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1. 发明申请

US20060280079A1 Optical recording apparatus and method for searching for recording power of the same 失效
标题翻译：用于搜索其记录功率的光学记录装置和方法
公开(公告)号：US20060280079A1
公开(公告)日：2006-12-14
申请号：US11449803
申请日：2006-06-09
申请人： Kang Cho , Yong Ahn
发明人： Kang Cho , Yong Ahn
IPC分类号： G11B7/12 , G11B7/00
CPC分类号： G11B7/1267 , G11B7/0045
摘要： An optical recording apparatus uses a method of searching for a recording power, where the method includes: searching for a first optimum recording power; recording data on an optical disc at the first optimum recording power; determining whether recording environments are changed when a user desires to re-record the data after recording the data in the optical recording apparatus; re-searching for the optimum recording power when the recording environments are changed, and determining the researched optimum recording power to be a second optimum recording power; and recording the data at the second optimum recording power.
摘要翻译：光记录装置使用搜索记录功率的方法，其中该方法包括：搜索第一最佳记录功率; 以第一最佳记录功率在光盘上记录数据; 当在光学记录装置中记录数据之后，当用户期望重新记录数据时，确定是否改变记录环境; 当记录环境改变时重新寻找最佳记录功率，并将研究的最佳记录功率确定为第二最佳记录功率; 并以第二最佳记录功率记录数据。

2. 发明申请

US20050142843A1 Method for forming metallic interconnects in semiconductor devices 失效
标题翻译：在半导体器件中形成金属互连的方法
公开(公告)号：US20050142843A1
公开(公告)日：2005-06-30
申请号：US11026756
申请日：2004-12-30
申请人： Yong Ahn
发明人： Yong Ahn
IPC分类号： H01L21/28 , B32B15/04 , H01L21/3205 , H01L21/44 , H01L21/4763 , H01L21/768
CPC分类号： H01L21/76838 , H01L21/32051
摘要： A method for forming a metallic interconnect in a semiconductor device is disclosed. An example method forms an IDL on a substrate including predetermined devices, forms a via hole in the IDL, depositing a first metal diffusion preventive layer and a metal layer to form a via plug on the IDL, and performs a planarization process using the first metal diffusion preventive layer using as an etching stop layer. In addition, the example method forms a metallic interconnect on the first metal diffusion preventive layer, deposits the other metal diffusion preventive layer on the metallic interconnect, and etches a predetermined part of first and second metal diffusion preventive layers and the metallic interconnect using a mask pattern.
摘要翻译：公开了一种在半导体器件中形成金属互连的方法。示例性方法在包括预定装置的基板上形成IDL，在IDL中形成通孔，沉积第一金属防扩散层和金属层以在IDL上形成通孔塞，并且使用第一金属扩散防止层用作蚀刻停止层。此外，示例性方法在第一金属扩散防止层上形成金属互连，在金属互连上沉积另一金属扩散防止层，并使用掩模蚀刻第一和第二金属防扩散层和金属互连的预定部分模式。

3. 发明申请

US20060280925A1 Rubber composition for studless tire tread 审中-公开
标题翻译：无钉轮胎胎面橡胶组合物
公开(公告)号：US20060280925A1
公开(公告)日：2006-12-14
申请号：US11444690
申请日：2006-06-01
申请人： Jung Kim , Yong Ahn , Sang Kim
发明人： Jung Kim , Yong Ahn , Sang Kim
IPC分类号： B32B25/02
CPC分类号： C08L7/00 , B60C1/0016 , C08J5/046 , C08J2321/00 , C08K3/013 , C08K5/01 , C08K7/02 , C08L9/00 , C08L9/06 , C08L21/00 , C08L77/00 , C08L2205/035 , Y10T428/249933 , Y10T428/249937 , C08L2666/08 , C08L2666/14
摘要： Disclosed is a rubber composition for a studless tire tread, comprising natural rubber, styrene-butadiene rubber and butadiene rubber, as raw rubber, and including 1˜10 parts by weight of co-poly-(paraphenylene/3,4-oxydiphenylene terephthalamide) fiber based on 100 parts by weight of the solid content of the raw rubber. Particularly, this invention provides a rubber composition for a studless tire tread, in which not only ice braking performance but also handling stability on dry roads and wear resistance are increased.
摘要翻译：公开了一种用于无钉防滑轮胎胎面的橡胶组合物，其包含作为生橡胶的天然橡胶，苯乙烯 - 丁二烯橡胶和丁二烯橡胶，并且包括1〜10重量份的共 - 对 - （对苯撑/ 3,4-氧代二亚苯基对苯二甲酰胺）纤维基于100重量份的生橡胶的固体含量。特别地，本发明提供了一种用于无钉防滑轮胎胎面的橡胶组合物，其中不仅制冰性能而且在干路上的处理稳定性和耐磨性都增加。

