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1. 发明授权

US06806942B2 Projection exposure system 有权
标题翻译：投影曝光系统
公开(公告)号：US06806942B2
公开(公告)日：2004-10-19
申请号：US10434952
申请日：2003-05-08
申请人： Karl-Heinz Schuster , Wilhelm Ulrich , Toralf Gruner , Daniel Kraehmer , Wolfgang Singer , Alexander Epple , Helmut Beierl , Reiner Garreis
发明人： Karl-Heinz Schuster , Wilhelm Ulrich , Toralf Gruner , Daniel Kraehmer , Wolfgang Singer , Alexander Epple , Helmut Beierl , Reiner Garreis
IPC分类号： G03B2754
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： A projection exposure system is proposed which is positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width &dgr;&lgr; about a central working wavelength &lgr;, wherein a relative width &dgr;&lgr;/&lgr; of the wavelength band is larger than 0.002, in particular, larger than 0.005, for example, of the Hg-I-line. The projection exposure system is a so-called three-bulge system comprising three bulges having, as a whole, a positive refractive power and two waists having, as a whole, a negative refractive power. By applying suitable measures, in particular, by suitably selecting the material for the lenses forming the projection exposure system, the long-term stability of the system is increased.
摘要翻译：提出了一种投影曝光系统，其可定位在第一物体和第二物体之间，用于在具有围绕中心工作波长λ的宽度偏差的波长带的光的第二物体的区域内成像第一物体，其中相对宽度波长带的偏差λ/λ大于0.002，特别是大于0.005，例如Hg-I线。投影曝光系统是所谓的三凸起系统，其包括总体上具有正屈光力的三个凸起，以及整体上具有负屈光力的两个凸起。通过适当的措施，特别是通过适当选择形成投影曝光系统的透镜的材料，可以提高系统的长期稳定性。

2. 发明授权

US07310187B2 Projection objective, especially for microlithography, and method for adjusting a projection objective 有权
公开(公告)号：US07310187B2
公开(公告)日：2007-12-18
申请号：US11783966
申请日：2007-04-13
申请人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
发明人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
IPC分类号： G02B3/00 , G02B15/02
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70341
摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature. The method comprises varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and preferably axial displacement of the last optical element in order to set a suitable working distance.

3. 发明授权

US07209292B2 Projection objective, especially for microlithography, and method for adjusting a projection objective 有权
标题翻译：投影目标，特别是微光刻法，以及调整投影物镜的方法
公开(公告)号：US07209292B2
公开(公告)日：2007-04-24
申请号：US10448339
申请日：2003-05-30
申请人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
发明人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
IPC分类号： G02B3/00 , G02B15/02 , G02B27/02
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70341
摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration. The projection objective includes optical elements arranged along an optical axis thereof, which include a first group of elements following the object plane and a last optical element following the first group, which is arranged near the image plane. The last optical element defines an exit surface of the projection objective, which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no or only slight curvature. The method includes varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and axially displacing the last optical element to set a working distance.
摘要翻译：调整投影物镜的方法允许在浸入构型和干构型之间调节投影物镜。投影物镜包括沿其光轴布置的光学元件，其包括在物平面之后的第一组元件和位于第一组之后的最后一个光学元件，其位于图像平面附近。最后一个光学元件限定投影物镜的出射表面，该出射表面设置在距离像平面的工作距离处。最后的光学元件基本上没有屈光力并且没有或仅有微小的曲率。该方法包括通过引入或去除浸没介质来改变最后一个光学元件的厚度，改变出射表面和图像平面之间的空间的折射率，以及轴向移动最后一个光学元件以设定工作距离。

4. 发明申请

US20070188881A1 Projection objective, especially for microlithography, and method for adjusting a projection objective 有权
标题翻译：投影目标，特别是微光刻法，以及调整投影物镜的方法
公开(公告)号：US20070188881A1
公开(公告)日：2007-08-16
申请号：US11783966
申请日：2007-04-13
申请人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
发明人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
IPC分类号： G02B3/00
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70341
摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature. The method comprises varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and preferably axial displacement of the last optical element in order to set a suitable working distance.
摘要翻译：调整投影物镜的方法允许投影物镜在浸没配置和干燥配置之间进行调节，而在系统中几乎没有干预，因此可任选地用作浸没物镜或干物镜。投影物镜具有沿着投影物镜的光轴布置的多个光学元件，光学元件包括跟随物平面的第一组光学元件和紧邻第一组的最后一个光学元件，邻近于图像并且限定投影物镜的离开像面的工作距离处的出射表面。最后一个光学元件基本上没有屈光力并且没有曲率或仅有轻微的曲率。该方法包括改变最后一个光学元件的厚度，通过引入或移除浸没介质来改变出射表面和图像平面之间的空间的折射率，优选地最后一个光学元件的轴向位移，以便设定合适的工作距离

5. 发明授权

US07079331B2 Device for holding a beam splitter element 失效
标题翻译：用于保持分束器元件的装置
公开(公告)号：US07079331B2
公开(公告)日：2006-07-18
申请号：US11109316
申请日：2005-04-19
申请人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
发明人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
IPC分类号： G02B7/02 , G02B27/10 , G02B27/14 , G02B7/18 , G02F1/01
CPC分类号： G03F7/70825 , G02B7/008 , G02B7/1805 , G03F7/70891
摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
摘要翻译：本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的外壳中的至少一个支撑元件。分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在分束器元件

6. 发明申请

US20050248858A1 Device for holding a beam splitter element 失效
标题翻译：用于固定分束器元件的装置
公开(公告)号：US20050248858A1
公开(公告)日：2005-11-10
申请号：US11109316
申请日：2005-04-19
申请人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
发明人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
IPC分类号： G02B7/00 , G02B7/18 , G03F7/20 , G02B5/30 , G02B7/02 , G02B27/28
CPC分类号： G03F7/70825 , G02B7/008 , G02B7/1805 , G03F7/70891
摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
摘要翻译：本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的壳体中的至少一个支撑元件。分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在分束器元件

7. 发明授权

US08605257B2 Projection system with compensation of intensity variations and compensation element therefor 有权
标题翻译：具有强度变化补偿和补偿要素的投影系统
公开(公告)号：US08605257B2
公开(公告)日：2013-12-10
申请号：US11628356
申请日：2005-06-03
申请人： Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer , Guenter Scheible , Sigrid Scheible
发明人： Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
IPC分类号： G03B27/72 , G03B27/68
CPC分类号： G02B13/02 , G02B17/0812 , G02B17/0892 , G03F7/70308
摘要： In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
摘要翻译：在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投射物镜的其余部件的空间传输分布，使得强度分布与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。

8. 发明申请

US20080094599A1 Projection System with Compensation of Intensity Variations and Compensation Element Therefor 有权
标题翻译：具有强度变化和补偿要素补偿的投影系统
公开(公告)号：US20080094599A1
公开(公告)日：2008-04-24
申请号：US11628356
申请日：2005-06-03
申请人： Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
发明人： Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G02B13/02 , G02B17/0812 , G02B17/0892 , G03F7/70308
摘要： In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
摘要翻译：在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投射物镜的其余部件的空间传输分布，使得强度分布与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。

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