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1. 发明申请

US20140290861A1 DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF 审中-公开
标题翻译：用于柔性基板的沉积平台及其操作方法
公开(公告)号：US20140290861A1
公开(公告)日：2014-10-02
申请号：US13894242
申请日：2013-05-14
申请人： Jose Manuel DIEGUEZ-CAMPO , Heike LANDGRAF , Tobias STOLLEY , Stefan HEIN , Florian RIES , Morrison NEIL
发明人： Jose Manuel DIEGUEZ-CAMPO , Heike LANDGRAF , Tobias STOLLEY , Stefan HEIN , Florian RIES , Morrison NEIL
IPC分类号： C23C16/44
CPC分类号： C23C16/545 , C23C14/562 , C23C16/44 , C23C16/4409 , C23C16/45519 , C23C16/509
摘要： An apparatus for processing a flexible substrate is described. The apparatus includes a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion, an unwinding shaft, a coating drum having a rotation axis and a curved outer surface for guiding the substrate along the curved outer surface through a first vacuum processing region and at least one second vacuum processing region, wherein a first portion of the coating drum is provided in the second chamber portion and the remaining portion of the coating drum is provided in the third chamber portion, a first processing station corresponding to the first processing region and at least one second processing station corresponding to the at least one second vacuum processing region, wherein the first processing station and the second processing station each includes a flange portion.
摘要翻译：描述了一种用于处理柔性基板的装置。该设备包括具有第一室部分，第二室部分和第三室部分的真空室，退绕轴，具有旋转轴线和弯曲外表面的涂覆滚筒，用于沿着弯曲的外表面引导基板通过第一真空处理区域和至少一个第二真空处理区域，其中涂布滚筒的第一部分设置在第二室部分中，并且涂布滚筒的剩余部分设置在第三室部分中，对应于第一处理站第一处理区域和对应于至少一个第二真空处理区域的至少一个第二处理站，其中第一处理站和第二处理站各自包括凸缘部分。

2. 发明申请

US20140212600A1 COMMON DEPOSITION PLATFORM, PROCESSING STATION, AND METHOD OF OPERATION THEREOF 有权
标题翻译：共同沉积平台，加工站及其操作方法
公开(公告)号：US20140212600A1
公开(公告)日：2014-07-31
申请号：US13871899
申请日：2013-04-26
申请人： Morrison NEIL , Jose Manuel DIEGUEZ-CAMPO , Heike LANDGRAF , Tobias STOLLEY , Stefan HEIN , Florian RIES , Wolfgang BUSCHBECK
发明人： Morrison NEIL , Jose Manuel DIEGUEZ-CAMPO , Heike LANDGRAF , Tobias STOLLEY , Stefan HEIN , Florian RIES , Wolfgang BUSCHBECK
IPC分类号： C23C16/54 , C23C16/50
CPC分类号： C23C16/545 , C23C16/45517 , C23C16/45519 , C23C16/50 , H01J37/32449 , H01J37/32513 , H01J37/32568 , H01J37/32752 , H01J37/32761 , H01J37/3277
摘要： An apparatus includes a substrate support having an outer surface for guiding the substrate through a first vacuum processing region and at least one second vacuum processing region. First and second deposition sources correspond to the first processing region and at least one second deposition source corresponds to the at least one second vacuum processing region, wherein at least the first deposition source includes an electrode having a surface that opposes the substrate support. A processing gas inlet and a processing gas outlet are arranged at opposing sides of the surface of the electrode. At least one separation gas inlet how one or more openings, wherein the one or more openings are at least provided at one of opposing sides of the electrode surface such that the processing gas inlet and/or the processing gas outlet are provided between the one or more openings and the surface of the electrode.
摘要翻译：一种设备包括具有用于引导基板通过第一真空处理区域和至少一个第二真空处理区域的外表面的基板支撑件。第一和第二沉积源对应于第一处理区域，并且至少一个第二沉积源对应于至少一个第二真空处理区域，其中至少第一沉积源包括具有与基板支撑件相对的表面的电极。处理气体入口和处理气体出口布置在电极表面的相对侧。至少一个分离气体入口如何一个或多个开口，其中所述一个或多个开口至少设置在电极表面的相对侧中的一个处，使得处理气体入口和/或处理气体出口设置在该一个或多个开口之间，更多的开口和电极的表面。

