会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明授权
    • Method and apparatus for generating exposure masks
    • 用于产生曝光掩模的方法和装置
    • US4505580A
    • 1985-03-19
    • US435705
    • 1982-10-21
    • Dieter Michel
    • Dieter Michel
    • G03B27/32G03B27/34G03B27/47G03F1/00G03F1/02G03F9/00G03F9/02G03B27/42G03B27/52
    • G03B27/326
    • A method and apparatus for generating exposure masks is disclosed which markedly reduces the number of required process steps. A plurality of recording originals are successively reproduced in reduced form on a photosensitive recording substrate. These reduced size images are adjusted and placed in registry with respect to one another by means of a computer. In order to achieve this desired result, the computer calculates from the prescribed desired coordinate values and the measured actual coordinate values of index marks included on the recording original, an angle .DELTA..phi. through which the recording original must be rotated to achieve the desired orientation. The computer then acts to determine the corrected actual coordinate values of the diagonal intersection point and from these the coordinate values at which the recording substrate is to be positioned to achieve the desired in registry reproduction of the reduced size image of the recording original. This process is repeated for a number of recording originals, reduced size images of which are successively reproduced on the recording substrate, which is in each case appropriately positioned by means of the computer. The recording substrate is then developed, and the desired exposure mask is produced by photolithographic techniques.
    • 公开了用于产生曝光掩模的方法和装置,其显着地减少了所需的处理步骤的数量。 多个记录原稿以缩小的形式连续地再现在感光记录基板上。 这些减小尺寸的图像被调整并且通过计算机相对于彼此放置在注册表中。 为了达到这个期望的结果,计算机根据规定的期望坐标值和记录原稿上包含的索引标记的测量实际坐标值来计算角度DELTA phi,记录原稿必须通过该角度DELTA phi来旋转以获得期望的取向。 然后,计算机用于确定对角线交叉点的校正实际坐标值,并从这些坐标值确定记录基板的位置,以实现记录原稿的缩小尺寸图像的所需注册表再现。 对于多个记录原稿重复该过程,其缩小尺寸的图像被连续地再现在记录基板上,每个记录基板通过计算机适当地定位。 然后显影记录基底,并通过光刻技术产生所需的曝光掩模。