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1. 发明授权

US6098023A Driving control system and monitoring device for fan filter unit in semiconductor clean room 失效
标题翻译：半导体洁净室风机过滤机组驱动控制系统及监控装置
公开(公告)号：US6098023A
公开(公告)日：2000-08-01
申请号：US959858
申请日：1997-10-29
申请人： Jung-sung Hwang , Jae-heung Choi , Yo-han Ahn , Dong-joo Lee
发明人： Jung-sung Hwang , Jae-heung Choi , Yo-han Ahn , Dong-joo Lee
IPC分类号： F24F7/06 , B01D46/46 , F24F3/16 , G05B23/02 , G06F11/32 , H01H1/02 , H01L21/02 , G06F11/30 , G05B11/00
CPC分类号： H01H1/0201 , F24F3/161 , G05B23/027 , G05B23/0272 , G06F11/326 , F24F2011/0093
摘要： A monitoring device and a driving control system for a fan filter unit in a semiconductor clean room for monitoring the operating state of the fan filter unit. The monitoring device includes a switching section in each fan filter unit which alternately applies electrical power to one of a plurality of terminals. The switching section is responsive to a force from an air stream introduced therein via rotation of a fan in the fan filter unit. A display section in each fan filter unit is connected to the plurality of terminals which provide different signals, indicative of an on or off state of the fan, according to which of the plurality of terminals is electrically connected to the electrical power.
摘要翻译：一种用于半导体洁净室中的风扇过滤器单元的监视装置和驱动控制系统，用于监视风扇过滤器单元的运行状态。监视装置包括在每个风扇过滤器单元中的切换部分，其交替地向多个终端中的一个终端提供电力。切换部分通过风扇过滤器单元中的风扇的旋转响应于从其中引入的气流的力。每个风扇滤波器单元中的显示部分连接到多个端子，所述多个端子提供指示风扇的开启或关闭状态的不同信号，根据多个端子中的哪一个电连接到电力。

2. 发明授权

US6093229A Drive checking system for fan filter units in clean room 有权
标题翻译：洁净室内风机过滤器的驱动检查系统
公开(公告)号：US6093229A
公开(公告)日：2000-07-25
申请号：US172152
申请日：1998-10-14
申请人： Kun-hyung Lee , Jung-sung Hwang , Yo-han Ahn , Jae-heung Choi
发明人： Kun-hyung Lee , Jung-sung Hwang , Yo-han Ahn , Jae-heung Choi
IPC分类号： F24F7/06 , B01D46/00 , B01D46/44 , F24F11/00 , F24F11/02 , B01D35/143
CPC分类号： B01D46/0086 , B01D46/444 , B01D2273/18 , B01D2273/30 , B01D2279/51 , Y10S55/34
摘要： A fan drive checking system, for an air conditioning system in a clean room having a fan filter unit (FFU), includes a flow sensor for sensing air flow inside a housing of a FFU. The sensor provides a sensor signal indicative of normal and adverse flow conditions in the housing. A control portion in data communication with the sensor outputs a control signal responsive to the sensing signal. An alarm in data communication with the control portion provides a warning when the control signal indicates the adverse flow condition.
摘要翻译：在具有风扇过滤器单元（FFU）的洁净室中的空调系统的风扇驱动器检查系统包括用于感测FFU的壳体内的空气流的流量传感器。传感器提供表示壳体中正常和不利流动条件的传感器信号。与传感器进行数据通信的控制部分响应于感测信号输出控制信号。当控制信号指示不利流动状况时，与控制部分的数据通信中的警报提供警告。

3. 发明授权

US08469650B2 Method of controlling pressure in a wafer transfer system 有权
公开(公告)号：US08469650B2
公开(公告)日：2013-06-25
申请号：US12285982
申请日：2008-10-17
申请人： Soo-woong Lee , Hyung-seok Choi , Jung-sung Hwang , Sung-hwan Choi
发明人： Soo-woong Lee , Hyung-seok Choi , Jung-sung Hwang , Sung-hwan Choi
IPC分类号： H01L21/677 , G06F19/00
CPC分类号： H01L21/67017 , H01L21/67772
摘要： A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.

