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1. 发明授权

US5407350A Heat-treatment apparatus 失效
标题翻译：热处理设备
公开(公告)号：US5407350A
公开(公告)日：1995-04-18
申请号：US17378
申请日：1993-02-12
申请人： Katsuhiko Iwabuchi , Takeo Suzuki , Takashi Tozawa , Satoshi Kagatsume , Hirotsugu Shiraiwa
发明人： Katsuhiko Iwabuchi , Takeo Suzuki , Takashi Tozawa , Satoshi Kagatsume , Hirotsugu Shiraiwa
IPC分类号： C23C16/54 , C30B33/00 , C30B35/00 , F27D3/12
CPC分类号： C30B33/00 , C23C16/54 , C30B35/005
摘要： A heat-treatment apparatus comprises a heat-treatment section for subjecting a heat-treatment to a wafer and a loading section for loading a wafer boat into and unloading it from the heat-treatment section. The loading section is connected to the heat-treatment section and includes in it a movable support member, a drive mechanism and a vertical base board as well as a load-lock chamber for maintaining the inside in vacuum. The movable support member supports a wafer boat. The movable support member is attached to a vertical base board so that it can move up and down. The drive mechanism is attached on the major surface of the vertical base board opposite to the surface facing the wafer boat. The drive mechanism drives the movable support to move up and down. The heat-treatment apparatus further comprises a wafer transfer section that includes an orientation flat alignment mechanism and a buffer stage disposed near the orientation flat alignment mechanism. The wafer transfer section includes a wafer cassette means, a buffer stage and a wafer transfer robot for transferring wafers between the orientation flat alignment mechanism and the wafer boat.
摘要翻译：一种热处理装置包括：对晶片进行热处理的热处理部和用于将晶片舟装载到热处理部的装载部。加载部分连接到热处理部分，其中包括可移动支撑部件，驱动机构和垂直基板以及用于将内部保持在真空中的装载锁定室。可移动支撑构件支撑晶片舟。可移动支撑构件附接到垂直底板，使得其可以上下移动。驱动机构附接在垂直基板的与面向晶片舟皿的表面相对的主表面上。驱动机构驱动可动支架上下移动。热处理装置还包括晶片转印部，该晶片转印部包括定位平面对准机构和设置在定向平直对准机构附近的缓冲台。晶片传送部分包括用于在定向平坦对准机构和晶片舟皿之间传送晶片的晶片盒装置，缓冲台和晶片传送机器人。

2. 发明授权

US5224999A Heat treatment apparatus 失效
标题翻译：热处理设备
公开(公告)号：US5224999A
公开(公告)日：1993-07-06
申请号：US910580
申请日：1992-07-08
申请人： Hirotsugu Shiraiwa , Satoshi Kagatsume , Takashi Tozawa
发明人： Hirotsugu Shiraiwa , Satoshi Kagatsume , Takashi Tozawa
IPC分类号： H01L21/31 , C23C16/44 , C23C16/54 , C30B35/00 , H01L21/00 , H01L21/677
CPC分类号： C23C16/4409 , C23C16/54 , C30B35/00 , H01L21/67115 , Y10S156/912
摘要： A vertical type of heat treatment apparatus which houses objects for treatment loaded on a wafer boat, in a process tube and performs heat treatment, and including a cap which opens and closes an opening portion of a manifold and which is disposed on the side of an opening portion of the process tube, a support mechanism which elastically supports the cap and which is provided to a vertical motion mechanism of the wafer boat, and an expandable and contractible airtightness maintenance means which maintains airtightness on the side of the cap, and which is provided between the cap and the vertical motion mechanism.
摘要翻译：一种垂直型的热处理装置，其容纳装载在晶片舟皿上的处理物体，处理管中并执行热处理，并且包括打开和关闭歧管的开口部并且设置在歧管侧处理管的开口部分，支撑机构，其弹性地支撑盖并且设置在晶片舟皿的垂直运动机构上;以及可膨胀和可收缩的气密性维持装置，其保持在盖的侧面上的气密性，设置在盖和垂直运动机构之间。

3. 发明授权

US5054988A Apparatus for transferring semiconductor wafers 失效
标题翻译：用于转移半导体晶圆的装置
公开(公告)号：US5054988A
公开(公告)日：1991-10-08
申请号：US377949
申请日：1989-07-11
申请人： Hirotsugu Shiraiwa
发明人： Hirotsugu Shiraiwa
IPC分类号： B25J15/10 , B25J19/00 , B65G47/90 , B65G49/07 , H01L21/677
CPC分类号： H01L21/67781 , Y10S414/138 , Y10S414/141
摘要： The present invention relates to an apparatus for transferring a plurality of semiconductor wafers from their cassettes to a boat. This apparatus comprises a support body on which the cassettes and the boat are mounted, a lifter for lifting wafers from the cassettes, a handling device for carrying the wafers and transferring them to the boat, and a plurality fans for introducing dust created by the handling device into the support body and removing it outside the support body.
摘要翻译：本发明涉及一种用于将多个半导体晶片从其盒带转移到船上的装置。该装置包括一个其上安装了盒和船的支撑体，一个用于从盒中提升晶片的提升器，一个用于承载晶片并将其转移到船上的处理装置，以及用于引入由处理产生的灰尘的多个风扇装置进入支撑体并将其移出支撑体外部。

