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    • 1. 发明授权
    • Solid/liquid interface detection in casting processes by gamma-ray
attenuation
    • 通过γ射线衰减在铸造过程中进行固/液界面检测
    • US5673746A
    • 1997-10-07
    • US625384
    • 1996-04-01
    • Jung-Hoon ChunRichard C. LanzaNannaji Saka
    • Jung-Hoon ChunRichard C. LanzaNannaji Saka
    • B22D11/20B22D11/16B22D11/22
    • B22D11/207
    • A liquid metal/solid metal interface detecting device comprises in general a radiation source for generating gamma radiation, which is directed to pass through a strand extruded from a continuous casting mold. A detector detects the gamma radiation passing through the partially solidified strand to determine a spatial profile for a liquid metal/solid metal interface by relying on the different gamma radiation attenuation characteristics of the solid metal and the liquid metal. Preferably, the gamma radiation is at energies of greater than one million electron volts. In some embodiments, a movable support carries the radiation source and the detector and moves the radiation source and detector along and around the ingot enabling generation of a three-dimensional profile of the liquid metal/solid metal interface by utilizing tomographic imaging techniques. Alternatively, solidification at a single region is determined and this information is used to control the formation of the strand in process controller implementations. Surface temperature detectors can also be used to provide more information about the solidification.
    • 液体金属/固体金属界面检测装置通常包括用于产生γ辐射的辐射源,其被引导通过从连续铸模中挤出的股线。 检测器通过依靠固体金属和液态金属的不同γ辐射衰减特性来检测通过部分凝固的股线的伽马辐射,以确定液态金属/固体金属界面的空间分布。 优选地,伽马辐射的能量大于一百万电子伏特。 在一些实施例中,可移动支撑件承载辐射源和检测器并且沿着晶锭移动辐射源和检测器,使得能够通过利用断层成像技术产生液态金属/固体金属界面的三维轮廓。 或者,确定单个区域的固化,并且该信息用于控制过程控制器实施中的链的形成。 表面温度检测器也可用于提供有关固化的更多信息。
    • 2. 发明授权
    • Solid/liquid interface detection in continuous casting processes by .gamma.
-
    • 通过γ射线衰减在连续铸造工艺中进行固/液界面检测
    • US5509460A
    • 1996-04-23
    • US296342
    • 1994-08-25
    • Jung-Hoon ChunRichard C. LanzaNannaji Saka
    • Jung-Hoon ChunRichard C. LanzaNannaji Saka
    • B22D11/20B22D11/22B22D11/16
    • B22D11/207
    • A liquid metal/solid metal interface detecting device comprises in general a radiation source for generating gamma radiation, which is directed to pass through a strand extruded from a continuous casting mold. A detector detects the gamma radiation passing through the partially solidified strand to determine a spatial profile for a liquid metal/solid metal interface by relying on the different gamma radiation attenuation characteristics of the solid metal and the liquid metal. Preferably, the gamma radiation is at energies of greater than one million electron volts. In some embodiments, a movable support carries the radiation source and the detector and moves the radiation source and detector along and around the ingot enabling generation of a three-dimensional profile of the liquid metal/solid metal interface by utilizing tomographic imaging techniques. Alternatively, solidification at a single region is determined and this information is used to control the formation of the strand in process controller implementations.
    • 液体金属/固体金属界面检测装置通常包括用于产生γ辐射的辐射源,其被引导通过从连续铸模中挤出的股线。 检测器通过依靠固体金属和液态金属的不同γ辐射衰减特性来检测通过部分凝固的股线的伽马辐射,以确定液态金属/固体金属界面的空间分布。 优选地,伽马辐射的能量大于一百万电子伏特。 在一些实施例中,可移动支撑件承载辐射源和检测器并且沿着晶锭移动辐射源和检测器,使得能够通过利用断层成像技术产生液态金属/固体金属界面的三维轮廓。 或者,确定单个区域的固化,并且该信息用于控制过程控制器实施中的链的形成。
    • 3. 发明申请
    • CHEMICAL-MECHANICAL POLISHING PAD CONDITIONING SYSTEM
    • 化学机械抛光垫调节系统
    • US20110244764A1
    • 2011-10-06
    • US12754645
    • 2010-04-06
    • Nannaji SakaThor EusnerJung-Hoon Chun
    • Nannaji SakaThor EusnerJung-Hoon Chun
    • B24B1/00B24B21/18
    • B24B53/017
    • Polishing pad conditioning system. The system includes a first rotatable platen supporting a polishing pad containing asperities having a radius of curvature. A second rotatable platen supports a disk of bulk material having holes therethrough, the second rotatable platen supported for translation as well as rotation. Means are provided for pushing the polishing pad and bulk material into contact at an interface during rotation and translation and means are provided for passing a slurry through the holes in the bulk material to the interface whereby the radius of curvature of the pad asperities is increased. Water may be delivered to the bulk material for cooling. A process for conditioning a polishing pad is also disclosed.
