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1. 发明申请

US20110070375A1 MODULAR SUBSTRATE PROCESSING SYSTEM AND METHOD 审中-公开
标题翻译：模块化基板处理系统及方法
公开(公告)号：US20110070375A1
公开(公告)日：2011-03-24
申请号：US12567647
申请日：2009-09-25
申请人： Andre HERZOG , Neil MORRISON , Stefan HEIN , Peter SAUER
发明人： Andre HERZOG , Neil MORRISON , Stefan HEIN , Peter SAUER
IPC分类号： B05D1/36 , B05C13/00
CPC分类号： H01L21/67132 , B65H23/24 , B65H23/32 , B65H2601/254 , B65H2801/87
摘要： A modular substrate processing system is provided for processing a flexible substrate. The system includes at least two process modules arranged adjacent to each other in a horizontal direction. The process modules include gas cushion rollers adapted for contactless guiding of the flexible substrate and for diverting the flexible substrate in vertical directions.
摘要翻译：提供了一种用于处理柔性基板的模块化基板处理系统。该系统包括沿水平方向彼此相邻布置的至少两个处理模块。处理模块包括适于柔性基板的非接触式引导和用于在垂直方向上转移柔性基板的气垫辊。

2. 发明申请

US20100196591A1 MODULAR PVD SYSTEM FOR FLEX PV 审中-公开
标题翻译： FLEX PV模块化PVD系统
公开(公告)号：US20100196591A1
公开(公告)日：2010-08-05
申请号：US12366299
申请日：2009-02-05
申请人： Stefan HEIN , Andre HERZOG , Peter SAUER , Neil MORRISON
发明人： Stefan HEIN , Andre HERZOG , Peter SAUER , Neil MORRISON
IPC分类号： B05D5/12 , B05C13/00 , C23C14/34
CPC分类号： C23C14/562 , H01L31/206 , Y02E10/50 , Y02P70/521
摘要： A system for thin film deposition on a flexible substrate having at least a first deposition region is described. The system includes a first chamber being based on a platform, wherein the first deposition region is within the first chamber, wherein the first chamber has a first support member configuration configured for supporting at least two different substrate guiding systems and wherein one substrate guiding system is supported by the first support member configuration, and wherein the platform is configured for at least two different deposition units and wherein one deposition unit of the at least two different deposition units is enclosed by the first chamber.
摘要翻译：描述了具有至少第一沉积区域的柔性基板上的薄膜沉积系统。该系统包括基于平台的第一室，其中第一沉积区域在第一室内，其中第一室具有构造成用于支撑至少两个不同的衬底引导系统的第一支撑构件配置，并且其中一个衬底引导系统是由所述第一支撑构件构造支撑，并且其中所述平台构造成用于至少两个不同的沉积单元，并且其中所述至少两个不同沉积单元中的一个沉积单元被所述第一室包围。

3. 发明申请

US20100186671A1 ARRANGEMENT FOR WORKING SUBSTRATES BY MEANS OF PLASMA 审中-公开
标题翻译：通过等离子体处理基板的布置
公开(公告)号：US20100186671A1
公开(公告)日：2010-07-29
申请号：US12358398
申请日：2009-01-23
申请人： Stefan HEIN , Andre HERZOG , Neil MORRISON , Jozef KUDELA
发明人： Stefan HEIN , Andre HERZOG , Neil MORRISON , Jozef KUDELA
IPC分类号： C23C16/54
CPC分类号： C23C16/24 , C23C16/455 , C23C16/5096 , H01J37/3244 , H01J37/32449 , H01J37/32541
摘要： The invention relates to an arrangement for working substrates by means of plasma (PECVD), wherein at least two electrodes are provided which are located in a common plane and are spaced apart from one another. Between the particular electrodes are provided interspaces which serve as gas inlets or gas outlets.
摘要翻译：本发明涉及一种通过等离子体（PECVD）工作衬底的装置，其中设置有至少两个电极，它们位于公共平面中并且彼此间隔开。在特定电极之间提供用作气体入口或气体出口的间隙。