4. 发明授权

US07438514B2 Wafer transfer system 有权
标题翻译：晶圆转移系统
公开(公告)号：US07438514B2
公开(公告)日：2008-10-21
申请号：US10963541
申请日：2004-10-14
申请人： Soo-woong Lee , Hyung-seok Choi , Jung-sung Hwang , Sung-hwan Choi
发明人： Soo-woong Lee , Hyung-seok Choi , Jung-sung Hwang , Sung-hwan Choi
IPC分类号： B65G49/07
CPC分类号： H01L21/67017 , H01L21/67772
摘要： A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.
摘要翻译：晶片传送系统和系统中的压力控制方法包括用于接收晶片容器的容纳端口，可操作地连接到负载端口的壳体，用于在晶片容器和壳体之间传送晶片的晶片传送机构，晶片容器传感器，用于检测装载口上的晶片容器的存在，设置在壳体的第一部分中的变速风扇，设置在面向第一部分的壳体的第二部分中的可变排气单元，该可变排气单元能够改变来自壳体的空气排出率，以及控制器，用于响应于来自晶片容器传感器的信号，可变地操作变速风扇和可变排气单元。

5. 发明申请

US20060018736A1 Wafer transfer system and method of controlling pressure in the system 有权
标题翻译：晶圆转移系统和系统压力控制方法
公开(公告)号：US20060018736A1
公开(公告)日：2006-01-26
申请号：US10963541
申请日：2004-10-14
申请人： Soo-woong Lee , Hyung-seok Choi , Jung-sung Hwang , Sung-hwan Choi
发明人： Soo-woong Lee , Hyung-seok Choi , Jung-sung Hwang , Sung-hwan Choi
IPC分类号： H01L21/677
CPC分类号： H01L21/67017 , H01L21/67772
摘要： A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.
摘要翻译：晶片传送系统和系统中的压力控制方法包括用于接收晶片容器的容纳端口，可操作地连接到负载端口的壳体，用于在晶片容器和壳体之间传送晶片的晶片传送机构，晶片容器传感器，用于检测装载口上的晶片容器的存在，设置在壳体的第一部分中的变速风扇，设置在面向第一部分的壳体的第二部分中的可变排气单元，该可变排气单元能够改变来自壳体的空气排出率，以及控制器，用于响应于来自晶片容器传感器的信号，可变地操作变速风扇和可变排气单元。

6. 发明授权

US06176120B1 Methods of analyzing water soluble contaminants generated during microelectronic device manufacturing processes 有权
标题翻译：分析微电子器件制造过程中产生的水溶性污染物的方法
公开(公告)号：US06176120B1
公开(公告)日：2001-01-23
申请号：US09330972
申请日：1999-06-11
申请人： Nam-hee You , Dong-soo Lee , Sun-young Lee , Jung-sung Hwang
发明人： Nam-hee You , Dong-soo Lee , Sun-young Lee , Jung-sung Hwang
IPC分类号： G01N1100
CPC分类号： G01N1/2202 , G01N1/24 , G01N2001/2223 , G01N2001/2282 , G01N2001/4066
摘要： Methods of analyzing water-soluble contaminants comprise providing reference air streams having gaseous water present therein; condensing the reference air streams such that the gaseous water liquefies; pressurizing the liquefied water; and supplying the liquefied water to analyzers. Systems for analyzing water-soluble contaminants comprise air inlets that absorb reference air containing gaseous water therein; valves that control the flow of the reference air in fluid communication with the air inlets; condensers that condense the gaseous water in the reference air in fluid communication with the valves; pressurization pumps that pressurize the water condensed from the reference air in fluid communication with the condensers; and discharge pumps that discharge an excessive amount of water contained in the reference air.
摘要翻译：分析水溶性污染物的方法包括提供其中存在气态水的参考空气流; 冷凝参考气流，使气态水液化; 对液化水加压; 并将液化水供应给分析仪。用于分析水溶性污染物的系统包括吸收其中含有气态水的参考空气的空气入口; 控制与空气入口流体连通的参考空气的流动的阀; 冷凝器，其将与参考空气中的气态水冷凝成与阀流体连通; 加压泵，其将与从冷凝器流体连通的参考空气冷凝的水加压; 以及排出包含在参考空气中的过量水的排出泵。

