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1. 发明授权

US5835285A Projection optical system and exposure apparatus using the same 失效
公开(公告)号：US5835285A
公开(公告)日：1998-11-10
申请号：US882802
申请日：1997-06-30
申请人： Hitoshi Matsuzawa , Misako Kobayashi , Kazumasa Endo , Yutaka Suenaga
发明人： Hitoshi Matsuzawa , Misako Kobayashi , Kazumasa Endo , Yutaka Suenaga
IPC分类号： G02B9/62 , G02B13/22 , G02B13/24 , G03F7/20 , G02B9/64 , G03C5/00
CPC分类号： G03F7/70241 , G02B13/22 , G02B13/24 , G02B9/62
摘要： The present invention relates to an exposure apparatus using a projection optical system to realize a small size and the bitelecentricity as securing a wide exposure area and a large numerical aperture and to realize extremely good correction for aberrations, particularly for distortion. The projection optical system comprises a first lens group G.sub.1 with a positive refracting power, a second lens group G.sub.2 with a negative refracting power, a third lens group G.sub.3 with a positive refracting power, a fourth lens group G.sub.4 with a negative refracting power, a fifth lens group G.sub.5 with a positive refracting power, and a sixth lens group G.sub.6 with a positive refracting power in order from the side of the first object R, wherein the second lens group G.sub.2 comprises a front lens L.sub.2F with a negative refracting power, a rear lens L.sub.2R of a negative meniscus shape, and an intermediate lens group G.sub.2M disposed between the front lens and the rear lens, and wherein the intermediate lens group G.sub.2M has a first lens L.sub.M1 with a positive refracting power, a second lens L.sub.M2 with a negative refracting power, and a third lens L.sub.M3 with a negative refracting power in order from the side of the first object R. The system is arranged to satisfy within suitable ranges of focal lengths for the first to sixth lens groups G.sub.1 -G.sub.6, based on the above arrangement.

2. 再颁专利

USRE37846E1 Projection optical system and exposure apparatus using the same 有权
标题翻译：投影光学系统和使用其的曝光装置
公开(公告)号：USRE37846E1
公开(公告)日：2002-09-17
申请号：US09709518
申请日：2000-11-13
申请人： Hitoshi Matsuzawa , Misako Kobayashi , Kazumasa Endo , Yutaka Suenaga
发明人： Hitoshi Matsuzawa , Misako Kobayashi , Kazumasa Endo , Yutaka Suenaga
IPC分类号： G02B964
CPC分类号： G03F7/70241 , G02B9/62 , G02B13/22 , G02B13/24
摘要： The present invention relates to an exposure apparatus using a projection optical system to realize a small size and the bitelecentricity as securing a wide exposure area and a large numerical aperture and to realize extremely good correction for aberrations, particularly for distortion. The projection optical system comprises a first lens group G1 with a positive refracting power, a second lens group G2 with a negative refracting power, a third lens group G3 with a positive refracting power, a fourth lens group G4 with a negative refracting power, a fifth lens group G5 with a positive refracting power, and a sixth lens group G6 with a positive refracting power in order from the side of the first object R, wherein the second lens group G2 comprises a front lens L2F with a negative refracting power, a rear lens L2R of a negative meniscus shape, and an intermediate lens group G2M disposed between the front lens and the rear lens, and wherein the intermediate lens group G2M has a first lens LM1 with a positive refracting power, a second lens LM2 with a negative refracting power, and a third lens LM3 with a negative refracting power in order from the side of the first object R. The system is arranged to satisfy within suitable ranges of focal lengths for the first to sixth lens groups G1-G6, based on the above arrangement.
摘要翻译：本发明涉及一种使用投影光学系统实现小尺寸和双轴偏心的曝光装置，以确保宽的曝光面积和大的数值孔径，并且特别是对于畸变而实现非常好的像差校正。投影光学系统包括具有正折射力的第一透镜组G1，具有负折射光焦度的第二透镜组G2，具有正折射光焦度的第三透镜组G3，具有负折射光焦度的第四透镜组G4，具有正折射率的第五透镜组G5和从第一对象R侧起依次具有正折射率的第六透镜组G6，其中第二透镜组G2包括具有负折射光焦度的前透镜L2F，具有负弯月形状的后透镜L2R和设置在前透镜和后透镜之间的中间透镜组G2M，并且其中中间透镜组G2M具有正折射率的第一透镜LM1，具有正折射率的第二透镜LM2 折射力的第三透镜LM3和具有负折射力的第三透镜LM3从第一物体R的侧面起依次排列。该系统被布置成满足第一至第六透镜组G1-G6，基于上述布置。

