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1. 发明授权

US10403477B2 Microwave plasma reactor for manufacturing synthetic diamond material 有权
公开(公告)号：US10403477B2
公开(公告)日：2019-09-03
申请号：US13994880
申请日：2011-12-14
申请人： John Robert Brandon , Alexander Lamb Cullen , Stephen David Williams , Joseph Michael Dodson , Helen Wilman , Christopher John Howard Wort
发明人： John Robert Brandon , Alexander Lamb Cullen , Stephen David Williams , Joseph Michael Dodson , Jonathan James Wilman , Christopher John Howard Wort
IPC分类号： H01J37/32 , C23C16/27 , C23C16/511
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapor deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode, wherein the resonance cavity has a central rotational axis of symmetry extending from the base to the top plate, and wherein the top plate is mounted across said central rotational axis of symmetry; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; and a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use; wherein the resonance cavity is configured to have a height, as measured from the base to the top plate of the plasma chamber, which supports a TM011 resonant mode between the base and the top plate at said frequency f, and wherein the resonance cavity is further configured to have a diameter, as measured at a height less than 50% of the height of the resonance cavity as measured from the base, which satisfies the condition that a ratio of the resonance cavity height/the resonance cavity diameter is in the range 0.3 to 1.0.

2. 发明申请

US20140234556A1 MICROWAVE PLASMA REACTORS AND SUBSTRATES FOR SYNTHETIC DIAMOND MANUFACTURE 有权
标题翻译： MICROWAVE等离子体反应器和合成金刚石制造基材
公开(公告)号：US20140234556A1
公开(公告)日：2014-08-21
申请号：US13994813
申请日：2011-12-14
申请人： Carlton Nigel Dodge , Paul Nicolas Inglis , Geoffrey Alan Scarsbrook , Timothy Peter Mollart , Charles Simon James Pickles , Steven Edward Coe , Joseph Michael Dodson , Alexander Lamb Cullen , John Robert Brandon , Christopher John Howard Wort
发明人： Carlton Nigel Dodge , Paul Nicolas Inglis , Geoffrey Alan Scarsbrook , Timothy Peter Mollart , Charles Simon James Pickles , Steven Edward Coe , Joseph Michael Dodson , Alexander Lamb Cullen , John Robert Brandon , Christopher John Howard Wort
IPC分类号： C23C16/27 , C23C16/52 , C23C16/511
CPC分类号： C23C16/274 , C01B32/25 , C23C16/4586 , C23C16/511 , C23C16/52 , C23C16/56 , C30B25/105 , C30B29/04 , H01J37/32192 , H01J37/32284 , Y10T428/12993
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode between the base and the top plate; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate; and a substrate disposed on the supporting surface, the substrate having a growth surface on which the synthetic diamond material is to be deposited in use, wherein the substrate dimensions and location within the resonance cavity are selected to generate a localized axisymmetric Ez electric field profile across the growth surface in use, the localized axisymmetric Ez electric field profile comprising a substantially flat central portion bound by a ring of higher electric field, the substantially flat central portion extending over at least 60% of an area of the growth surface of the substrate and having an Ez electric field variation of no more than ±10% of a central Ez electric field strength, the ring of higher electric field being disposed around the central portion and having a peak Ez electric field strength in a range 10% to 50% higher than the central Ez electric field strength.
摘要翻译：一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：微波发生器，其被配置为以频率f产生微波; 等离子体室，其包括基底，顶板和从所述底座延伸到所述顶板的侧壁，所述侧壁限定用于在所述基底和所述顶板之间支撑微波共振模式的共振腔; 用于将微波从微波发生器馈送到等离子体室中的微波耦合配置; 用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 衬底保持器，其设置在所述等离子体室中并且包括用于支撑衬底的支撑表面; 以及设置在所述支撑表面上的基板，所述基板具有生长表面，所述合成金刚石材料将在其上沉积在所述生长表面上，其中所述共振腔内的所述基板尺寸和位置被选择以产生局部轴对称Ez电场分布在使用中的生长表面，局部轴对称Ez电场分布包括由较高电场环结合的基本上平坦的中心部分，基本上平坦的中心部分延伸至衬底的生长表面的至少60％的面积; 具有不大于中心Ez电场强度的±10％的Ez电场变化，较高电场的环设置在中心部分周围，并且具有10％至50％以上范围内的峰值Ez电场强度比中央Ez电场强度高。