3. 发明申请

US20100186671A1 ARRANGEMENT FOR WORKING SUBSTRATES BY MEANS OF PLASMA 审中-公开
标题翻译：通过等离子体处理基板的布置
公开(公告)号：US20100186671A1
公开(公告)日：2010-07-29
申请号：US12358398
申请日：2009-01-23
申请人： Stefan HEIN , Andre HERZOG , Neil MORRISON , Jozef KUDELA
发明人： Stefan HEIN , Andre HERZOG , Neil MORRISON , Jozef KUDELA
IPC分类号： C23C16/54
CPC分类号： C23C16/24 , C23C16/455 , C23C16/5096 , H01J37/3244 , H01J37/32449 , H01J37/32541
摘要： The invention relates to an arrangement for working substrates by means of plasma (PECVD), wherein at least two electrodes are provided which are located in a common plane and are spaced apart from one another. Between the particular electrodes are provided interspaces which serve as gas inlets or gas outlets.
摘要翻译：本发明涉及一种通过等离子体（PECVD）工作衬底的装置，其中设置有至少两个电极，它们位于公共平面中并且彼此间隔开。在特定电极之间提供用作气体入口或气体出口的间隙。

4. 发明申请

US20100297361A1 PLASMA DEPOSITION SOURCE AND METHOD FOR DEPOSITING THIN FILMS 审中-公开
标题翻译：等离子体沉积源和沉积薄膜的方法
公开(公告)号：US20100297361A1
公开(公告)日：2010-11-25
申请号：US12476891
申请日：2009-06-02
申请人： Neil MORRISON , Andre HERZOG , Stefan HEIN , Peter SKUK
发明人： Neil MORRISON , Andre HERZOG , Stefan HEIN , Peter SKUK
IPC分类号： C23C16/50 , H05H1/32
CPC分类号： H01J37/32 , C23C14/505 , H01J37/3277
摘要： A plasma deposition source for transferring a deposition gas into a plasma phase and for depositing, from the plasma phase, a thin film onto a substrate moving in a substrate transport direction in a vacuum chamber is described. The plasma deposition source includes a multi-region electrode device adapted to be positioned in the vacuum chamber and including at least one RF electrode arranged opposite to the moving substrate, and an RF power generator adapted for supplying RF power to the RF electrode. The RF electrode has at least one gas inlet arranged at one edge of the RF electrode and at least one gas outlet arranged at the opposed edge of the RF electrode. A normalized plasma volume is provided by a plasma volume defined between an electrode surface and an opposite substrate position, divided by an electrode length. The normalized plasma volume is tuned to a depletion length of the deposition gas.
摘要翻译：一种等离子体沉积源，用于将沉积气体转移到等离子体相中，并且用于从等离子体相将薄膜沉积到在真空室中沿基板输送方向移动的基板上。等离子体沉积源包括多区域电极装置，其适于定位在真空室中并且包括与移动衬底相对设置的至少一个RF电极，以及适于向RF电极提供RF功率的RF发生器。 RF电极具有布置在RF电极的一个边缘处的至少一个气体入口和布置在RF电极的相对边缘处的至少一个气体出口。通过在电极表面和相对的衬底位置之间限定的等离子体体积除以电极长度来提供归一化的等离子体体积。归一化的等离子体体积被调节到沉积气体的耗尽长度。

5. 发明申请

US20200318233A1 DEPOSITION APPARATUS, METHOD OF COATING A FLEXIBLE SUBSTRATE AND FLEXIBLE SUBSTRATE HAVING A COATING 审中-公开
公开(公告)号：US20200318233A1
公开(公告)日：2020-10-08
申请号：US16308695
申请日：2017-11-28
申请人： Edgar HABERKORN , Stefan LORENZ , Stefan HEIN , Neil MORRISON , Reiner KUKLA , Christof KURTHEN , Thomas DEPPISCH , Applied Materials, Inc.
发明人： Edgar HABERKORN , Stefan LORENZ , Stefan HEIN , Neil MORRISON , Reiner KUKLA , Christof KURTHEN , Thomas DEPPISCH
IPC分类号： C23C14/58 , C23C14/06 , C23C14/50 , C23C14/34
摘要： A deposition apparatus for coating a flexible substrate is described. The deposition apparatus includes a first spool chamber housing a storage spool for providing the flexible substrate, a deposition chamber arranged downstream from the first spool chamber, and a second spool chamber arranged downstream from the deposition chamber and housing a wind-up spool for winding the flexible substrate thereon after deposition. The deposition chamber includes a coating drum for guiding the flexible substrate past a plurality of deposition units including at least one deposition unit having a graphite target. Further, the deposition chamber includes a coating treatment device configured to densify a layer deposited on the flexible substrate.

