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1. 发明申请

US20070258073A1 Enhanced lithographic resolution through double exposure 审中-公开
公开(公告)号：US20070258073A1
公开(公告)日：2007-11-08
申请号：US11822995
申请日：2007-07-11
申请人： Jozef Finders , Donis Flagello , Steven Hansen
发明人： Jozef Finders , Donis Flagello , Steven Hansen
IPC分类号： G03B27/42
CPC分类号： G03F7/70433 , G03F7/70466
摘要： A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.

2. 发明申请

US20050162627A1 Enhanced lithographic resolution through double exposure 失效
标题翻译：通过双重曝光增强光刻分辨率
公开(公告)号：US20050162627A1
公开(公告)日：2005-07-28
申请号：US10765218
申请日：2004-01-28
申请人： Jozef Finders , Donis Flagello , Steven Hansen
发明人： Jozef Finders , Donis Flagello , Steven Hansen
IPC分类号： G03B27/42 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70433 , G03F7/70466
摘要： A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.
摘要翻译：本文给出了用于增强光刻系统中的图像分辨率的系统和方法。本发明包括将掩模版图案分解为能够被光刻系统光学分辨的至少两个构成子图案，用预定的光致抗蚀剂层涂覆基底，以及暴露至少两个构成子图案中的第一个，通过将投影光束引导通过第一子图案使得光刻系统在基板的预定光致抗蚀剂层上产生第一子图案图像。本发明还包括处理曝光的基板，通过将投影光束引导通过第二子图案来暴露至少两个构成子图案中的第二个，使得光刻系统在预定的光致抗蚀剂上产生第二子图案图像层，然后组合第一和第二子图案图像以在衬底上产生期望的图案。

3. 发明申请

US20060256311A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060256311A1
公开(公告)日：2006-11-16
申请号：US11129556
申请日：2005-05-16
申请人： Steven Hansen , Bernd Geh , Donis Flagello
发明人： Steven Hansen , Bernd Geh , Donis Flagello
IPC分类号： G03B27/54
CPC分类号： G03F7/70091 , G03F7/70125 , G03F7/70325
摘要： A method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The lithographic apparatus includes an illumination system configured to provide an illumination configuration and a projection system. In an embodiment of the invention, the method includes illuminating a mask pattern with an illumination configuration that includes a dark field component; and projecting an image of the illuminated pattern onto a photoresist layer coated on the substrate.
摘要翻译：提出了一种使用光刻设备将掩模图案的图像转印到基板上的方法。光刻设备包括被配置为提供照明配置和投影系统的照明系统。在本发明的实施例中，该方法包括用包括暗场分量的照明配置照亮掩模图案; 以及将照射图案的图像投射到涂覆在基底上的光致抗蚀剂层上。

4. 发明申请

US20050007573A1 Device manufacturing method 审中-公开
标题翻译：器件制造方法
公开(公告)号：US20050007573A1
公开(公告)日：2005-01-13
申请号：US10816190
申请日：2004-04-02
申请人： Steven Hansen , Donis Flagello , Michel Fransois Klaassen , Laurentius De Winter , Edwin Wilhelmus Knols
发明人： Steven Hansen , Donis Flagello , Michel Fransois Klaassen , Laurentius De Winter , Edwin Wilhelmus Knols
IPC分类号： G02B5/18 , G03F7/20 , H01L21/027 , G03B27/68
CPC分类号： G03F7/70066 , G03F7/70091 , G03F7/701 , G03F7/70566 , G03F7/70891
摘要： A rectangular or bar-shaped, on-axis illumination mask with radiation polarized parallel to the length of the bar provides improved DOF and exposure latitude with less lens heating as compared to a circular monopole with equivalent σ.
摘要翻译：与具有等同的sigma的圆形单极子相比，具有平行于条的长度偏振的辐射的矩形或棒状的轴上照明掩模提供改进的DOF和曝光宽容度，具有较少的透镜加热。

5. 发明申请

US20080030708A1 DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：装置制造方法
公开(公告)号：US20080030708A1
公开(公告)日：2008-02-07
申请号：US11867533
申请日：2007-10-04
申请人： Steven Hansen , Donis Flagello , Michel Klaassen , Laurentius De Winter , Edwin Knols
发明人： Steven Hansen , Donis Flagello , Michel Klaassen , Laurentius De Winter , Edwin Knols
IPC分类号： G03B27/72
CPC分类号： G03F7/70066 , G03F7/70091 , G03F7/701 , G03F7/70566 , G03F7/70891
摘要： A rectangular or bar-shaped, on-axis illumination mask with radiation polarized parallel to the length of the bar provides improved DOF and exposure latitude with less lens heating as compared to a circular monopole with equivalent σ.
摘要翻译：与具有等同的sigma的圆形单极子相比，具有平行于条的长度偏振的辐射的矩形或棒状的轴上照明掩模提供改进的DOF和曝光宽容度，具有较少的透镜加热。

