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1. 发明授权

US08710451B2 Ion beam system and method of operating ion beam system 有权
标题翻译：离子束系统和操作离子束系统的方法
公开(公告)号：US08710451B2
公开(公告)日：2014-04-29
申请号：US13251174
申请日：2011-09-30
申请人： Josef Biberger , Ralph Pulwey , Andreas Adolf
发明人： Josef Biberger , Ralph Pulwey , Andreas Adolf
IPC分类号： H01J37/317
CPC分类号： H01J3/26 , H01J3/14 , H01J37/1477 , H01J37/28 , H01J37/317 , H01J2237/303 , H01J2237/31749
摘要： An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having a plurality of first defection electrodes 51a, 51b, 51c and a plurality of second deflection electrodes 52a, 52b, 52c wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plurality of second deflection electrodes such that electric deflection fields between the plurality of second deflection electrodes and the plurality of opposite first deflection electrodes have a common orientation. The ion beam system has a high kinetic energy mode in which a distribution of the electric deflection fields has a greater width, and a low kinetic energy mode in which a distribution of the electric deflection fields has a smaller width.
摘要翻译：离子束系统包括电压供应系统7和具有多个第一偏移电极51a，51b，51c和多个第二偏转电极52a，52b，52c的至少一个光束偏转器39，其中电压供应系统被配置为供应对多个第二偏转电极的不同的可调偏转电压使得多个第二偏转电极和多个相对的第一偏转电极之间的电偏转场具有共同的取向。离子束系统具有高动能模式，其中电偏转场的分布具有较大的宽度，以及低动能模式，其中电偏转场的分布具有较小的宽度。

2. 发明授权

US08816303B2 Method of processing of an object 有权
标题翻译：处理对象的方法
公开(公告)号：US08816303B2
公开(公告)日：2014-08-26
申请号：US13164122
申请日：2011-06-20
申请人： Josef Biberger , Ralph Pulwey , Jaroslaw Paluszynski , Dietmar Doenitz , Hans Mathèe , Michael Steigerwald
发明人： Josef Biberger , Ralph Pulwey , Jaroslaw Paluszynski , Dietmar Doenitz , Hans Mathèe , Michael Steigerwald
IPC分类号： H01J37/30 , H01J37/305 , H01J37/317 , H01J37/304
CPC分类号： H01J37/3056 , G01B15/04 , H01J37/30 , H01J37/3005 , H01J37/3007 , H01J37/304 , H01J37/3174 , H01J2237/2611 , H01J2237/30455 , H01J2237/30494 , H01J2237/31722 , H01J2237/31749
摘要： A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons; determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations.
摘要翻译：一种处理物体的方法包括：扫描物体表面上的粒子束，并检测由于扫描而从物体出射的电子; 基于检测到的电子，确定物体表面与物体表面上的多个位置中的每一个的预定表面之间的高度差; 基于所确定的高度差来确定所述物体表面上的所述多个位置中的每一个的处理强度; 并且基于所确定的处理强度将粒子束引导到多个位置，以便从多个位置处去除材料或在物体上沉积材料。

3. 发明申请

US20120145895A1 Method of Processing of an Object 有权
标题翻译：对象的处理方法
公开(公告)号：US20120145895A1
公开(公告)日：2012-06-14
申请号：US13164122
申请日：2011-06-20
申请人： Josef BIBERGER , Ralph Pulwey , Jaroslaw Paluszynski , Dietmar Doenitz , Hans Mathèe , Michael Steigerwald
发明人： Josef BIBERGER , Ralph Pulwey , Jaroslaw Paluszynski , Dietmar Doenitz , Hans Mathèe , Michael Steigerwald
IPC分类号： H01J37/28 , H01J37/30
CPC分类号： H01J37/3056 , G01B15/04 , H01J37/30 , H01J37/3005 , H01J37/3007 , H01J37/304 , H01J37/3174 , H01J2237/2611 , H01J2237/30455 , H01J2237/30494 , H01J2237/31722 , H01J2237/31749
摘要： A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons; determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations.
摘要翻译：一种处理物体的方法包括：扫描物体表面上的粒子束，并检测由于扫描而从物体出射的电子; 基于检测到的电子，确定物体表面与物体表面上的多个位置中的每一个的预定表面之间的高度差; 基于所确定的高度差来确定所述物体表面上的所述多个位置中的每一个的处理强度; 并且基于所确定的处理强度将粒子束引导到多个位置，以便从多个位置处去除材料或在物体上沉积材料。