4. 发明申请

US20100297361A1 PLASMA DEPOSITION SOURCE AND METHOD FOR DEPOSITING THIN FILMS 审中-公开
标题翻译：等离子体沉积源和沉积薄膜的方法
公开(公告)号：US20100297361A1
公开(公告)日：2010-11-25
申请号：US12476891
申请日：2009-06-02
申请人： Neil MORRISON , Andre HERZOG , Stefan HEIN , Peter SKUK
发明人： Neil MORRISON , Andre HERZOG , Stefan HEIN , Peter SKUK
IPC分类号： C23C16/50 , H05H1/32
CPC分类号： H01J37/32 , C23C14/505 , H01J37/3277
摘要： A plasma deposition source for transferring a deposition gas into a plasma phase and for depositing, from the plasma phase, a thin film onto a substrate moving in a substrate transport direction in a vacuum chamber is described. The plasma deposition source includes a multi-region electrode device adapted to be positioned in the vacuum chamber and including at least one RF electrode arranged opposite to the moving substrate, and an RF power generator adapted for supplying RF power to the RF electrode. The RF electrode has at least one gas inlet arranged at one edge of the RF electrode and at least one gas outlet arranged at the opposed edge of the RF electrode. A normalized plasma volume is provided by a plasma volume defined between an electrode surface and an opposite substrate position, divided by an electrode length. The normalized plasma volume is tuned to a depletion length of the deposition gas.
摘要翻译：一种等离子体沉积源，用于将沉积气体转移到等离子体相中，并且用于从等离子体相将薄膜沉积到在真空室中沿基板输送方向移动的基板上。等离子体沉积源包括多区域电极装置，其适于定位在真空室中并且包括与移动衬底相对设置的至少一个RF电极，以及适于向RF电极提供RF功率的RF发生器。 RF电极具有布置在RF电极的一个边缘处的至少一个气体入口和布置在RF电极的相对边缘处的至少一个气体出口。通过在电极表面和相对的衬底位置之间限定的等离子体体积除以电极长度来提供归一化的等离子体体积。归一化的等离子体体积被调节到沉积气体的耗尽长度。

5. 发明申请

US20200318233A1 DEPOSITION APPARATUS, METHOD OF COATING A FLEXIBLE SUBSTRATE AND FLEXIBLE SUBSTRATE HAVING A COATING 审中-公开
公开(公告)号：US20200318233A1
公开(公告)日：2020-10-08
申请号：US16308695
申请日：2017-11-28
申请人： Edgar HABERKORN , Stefan LORENZ , Stefan HEIN , Neil MORRISON , Reiner KUKLA , Christof KURTHEN , Thomas DEPPISCH , Applied Materials, Inc.
发明人： Edgar HABERKORN , Stefan LORENZ , Stefan HEIN , Neil MORRISON , Reiner KUKLA , Christof KURTHEN , Thomas DEPPISCH
IPC分类号： C23C14/58 , C23C14/06 , C23C14/50 , C23C14/34
摘要： A deposition apparatus for coating a flexible substrate is described. The deposition apparatus includes a first spool chamber housing a storage spool for providing the flexible substrate, a deposition chamber arranged downstream from the first spool chamber, and a second spool chamber arranged downstream from the deposition chamber and housing a wind-up spool for winding the flexible substrate thereon after deposition. The deposition chamber includes a coating drum for guiding the flexible substrate past a plurality of deposition units including at least one deposition unit having a graphite target. Further, the deposition chamber includes a coating treatment device configured to densify a layer deposited on the flexible substrate.

6. 发明申请

US20200165721A1 VACUUM PROCESSING SYSTEM AND METHODS THEREFOR 审中-公开
公开(公告)号：US20200165721A1
公开(公告)日：2020-05-28
申请号：US16075914
申请日：2016-02-12
申请人： Neil MORRISON , Jürgen HENRICH , Florian RIES , Tobias STOLLEY , Andreas SAUER , Wolfgang BUSCHBECK , Applied Materials, Inc.
发明人： Neil MORRISON , Jürgen HENRICH , Florian RIES , Tobias STOLLEY , Andreas SAUER , Wolfgang BUSCHBECK
IPC分类号： C23C14/56 , C23C16/54 , B65G39/18 , B05C9/14 , B05C1/08 , C23C16/458 , C23C16/511
摘要： A vacuum processing system for a flexible substrate is provided. The vacuum processing system includes a first chamber adapted for housing a supply roll for providing the flexible substrate; a second chamber adapted for housing a take-up roll for storing the flexible substrate after processing; a substrate transport arrangement including one or more guide rollers for guiding the flexible substrate from the first chamber to the second chamber; a maintenance zone between the first chamber and the second chamber wherein the maintenance zone allows for maintenance access to or of at least one of the first chamber and the second chamber; and a first process chamber for processing the flexible substrate.

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