3. 发明授权

US08859058B2 Microwave plasma reactors and substrates for synthetic diamond manufacture 有权
标题翻译：微波等离子体反应器和合成金刚石制造用基材
公开(公告)号：US08859058B2
公开(公告)日：2014-10-14
申请号：US13994813
申请日：2011-12-14
申请人： Carlton Nigel Dodge , Paul Nicolas Inglis , Geoffrey Alan Scarsbrook , Timothy Peter Mollart , Charles Simon James Pickles , Steven Edward Coe , Joseph Michael Dodson , Alexander Lamb Cullen , John Robert Brandon , Christopher John Howard Wort
发明人： Carlton Nigel Dodge , Paul Nicolas Inglis , Geoffrey Alan Scarsbrook , Timothy Peter Mollart , Charles Simon James Pickles , Steven Edward Coe , Joseph Michael Dodson , Alexander Lamb Cullen , John Robert Brandon , Christopher John Howard Wort
IPC分类号： C23C16/00 , C23C16/27 , C23C16/52 , C23C16/511
CPC分类号： C23C16/274 , C01B32/25 , C23C16/4586 , C23C16/511 , C23C16/52 , C23C16/56 , C30B25/105 , C30B29/04 , H01J37/32192 , H01J37/32284 , Y10T428/12993
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapor deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode between the base and the top plate; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate; and a substrate disposed on the supporting surface, the substrate having a growth surface on which the synthetic diamond material is to be deposited in use, wherein the substrate dimensions and location within the resonance cavity are selected to generate a localized axisymmetric Ez electric field profile across the growth surface in use, the localized axisymmetric Ez electric field profile comprising a substantially flat central portion bound by a ring of higher electric field, the substantially flat central portion extending over at least 60% of an area of the growth surface of the substrate and having an Ez electric field variation of no more than ±10% of a central Ez electric field strength, the ring of higher electric field being disposed around the central portion and having a peak Ez electric field strength in a range 10% to 50% higher than the central Ez electric field strength.
摘要翻译：一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：微波发生器，其被配置为以频率f产生微波; 等离子体室，其包括基底，顶板和从所述底座延伸到所述顶板的侧壁，所述侧壁限定用于在所述基底和所述顶板之间支撑微波共振模式的共振腔; 用于将微波从微波发生器馈送到等离子体室中的微波耦合配置; 用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 衬底保持器，其设置在所述等离子体室中并且包括用于支撑衬底的支撑表面; 以及设置在所述支撑表面上的基板，所述基板具有生长表面，所述合成金刚石材料将在其上沉积在所述生长表面上，其中所述共振腔内的所述基板尺寸和位置被选择以产生局部轴对称Ez电场分布在使用中的生长表面，局部轴对称Ez电场分布包括由较高电场环结合的基本上平坦的中心部分，基本上平坦的中心部分延伸至衬底的生长表面的至少60％的面积; 具有不大于中心Ez电场强度的±10％的Ez电场变化，较高电场的环设置在中心部分周围，并且具有10％至50％以上范围内的峰值Ez电场强度比中央Ez电场强度高。

4. 发明授权

US09410242B2 Microwave plasma reactor for manufacturing synthetic diamond material 有权
标题翻译：用于制造合成金刚石材料的微波等离子体反应器
公开(公告)号：US09410242B2
公开(公告)日：2016-08-09
申请号：US13980452
申请日：2011-12-14
申请人： Geoffrey Alan Scarsbrook , Jonathan James Wilman , Helen Wilman , Joseph Michael Dodson , John Robert Brandon , Steven Edward Coe , Christopher John Howard Wort
发明人： Geoffrey Alan Scarsbrook , Jonathan James Wilman , Joseph Michael Dodson , John Robert Brandon , Steven Edward Coe , Christopher John Howard Wort
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , C23C16/27 , C23C16/511 , C30B25/10 , C30B29/04 , H01J37/32 , C01B31/06
CPC分类号： C23C16/274 , C01B32/25 , C23C16/511 , C30B25/105 , C30B29/04 , H01J37/32192 , H01J37/32642 , H01J2237/339
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber; a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use; a microwave coupling configuration for feeding microwaves from a microwave generator into the plasma chamber; and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; wherein the microwave plasma reactor further comprises an electrically conductive plasma stabilizing annulus disposed around the substrate holder within the plasma chamber.
摘要翻译：一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：等离子体室; 衬底保持器，其设置在所述等离子体室中，并且包括支撑表面，所述支撑表面用于支撑在其上沉积合成金刚石材料的基底; 用于将微波从微波发生器馈入等离子体室的微波耦合配置; 以及用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 其中微波等离子体反应器还包括设置在等离子体室内的衬底保持器周围的导电等离子体稳定环。

