专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06340553B1 Positive-working photoresist composition 有权
公开(公告)号：US06340553B1
公开(公告)日：2002-01-22
申请号：US09585616
申请日：2000-06-02
申请人： Katsumi Oomori , Hiroto Yukawa , Akiyoshi Yamazaki , Kazuo Tani , Yohei Kinoshita , Tomotaka Yamada
发明人： Katsumi Oomori , Hiroto Yukawa , Akiyoshi Yamazaki , Kazuo Tani , Yohei Kinoshita , Tomotaka Yamada
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106
摘要： Disclosed is a novel positive-working chemical-amplification photoresist composition used in the photolithographic patterning works in the manufacture of semiconductor devices capable of giving an excellently patterned resist layer with remarkably small film thickness reduction by the development treatment with an aqueous alkaline developer solution in the areas unexposed to patternwise exposure to light. Characteristically, the resinous ingredient in the composition, which is formulated in combination with a radiation-sensitive acid-generating agent and imparted with an increase in the solubility in an alkaline developer solution, is a ternary copolymeric resin consisting of the monomeric units of (a) hydroxystyrene units, (b) styrene units and (c) 1-alkylcyclohexyl (meth)acrylate units each in a specified molar fraction.

2. 发明授权

US06485887B2 Positive-working photoresist composition 有权
标题翻译：正光刻胶组合物
公开(公告)号：US06485887B2
公开(公告)日：2002-11-26
申请号：US09950589
申请日：2001-09-13
申请人： Katsumi Oomori , Hiroto Yukawa , Akiyoshi Yamazaki , Kazuo Tani , Yohei Kinoshita , Tomotaka Yamada
发明人： Katsumi Oomori , Hiroto Yukawa , Akiyoshi Yamazaki , Kazuo Tani , Yohei Kinoshita , Tomotaka Yamada
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106
摘要： Disclosed is a novel positive-working chemical-amplification photoresist composition used in the photolithographic patterning works in the manufacture of semiconductor devices capable of giving an excellently patterned resist layer with remarkably small film thickness reduction by the development treatment with an aqueous alkaline developer solution in the areas unexposed to patternwise exposure to light. Characteristically, the resinous ingredient in the composition, which is formulated in combination with a radiation-sensitive acid-generating agent and imparted with an increase in the solubility in an alkaline developer solution, is a ternary copolymeric resin consisting of the monomeric units of (a) hydroxystyrene units, (b) styrene units and (c) 1-alkylcyclohexyl (meth)acrylate units each in a specified molar fraction.
摘要翻译：公开了一种用于制造半导体器件的光刻图案化工艺中的新型正性化学扩增光致抗蚀剂组合物，该半导体器件能够通过用碱性显影剂水溶液进行显影处理而赋予优异的图案化抗蚀剂层，未暴露于图案曝光的区域。特别地，与辐射敏感的酸产生剂组合配制并赋予在碱性显影剂溶液中的溶解度增加的组合物中的树脂成分是三元共聚树脂，其由（a ）羟基苯乙烯单元，（b）苯乙烯单元和（c）指定摩尔分数的（甲基）丙烯酸1-烷基环己酯单元。

3. 发明授权

US06777158B2 Method for the preparation of a semiconductor device 有权
标题翻译：制备半导体器件的方法
公开(公告)号：US06777158B2
公开(公告)日：2004-08-17
申请号：US09939842
申请日：2001-08-28
申请人： Satoshi Maemori , Kazufumi Sato , Kazuyuki Nitta , Katsumi Oomori , Kazuo Tani , Yohei Kinoshita , Tomotaka Yamada
发明人： Satoshi Maemori , Kazufumi Sato , Kazuyuki Nitta , Katsumi Oomori , Kazuo Tani , Yohei Kinoshita , Tomotaka Yamada
IPC分类号： G03F7004
CPC分类号： G03F7/0392
摘要： The invention discloses an improvement in the photo-lithographic patterning process of a photoresist layer in the manufacture of semiconductor devices in which occurrence of defects in the patterned resist layer can be greatly suppressed resulting in increased reliability of the semiconductor devices and productivity thereof. The improvement can be accomplished by using a chemical-amplification positive-working photoresist composition which exhibits a rate of film thickness reduction in the range from 0.09 to 1.0 nm/second when the photoresist layer before light-exposure is kept in a 2.38% aqueous solution of tetramethylammonium hydroxide at 23° C. to dissolve away the resist layer.
摘要翻译：本发明公开了在半导体器件的制造中光致抗蚀剂层的光刻图案化工艺的改进，其中可以大大抑制图案化抗蚀剂层中的缺陷的发生，从而提高半导体器件的可靠性及其生产率。可以通过使用化学扩增正性光致抗蚀剂组合物来实现改进，当将曝光前的光致抗蚀剂层保持在2.38％的水溶液中时，其表现出在0.09至1.0nm /秒的范围内的膜厚度降低速率的氢氧化四甲铵在23℃下溶解掉抗蚀剂层。

