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1. 发明申请

US20070084408A1 BATCH PROCESSING CHAMBER WITH DIFFUSER PLATE AND INJECTOR ASSEMBLY 审中-公开
标题翻译：具有扩散板和注射器组件的批处理室
公开(公告)号：US20070084408A1
公开(公告)日：2007-04-19
申请号：US11381966
申请日：2006-05-05
申请人： Joseph Yudovsky , Tai Ngo , Cesar Tejamo , Maitreyee Mahajani , Brendan McDougall , Yi-Chiau Huang , Robert Cook , Yeong Kim , Alexander Tam , Adam Brailove , Steve Ghanayem
发明人： Joseph Yudovsky , Tai Ngo , Cesar Tejamo , Maitreyee Mahajani , Brendan McDougall , Yi-Chiau Huang , Robert Cook , Yeong Kim , Alexander Tam , Adam Brailove , Steve Ghanayem
IPC分类号： C23C16/00
CPC分类号： C23C16/46 , C23C16/45578 , H01L21/67109
摘要： An apparatus for batch processing of a wafer is disclosed. In one embodiment the batch processing apparatus includes a bell jar furnace having a diffuser disposed between gas inlets and the substrate positioned within the furnace to direct flows within the chamber around the perimeter of the substrate.
摘要翻译：公开了一种用于批处理晶片的设备。在一个实施例中，批处理设备包括钟罩式炉，其具有设置在气体入口之间的扩散器和位于炉内的基板，以引导室内围绕衬底周边的流动。

2. 发明申请

US20070084406A1 Reaction chamber with opposing pockets for gas injection and exhaust 审中-公开
标题翻译：反应室具有相对的气体注入和排气口袋
公开(公告)号：US20070084406A1
公开(公告)日：2007-04-19
申请号：US11249555
申请日：2005-10-13
申请人： Joseph Yudovsky , Robert Cook , Yeong Kim , Alexander Tam , Maitreyee Mahajani , Adam Brailove , Steve Ghanayem
发明人： Joseph Yudovsky , Robert Cook , Yeong Kim , Alexander Tam , Maitreyee Mahajani , Adam Brailove , Steve Ghanayem
IPC分类号： C23F1/00 , C23C16/00
CPC分类号： C23C16/45578 , C23C16/46 , H01L21/67109
摘要： The present invention generally provides a batch processing chamber having a quartz chamber, at least one heater block, an inject assembly coupled to one side of the quartz chamber, and an exhaust assembly coupled to an opposite side of the quartz chamber. In one embodiment, the inject assembly is independently temperature controlled. In another embodiment, at least one temperature sensor is disposed outside the quartz chamber.
摘要翻译：本发明通常提供了具有石英室，至少一个加热器块，耦合到石英腔的一侧的注射组件以及耦合到石英腔的相对侧的排气组件的批处理室。在一个实施例中，注射组件是独立温度控制的。在另一个实施例中，至少一个温度传感器设置在石英腔外部。

3. 发明申请

US20100224130A1 ROTATING SUBSTRATE SUPPORT AND METHODS OF USE 审中-公开
标题翻译：旋转基板支持和使用方法
公开(公告)号：US20100224130A1
公开(公告)日：2010-09-09
申请号：US12779904
申请日：2010-05-13
申请人： Jacob Smith , Alexander Tam , R. Suryanarayanan Iyer , Sean Seutter , Binh Tran , Nir Merry , Adam Brailove , Robert Shydo, JR. , Robert Andrews , Frank Roberts , Theodore Smick , Geoffrey Ryding
发明人： Jacob Smith , Alexander Tam , R. Suryanarayanan Iyer , Sean Seutter , Binh Tran , Nir Merry , Adam Brailove , Robert Shydo, JR. , Robert Andrews , Frank Roberts , Theodore Smick , Geoffrey Ryding
IPC分类号： H01L21/46
CPC分类号： H01L21/68792 , C23C16/4584 , H01L21/67126 , H01L21/68742
摘要： A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.
摘要翻译：本文公开了一种利用旋转衬底支撑件来处理衬底的方法和装置。在一个实施例中，用于处理衬底的装置包括具有设置在腔室内的衬底支撑组件的室。衬底支撑组件包括具有支撑表面的衬底支撑件和设置在支撑表面下方的加热器。轴联接到基板支撑件，并且电机通过转子联接到轴，以向基板支撑件提供旋转运动。密封块设置在转子周围并与其形成密封。密封块具有至少一个密封件和沿密封块和轴之间的界面设置的至少一个通道。端口连接到每个通道以连接到泵。升降机构联接到轴上以升高和降低基板支撑。

