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    • 1. 发明授权
    • Heat-treatment apparatus
    • 热处理设备
    • US5407350A
    • 1995-04-18
    • US17378
    • 1993-02-12
    • Katsuhiko IwabuchiTakeo SuzukiTakashi TozawaSatoshi KagatsumeHirotsugu Shiraiwa
    • Katsuhiko IwabuchiTakeo SuzukiTakashi TozawaSatoshi KagatsumeHirotsugu Shiraiwa
    • C23C16/54C30B33/00C30B35/00F27D3/12
    • C30B33/00C23C16/54C30B35/005
    • A heat-treatment apparatus comprises a heat-treatment section for subjecting a heat-treatment to a wafer and a loading section for loading a wafer boat into and unloading it from the heat-treatment section. The loading section is connected to the heat-treatment section and includes in it a movable support member, a drive mechanism and a vertical base board as well as a load-lock chamber for maintaining the inside in vacuum. The movable support member supports a wafer boat. The movable support member is attached to a vertical base board so that it can move up and down. The drive mechanism is attached on the major surface of the vertical base board opposite to the surface facing the wafer boat. The drive mechanism drives the movable support to move up and down. The heat-treatment apparatus further comprises a wafer transfer section that includes an orientation flat alignment mechanism and a buffer stage disposed near the orientation flat alignment mechanism. The wafer transfer section includes a wafer cassette means, a buffer stage and a wafer transfer robot for transferring wafers between the orientation flat alignment mechanism and the wafer boat.
    • 一种热处理装置包括:对晶片进行热处理的热处理部和用于将晶片舟装载到热处理部的装载部。 加载部分连接到热处理部分,其中包括可移动支撑部件,驱动机构和垂直基板以及用于将内部保持在真空中的装载锁定室。 可移动支撑构件支撑晶片舟。 可移动支撑构件附接到垂直底板,使得其可以上下移动。 驱动机构附接在垂直基板的与面向晶片舟皿的表面相对的主表面上。 驱动机构驱动可动支架上下移动。 热处理装置还包括晶片转印部,该晶片转印部包括定位平面对准机构和设置在定向平直对准机构附近的缓冲台。 晶片传送部分包括用于在定向平坦对准机构和晶片舟皿之间传送晶片的晶片盒装置,缓冲台和晶片传送机器人。