4. 发明授权

US06818380B2 Method for the preparation of a semiconductor device 有权
标题翻译：制备半导体器件的方法
公开(公告)号：US06818380B2
公开(公告)日：2004-11-16
申请号：US10678259
申请日：2003-10-06
申请人： Satoshi Maemori , Kazufumi Sato , Kazuyuki Nitta , Katsumi Oomori , Kazuo Tani , Yohei Kinoshita , Tomotaka Yamada
发明人： Satoshi Maemori , Kazufumi Sato , Kazuyuki Nitta , Katsumi Oomori , Kazuo Tani , Yohei Kinoshita , Tomotaka Yamada
IPC分类号： G03F7004
CPC分类号： G03F7/0392
摘要： The invention discloses an improvement in the photolithographic patterning process of a photoresist layer in the manufacture of semiconductor devices in which occurrence of defects in the patterned resist layer can be greatly suppressed resulting in increased reliability of the semiconductor devices and productivity thereof. The improvement can be accomplished by using a chemical-amplification positive-working photoresist composition which exhibits a rate of film thickness reduction in the range from 0.09 to 1.0 nm/second when the photoresist layer before light-exposure is kept in a 2.38% aqueous solution of tetramethylammonium hydroxide at 23° C. to dissolve away the resist layer.
摘要翻译：本发明公开了在半导体器件的制造中光致抗蚀剂层的光刻图案化工艺的改进，其中可以大大抑制图案化抗蚀剂层中的缺陷的发生，从而提高半导体器件的可靠性及其生产率。可以通过使用化学扩增正性光致抗蚀剂组合物来实现改进，当将曝光前的光致抗蚀剂层保持在2.38％的水溶液中时，其表现出在0.09至1.0nm /秒的范围内的膜厚度降低速率的氢氧化四甲铵在23℃下溶解掉抗蚀剂层。

5. 发明申请

US20060210916A1 Positive photoresist composition and method of forming resist pattern 有权
公开(公告)号：US20060210916A1
公开(公告)日：2006-09-21
申请号：US10566425
申请日：2004-09-17
申请人： Akiyoshi Yamazaki , Kazuo Tani , Naoto Motoike , Satoshi Maemori , Sachiko Yoshizawa
发明人： Akiyoshi Yamazaki , Kazuo Tani , Naoto Motoike , Satoshi Maemori , Sachiko Yoshizawa
IPC分类号： G03C1/00
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition that includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) is a copolymer (A1) containing a first structural unit (a1) derived from hydroxystyrene and a second structural unit (a2) derived from a (meth)acrylate ester having an alcoholic hydroxyl group, in which a portion of the hydroxyl groups of the structural units (a1) and the alcoholic hydroxyl groups of the structural units (a2) have been protected with the acid dissociable, dissolution inhibiting groups; and either the acid generator component (B) includes a diazomethane-based acid generator and an onium salt-based acid generator; or the composition further contains a compound, which contains at least one acid dissociable, dissolution inhibiting group, and generates an organic carboxylic acid under the action of acid generated from the component (B).

6. 发明授权

US07629105B2 Positive photoresist composition and method of forming resist pattern 有权
标题翻译：正型光致抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07629105B2
公开(公告)日：2009-12-08
申请号：US10566425
申请日：2004-09-17
申请人： Akiyoshi Yamazaki , Kazuo Tani , Naoto Motoike , Satoshi Maemori , Sachiko Yoshizawa
发明人： Akiyoshi Yamazaki , Kazuo Tani , Naoto Motoike , Satoshi Maemori , Sachiko Yoshizawa
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition that includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) is a copolymer (A1) containing a first structural unit (a1) derived from hydroxystyrene and a second structural unit (a2) derived from a (meth)acrylate ester having an alcoholic hydroxyl group, in which a portion of the hydroxyl groups of the structural units (a1) and the alcoholic hydroxyl groups of the structural units (a2) have been protected with the acid dissociable, dissolution inhibiting groups; and either the acid generator component (B) includes a diazomethane-based acid generator and an onium salt-based acid generator; or the composition further contains a compound, which contains at least one acid dissociable, dissolution inhibiting group, and generates an organic carboxylic acid under the action of acid generated from the component (B).
摘要翻译：一种正性抗蚀剂组合物，其包含含有酸解离的溶解抑制基团并在酸的作用下表现出增加的碱溶解性的树脂组分（A）和在曝光时产生酸的酸产生剂组分（B），其中所述树脂组分（A）是含有由羟基苯乙烯衍生的第一结构单元（a1）和衍生自具有醇羟基的（甲基）丙烯酸酯的第二结构单元（a2）的共聚物（A1），其中一部分羟基的结构单元（a1）和结构单元（a2）的醇羟基已经被酸解离的溶解抑制基团保护; 并且酸产生剂组分（B）包括重氮甲烷基酸生成剂和鎓盐型酸发生剂; 或者组合物还含有含有至少一个酸解离的溶解抑制基团并在由组分（B）产生的酸的作用下产生有机羧酸的化合物。