4. 发明授权

US5404894A Conveyor apparatus 失效
标题翻译：输送装置
公开(公告)号：US5404894A
公开(公告)日：1995-04-11
申请号：US62611
申请日：1993-05-18
申请人： Hirotsugu Shiraiwa
发明人： Hirotsugu Shiraiwa
IPC分类号： H01L21/00 , H01L21/677 , B65G51/02
CPC分类号： H01L21/67781 , H01L21/67167 , H01L21/6719 , H01L21/67745 , Y10S414/136 , Y10S414/137 , Y10S414/141
摘要： A thermal processing station is provided with a first conveyor that conveys a wafer from a first conveyor access portion and a second conveyor that conveys another wafer from a second conveyor access opening portion. The wafer conveyed from the first conveyor is conveyed along a route consisting of the second conveyor, a washing portion, the second conveyor again, the first conveyor, and a thermal processing portion. On the other hand, the wafer conveyed from the second conveyor is conveyed along a route consisting of the washing portion, the second conveyor again, the first conveyor, and the thermal processing portion. An intermediate transfer portion that is free to rotate and rise and lower is provided between the first and second conveyor. A control section does not rotate the intermediate transfer portion while the wafer is being transferred along the former route, but it does rotate the intermediate transfer portion through 180.degree. for the latter route, to keep the orientation of wafers constant during the thermal processing. In this manner, the orientation of objects to be processed, such as semiconductor wafers, can be easily managed during thermal processing.
摘要翻译：热处理站设置有第一传送器，其从第一传送器访问部分传送晶片和从第二传送器进入开口部分传送另一晶片的第二传送器。从第一输送机输送的晶片沿着由第二输送机，洗涤部分，第二输送机，第一输送机和热处理部分组成的路线输送。另一方面，从第二输送机输送的晶片沿着由洗涤部分，第二输送机，第一输送机和热处理部分组成的路线输送。在第一和第二输送机之间设置有自由旋转和上升和下降的中间转印部分。当晶片沿着前一路线转移时，控制部分不转动中间转印部分，但是为了保持晶片的定向在热处理过程中保持恒定，中间转印部分将中间转印部分转动180°。以这种方式，可以在热处理期间容易地管理诸如半导体晶片的待处理对象的取向。

5. 发明授权

US5203445A Carrier conveying apparatus 失效
标题翻译：载体输送装置
公开(公告)号：US5203445A
公开(公告)日：1993-04-20
申请号：US736647
申请日：1991-07-26
申请人： Hirotsugu Shiraiwa
发明人： Hirotsugu Shiraiwa
IPC分类号： B65G1/00 , B65G47/52 , H01L21/677
CPC分类号： H01L21/67781 , Y10S414/14
摘要： A carrier conveying apparatus comprises a first carrier rest for placing carriers thereon, a second carrier rest to which the carriers are conveyed, a carrier holding member for holding a plurality of carriers at a time from below, a liftably moving mechanism for liftably moving the carrier holding member and a horizontally moving mechanism provided over a distance from below the first carrier rest to a position below the second carrier rest to horizontally move the carrier holding member and liftably moving mechanism. The liftably moving mechanism lifts the carrier holding member from below the first carrier rest and hence lifts the carriers placed on the first carrier rest in a manner to hold them by the carrier holding member. Then the horizontally moving means horizontally moves the carrier holding member and liftably moving mechanism to a position above the second carrier rest. Then the liftably moving mechanism lowers the carrier holding member to place the carriers on the second carrier rest.
摘要翻译：载体输送装置包括用于在其上放置载体的第一载体托架，载体被运送到的第二托架托架，用于在下方一次保持多个托架的托架保持构件，用于可移动地移动托架的可升降运动机构保持构件和水平移动机构，其设置在第一托架下方一定距离处，到第二托架的下方的位置，以使托架保持构件和可移动机构水平移动。可移动机构将托架保持构件从第一承载架的下方提升，并且因此以承载件保持构件的方式提升设置在第一承载架上的承载件。然后水平移动装置使载体保持构件和可升降移动机构水平移动到第二载架的上方。然后，可移动机构降低载体保持构件，以将载体放置在第二载体架上。

