会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Polarized light defect detection in pupil images
    • 瞳孔图像中的偏振光缺陷检测
    • US08730465B2
    • 2014-05-20
    • US12314995
    • 2008-12-19
    • Kazumasa EndoDaisaku MochidaToru YoshikawaHiromasa ShibataAkitoshi Kawai
    • Kazumasa EndoDaisaku MochidaToru YoshikawaHiromasa ShibataAkitoshi Kawai
    • G01N21/88
    • G01N21/956G01N21/21G03F7/70625
    • A defect inspecting apparatus inspects defects of a sample having a pattern formed on the surface. The defect inspecting apparatus is provided with a stage which has a sample placed thereon and linearly moves and turns; a light source; an illuminating optical system, which selects a discretionary wavelength region from the light source and epi-illuminates the sample surface through a polarizer and an objective lens; a detecting optical system, which obtains a pupil image, by passing through reflection light applied by the illuminating optical system from the surface of the sample through the objective lens and an analyzer which satisfies the cross-nichols conditions with the polarizer; and a detecting section which detects defects of the sample by comparing the obtained pupil image with a previously stored pupil image. Conformity of the pattern on a substrate to be inspected can be judged in a short time.
    • 缺陷检查装置检查具有在表面上形成的图案的样品的缺陷。 缺陷检查装置设置有放置在其上的样品并且线性地移动和转动的台架; 光源; 照明光学系统,其从光源中选择任意波长区域,并通过偏振器和物镜对样品表面进行外照射; 检测光学系统,其通过经由物镜的表面通过照射光学系统施加的反射光和通过偏振器满足交叉尼可可斯条件的分析仪获得瞳孔图像; 以及检测部,其通过将获得的瞳孔图像与先前存储的瞳孔图像进行比较来检测样本的缺陷。 可以在短时间内判断要检查的基板上的图案的一致性。
    • 3. 发明申请
    • Defect detecting apparatus and defect detecting method
    • 缺陷检测装置和缺陷检测方法
    • US20090147247A1
    • 2009-06-11
    • US12314995
    • 2008-12-19
    • Kazumasa EndoDaisaku MochidaToru YoshikawaHiromasa ShibataAkitoshi Kawai
    • Kazumasa EndoDaisaku MochidaToru YoshikawaHiromasa ShibataAkitoshi Kawai
    • G01N21/88
    • G01N21/956G01N21/21G03F7/70625
    • A defect inspecting apparatus inspects defects of a sample having a pattern formed on the surface. The defect inspecting apparatus is provided with a stage which has a sample placed thereon and linearly moves and turns; a light source; an illuminating optical system, which selects a discretionary wavelength region from the light source and epi-illuminates the sample surface through a polarizer and an objective lens; a detecting optical system, which obtains a pupil image, by passing through reflection light applied by the illuminating optical system from the surface of the sample through the objective lens and an analyzer which satisfies the cross-nichols conditions with the polarizer; and a detecting section which detects defects of the sample by comparing the obtained pupil image with a previously stored pupil image. Conformity of the pattern on a substrate to be inspected can be judged in a short time.
    • 缺陷检查装置检查具有在表面上形成的图案的样品的缺陷。 缺陷检查装置设置有放置在其上的样品并且线性地移动和转动的台架; 光源; 照明光学系统,其从光源中选择任意波长区域,并通过偏振器和物镜对样品表面进行外照射; 检测光学系统,其通过经由物镜的表面通过照射光学系统施加的反射光和通过偏振器满足交叉尼可可斯条件的分析仪获得瞳孔图像; 以及检测部,其通过将获得的瞳孔图像与先前存储的瞳孔图像进行比较来检测样本的缺陷。 可以在短时间内判断要检查的基板上的图案的一致性。
    • 5. 发明申请
    • OPTICAL AMPLIFYING APPARATUS
    • 光学放大装置
    • US20080205460A1
    • 2008-08-28
    • US12014514
    • 2008-01-15
    • Takeo OKANIWAJie WuNobuyuki KagiToru Yoshikawa
    • Takeo OKANIWAJie WuNobuyuki KagiToru Yoshikawa
    • H01S3/13
    • H04B10/294H01S3/06754H01S3/09415H01S3/10015H01S3/10069H01S3/1301H01S3/1305H04B10/2931
    • The present invention provides an optical amplifying apparatus having: a CPU 11 for processing various signals; a plurality of circuits 17, 18 for controlling respective devices 4, 9 required for optical amplification; a first storing unit 14 for storing a program supplied from a user a gate array 12 for storing various parameters for controlling the devices 4, 9, the gate array being updated based on the program which is stored in the first storing unit 14 and sent via the CPU 11; a latch unit 13, provided between the gate array 12 and the circuits 17, 18, for interrupting a signal path from the gate array 12 to the circuits 17, 18 after receiving a starting signal of an update from the CPU 11 until the update being finished and for controlling the circuits 17, 18 based on the parameters stored in the gate array 12 before the signal path is interrupted; and a second storing unit 16 for, at least during the update, storing the various parameters which are stored in the gate array 12 before the update.
    • 本发明提供一种具有:用于处理各种信号的CPU 11的光放大装置; 用于控制光放大所需的各个装置4,9的多个电路17,18; 第一存储单元14,用于存储从用户提供的程序,用于存储用于控制设备4,9的各种参数的门阵列12,基于存储在第一存储单元14中的程序更新门阵列,并经由 CPU 11; 锁存单元13,设置在门阵列12和电路17,18之间,用于在接收到来自CPU 11的更新的起始信号直到更新为止之后中断从门阵列12到电路17,18的信号路径 在信号路径被中断之前基于存储在门阵列12中的参数来完成并控制电路17,18; 以及第二存储单元16,用于至少在更新期间,存储在更新之前存储在门阵列12中的各种参数。
    • 10. 发明申请
    • Inspecting apparatus and inspecting method
    • 检查仪器和检查方法
    • US20100245811A1
    • 2010-09-30
    • US12801339
    • 2010-06-03
    • Toru Yoshikawa
    • Toru Yoshikawa
    • G01N21/00
    • G01B11/24G01N21/9501G01N21/95623
    • An inspecting apparatus (1) obtains a pixel from among pixels of a DMD element (31) for guiding light from a wafer (W) to detecting elements (36a, 36b, 36c), based on luminance information on Fourier image obtained by detection by a two-dimensional imaging element (33) when the inspecting apparatus is set to guide all the light from the wafer (W) to the two-dimensional imaging element (33) by having all the pixels (micro mirrors) of the DMD element (31) in the on-state. Then, the inspecting device brings the obtained pixel of the DMD element (31) into the off-state, reflects a part of the light from the wafer (W) by the pixel in the off-state and guides the light to the detecting elements (36a, 36b, 36c).
    • 检查装置(1)从DMD元件(31)的像素中获取用于将来自晶片(W)的光引导到检测元件(36a,36b,36c)的像素,基于通过检测获得的付里叶图像的亮度信息 当检查装置被设置为通过具有DMD元件的所有像​​素(微镜)将来自晶片(W)的所有光引导到二维成像元件(33)时的二维成像元件(33) 31)在开状态。 然后,检查装置将获得的DMD元件(31)的像素进入截止状态,将处于断开状态的像素的来自晶片(W)的一部分光反射,并将光引导到检测元件 (36a,36b,36c)。