4. 发明申请

US20120074320A1 PARTICLE BEAM DEVICE HAVING A SAMPLE HOLDER 有权
标题翻译：具有样品座的颗粒束装置
公开(公告)号：US20120074320A1
公开(公告)日：2012-03-29
申请号：US13239535
申请日：2011-09-22
申请人： Josef BIBERGER , Ralph Pulwey
发明人： Josef BIBERGER , Ralph Pulwey
IPC分类号： H01J37/26 , H01J37/20
CPC分类号： H01J37/28 , H01J37/20 , H01J2237/201 , H01J2237/20207 , H01J2237/20214 , H01J2237/20221 , H01J2237/20285 , H01J2237/20292
摘要： A particle beam device and a sample receptacle apparatus, which has a sample holder, are disclosed. The sample holder is arranged in a movable fashion along at least a first axis and along at least a second axis. Furthermore, the sample holder is arranged in a rotatable fashion about a first axis of rotation and about a second axis of rotation. A first sample holding device is arranged relative to the sample holder in a rotatable fashion about a third axis of rotation, in which the third axis of rotation and the second axis of rotation are at least in part arranged laterally offset with respect to one another. Furthermore, a control apparatus is provided, in which the first sample holding device is rotatable about the third axis of rotation into an analysis position and/or treating position using the control apparatus.
摘要翻译：公开了一种具有样品保持器的粒子束装置和样品容器装置。样品保持器沿着至少第一轴线和至少第二轴线以可移动的方式布置。此外，样品保持器围绕第一旋转轴线和约第二旋转轴线可旋转地布置。第一样品保持装置以关于第三旋转轴线的可旋转方式相对于样品保持器布置，其中第三旋转轴线和第二旋转轴线至少部分地相对于彼此横向偏移地布置。此外，提供一种控制装置，其中第一样品保持装置可以使用控制装置绕第三旋转轴线旋转到分析位置和/或处理位置。

5. 发明授权

US09136090B2 Method and apparatus for scanning a surface of an object using a particle beam 有权
标题翻译：使用粒子束扫描物体表面的方法和装置
公开(公告)号：US09136090B2
公开(公告)日：2015-09-15
申请号：US13905067
申请日：2013-05-29
申请人： Ralph Pulwey , Josef Biberger
发明人： Ralph Pulwey , Josef Biberger
IPC分类号： H01J37/302 , H01J37/317 , H01J3/26 , H01J37/305
CPC分类号： H01J37/3026 , H01J3/26 , H01J37/302 , H01J37/3023 , H01J37/3056 , H01J37/3174 , H01J2237/1536 , H01J2237/30483 , H01J2237/30488
摘要： A method of scanning a surface of an object using a particle beam comprises: determining a surface portion of the surface of the object, wherein the surface portion is to be scanned; determining initial positions of a set of raster points within the surface portion; changing the positions of at least some raster points of the set of raster points; and then scanning the surface portion by directing the particle beam to the positions of the raster points.
摘要翻译：使用粒子束扫描物体的表面的方法包括：确定物体表面的表面部分，其中表面部分被扫描; 确定所述表面部分内的一组光栅点的初始位置; 改变该组光栅点的至少一些光栅点的位置; 然后通过将粒子束引导到光栅点的位置来扫描表面部分。