4. 发明申请

US20060281310A1 Rotating substrate support and methods of use 审中-公开
标题翻译：旋转基板支撑和使用方法
公开(公告)号：US20060281310A1
公开(公告)日：2006-12-14
申请号：US11147938
申请日：2005-06-08
申请人： Jacob Smith , Alexander Tam , R. Iyer , Sean Seutter , Binh Tran , Nir Merry , Adam Brailove , Robert Shydo , Robert Andrews , Frank Roberts , Theodore Smick , Geoffrey Ryding
发明人： Jacob Smith , Alexander Tam , R. Iyer , Sean Seutter , Binh Tran , Nir Merry , Adam Brailove , Robert Shydo , Robert Andrews , Frank Roberts , Theodore Smick , Geoffrey Ryding
IPC分类号： H01L21/44 , C23C16/00
CPC分类号： H01L21/68792 , C23C16/4584 , H01L21/67126 , H01L21/68742
摘要： A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.
摘要翻译：本文公开了一种利用旋转衬底支撑件来处理衬底的方法和装置。在一个实施例中，用于处理衬底的装置包括具有设置在腔室内的衬底支撑组件的室。衬底支撑组件包括具有支撑表面的衬底支撑件和设置在支撑表面下方的加热器。轴联接到基板支撑件，并且电机通过转子联接到轴，以向基板支撑件提供旋转运动。密封块设置在转子周围并与其形成密封。密封块具有至少一个密封件和沿密封块和轴之间的界面设置的至少一个通道。端口连接到每个通道以连接到泵。升降机构联接到轴上以升高和降低基板支撑。

5. 发明授权

US09892941B2 Multi-zone resistive heater 有权
公开(公告)号：US09892941B2
公开(公告)日：2018-02-13
申请号：US12485160
申请日：2009-06-16
申请人： Anqing Cui , Binh Tran , Alexander Tam , Jacob W. Smith , R. Suryanarayanan Iyer , Joseph Yudovsky , Sean M. Seutter
发明人： Anqing Cui , Binh Tran , Alexander Tam , Jacob W. Smith , R. Suryanarayanan Iyer , Joseph Yudovsky , Sean M. Seutter
IPC分类号： H05B3/68 , H01L21/67
CPC分类号： H01L21/67103 , H01L21/67248 , H05B3/68
摘要： Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.

6. 发明申请

US20070125762A1 Multi-zone resistive heater 审中-公开
标题翻译：多区电阻加热器
公开(公告)号：US20070125762A1
公开(公告)日：2007-06-07
申请号：US11293626
申请日：2005-12-01
申请人： Anqing Cui , Binh Tran , Alexander Tam , Jacob Smith , R. Iyer , Joseph Yudovsky , Sean Seutter
发明人： Anqing Cui , Binh Tran , Alexander Tam , Jacob Smith , R. Iyer , Joseph Yudovsky , Sean Seutter
IPC分类号： H05B3/68
CPC分类号： H01L21/67103
摘要： Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.
摘要翻译：公开了用于加热基底的装置，反应器和方法。该装置包括一个舞台，包括主体和具有支撑衬底的区域的表面，耦合到舞台的轴，设置在舞台的身体的中心区域内的第一加热元件，以及至少第二和第三加热元件设置在所述台体内，所述至少第二和第三加热元件各自部分地围绕所述第一加热元件，并且其中所述至少第二和第三加热元件彼此周向相邻。

7. 发明申请

US20090314762A1 Multi-Zone Resistive Heater 有权
标题翻译：多区电阻加热器
公开(公告)号：US20090314762A1
公开(公告)日：2009-12-24
申请号：US12485160
申请日：2009-06-16
申请人： Anqing Cui , Binh Tran , Alexander Tam , Jacob W. Smith , R. Suryanarayanan Iyer , Joseph Yudovsky , Sean M. Seutter
发明人： Anqing Cui , Binh Tran , Alexander Tam , Jacob W. Smith , R. Suryanarayanan Iyer , Joseph Yudovsky , Sean M. Seutter
IPC分类号： H05B3/68
CPC分类号： H01L21/67103 , H01L21/67248 , H05B3/68
摘要： Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.
摘要翻译：公开了用于加热基底的装置，反应器和方法。该装置包括一个舞台，包括主体和具有支撑衬底的区域的表面，耦合到舞台的轴，设置在舞台的身体的中心区域内的第一加热元件，以及至少第二和第三加热元件设置在所述台体内，所述至少第二和第三加热元件各自部分地围绕所述第一加热元件，并且其中所述至少第二和第三加热元件彼此周向相邻。

8. 发明申请

US20110308551A1 METHOD AND APPARATUS FOR INDUCING TURBULENT FLOW OF A PROCESSING CHAMBER CLEANING GAS 有权
标题翻译：用于诱导加工室清洁气体的涡流的方法和装置
公开(公告)号：US20110308551A1
公开(公告)日：2011-12-22
申请号：US13041230
申请日：2011-03-04
申请人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J.K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
发明人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J.K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
IPC分类号： B08B9/00 , B08B3/04
CPC分类号： B08B5/00 , C23C16/4405 , C23C16/45506 , C23C16/45591 , H01L21/02041 , H01L21/67115 , Y10S438/905
摘要： Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.
摘要翻译：本发明的实施例一般涉及使用清洁板清洁腔室部件的设备和方法。清洁板适于在清洁过程期间定位在基板支撑件上，并且包括多个湍流诱导结构。湍流诱导结构在清洁过程中清洁板旋转时引起清洁气体的湍流。在清洁过程中，清洁板增加了喷头附近清洁气体的停留时间。此外，清洁板减少清洁板内的浓度梯度以提供更有效的清洁。该方法包括将清洁板定位在与喷头相邻的位置，并将清洁气体引入到喷头和清洁板之间的空间。然后将沉积在喷头表面上的材料在清洁气体的存在下加热和蒸发，然后从处理室中排出。