7. 发明授权

US5890367A Air conditioning system for semiconductor clean room including a chemical filter downstream of a humidifier 失效
标题翻译：半导体洁净室的空调系统，包括加湿器下游的化学过滤器
公开(公告)号：US5890367A
公开(公告)日：1999-04-06
申请号：US899388
申请日：1997-07-23
申请人： Nam-hee You , Jung-sung Hwang , Gee-do Kim , Young-jin Han
发明人： Nam-hee You , Jung-sung Hwang , Gee-do Kim , Young-jin Han
IPC分类号： F24F3/14 , B01D39/14 , F24F3/16 , F24F7/06 , H01L21/02 , B01L1/04 , F25D17/06
CPC分类号： F24F3/161 , F24F2003/1682
摘要： An air conditioning system for a semiconductor clean room includes a chemical filter between an air conditioner including a humidifier and a ULPA filter of the clean room, for ionizing chemical impurities using moisture supplied from the humidifier and then adsorbing the ionized chemical impurities by using the chemical filter. The chemical filter is installed downstream of the humidifier, which applies phosphoric acid for the prevention of scale-formation. This downstream location allows the chemical filter to prevent the phosphoric acid from being included in the fresh air as a new chemical impurity, which makes regulation of temperature and humidity of the air possible without having to use a special and expensive pure steam system.
摘要翻译：用于半导体洁净室的空调系统包括在包括加湿器的空气调节器和洁净室的ULPA过滤器之间的化学过滤器，用于使用从加湿器供应的水分电离化学杂质，然后通过使用化学品吸附电离的化学杂质过滤。化学过滤器安装在加湿器的下游，该加湿器采用磷酸防止结垢形成。该下游位置允许化学过滤器防止磷酸作为新的化学杂质被包含在新鲜空气中，这使得可以调节空气的温度和湿度，而不必使用特殊和昂贵的纯蒸汽系统。

8. 发明申请

US20090053034A1 Method of controlling pressure in a wafer transfer system 有权
标题翻译：控制晶片传送系统压力的方法
公开(公告)号：US20090053034A1
公开(公告)日：2009-02-26
申请号：US12285982
申请日：2008-10-17
申请人： Soo-woong Lee , Hyung-seok Choi , Jung-sung Hwang , Sung-hwan Choi
发明人： Soo-woong Lee , Hyung-seok Choi , Jung-sung Hwang , Sung-hwan Choi
IPC分类号： H01L21/677
CPC分类号： H01L21/67017 , H01L21/67772
摘要： A wafer transfer system, and method of controlling pressure in the system, includes a loadport for receiving a wafer container, a housing operably connected to the loadport, a wafer transfer mechanism for transferring a wafer between the wafer container and the housing, a wafer container sensor for detecting a presence of the wafer container on the loadport, a variable speed fan disposed in a first portion of the housing, a variable exhaust unit disposed in a second portion of the housing facing the first portion, the variable exhaust unit being capable of varying an exhaust rate of air from the housing, and a controller for variably operating the variable speed fan and the variable exhaust unit in response to a signal from the wafer container sensor.
摘要翻译：晶片传送系统和系统中的压力控制方法包括用于接收晶片容器的容纳端口，可操作地连接到负载端口的壳体，用于在晶片容器和壳体之间传送晶片的晶片传送机构，晶片容器传感器，用于检测装载口上的晶片容器的存在，设置在壳体的第一部分中的变速风扇，设置在面向第一部分的壳体的第二部分中的可变排气单元，该可变排气单元能够改变来自壳体的空气排出率，以及控制器，用于响应于来自晶片容器传感器的信号，可变地操作变速风扇和可变排气单元。