6. 发明申请

US20070002300A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070002300A1
公开(公告)日：2007-01-04
申请号：US11436058
申请日：2006-05-18
申请人： Steven Hansen , Donis Flagello , Wolfgang Singer , Bernd Geh , Vladan Blahnik
发明人： Steven Hansen , Donis Flagello , Wolfgang Singer , Bernd Geh , Vladan Blahnik
IPC分类号： G03B27/54
CPC分类号： G03F7/70325 , G03F7/70091 , G03F7/70108 , G03F7/7025
摘要： A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.
摘要翻译：光刻设备包括照明单元，其包括被配置为产生辐射束的辐射源，具有数值孔径NA <0>的照明光学器件和孔径系统; 具有第一数值孔径NA 的投影透镜; 布置在照明单元和投影透镜之间并被配置为支撑图案形成装置的支撑件; 衬底支撑件，被配置为支撑在其上成像图案形成装置上的结构的衬底，其中投影透镜的第一数值孔径NA 小于数值孔径NA < >照明单元。

7. 发明授权

US08395757B2 Optimized polarization illumination 有权
标题翻译：优化极化照明
公开(公告)号：US08395757B2
公开(公告)日：2013-03-12
申请号：US12773775
申请日：2010-05-04
申请人： Robert Socha , Donis Flagello , Steve Hansen
发明人： Robert Socha , Donis Flagello , Steve Hansen
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/705 , G03F7/70125 , G03F7/70341 , G03F7/70566 , G03F7/70616
摘要： Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.
摘要翻译：公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明，确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率，确定最大图像记录斜率（ILS），其中ILS对于照明器上的至少一个点接近于零，并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。对于照明器上的多个点可以重复这一点。

8. 发明申请

US20070273853A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070273853A1
公开(公告)日：2007-11-29
申请号：US11655999
申请日：2007-01-22
申请人： Arno Bleeker , Donis Flagello , Robert Socha , James Greeneich , Kars Troost
发明人： Arno Bleeker , Donis Flagello , Robert Socha , James Greeneich , Kars Troost
IPC分类号： G03B27/32
CPC分类号： G03B27/54 , G03F7/70116 , G03F7/705
摘要： A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.
摘要翻译：将图案布局的图像转印到基板的表面上的方法，包括为图案布局的第一区域选择第一照明轮廓，以及为图案布局的第二区域选择第二照明轮廓; 在图案布局的图像传送期间切换照明轮廓，使得图案布局的第一区域被第一照明轮廓照亮，并且第二区域被第二照明轮廓照亮; 以及将照射的第一和第二区域的图像投影到基板的表面上。

9. 发明授权

US07221501B2 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems 有权
标题翻译：用于高数值孔径系统的静态和动态径向横向电偏振器
公开(公告)号：US07221501B2
公开(公告)日：2007-05-22
申请号：US11106480
申请日：2005-04-15
申请人： Donis Flagello , Kevin Cummings , Alexander Straaijer
发明人： Donis Flagello , Kevin Cummings , Alexander Straaijer
IPC分类号： G02B5/30 , G02B27/28 , G02B27/72
CPC分类号： G03F7/70566 , G02B5/3058
摘要： A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.
摘要翻译：提供径向横向电偏振器装置。该器件包括具有第一折射率的第一材料层，具有第二折射率的第二材料层和位于方位角和周期上间隔开的多个细长元件，并且设置在第一层和第二层之间。多个细长元件与辐射的电磁波相互作用以透射辐射的电磁波的横向电极化。本发明的一个方面是例如在光刻投影设备中使用这种偏振器装置来增加成像分辨率。另一方面是提供一种包括在横向电极化中偏振辐射束的装置制造方法。

10. 发明授权

US07511884B2 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems 失效
标题翻译：用于高数值孔径系统的静态和动态径向横向电偏振器
公开(公告)号：US07511884B2
公开(公告)日：2009-03-31
申请号：US11187848
申请日：2005-07-25
申请人： Donis Flagello , Kevin Cummings , Alexander Straaijer
发明人： Donis Flagello , Kevin Cummings , Alexander Straaijer
IPC分类号： G02B5/30
CPC分类号： G03F7/70566 , G02B5/3058
摘要： A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.
摘要翻译：提供径向横向电偏振器装置。该器件包括具有第一折射率的第一材料层，具有第二折射率的第二材料层和位于方位角和周期上间隔开的多个细长元件，并且设置在第一层和第二层之间。多个细长元件与辐射的电磁波相互作用以透射辐射的电磁波的横向电极化。本发明的一个方面是例如在光刻投影设备中使用这种偏振器装置来增加成像分辨率。另一方面是提供一种包括在横向电极化中偏振辐射束的装置制造方法。

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