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    • 3. 发明申请
    • Lithographic apparatus and device manufacturing method
    • 平版印刷设备和器件制造方法
    • US20060078805A1
    • 2006-04-13
    • US11090697
    • 2005-03-28
    • Steve Hansen
    • Steve Hansen
    • G03C5/00G03B27/42G03F1/00
    • G03F7/70091G03F7/70125
    • By proper selection of illumination configuration, mask transmission, and mask bias, complex patterns of contact holes may be imaged with sufficient latitude for manufacturing at minimum half-pitches of k1=0.40 or below. In an embodiment, a method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The method includes illuminating a mask pattern of an attenuated phase shift mask with an illumination configuration including on-axis and off-axis components, the off-axis component of the illumination being an annular illumination extending near a pupil edge, and projecting an image of the illuminated mask pattern onto the substrate.
    • 通过适当选择照明配置,掩模透射和掩模偏压,接触孔的复杂图案可以以足够的纬度被成像,以便以最小半间距k≤0.40或更低制造。 在一个实施例中,提出了用光刻设备将掩模图案的图像转印到基板上的方法。 该方法包括用包括轴上和离轴分量的照明配置照亮衰减的相移掩模的掩模图案,照明的离轴分量是在瞳孔边缘附近延伸的环形照明,并且投影图​​像 照明的掩模图案到基底上。
    • 4. 发明申请
    • Optimized polarization illumination
    • 优化极化照明
    • US20050134822A1
    • 2005-06-23
    • US10921878
    • 2004-08-20
    • Robert SochaDonis FlagelloSteve Hansen
    • Robert SochaDonis FlagelloSteve Hansen
    • G03F7/20H01L21/027G03B27/72
    • G03F7/705G03F7/70125G03F7/70341G03F7/70566G03F7/70616
    • Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.
    • 公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。 通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明,确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率,确定最大图像记录 斜率(ILS),其中ILS对于照明器上的至少一个点接近于零,并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。 对于照明器上的多个点可以重复这一点。
    • 7. 发明授权
    • Optimized polarization illumination
    • 优化极化照明
    • US08395757B2
    • 2013-03-12
    • US12773775
    • 2010-05-04
    • Robert SochaDonis FlagelloSteve Hansen
    • Robert SochaDonis FlagelloSteve Hansen
    • G03B27/72G03B27/54
    • G03F7/705G03F7/70125G03F7/70341G03F7/70566G03F7/70616
    • Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.
    • 公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。 通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明,确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率,确定最大图像记录 斜率(ILS),其中ILS对于照明器上的至少一个点接近于零,并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。 对于照明器上的多个点可以重复这一点。
    • 10. 发明申请
    • OPTIMIZED POLARIZATION ILLUMINATION
    • 优化极化照明
    • US20110051114A1
    • 2011-03-03
    • US12773775
    • 2010-05-04
    • Robert SOCHADonis FlagelloSteve Hansen
    • Robert SOCHADonis FlagelloSteve Hansen
    • G03B27/72
    • G03F7/705G03F7/70125G03F7/70341G03F7/70566G03F7/70616
    • Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.
    • 公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。 通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明,确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率,确定最大图像记录 斜率(ILS),其中ILS对于照明器上的至少一个点接近于零,并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。 对于照明器上的多个点可以重复这一点。