730465B2 Polarized light defect detection in pupil images 有权
标题翻译：瞳孔图像中的偏振光缺陷检测
公开(公告)号：US08730465B2
公开(公告)日：2014-05-20
申请号：US12314995
申请日：2008-12-19
申请人： Kazumasa Endo , Daisaku Mochida , Toru Yoshikawa , Hiromasa Shibata , Akitoshi Kawai
发明人： Kazumasa Endo , Daisaku Mochida , Toru Yoshikawa , Hiromasa Shibata , Akitoshi Kawai
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/21 , G03F7/70625
摘要： A defect inspecting apparatus inspects defects of a sample having a pattern formed on the surface. The defect inspecting apparatus is provided with a stage which has a sample placed thereon and linearly moves and turns; a light source; an illuminating optical system, which selects a discretionary wavelength region from the light source and epi-illuminates the sample surface through a polarizer and an objective lens; a detecting optical system, which obtains a pupil image, by passing through reflection light applied by the illuminating optical system from the surface of the sample through the objective lens and an analyzer which satisfies the cross-nichols conditions with the polarizer; and a detecting section which detects defects of the sample by comparing the obtained pupil image with a previously stored pupil image. Conformity of the pattern on a substrate to be inspected can be judged in a short time.
摘要翻译：缺陷检查装置检查具有在表面上形成的图案的样品的缺陷。缺陷检查装置设置有放置在其上的样品并且线性地移动和转动的台架; 光源; 照明光学系统，其从光源中选择任意波长区域，并通过偏振器和物镜对样品表面进行外照射; 检测光学系统，其通过经由物镜的表面通过照射光学系统施加的反射光和通过偏振器满足交叉尼可可斯条件的分析仪获得瞳孔图像; 以及检测部，其通过将获得的瞳孔图像与先前存储的瞳孔图像进行比较来检测样本的缺陷。可以在短时间内判断要检查的基板上的图案的一致性。

6. 发明授权

US08705840B2 Defect inspection device and defect inspection method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US08705840B2
公开(公告)日：2014-04-22
申请号：US13096490
申请日：2011-04-28
申请人： Kazumasa Endo
发明人： Kazumasa Endo
IPC分类号： G06K9/00
CPC分类号： G01N21/956 , G01N21/8806 , H01L22/12
摘要： A defect inspection device and an inspection method which can decide the quality of a pattern shape of a sample surface in a short time are provided. A defect inspection device 20 that inspects a defect of a substrate (wafer 10) on which a repeated pattern is formed includes an illumination optical system 21 that has an objective lens 9 and radiates light from a light source 1 onto the repeated pattern formed on the wafer 10 via the objective lens 9, a detection optical system 22 that detects an image of a pupil plane of the objective lens 9 produced by diffracted light of a plurality of orders caused by the repeated pattern and a detection section 23 that detects a defect of the repeated pattern of the wafer 10 from the pupil image obtained.
摘要翻译：提供了能够在短时间内决定样品表面的图案形状的质量的缺陷检查装置和检查方法。检查其上形成有重复图案的基板（晶片10）的缺陷的缺陷检查装置20包括照明光学系统21，其具有物镜9，并将来自光源1的光照射到形成在其上的重复图案上通过物镜9的晶片10，检测光学系统22，其检测由由重复图案引起的多个次序的衍射光产生的物镜9的光瞳面的图像;以及检测部23，其检测缺陷从获得的瞳孔图像中的晶片10的重复图案。

7. 发明授权

US08599370B2 Polarized light defect detection in pupil images 有权
公开(公告)号：US08599370B2
公开(公告)日：2013-12-03
申请号：US12314995
申请日：2008-12-19
申请人： Kazumasa Endo , Daisaku Mochida , Toru Yoshikawa , Hiromasa Shibata , Akitoshi Kawai
发明人： Kazumasa Endo , Daisaku Mochida , Toru Yoshikawa , Hiromasa Shibata , Akitoshi Kawai
IPC分类号： G01N21/88
摘要： A defect inspecting apparatus inspects defects of a sample having a pattern formed on the surface. The defect inspecting apparatus is provided with a stage which has a sample placed thereon and linearly moves and turns; a light source; an illuminating optical system, which selects a discretionary wavelength region from the light source and epi-illuminates the sample surface through a polarizer and an objective lens; a detecting optical system, which obtains a pupil image, by passing through reflection light applied by the illuminating optical system from the surface of the sample through the objective lens and an analyzer which satisfies the cross-nichols conditions with the polarizer; and a detecting section which detects defects of the sample by comparing the obtained pupil image with a previously stored pupil image. Conformity of the pattern on a substrate to be inspected can be judged in a short time.