6. 发明授权

US08759796B2 Particle beam system 有权
标题翻译：粒子束系统
公开(公告)号：US08759796B2
公开(公告)日：2014-06-24
申请号：US13025556
申请日：2011-02-11
申请人： Josef Biberger , Ralph Pulwey
发明人： Josef Biberger , Ralph Pulwey
IPC分类号： G21K1/00 , H01J37/317 , H01J37/26 , H01J37/04
CPC分类号： H01J37/3174 , H01J37/045 , H01J37/24 , H01J37/26 , H01J2237/0432 , H01J2237/2485 , H01J2237/28 , H01J2237/317
摘要： A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates 56, 57, and a control circuit. The control circuit provides a first current path 67 between the two deflection plates, wherein a switch 70, a node 72 connected to the high voltage source and a switch 76 are arranged in this order in the first current path starting from the deflection plate 56. The control circuit provides a second current path 85 between the deflection plate 56 and the deflection plate 57, wherein in the second current path, starting from the deflection plate 56, a series connection 88 comprising a voltage source 91 a switch 90, a node 86 connected to the high voltage source and a series connection 92 comprising a voltage source 95 and a switch 94 are arranged in this order.
摘要翻译：粒子束系统包括用于产生粒子束的粒子束源，高压源，具有偏转板56,57和控制电路的束消除系统。控制电路在两个偏转板之间提供第一电流路径67，其中开关70，连接到高电压源的节点72和开关76以从偏转板56开始的第一电流路径依次布置。控制电路在偏转板56和偏转板57之间提供第二电流路径85，其中在第二电流路径中，从偏转板56开始，串联连接88包括电压源91，开关90，节点86 连接到高电压源，并且包括电压源95和开关94的串联连接92按此顺序布置。

7. 发明申请

US20120256098A1 Ion Beam System and Method of Operating Ion Beam System 有权
标题翻译：离子束系统和操作离子束系统的方法
公开(公告)号：US20120256098A1
公开(公告)日：2012-10-11
申请号：US13251174
申请日：2011-09-30
申请人： Josef Biberger , Ralph Pulwey , Andreas Adolf
发明人： Josef Biberger , Ralph Pulwey , Andreas Adolf
IPC分类号： H01J3/14
CPC分类号： H01J3/26 , H01J3/14 , H01J37/1477 , H01J37/28 , H01J37/317 , H01J2237/303 , H01J2237/31749
摘要： An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation.The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.
摘要翻译：离子束系统包括电压供应系统7和至少一个具有至少一个第一偏转电极51a，51b，51c和多个第二偏转电极52a，52b，52c的光束偏转器39，其中电压供应系统被配置为提供不同的可变偏转电压到多个第二偏转电极，使得多个第二偏转电极和相对的至少一个第一偏转电极之间的电偏转场具有共同的取向。该系统具有高动能模式，其中电偏转场的分布具有较大的宽度，其中电偏转场的分布具有较小宽度的低动能模式。

8. 发明申请

US20120025093A1 Particle Beam System 有权
标题翻译：粒子束系统
公开(公告)号：US20120025093A1
公开(公告)日：2012-02-02
申请号：US13025556
申请日：2011-02-11
申请人： Josef Biberger , Ralph Pulwey
发明人： Josef Biberger , Ralph Pulwey
IPC分类号： H01J3/26
CPC分类号： H01J37/3174 , H01J37/045 , H01J37/24 , H01J37/26 , H01J2237/0432 , H01J2237/2485 , H01J2237/28 , H01J2237/317
摘要： A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates 56, 57, and a control circuit. The control circuit provides a first current path 67 between the two deflection plates, wherein a switch 70, a node 72 connected to the high voltage source and a switch 76 are arranged in this order in the first current path starting from the deflection plate 56. The control circuit provides a second current path 85 between the deflection plate 56 and the deflection plate 57, wherein in the second current path, starting from the deflection plate 56, a series connection 88 comprising a voltage source 91 a switch 90, a node 86 connected to the high voltage source and a series connection 92 comprising a voltage source 95 and a switch 94 are arranged in this order.
摘要翻译：粒子束系统包括用于产生粒子束的粒子束源，高压源，具有偏转板56,57和控制电路的束消除系统。控制电路在两个偏转板之间提供第一电流路径67，其中开关70，连接到高电压源的节点72和开关76以从偏转板56开始的第一电流路径依次布置。控制电路在偏转板56和偏转板57之间提供第二电流路径85，其中在第二电流路径中，从偏转板56开始，串联连接88包括电压源91，开关90，节点86 连接到高电压源，并且包括电压源95和开关94的串联连接92按此顺序排列。

