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    • 3. 发明申请
    • Polyesters and slurries containing microfiber and micropowder, and methods for using and making same
    • 含有超细纤维和微粉的聚酯和浆料,以及使用和制造方法
    • US20060155064A1
    • 2006-07-13
    • US11032575
    • 2005-01-10
    • Steven Hansen
    • Steven Hansen
    • C08L5/00C08L67/02
    • C08K7/02C08K3/22C08L27/18C08L67/02C08L2666/04
    • Polyester compositions comprising microfibers and micropowders are disclosed. The polyester compositions are made by contacting microfibers and micropowders with polymerizable components, such as monomers, suitable for making polyesters, and polymerizing the polymerizable components. The microfibers and micropowders can be provided in the form of either separate slurries, or a single slurry. The micropowders can also alternatively be provided in the form of a powder rather than a slurry. A slurry containing microfiber and micropowders, and a process for making such a slurry, is also disclosed. Incorporating microfibers and micropowders into a polyester improves the properties of the molded parts, films and/or fibers that are made from such a polyester. A slurry containing microfibers and micropowders is more stable and easier to process, wherein the micropowder is less likely to separate out of the slurry or agglomerate when compared to a slurry containing only micropowder.
    • 公开了包含微纤维和微粉末的聚酯组合物。 聚酯组合物通过使微纤维和微粉与可聚合组分(例如单体)接触,制备聚酯并使可聚合组分聚合来制备。 微纤维和微粉可以以单独的浆液或单一浆料的形式提供。 微粉也可以以粉末形式而不是浆料提供。 还公开了含有超细纤维和微粉的浆料,以及制备这种浆料的方法。 将微纤维和微粉掺入聚酯中改善了由这种聚酯制成的模塑部件,膜和/或纤维的性能。 含有微纤维和微粉的浆料更稳定并且易于加工,其中当与仅含有微粉末的浆料相比时,该微粉不太可能分离出浆料或附聚物。
    • 7. 发明申请
    • Exposure with intensity balancing to mimic complex illuminator shape
    • 曝光强度平衡模拟复杂的照明器形状
    • US20050018164A1
    • 2005-01-27
    • US10889216
    • 2004-07-13
    • Steven Hansen
    • Steven Hansen
    • G03F7/20G03B27/72
    • G03F7/705G03F7/701G03F7/70108
    • A method for optimizing the optical transfer of a mask pattern onto a substrate using a lithographic apparatus, the lithographic apparatus including an illuminator configured to illuminate the mask pattern, the method including determining a plurality of illumination arrangements for a pupil plane of the illuminator, each of the plurality of illumination arrangements being determined to improve a respective lithographic performance response parameter when illuminating the mask pattern; and adjusting an intensity of a first illumination arrangement of the plurality of illumination arrangements relative to a second illumination arrangement of the plurality of illumination arrangements, the mask pattern to be illuminated with the first and second illumination arrangements. The mask pattern may be illuminated at least once for each of the first and second illumination arrangements or all at once with at least the first illumination arrangement and the second illumination arrangement.
    • 一种使用光刻设备优化掩模图案在基板上的光学传递的方法,所述光刻设备包括被配置为照亮掩模图案的照明器,所述方法包括确定用于照明器的光瞳面的多个照明装置,每个 所述多个照明装置被确定为当照亮所述掩模图案时改善相应的光刻性能响应参数; 以及相对于所述多个照明装置的第二照明装置调整所述多个照明装置中的第一照明装置的强度,所述掩模图案将被所述第一和第二照明装置照明。 可以对于第一和第二照明装置中的每一个至少照亮一次掩模图案,或者至少第一照明装置和第二照明装置一次照射该掩模图案。
    • 10. 发明申请
    • Enhanced lithographic resolution through double exposure
    • 通过双重曝光增强光刻分辨率
    • US20050162627A1
    • 2005-07-28
    • US10765218
    • 2004-01-28
    • Jozef FindersDonis FlagelloSteven Hansen
    • Jozef FindersDonis FlagelloSteven Hansen
    • G03B27/42G03F7/20H01L21/027
    • G03F7/70433G03F7/70466
    • A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.
    • 本文给出了用于增强光刻系统中的图像分辨率的系统和方法。 本发明包括将掩模版图案分解为能够被光刻系统光学分辨的至少两个构成子图案,用预定的光致抗蚀剂层涂覆基底,以及暴露至少两个构成子图案中的第一个, 通过将投影光束引导通过第一子图案使得光刻系统在基板的预定光致抗蚀剂层上产生第一子图案图像。 本发明还包括处理曝光的基板,通过将投影光束引导通过第二子图案来暴露至少两个构成子图案中的第二个,使得光刻系统在预定的光致抗蚀剂上产生第二子图案图像 层,然后组合第一和第二子图案图像以在衬底上产生期望的图案。