9. 发明申请

US20110256315A1 SHOWERHEAD ASSEMBLY WITH GAS INJECTION DISTRIBUTION DEVICES 审中-公开
标题翻译：淋浴器组装与气体注射分配装置
公开(公告)号：US20110256315A1
公开(公告)日：2011-10-20
申请号：US12856747
申请日：2010-08-16
申请人： Alexander Tam , Anzhong Chang , Sumedh Acharya
发明人： Alexander Tam , Anzhong Chang , Sumedh Acharya
IPC分类号： C23C16/455
CPC分类号： B05B1/18 , C23C16/45519 , C23C16/45565 , C23C16/52 , C30B25/14 , H01L21/67115
摘要： A method and apparatus that may be utilized for chemical vapor deposition and/or hydride vapor phase epitaxial (HVPE) deposition are provided. The apparatus includes a showerhead assembly with separate inlets and manifolds for delivering separate processing gases into a processing volume of the chamber without mixing the gases prior to entering the processing volume. The showerhead includes a plurality of gas distribution devices disposed within a plurality of gas inlets for injecting one of the processing gases into and distributing it across a manifold for uniform delivery into the processing volume of the chamber. Each of the gas distribution devices preferably has a nozzle configured to evenly distribute the processing gas flowing therethrough while minimizing recirculation of the processing gas within the manifold. As a result, improved deposition uniformity is achieved on a plurality of substrates positioned in the processing volume of the processing chamber.
摘要翻译：提供了可用于化学气相沉积和/或氢化物气相外延（HVPE）沉积的方法和装置。该装置包括具有单独的入口和歧管的喷头组件，用于在进入处理体积之前将不同的处理气体输送到室的处理体积而不混合气体。淋浴头包括多个气体分配装置，其设置在多个气体入口内，用于将一个处理气体注入和分配到歧管上，以均匀地输送到腔室的处理容积中。每个气体分配装置优选地具有喷嘴，喷嘴构造成使流过其中的处理气体均匀地分布，同时最小化歧管内的处理气体的再循环。结果，在位于处理室的处理容积中的多个基板上实现了改善的沉积均匀性。

10. 发明申请

US20110121503A1 CVD APPARATUS 审中-公开
标题翻译： CVD装置
公开(公告)号：US20110121503A1
公开(公告)日：2011-05-26
申请号：US12850738
申请日：2010-08-05
申请人： BRIAN H. BURROWS , Ronald Stevens , Jacob Grayson , Joshua J. Podesta , Sandeep Nijhawan , Lori D. Washington , Alexander Tam , Sumedh Acharya
发明人： BRIAN H. BURROWS , Ronald Stevens , Jacob Grayson , Joshua J. Podesta , Sandeep Nijhawan , Lori D. Washington , Alexander Tam , Sumedh Acharya
IPC分类号： B23Q3/00
CPC分类号： H01L21/67115 , C23C16/4412 , C23C16/4584 , C23C16/481 , H01L21/68742 , H01L21/68792
摘要： Embodiments of the present invention generally relate to methods and apparatus for chemical vapor deposition (CVD) on a substrate, and, in particular, to a process chamber and components for use in metal organic chemical vapor deposition. The apparatus comprises a chamber body defining a process volume. A showerhead in a first plane defines a top portion of the process volume. A carrier plate extends across the process volume in a second plane forming an upper process volume between the showerhead and the susceptor plate. A transparent material in a third plane defines a bottom portion of the process volume forming a lower process volume between the carrier plate and the transparent material. A plurality of lamps forms one or more zones located below the transparent material. The apparatus provides uniform precursor flow and mixing while maintaining a uniform temperature over larger substrates thus yielding a corresponding increase in throughput.
摘要翻译：本发明的实施方案一般涉及用于基板上的化学气相沉积（CVD）的方法和装置，特别涉及用于金属有机化学气相沉积中的处理室和组件。该装置包括限定处理量的室主体。第一平面中的喷头定义了处理量的顶部。载体板在第二平面中延伸过程体积，形成在喷头和基座板之间的上过程体积。在第三平面中的透明材料限定了处理体积的底部，其在承载板和透明材料之间形成较低的处理体积。多个灯形成位于透明材料下方的一个或多个区域。该装置提供均匀的前体流动和混合，同时在较大的底物上保持均匀的温度，从而产生相应的生产量的增加。

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