9. 发明授权

US09190242B2 Particle beam device having a sample holder 有权
标题翻译：具有样品架的颗粒束装置
公开(公告)号：US09190242B2
公开(公告)日：2015-11-17
申请号：US13239535
申请日：2011-09-22
申请人： Josef Biberger , Ralph Pulwey
发明人： Josef Biberger , Ralph Pulwey
IPC分类号： H01J37/20 , H01J37/28
CPC分类号： H01J37/28 , H01J37/20 , H01J2237/201 , H01J2237/20207 , H01J2237/20214 , H01J2237/20221 , H01J2237/20285 , H01J2237/20292
摘要： A particle beam device and a sample receptacle apparatus, which has a sample holder, are disclosed. The sample holder is arranged in a movable fashion along at least a first axis and along at least a second axis. Furthermore, the sample holder is arranged in a rotatable fashion about a first axis of rotation and about a second axis of rotation. A first sample holding device is arranged relative to the sample holder in a rotatable fashion about a third axis of rotation, in which the third axis of rotation and the second axis of rotation are at least in part arranged laterally offset with respect to one another. Furthermore, a control apparatus is provided, in which the first sample holding device is rotatable about the third axis of rotation into an analysis position and/or treating position using the control apparatus.
摘要翻译：公开了一种具有样品保持器的粒子束装置和样品容器装置。样品保持器沿着至少第一轴线和至少第二轴线以可移动的方式布置。此外，样品保持器围绕第一旋转轴线和约第二旋转轴线可旋转地布置。第一样品保持装置以关于第三旋转轴线的可旋转方式相对于样品保持器布置，其中第三旋转轴线和第二旋转轴线至少部分地相对于彼此横向偏移地布置。此外，提供一种控制装置，其中第一样品保持装置可以使用控制装置绕第三旋转轴线旋转到分析位置和/或处理位置。

10. 发明申请

US20130180962A1 Methods and Systems for Raster Scanning a Surface of an Object Using a Particle Beam 审中-公开
标题翻译：使用粒子束对物体表面进行光栅扫描的方法和系统
公开(公告)号：US20130180962A1
公开(公告)日：2013-07-18
申请号：US13741677
申请日：2013-01-15
申请人： Josef Biberger , Ralph Pulwey
发明人： Josef Biberger , Ralph Pulwey
IPC分类号： B23K15/00
CPC分类号： B23K15/00 , B23K15/08 , H01J37/304 , H01J37/3053 , H01J2237/30488
摘要： A method of raster scanning a surface of an object using a particle beam comprises determining a basic set of raster points within a surface; determining a surface portion of the surface of the object, wherein the surface portion is to be raster scanned; ordering a set of raster points of the basic set located within the surface portion; and scanning of the surface portion by directing the particle beam onto the raster points of the ordered set in an order corresponding to an order of the raster points in the ordered set from the outside to the inside, i.e. starting from the boundary of the surface portion towards its center, or in the reverse order, i.e. from the inside to the outside.
摘要翻译：使用粒子束光栅扫描对象的表面的方法包括确定表面内的一组基本的光栅点; 确定所述物体的表面的表面部分，其中所述表面部分将被光栅扫描; 订购位于表面部分内的基本集合的一组光栅点; 通过将粒子束以与从外部到内部的有序集合中的光栅点的顺序相对应的顺序将粒子束引导到有序集的光栅点上，即从表面部分的边界开始，扫描表面部分朝向其中心，或以相反的顺序，即从内向外。

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