7. 发明授权

US08537186B2 Adhesive label and apparatus for producing the same 有权
标题翻译：粘合标签及其制造装置
公开(公告)号：US08537186B2
公开(公告)日：2013-09-17
申请号：US13199952
申请日：2011-09-13
申请人： Kazuo Tani , Norimitsu Sanbongi , Yoshinori Sato
发明人： Kazuo Tani , Norimitsu Sanbongi , Yoshinori Sato
IPC分类号： B41J2/32
CPC分类号： G09F3/10 , B32B7/06 , B32B7/12 , B32B27/06 , B32B27/302 , B32B27/304 , B32B27/306 , B32B27/32 , B32B27/36 , B32B2405/00 , B32B2519/00 , B65C9/25 , C09J7/38 , C09J2201/28 , C09J2203/334 , G09F2003/0247 , G09F2003/025 , G09F2003/026
摘要： An adhesive label includes a pressure-sensitive adhesive agent layer formed on one surface of a support. A non-adhesive heat-reactive layer is positioned above the adhesive agent layer and in which openings are formed by heating at a predetermined temperature or higher. An intermediate layer is positioned between the heat-reactive layer and the adhesive agent layer. The intermediate layer and the heat-reactive layer are each formed thinner than the adhesive agent layer. The intermediate layer facilitates the formation of the openings in the heat-reactive layer with good heat energy efficiency and allows the intermediate layer or the adhesive agent layer to be exposed through the openings.
摘要翻译：粘合剂标签包括形成在支撑体的一个表面上的压敏粘合剂层。非粘合热反应层位于粘合剂层的上方，其中通过在预定温度或更高温度下加热形成开口。中间层位于热反应层和粘合剂层之间。中间层和热反应层各自形成为比粘合剂层更薄。中间层有助于在热反应层中形成具有良好的热能效率的开口，并允许中间层或粘合剂层通过开口露出。

8. 发明申请

US20080190561A1 Apparatus and method for producing a sheet material 审中-公开
标题翻译：用于生产片材的装置和方法
公开(公告)号：US20080190561A1
公开(公告)日：2008-08-14
申请号：US12011380
申请日：2008-01-24
申请人： Norimitsu Sanbongi , Takanori Okayasu , Kazuo Tani , Minoru Hoshino , Noriyoshi Shoji
发明人： Norimitsu Sanbongi , Takanori Okayasu , Kazuo Tani , Minoru Hoshino , Noriyoshi Shoji
IPC分类号： B29C65/00 , B32B37/00
CPC分类号： B32B37/1207 , B32B38/0004 , B32B38/145 , B32B2519/02 , G06K1/14 , G06K19/06046 , G06K19/07749 , G06K19/083
摘要： Provided is an apparatus for producing a sheet material including: an RFID reader (11) for reading information from an RFID tag; a sheet supply unit (12) for supplying the sheet material (4) having a heat-sensitive printing layer on one surface of a sheet-type base material, and having a heat-sensitive adhesive layer on the other surface of the sheet-type base material; a printing unit (13) for performing printing on the heat-sensitive printing layer of the sheet material (4) supplied from the sheet supply unit (12); a thermal activation unit (15) for heating the heat-sensitive adhesive layer of the sheet material (4), which is printed by the printing unit (13), to develop an adhesive force of the heat-sensitive adhesive layer; and a control unit (16) for controlling the thermal activation unit (15) to develop the adhesive force in a predetermined area of the heat-sensitive adhesive layer other than an area facing the RFID tag so as to form an adhesive area to be attached to the article, and for controlling the printing unit (13) to print predetermined information on the heat-sensitive printing layer, based on the information read from the RFID tag by the RFID reader (11), thereby making it possible to match information of the tag with information printed on the sheet material with reliability, and to simply attach the tag to the article.
摘要翻译：提供了一种用于制造片材的设备，包括：用于从RFID标签读取信息的RFID读取器（11）; 用于在片状基材的一个表面上供给具有热敏印刷层的片材（4）的片材供应单元（12），并且在片状基材的另一个表面上具有热敏粘合剂层基材; 印刷单元（13），用于在从片材供应单元（12）供应的片材（4）的热敏印刷层上进行印刷; 用于加热被印刷单元（13）印刷的片材（4）的热敏粘合剂层的热激活单元（15），以形成热敏粘合剂层的粘合力; 以及控制单元（16），用于控制热激活单元（15）在除了RFID标签之外的区域之外的热敏粘合剂层的预定区域中形成粘合力，以形成要附着的粘合区域并且为了控制印刷单元（13），基于由RFID读取器（11）从RFID标签读取的信息，在热敏印刷层上打印预定信息，从而使得可以匹配信息具有可靠性地印在片材上的信息的标签，并且将标签简单地附接到制品上。