    • 抛光垫调节系统。 该系统包括支撑包含具有曲率半径的凹凸的抛光垫的第一可旋转压板。 第二可旋转压板支撑具有穿过其中的孔的散装材料盘,第二可旋转压板被支撑成平移和旋转。 提供了用于在旋转和平移期间将抛光垫和散装材料在界面处推动接触的装置,并且提供了用于使浆料通过块状材料中的孔通过到界面的装置,由此增加焊盘粗糙度的曲率半径。 水可以输送到散装材料进行冷却。 还公开了一种用于调理抛光垫的工艺。
    • 4. 发明授权
    • Chemical-mechanical polishing pad conditioning system
    • 化学机械抛光垫调节系统
    • US08758091B2
    • 2014-06-24
    • US12754645
    • 2010-04-06
    • Nannaji SakaThor EusnerJung-Hoon Chun
    • Nannaji SakaThor EusnerJung-Hoon Chun
    • B24B1/00B24B21/18
    • B24B53/017
    • Polishing pad conditioning system. The system includes a first rotatable platen supporting a polishing pad containing asperities having a radius of curvature. A second rotatable platen supports a disk of bulk material having holes therethrough, the second rotatable platen supported for translation as well as rotation. Means are provided for pushing the polishing pad and bulk material into contact at an interface during rotation and translation and means are provided for passing a slurry through the holes in the bulk material to the interface whereby the radius of curvature of the pad asperities is increased. Water may be delivered to the bulk material for cooling. A process for conditioning a polishing pad is also disclosed.
    • 抛光垫调节系统。 该系统包括支撑包含具有曲率半径的凹凸的抛光垫的第一可旋转压板。 第二可旋转压板支撑具有穿过其中的孔的散装材料盘,第二可旋转压板被支撑成平移和旋转。 提供了用于在旋转和平移期间将抛光垫和散装材料在界面处推动接触的装置,并且提供了用于使浆料通过块状材料中的孔通过到界面的装置,由此增加焊盘粗糙度的曲率半径。 水可以输送到散装材料进行冷却。 还公开了一种用于调理抛光垫的工艺。
    • 8. 发明授权
    • High efficiency photoresist coating
    • 高效光刻胶涂层
    • US06191053B1
    • 2001-02-20
    • US09094443
    • 1998-06-10
    • Jung-Hoon ChunJames DerksenSangjun Han
    • Jung-Hoon ChunJames DerksenSangjun Han
    • H01L21312
    • H01L21/6715B05C5/0245B05C11/08B05D1/002B05D1/005B05D1/265G03F7/16G03F7/162
    • An improved method and apparatus for coating semiconductor substrates with organic photoresist polymers by extruding a ribbon of photoresist in a spiral pattern which covers the entire top surface of the wafer. The invention provides a more uniform photoresist layer and is much more efficient than are current methods in the use of expensive photoresist solutions. A wafer is mounted on a chuck, aligned horizontally and oriented upward. An extrusion head is positioned adjacent to the outer edge of the wafer and above the top surface of the wafer with an extrusion slot aligned radially with respect to the wafer. The wafer is rotated and the extrusion head moved radially toward the center of the wafer while photoresist is extruded out the extrusion slot. The rotation rate of the wafer and the radial speed of the extrusion head are controlled so that the tangential velocity of the extrusion head with respect to the rotating wafer is a constant.
    • 一种改进的用有机光致抗蚀剂聚合物涂覆半导体衬底的方法和装置,通过以覆盖晶片的整个顶表面的螺旋图案挤出光致抗蚀剂带。 本发明提供了更均匀的光致抗蚀剂层,并且比使用昂贵的光致抗蚀剂溶液中的现有方法更有效。 将晶片安装在卡盘上,水平排列并向上取向。 挤出头定位成与晶片的外边缘相邻并且在晶片的顶表面上方,具有相对于晶片径向排列的挤压槽。 晶片旋转,并且挤出头朝向晶片的中心径向移动,而光致抗蚀剂被挤出挤出槽。 控制晶片的旋转速度和挤压头的径向速度,使得挤出头相对于旋转晶片的切向速度是恒定的。