6. 发明申请

US20110070375A1 MODULAR SUBSTRATE PROCESSING SYSTEM AND METHOD 审中-公开
标题翻译：模块化基板处理系统及方法
公开(公告)号：US20110070375A1
公开(公告)日：2011-03-24
申请号：US12567647
申请日：2009-09-25
申请人： Andre HERZOG , Neil MORRISON , Stefan HEIN , Peter SAUER
发明人： Andre HERZOG , Neil MORRISON , Stefan HEIN , Peter SAUER
IPC分类号： B05D1/36 , B05C13/00
CPC分类号： H01L21/67132 , B65H23/24 , B65H23/32 , B65H2601/254 , B65H2801/87
摘要： A modular substrate processing system is provided for processing a flexible substrate. The system includes at least two process modules arranged adjacent to each other in a horizontal direction. The process modules include gas cushion rollers adapted for contactless guiding of the flexible substrate and for diverting the flexible substrate in vertical directions.
摘要翻译：提供了一种用于处理柔性基板的模块化基板处理系统。该系统包括沿水平方向彼此相邻布置的至少两个处理模块。处理模块包括适于柔性基板的非接触式引导和用于在垂直方向上转移柔性基板的气垫辊。

7. 发明申请

US20110003072A1 BENDING FIXTURE FOR HOMOGENOUS AND SMOOTH OPERATION OF AN EVAPORATION SOURCE 审中-公开
标题翻译：用于平衡蒸发源的均匀和平滑操作的弯曲固定
公开(公告)号：US20110003072A1
公开(公告)日：2011-01-06
申请号：US12500439
申请日：2009-07-09
申请人： Stefan KELLER , Juergen BRUCH , Guenter KLEMM , Karl-Albert KEIM , Stefan HEIN
发明人： Stefan KELLER , Juergen BRUCH , Guenter KLEMM , Karl-Albert KEIM , Stefan HEIN
IPC分类号： B05D5/06 , C23C14/22
CPC分类号： C23C14/223 , B21F1/00 , B21F99/00 , C23C14/542
摘要： An evaporation apparatus for coating a substrate having an evaporation structure for evaporating material, the evaporation structure having an evaporation structure surface for receiving a wire; a wire feed for providing the wire; and a bending fixture with the bending fixture including a first and a second roller for giving the wire a reproducible curvature so that in operation of the evaporation apparatus the contact spot of the wire on the evaporation structure is at a desired position.
摘要翻译：一种用于涂覆具有用于蒸发材料的蒸发结构的基底的蒸发装置，所述蒸发结构具有用于接收线的蒸发结构表面; 用于提供线的送丝; 以及弯曲夹具，其中所述弯曲夹具包括第一和第二辊，用于给所述导线提供可再现的曲率，使得在所述蒸发装置的操作中，所述蒸发结构上的所述导线的接触点处于期望位置。

8. 发明申请

US20100196591A1 MODULAR PVD SYSTEM FOR FLEX PV 审中-公开
标题翻译： FLEX PV模块化PVD系统
公开(公告)号：US20100196591A1
公开(公告)日：2010-08-05
申请号：US12366299
申请日：2009-02-05
申请人： Stefan HEIN , Andre HERZOG , Peter SAUER , Neil MORRISON
发明人： Stefan HEIN , Andre HERZOG , Peter SAUER , Neil MORRISON
IPC分类号： B05D5/12 , B05C13/00 , C23C14/34
CPC分类号： C23C14/562 , H01L31/206 , Y02E10/50 , Y02P70/521
摘要： A system for thin film deposition on a flexible substrate having at least a first deposition region is described. The system includes a first chamber being based on a platform, wherein the first deposition region is within the first chamber, wherein the first chamber has a first support member configuration configured for supporting at least two different substrate guiding systems and wherein one substrate guiding system is supported by the first support member configuration, and wherein the platform is configured for at least two different deposition units and wherein one deposition unit of the at least two different deposition units is enclosed by the first chamber.
摘要翻译：描述了具有至少第一沉积区域的柔性基板上的薄膜沉积系统。该系统包括基于平台的第一室，其中第一沉积区域在第一室内，其中第一室具有构造成用于支撑至少两个不同的衬底引导系统的第一支撑构件配置，并且其中一个衬底引导系统是由所述第一支撑构件构造支撑，并且其中所述平台构造成用于至少两个不同的沉积单元，并且其中所述至少两个不同沉积单元中的一个沉积单元被所述第一室包围。

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