8. 发明申请

US20050081777A1 Optical member, method of manufacturing the same, and projection exposure system 有权
标题翻译：光学部件及其制造方法以及投影曝光系统
公开(公告)号：US20050081777A1
公开(公告)日：2005-04-21
申请号：US10973260
申请日：2004-10-27
申请人： Hideki Obara , Kazumasa Endo
发明人： Hideki Obara , Kazumasa Endo
IPC分类号： G02B1/02 , G03F7/20 , C30B1/00 , G03B27/42
CPC分类号： C30B29/12 , C30B11/00 , G02B1/02 , G03F7/70216 , G03F7/70958
摘要： A method of manufacturing an optical member includes a crystal growing step and a carving step. The crystal growing step includes melting a mixture of fluoride powder and a scavenger at a melting temperature of a melting point for the fluoride and above, and then crystallizing the melted fluid and further cooling down an obtained fluoride crystal in a temperature range from 1000° C. to 900° C. by a temperature decreasing rate in a range from 0.1 to 5° C./hr. The carving step includes carving an optical member out of the fluoride crystal obtained in the crystal growing step such that the optical member is made of a fluoride crystal in which a maximum diameter dmax of scattering bodies existing internally and a quantity ns of the scattering bodies per 1 cm3 satisfy a condition represented by the following formula (1): 0
摘要翻译：制造光学构件的方法包括晶体生长步骤和雕刻步骤。晶体生长步骤包括在氟化物及其以上的熔点的熔融温度下熔化氟化物粉末和清除剂的混合物，然后使熔融的流体结晶，并在1000℃的温度范围内进一步冷却所得的氟化物晶体至900℃，温度降低率为0.1至5℃/小时。雕刻步骤包括在晶体生长步骤中获得的氟化物晶体中雕刻光学构件，使得光学构件由氟化物晶体制成，其中在内部存在的散射体的最大直径d最大值<！ - SIPO 0 最大 2 2 （cm -1）（1）。 <？in-line-formula description =“In-line Formulas”end =“tail”？>

9. 发明授权

US06262793B1 Method of manufacturing and using correction member to correct aberration in projection exposure apparatus 失效
标题翻译：制造和使用校正构件以校正投影曝光装置中的像差的方法
公开(公告)号：US06262793B1
公开(公告)日：2001-07-17
申请号：US08360515
申请日：1994-12-21
申请人： Toshihiro Sasaya , Kazumasa Endo , Kazuo Ushida
发明人： Toshihiro Sasaya , Kazumasa Endo , Kazuo Ushida
IPC分类号： G03B2742
CPC分类号： G03F7/70308 , F21V5/04 , F21W2131/103 , F21Y2101/00 , G02B3/06 , G02B13/24 , G02B27/0025 , G03F7/70241
摘要： A method of manufacturing an exposure apparatus includes a step of providing a projection optical system that projects a pattern image formed on a mask onto a photosensitive substrate. Additionally, a surface of a correction member having a predetermined thickness is locally tooled or processed in order to correct random aberration that remains in the projection optical system. The tooled correction member is arranged between the mask and the substrate, irrespective of the mask. Furthermore, when the projection optical system is provided, an aberration caused due to the predetermined thickness of the correction member is taken into account in advance.
摘要翻译：制造曝光装置的方法包括提供将形成在掩模上的图案图像投影到感光基板上的投影光学系统的步骤。此外，具有预定厚度的校正构件的表面被局部加工或加工，以便校正残留在投影光学系统中的随机像差。加工的校正构件布置在掩模和基板之间，而不管掩模。此外，当设置投影光学系统时，预先考虑由于校正构件的预定厚度引起的像差。

10. 发明授权

US5835285A Projection optical system and exposure apparatus using the same 失效
公开(公告)号：US5835285A
公开(公告)日：1998-11-10
申请号：US882802
申请日：1997-06-30
申请人： Hitoshi Matsuzawa , Misako Kobayashi , Kazumasa Endo , Yutaka Suenaga
发明人： Hitoshi Matsuzawa , Misako Kobayashi , Kazumasa Endo , Yutaka Suenaga
IPC分类号： G02B9/62 , G02B13/22 , G02B13/24 , G03F7/20 , G02B9/64 , G03C5/00
CPC分类号： G03F7/70241 , G02B13/22 , G02B13/24 , G02B9/62
摘要： The present invention relates to an exposure apparatus using a projection optical system to realize a small size and the bitelecentricity as securing a wide exposure area and a large numerical aperture and to realize extremely good correction for aberrations, particularly for distortion. The projection optical system comprises a first lens group G.sub.1 with a positive refracting power, a second lens group G.sub.2 with a negative refracting power, a third lens group G.sub.3 with a positive refracting power, a fourth lens group G.sub.4 with a negative refracting power, a fifth lens group G.sub.5 with a positive refracting power, and a sixth lens group G.sub.6 with a positive refracting power in order from the side of the first object R, wherein the second lens group G.sub.2 comprises a front lens L.sub.2F with a negative refracting power, a rear lens L.sub.2R of a negative meniscus shape, and an intermediate lens group G.sub.2M disposed between the front lens and the rear lens, and wherein the intermediate lens group G.sub.2M has a first lens L.sub.M1 with a positive refracting power, a second lens L.sub.M2 with a negative refracting power, and a third lens L.sub.M3 with a negative refracting power in order from the side of the first object R. The system is arranged to satisfy within suitable ranges of focal lengths for the first to sixth lens groups G.sub.1 -G.sub.6, based on the above arrangement.

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