9. 发明申请

US20120094064A1 Adhesive label, method of producing the same, and apparatus for producing the same 审中-公开
标题翻译：粘合标签及其制造方法及其制造方法
公开(公告)号：US20120094064A1
公开(公告)日：2012-04-19
申请号：US13200245
申请日：2011-09-21
申请人： Yoshinori Sato , Kazuo Tani , Norimitsu Sanbongi
发明人： Yoshinori Sato , Kazuo Tani , Norimitsu Sanbongi
IPC分类号： B32B3/10 , B28B11/00 , B28B11/14
CPC分类号： G09F3/10 , B65C9/24 , C09J7/38 , C09J2201/28 , G09F2003/0241 , G09F2003/0247 , G09F2003/026 , Y10T428/24314
摘要： To obtain large adhesive strength by forming openings with a sufficient size and high precision in a non-adhesive layer of an adhesive label, and exposing an adhesive agent layer through the openings, heat or a physical force is applied to a non-adhesive layer formed on an adhesive agent layer, which is made of a pressure-sensitive adhesive agent and provided on one surface of a support of an adhesive label, to form openings with respect to slits formed in the non-adhesive layer, and the adhesive agent layer is exposed through the openings.
摘要翻译：为了通过在粘合剂标签的非粘合剂层中形成具有足够尺寸和高精度的开口并且通过开口暴露粘合剂层来获得大的粘合强度，加热或物理力施加到形成的非粘合层在由粘合剂制成并且设置在粘合标签的支撑体的一个表面上的粘合剂层上形成相对于形成在非粘合层中的狭缝的开口，并且粘合剂层是暴露在开口处。

10. 发明申请

US20120069123A1 Adhesive label and apparatus for producing the same 有权
标题翻译：粘合标签及其制造装置
公开(公告)号：US20120069123A1
公开(公告)日：2012-03-22
申请号：US13199952
申请日：2011-09-13
申请人： Kazuo Tani , Norimitsu Sanbongi , Yoshinori Sato
发明人： Kazuo Tani , Norimitsu Sanbongi , Yoshinori Sato
IPC分类号： B41J2/32 , B01J3/04 , C09J7/02 , B32B33/00 , B05C11/00
CPC分类号： G09F3/10 , B32B7/06 , B32B7/12 , B32B27/06 , B32B27/302 , B32B27/304 , B32B27/306 , B32B27/32 , B32B27/36 , B32B2405/00 , B32B2519/00 , B65C9/25 , C09J7/38 , C09J2201/28 , C09J2203/334 , G09F2003/0247 , G09F2003/025 , G09F2003/026
摘要： An adhesive agent label includes an adhesive agent layer which is made of an adhesive agent and is formed on one surface of a support. A non-adhesive heat-reactive layer is positioned above the adhesive agent layer and has openings formed by heating at a predetermined temperature or higher. An intermediate layer is positioned between the heat-reactive layer and the adhesive agent layer. The intermediate layer and the heat-reactive layer are formed thinner than the adhesive agent layer. The intermediate layer facilitates the formation of the openings in the heat-reactive layer with good heat energy efficiency and allows the intermediate layer or adhesive agent layer to be exposed through the openings.
摘要翻译：粘合剂标签包括由粘合剂制成并形成在支撑体的一个表面上的粘合剂层。非粘合性热反应层位于粘合剂层的上方，并且具有通过在预定温度或更高温度下加热形成的开口。中间层位于热反应层和粘合剂层之间。中间层和热反应层形成得比粘合剂层薄。中间层有助于在热反应层中形成具有良好热能效率的开口，并允许中间层或粘合剂层通过开口露出。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式