6. 发明申请

US20070065581A1 Substrate processing system and method 审中-公开
标题翻译：基板加工系统及方法
公开(公告)号：US20070065581A1
公开(公告)日：2007-03-22
申请号：US11523602
申请日：2006-09-20
申请人： Hirotsugu Shiraiwa
发明人： Hirotsugu Shiraiwa
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： C23C16/54 , H01L21/67201 , H01L21/67745 , H01L21/67748 , H01L21/67754
摘要： A substrate processing system includes: a processing chamber where a substrate is processed; and a carrier device carrying the substrate to/from the processing chamber, wherein the carrier device includes at least two arms each capable of holding a substrate and is capable of switching a state of making the two arms simultaneously enter the processing chamber and a state of making the two arms leave the processing chamber at different timings.
摘要翻译：基板处理系统包括：处理基板的处理室; 以及将所述基板搬运到所述处理室的载体装置，其中，所述载体装置包括至少两个臂，每个臂能够保持基板，并且能够切换使两个臂同时进入所述处理室的状态，使两个武器在不同的时间离开处理室。

7. 发明授权

US5284412A Stock unit for storing carriers 失效
标题翻译：存储承运人的库存单位
公开(公告)号：US5284412A
公开(公告)日：1994-02-08
申请号：US740136
申请日：1991-08-05
申请人： Hirotsugu Shiraiwa , Takashi Tanahashi
发明人： Hirotsugu Shiraiwa , Takashi Tanahashi
IPC分类号： H01L21/677 , B65G1/04
CPC分类号： H01L21/67769 , Y10S414/14
摘要： A stock unit for storing carriers has a stock unit body, a plurality of carrier mounting shelves provided in a side wall of the stock unit body at predetermined spaces in a vertical direction, a carrier station, provided in the lower portion of the stock unit body, receiving and sending a carrier between the stock unit and a carrier part provided in the outside of the stock unit body, a carrier transport device, provided in the lower portion of the stock unit body, for transporting the carrier from the inside of the stock unit body to wafer transfer device provided in the outside of the stock unit body, and a carrier arm mechanism gripping at least one carrier, receiving and sending the carrier between the carrier station and the carrier transport device, and between the carrier mounting shelves and the carrier transport device regardless of the operation of the carrier transport device.
摘要翻译：用于存放托架的库存单元具有库存单元主体，在垂直方向上的预定空间处设置在库单元主体的侧壁中的多个托架安装架，设置在库单元主体的下部的承载站在所述库存单元和设置在所述库存单元的外部的承载部之间接收和发送承载件，设置在所述库存单元主体的下部中的用于从所述库存内部运送所述承运人的承运人运输装置设置在储存单元主体的外部的单元体对晶片转移装置，以及夹持至少一个载体的承载臂机构，在承载站和载体输送装置之间以及载体安装架之间和载体安装架之间接收和发送载体载波传输设备，而不管载波传输设备的操作。

8. 发明授权

US5273423A Heat treatment apparatus 失效
标题翻译：热处理设备
公开(公告)号：US5273423A
公开(公告)日：1993-12-28
申请号：US886873
申请日：1992-05-22
申请人： Hirotsugu Shiraiwa
发明人： Hirotsugu Shiraiwa
IPC分类号： C23C16/44 , C23C16/455 , C23C16/54 , C30B33/00 , H01L21/22 , H01L21/31 , F27D5/00 , F27B9/00
CPC分类号： C30B33/00 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A heat treatment apparatus includes a process tube for heat treatment of an object to be heat treated, and a load lock chamber linked to the process tube and for housing the object to be heat treated and maintaining either a vacuum or maintaining an arbitrary inert gas atmosphere, and with the load lock chamber being provided with an elevator for raising the object to be heat treated on a loading mechanism and into the process tube, and a nozzle unit provided with a plural number of gas emission openings in an inner wall of the load lock chamber on a side opposing the elevator, and to uniformly emit gas to the object to be heat treated and which is on the loading mechanism. By such a configuration, it is possible to emit gas uniformly to the object for heat treatment and which is on the loading mechanism for the object for heat treatment.
摘要翻译：热处理装置包括用于热处理待处理物体的处理管和连接到处理管的负载锁定室，并用于容纳被处理物体并保持真空或保持任意的惰性气体气氛并且在负载锁定室设置有用于将加热物体进行加热处理的物体提升到加工管内的电梯，以及在负载的内壁中设置有多个气体排出口的喷嘴单元锁定室在与电梯相对的一侧，并且均匀地将气体排放到待热处理的物体上，并且位于加载机构上。通过这样的结构，能够将热量均匀地放出到热处理对象物上，该热处理对象物的加载机构。

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