3. 发明授权

US5781278A Projection optical system and exposure apparatus with the same 失效
标题翻译：投影光学系统和曝光设备相同
公开(公告)号：US5781278A
公开(公告)日：1998-07-14
申请号：US901681
申请日：1997-07-28
申请人： Hitoshi Matsuzawa , Yutaka Suenaga , Misako Kobayashi
发明人： Hitoshi Matsuzawa , Yutaka Suenaga , Misako Kobayashi
IPC分类号： G02B13/24 , G02B13/22 , G03F7/20 , G02B9/62 , G03B27/42 , G03B27/44
CPC分类号： G03F7/70216 , G02B13/22
摘要： The present invention relates to a both-side telecentric projection optical system and an exposure apparatus equipped with this projection optical system. In particular, the projection optical system has a structure for quite favorably correcting various kinds of aberration such as distortion in particular, while securing a relatively broad exposure area and a large numerical aperture.
摘要翻译：本发明涉及一种双侧远心投影光学系统和配备该投影光学系统的曝光装置。特别地，投影光学系统具有在确保相对宽的曝光面积和大的数值孔径的同时特别地适当地校正诸如失真的各种像差的结构。

4. 发明授权

US07588747B2 Singlet oxygen quencher and composition using the same 失效
标题翻译：单线态氧猝灭剂及其组成使用相同
公开(公告)号：US07588747B2
公开(公告)日：2009-09-15
申请号：US10568875
申请日：2004-08-20
申请人： Noboru Naito , Kumi Kameyama , Akemi Takayama , Misako Kobayashi , Yusei Miyamoto , Masashi Kajita
发明人： Noboru Naito , Kumi Kameyama , Akemi Takayama , Misako Kobayashi , Yusei Miyamoto , Masashi Kajita
IPC分类号： D01F9/12
CPC分类号： A61K8/19 , A61K2800/522 , A61Q17/04 , A61Q19/08
摘要： A novel singlet oxygen quencher is disclosed. The quencher consists of a colloidal liquid of a platinum metal group. A composition comprising, as an active ingredient, the singlet oxygen quencher is also disclosed.
摘要翻译：公开了一种新型单线态氧猝灭剂。淬灭剂由铂金属基团的胶体液组成。还公开了包含作为活性成分的单线态氧猝灭剂的组合物。

5. 发明申请

US20070090153A1 Singlet oxygen quencher and composition using the same 失效
标题翻译：单线态氧猝灭剂及其组成使用相同
公开(公告)号：US20070090153A1
公开(公告)日：2007-04-26
申请号：US10568875
申请日：2004-08-20
申请人： Noboru Naito , Kumi Kameyama , Akemi Takayama , Misako Kobayashi , Yusei Miysmoto , Masashi Kajita
发明人： Noboru Naito , Kumi Kameyama , Akemi Takayama , Misako Kobayashi , Yusei Miysmoto , Masashi Kajita
IPC分类号： A47J36/02
CPC分类号： A61K8/19 , A61K2800/522 , A61Q17/04 , A61Q19/08
摘要： A novel singlet oxygen quencher is disclosed. The quencher comprises a colloidal liquid of a platinum metal group. A composition comprising, as an active ingredient, the singlet oxygen quencher is also disclosed.
摘要翻译：公开了一种新型单线态氧猝灭剂。猝灭剂包括铂金属基团的胶态液体。还公开了包含作为活性成分的单线态氧猝灭剂的组合物。

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