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    • 2. 发明授权
    • Method and apparatus for wavelength calibration
    • US06608848B2
    • 2003-08-19
    • US09849600
    • 2001-05-04
    • Jürgen KleinschmidtUwe StammKlaus VoglerPeter Lokai
    • Jürgen KleinschmidtUwe StammKlaus VoglerPeter Lokai
    • H01S313
    • H01S3/1392H01S3/225
    • A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F2-laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.
    • 3. 发明授权
    • Method and apparatus for wavelength calibration
    • 用于波长校准的方法和装置
    • US06272158B1
    • 2001-08-07
    • US09679592
    • 2000-10-04
    • Jürgen KleinschmidtUwe StammKlaus VoglerPeter Lokai
    • Jürgen KleinschmidtUwe StammKlaus VoglerPeter Lokai
    • H01S313
    • H01S3/1392H01S3/225
    • A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F2-laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.
    • 波长校准系统确定准分子或分子激光系统的窄谱分光发射带的绝对波长。 该系统包括模块,该模块包括与激光系统的可变范围内的变窄带周围的激光输出光束的分量光学相互作用的元件。 通过监测模块内的电压变化来检测层间谐振,或者通过光电检测设备检测光吸收。 当发生光学转变并被检测时,窄带的绝对波长可以精确地确定。 当该系统具体包括ArF-准分子激光室时,该模块优选地是含有吸光约193nm的元素的加合加速器,该元件优选为选自砷,碳,氧,铁 ,气态烃,卤化烃,碳污染的惰性气体,锗和铂蒸气。 当该系统具体包括F2激光室时,该模块优选为含有吸收约157nm的元素的加合加速器,该元件优选为选自硒,溴和硅的气体或蒸汽。 该模块可选地是可配置为用光吸收气体吹扫的净化室。
    • 4. 发明授权
    • Method and procedure to automatically stabilize excimer laser output parameters
    • 自动稳定准分子激光输出参数的方法和程序
    • US06490307B1
    • 2002-12-03
    • US09447882
    • 1999-11-23
    • Bruno Becker de MosUwe StammKlaus Vogler
    • Bruno Becker de MosUwe StammKlaus Vogler
    • H01S322
    • G03F7/70025G03F7/70575H01S3/036H01S3/134H01S3/225
    • A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. A parameter such as time, pulse count, driving voltage for maintaining a constant laser beam output energy, pulse shape, pulse duration, pulse stability, beam profile, bandwidth of the laser beam, temporal or spatial coherence, discharge width, or a combination thereof, which varies with a known correspondence to the partial pressure of the constituent gas is monitored. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber. A number of successive injections is performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters.
    • 提供了一种用于通过使用气体供应单元和处理器将激光气体混合物的组成气体维持在预定分压来稳定气体放电激光器的输出光束参数的方法和装置。 激光气体混合物的构成气体以初始分压提供,并且组成气体在激光放电室内耗尽。 诸如时间,脉冲计数,用于保持恒定的激光束输出能量,脉冲形状,脉冲持续时间,脉冲稳定性,光束分布,激光束的带宽,时间或空间相干性,放电宽度或其组合的参数 ,其随着对构成气体的分压的已知对应而变化。 各组分气体的注入是在放电室中增加选定量的分压。 以选定的间隔执行多次连续喷射,以维持构成气体基本处于初始分压,以维持稳定的输出光束参数。
    • 7. 发明授权
    • Interface unit for positioning an object to be irradiated in relation to a radiation source
    • 用于定位相对于辐射源照射的物体的接口单元
    • US08858581B2
    • 2014-10-14
    • US12894356
    • 2010-09-30
    • Gerhard RoblThomas DeisingerKlaus Vogler
    • Gerhard RoblThomas DeisingerKlaus Vogler
    • A61F9/00A61B18/18A61F9/009
    • A61F9/009
    • An interface unit for positioning an object to be irradiated in relation to a radiation source has at least one first positioning surface for positioning the interface unit in relation to the radiation source, and a second positioning surface for bearing on the object to be irradiated. The interface unit provides a path, which passes through the second positioning surface, for the radiation from the radiation source. According to the invention, the interface unit comprises an integrally produced interface body which forms both the at least one first positioning surface and the second positioning surface. The interface body is preferably produced from a plastic material by an injection compression molding method, in order to achieve the desired high manufacturing accuracy.
    • 用于定位相对于辐射源照射的物体的接口单元具有至少一个用于将接口单元相对于辐射源定位的第一定位表面和用于承载在被照射物体上的第二定位表面。 接口单元提供穿过第二定位表面的路径,用于来自辐射源的辐射。 根据本发明,接口单元包括整体制造的接口体,其形成至少一个第一定位表面和第二定位表面。 界面体优选地通过注射压缩成型方法由塑料材料制成,以便实现期望的高制造精度。