4. 发明申请

US20060194906A1 Thermally curable resin composition with extended storage stability and good adhesive property 有权
标题翻译：具有延长储存稳定性和良好粘合性能的热固性树脂组合物
公开(公告)号：US20060194906A1
公开(公告)日：2006-08-31
申请号：US11336930
申请日：2006-01-23
申请人： Dong Kim , Seung Lee , Sang Kwak , Yong Ahn
发明人： Dong Kim , Seung Lee , Sang Kwak , Yong Ahn
IPC分类号： C08K5/24
CPC分类号： C08F220/32 , C08F220/26 , C08F230/08 , C08J3/243 , Y02P20/582
摘要： This invention provides a thermally curable resin copolymer (A), composed mainly of an ethylenically unsaturated monomer (a-1), which produces an acid via decomposition at 150° C. or more, an ethylenically unsaturated monomer (a-2) containing an epoxy group copolymerizable with the ethylenically unsaturated monomer (a-1), and an ethylenically unsaturated monomer (a-3) having a reactive silyl group; a thermally curable resin composition including the thermally curable resin copolymer; a cured film formed from the composition; and a liquid crystal display including the cured film. The thermally curable resin composition has extended storage stability and can be formed into the cured film having good adhesion to a substrate.
摘要翻译：本发明提供一种主要由烯键式不饱和单体（a-1）组成的热固性树脂共聚物（A），其通过在150℃以上分解而产生酸，含有可与烯属不饱和单体（a-1）共聚的环氧基和具有反应性甲硅烷基的烯属不饱和单体（a-3）包含该热固性树脂共聚物的热固性树脂组合物; 由该组合物形成的固化膜; 以及包括固化膜的液晶显示器。热固性树脂组合物具有延长的储存稳定性，并且可以形成具有对基材的良好粘附性的固化膜。

5. 发明申请

US20060081014A1 Washing apparatus 审中-公开
标题翻译：洗衣机
公开(公告)号：US20060081014A1
公开(公告)日：2006-04-20
申请号：US11221913
申请日：2005-09-09
申请人： Dong Choi , Soo Kim , Kyu Lee , Yong Ahn , Min Kim
发明人： Dong Choi , Soo Kim , Kyu Lee , Yong Ahn , Min Kim
IPC分类号： D06F37/00 , D06F39/00
CPC分类号： D06F39/12 , D06F39/081
摘要： Disclosed herein is a washing apparatus in which the top of a base pan is inclined downward toward a mounting position of a water leakage sensor, so that water, dropped onto the base pan, is gathered toward the water leakage sensor regardless of a water drop position, thereby enabling prompt operation of the water leakage sensor and achieving an enhancement in reliability. Furthermore, the washing apparatus comprises holders by which the water leakage sensor is vertically caught after being vertically press fitted to the base pan, thereby enabling the water leakage sensor to be mounted to the base pan via a single vertical press-fitting operation, resulting in an enhancement in assembling efficiency.
摘要翻译：这里公开了一种洗涤装置，其中底盘的顶部朝向漏水传感器的安装位置向下倾斜，使得落在底盘上的水聚集到漏水传感器，而不管水滴位置如何从而能够及时地进行漏水传感器的动作，提高可靠性。此外，洗涤装置包括保持器，在垂直压配合到底盘之后，使漏水传感器垂直卡止，从而使漏水传感器能够通过单个垂直压配合操作而安装到底盘上，导致提高组装效率。