9. 发明授权

US06295864B1 Analysis system and method for water-soluble contaminants in a cleanroom environment 有权
标题翻译：洁净室环境中水溶性污染物的分析系统和方法
公开(公告)号：US06295864B1
公开(公告)日：2001-10-02
申请号：US09236545
申请日：1999-01-26
申请人： Nam-hee You , Soon-young Lee , Jung-sung Hwang , Kwang-young Kim
发明人： Nam-hee You , Soon-young Lee , Jung-sung Hwang , Kwang-young Kim
IPC分类号： G01N1100
CPC分类号： G01N33/0016 , G01N1/22 , G01N1/34
摘要： An analysis system and method for a cleanroom environment is disclosed wherein on-line testing of water-soluble contaminants is performed by condensing water vapor from an air sample taken from the clean room. The condenser is connected to a analyzing unit that is used to measure and analyze the water-soluble contaminants in the condensed water received from the condensing unit.
摘要翻译：公开了一种用于洁净室环境的分析系统和方法，其中水溶性污染物的在线测试是通过冷凝来自洁净室的空气样品的水蒸气来进行的。冷凝器连接到用于测量和分析从冷凝单元接收的冷凝水中的水溶性污染物的分析单元。

10. 发明授权

US5972293A Aqueous compositions for making ultrapure water used in microelectronic device fabrication processes and methods of sterilizing ultrapure water delivery systems using the same 失效
标题翻译：用于微电子器件制造方法中制造超纯水的水性组合物和使用其的超纯水输送系统的灭菌方法
公开(公告)号：US5972293A
公开(公告)日：1999-10-26
申请号：US61990
申请日：1998-04-17
申请人： Seung-uhn Kim , Yun-chul Oh , Sue-ryeon Kim , Jung-sung Hwang
发明人： Seung-uhn Kim , Yun-chul Oh , Sue-ryeon Kim , Jung-sung Hwang
IPC分类号： H01L21/304 , A01N37/16 , A01N59/00 , A61L2/18 , B01D65/02 , C02F1/32 , C02F1/44 , C02F1/50 , C02F1/72
CPC分类号： A61L2/186 , A01N37/16 , B01D65/022 , C02F1/444 , C02F1/50 , C02F1/722 , B01D2321/08 , B01D2321/162 , B01D2321/343 , C02F1/32 , C02F2103/04 , Y10S210/90
摘要： Compositions for making ultrapure water in microelectronic device fabrication processes comprise hydrogen peroxide, peracetic acid, and water. Methods of sterilizing ultrapure water delivery systems for use in microelectronic device fabrication processes comprise contacting ultrapure water delivery systems with water having temperatures ranging from about 26.degree. C. to about 40.degree. C.; and sterilizing the ultrapure water delivery systems with compositions comprising hydrogen peroxide, peracetic acid, and water. The ultrapure water delivery systems comprise water tanks, heat exchangers in fluid communication with the water tanks, ultraviolet sterilizers in fluid communication with the heat exchangers, OR-polishers in fluid communication with the ultraviolet sterilizers, MB-polishers in fluid communication with the OR-polishers, and ultrafilters in fluid communication with the OR-polishers. The compositions employed in the sterilizing step do not contact the OR-polishers and the MB-polishers.
摘要翻译：用于在微电子器件制造方法中制造超纯水的组合物包括过氧化氢，过乙酸和水。用于微电子器件制造工艺的超纯水输送系统的灭菌方法包括使超纯水输送系统与约26℃至约40℃温度范围内的水接触。并用包含过氧化氢，过乙酸和水的组合物对超纯水输送系统进行灭菌。超纯水输送系统包括水箱，与水箱流体连通的热交换器，与热交换器流体连通的紫外线灭菌器，与紫外线灭菌器流体连通的OR抛光机，与OR- 抛光机和超滤器与OR抛光机流体连通。灭菌步骤中使用的组合物不接触OR抛光机和MB抛光机。

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