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    • 2. 发明申请
    • Enhanced lithographic resolution through double exposure
    • 通过双重曝光增强光刻分辨率
    • US20050162627A1
    • 2005-07-28
    • US10765218
    • 2004-01-28
    • Jozef FindersDonis FlagelloSteven Hansen
    • Jozef FindersDonis FlagelloSteven Hansen
    • G03B27/42G03F7/20H01L21/027
    • G03F7/70433G03F7/70466
    • A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.
    • 本文给出了用于增强光刻系统中的图像分辨率的系统和方法。 本发明包括将掩模版图案分解为能够被光刻系统光学分辨的至少两个构成子图案,用预定的光致抗蚀剂层涂覆基底,以及暴露至少两个构成子图案中的第一个, 通过将投影光束引导通过第一子图案使得光刻系统在基板的预定光致抗蚀剂层上产生第一子图案图像。 本发明还包括处理曝光的基板,通过将投影光束引导通过第二子图案来暴露至少两个构成子图案中的第二个,使得光刻系统在预定的光致抗蚀剂上产生第二子图案图像 层,然后组合第一和第二子图案图像以在衬底上产生期望的图案。
    • 7. 发明授权
    • Optimized polarization illumination
    • 优化极化照明
    • US08395757B2
    • 2013-03-12
    • US12773775
    • 2010-05-04
    • Robert SochaDonis FlagelloSteve Hansen
    • Robert SochaDonis FlagelloSteve Hansen
    • G03B27/72G03B27/54
    • G03F7/705G03F7/70125G03F7/70341G03F7/70566G03F7/70616
    • Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.
    • 公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。 通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明,确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率,确定最大图像记录 斜率(ILS),其中ILS对于照明器上的至少一个点接近于零,并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。 对于照明器上的多个点可以重复这一点。
    • 10. 发明授权
    • Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
    • 用于高数值孔径系统的静态和动态径向横向电偏振器
    • US07511884B2
    • 2009-03-31
    • US11187848
    • 2005-07-25
    • Donis FlagelloKevin CummingsAlexander Straaijer
    • Donis FlagelloKevin CummingsAlexander Straaijer
    • G02B5/30
    • G03F7/70566G02B5/3058
    • A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.
    • 提供径向横向电偏振器装置。 该器件包括具有第一折射率的第一材料层,具有第二折射率的第二材料层和位于方位角和周期上间隔开的多个细长元件,并且设置在第一层和第二层之间。 多个细长元件与辐射的电磁波相互作用以透射辐射的电磁波的横向电极化。 本发明的一个方面是例如在光刻投影设备中使用这种偏振器装置来增加成像分辨率。 另一方面是提供一种包括在横向电极化中偏振辐射束的装置制造方法。