6. 发明申请

US20060138571A1 Method of forming double gate dielectric layers and semiconductor device having the same 有权
标题翻译：形成双栅极电介质层的方法和具有该双栅极电介质层的半导体器件
公开(公告)号：US20060138571A1
公开(公告)日：2006-06-29
申请号：US11319531
申请日：2005-12-29
申请人： Yong Ahn
发明人： Yong Ahn
IPC分类号： H01L21/8238 , H01L29/94
CPC分类号： H01L29/518 , H01L21/28202 , H01L21/28211 , H01L21/823462 , H01L29/513 , H01L29/7833
摘要： A method of forming double gate dielectric layers composed of an underlying oxide layer and an overlying oxy-nitride layer is provided to prevent degradation of gate dielectric properties due to plasma-induced charges. In the method, the oxide layer is thermally grown on a silicon substrate under oxygen gas atmosphere to have a first thickness, and then the oxy-nitride layer is thermally grown on the oxide layer under nitrogen monoxide gas atmosphere to have a second thickness smaller than the first thickness. The substrate may have a high voltage area and a low voltage area, and the oxide layer may be partially etched in the low voltage area so as to have a reduced thickness. The oxy-nitride layer behaves like a barrier, blocking the inflow of the plasma-induced charges.
摘要翻译：提供了形成由下面的氧化物层和上覆的氮氧化物层构成的双栅极介电层的方法，以防止由于等离子体引起的电荷导致的栅极介电性能的劣化。在该方法中，氧化层在氧气气氛下在硅衬底上热生长以具有第一厚度，然后氮氧化物层在一氧化氮气体气氛下在氧化物层上热生长以具有小于第一厚度。衬底可以具有高电压面积和低电压面积，并且氧化物层可以在低电压区域中被部分地蚀刻以具有减小的厚度。氮氧化物层的作用就像阻挡层，阻止了等离子体引发的电荷的流入。

7. 发明申请

US20050266341A1 Photosensitive resin composition and LCD using the same 审中-公开
标题翻译：感光树脂组合物和使用其的LCD
公开(公告)号：US20050266341A1
公开(公告)日：2005-12-01
申请号：US11138355
申请日：2005-05-27
申请人： Dong Kim , Yong Ahn , Kyungjun Kim , Seung Lee , Il Kwon
发明人： Dong Kim , Yong Ahn , Kyungjun Kim , Seung Lee , Il Kwon
IPC分类号： G03F7/027 , G03C1/492 , G03F7/00 , G03F7/004 , G03F7/033
CPC分类号： G03F7/0045 , G03F7/0007 , G03F7/033
摘要： A photosensitive resin composition includes: a copolymer of an unsaturated carboxylic acid and a compound with unsaturated ethylenic bonds; an acrylate multi-functional monomer; a phenolic compound; a photopolymerization initiator; and an organic solvent. The photosensitive resin composition according to the present invention has superior resolution and development property because of enlarged solubility differentiation between exposed and unexposed region. The photosensitive resin composition can be effectively used for a transparent protective layer, an insulating layer, a passivation layer, a patterned spacer, etc., for LCDs.
摘要翻译：感光性树脂组合物包含：不饱和羧酸与具有不饱和烯键的化合物的共聚物; 丙烯酸酯多官能单体; 酚类化合物; 光聚合引发剂; 和有机溶剂。本发明的感光性树脂组合物由于曝光区域与未曝光区域之间的溶解度差异扩大而具有优异的分辨率和显影性。感光性树脂组合物可以有效地用于LCD的透明保护层，绝缘层，钝化层，图案化间隔物等。

8. 发明申请

US20050142844A1 Method for fabricating metal interconnect in semiconductor device 审中-公开
标题翻译：在半导体器件中制造金属互连的方法
公开(公告)号：US20050142844A1
公开(公告)日：2005-06-30
申请号：US11026916
申请日：2004-12-30
申请人： Yong Ahn
发明人： Yong Ahn
IPC分类号： H01L21/28 , H01L21/3213 , H01L21/44 , H01L21/4763 , H01L21/768 , H01L23/522
CPC分类号： H01L21/32136 , H01L21/76885 , H01L23/5226 , H01L2924/0002 , H01L2924/00
摘要： A method for fabricating a metal interconnect in a semiconductor device is disclosed. A disclosed method comprises: forming a via hole by a damascene process in an interlayer dielectric layer on a substrate; depositing a conducting layer on the substrate including the via hole; forming a photoresist pattern on the conducting layer; and forming a metal interconnect using the photoresist pattern as an etching mask, the lower part of the metal interconnect being wider than the upper part thereof.
摘要翻译：公开了一种在半导体器件中制造金属互连的方法。所公开的方法包括：通过镶嵌工艺在衬底上的层间电介质层中形成通孔; 在包括通孔的基板上沉积导电层; 在导电层上形成光致抗蚀剂图案; 并且使用光致抗蚀剂图案形成金属互连作为蚀刻掩模，金属互连的下部比其上部宽。

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