5. 发明授权

US09637838B2 Methods of manufacturing synthetic diamond material by microwave plasma enhanced chemical vapor deposition from a microwave generator and gas inlet(s) disposed opposite the growth surface area 有权
公开(公告)号：US09637838B2
公开(公告)日：2017-05-02
申请号：US13994922
申请日：2011-12-14
申请人： Steven Edward Coe , Jonathan James Wilman , Helen Wilman , Daniel James Twitchen , Geoffrey Alan Scarsbrook , John Robert Brandon , Christopher John Howard Wort , Matthew Lee Markham
发明人： Steven Edward Coe , Jonathan James Wilman , Daniel James Twitchen , Geoffrey Alan Scarsbrook , John Robert Brandon , Christopher John Howard Wort , Matthew Lee Markham
IPC分类号： C30B25/14 , C01B31/06 , C23C16/27 , C30B29/04 , H01J37/32 , C30B25/02 , C30B25/16
CPC分类号： C30B25/14 , C01B32/25 , C23C16/274 , C23C16/278 , C30B25/02 , C30B25/165 , C30B29/04 , H01J37/32192 , H01J37/32449
摘要： Disclosed herein are methods of manufacturing synthetic CVD diamond material including orienting and controlling process gas flow in a microwave plasma reactor to improve performance. The microwave plasma reactor includes a gas flow system with a gas inlet comprising one or more gas inlet nozzles disposed opposite the growth surface area and configured to inject process gases towards the growth surface area. The method comprises injecting process gases towards the growth surface area at a total gas flow rate equal to or greater than 500 standard cm3 per minute wherein the process gases are injected into the plasma chamber through the one or more gas inlet nozzles with a Reynolds number in a range 1 to 100.

6. 发明授权

US09142389B2 Microwave power delivery system for plasma reactors 有权
标题翻译：用于等离子体反应堆的微波功率输送系统
公开(公告)号：US09142389B2
公开(公告)日：2015-09-22
申请号：US13994826
申请日：2011-12-14
申请人： Christopher John Howard Wort , John Robert Brandon
发明人： Christopher John Howard Wort , John Robert Brandon
IPC分类号： H01J37/32 , C23C16/27 , C23C16/511 , C23C16/54 , H01P5/20 , H01P5/22
CPC分类号： H01J37/32229 , C23C16/274 , C23C16/511 , C23C16/54 , H01J37/32192 , H01J37/32256 , H01J37/32266 , H01J2237/3321 , H01P5/20 , H01P5/222
摘要： A microwave power delivery system for supplying microwave power to a plurality of microwave plasma reactors (8), the microwave power delivery system comprising: a tuner (14) configured to be coupled to a microwave source (4) and configured to match impedance of the plurality of microwave plasma reactors to that of the microwave source; and a waveguide junction (18) coupled to the tuner and configured to guide microwaves to and from the plurality of microwave plasma reactors, wherein the waveguide junction comprises four waveguide ports including a first port coupled to the tuner, second and third ports configured to be coupled to respective microwave plasma reactors, and a fourth port coupled to a microwave sink (20), wherein the waveguide junction is configured to evenly split microwave power input from the tuner through the first port between the second and third ports for providing microwave power to respective microwave plasma reactors, wherein the waveguide junction is configured to decouple the second and third ports thereby preventing any reflected microwaves from one of the microwave plasma reactors from feeding across the waveguide junction directly into another microwave plasma reactor causing an imbalance, wherein the waveguide junction is further configured to feed reflected microwaves received back through the second and third ports which are balanced in terms of magnitude and phase to the tuner such that they can be reflected by the tuner and re-used, and wherein the waveguide junction is further configured to feed excess reflected power which is not balanced through the fourth port into the microwave sink.
摘要翻译：一种用于向多个微波等离子体反应器（8）提供微波功率的微波功率输送系统，所述微波功率输送系统包括：调谐器（14），其被配置为耦合到微波源（4）并且被配置为使所述微波功率输出系统多个微波等离子体反应器; 以及波导结（18），其耦合到所述调谐器并且被配置为向所述多个微波等离子体反应器引导微波，其中所述波导结包括四个波导端口，所述波导端口包括耦合到所述调谐器的第一端口，所述第二端口和所述第三端口被配置为耦合到相应的微波等离子体反应器，以及耦合到微波吸收器（20）的第四端口，其中所述波导结被配置为将从所述调谐器输入的微波功率均匀地分开通过所述第二和第三端口之间的第一端口，以提供微波功率相应的微波等离子体反应器，其中波导结被配置为使第二和第三端口去耦，从而防止来自微波等离子体反应器之一的任何反射的微波直接通过波导接头进入另一个引起不平衡的微波等离子体反应器，其中波导结进一步构造成供给反向收回的反射的微波 gh第二和第三端口，其在幅度和相位方面与调谐器平衡，使得它们可以被调谐器反射并重新使用，并且其中波导结还被配置为馈送不平衡的多余的反射功率第四口进入微波槽。

7. 发明申请

US20130334964A1 MICROWAVE POWER DELIVERY SYSTEM FOR PLASMA REACTORS 有权
标题翻译：用于等离子体反应器的微波功率输送系统
公开(公告)号：US20130334964A1
公开(公告)日：2013-12-19
申请号：US13994826
申请日：2011-12-14
申请人： Christopher John Howard Wort , John Robert Brandon
发明人： Christopher John Howard Wort , John Robert Brandon
IPC分类号： H01J37/32
CPC分类号： H01J37/32229 , C23C16/274 , C23C16/511 , C23C16/54 , H01J37/32192 , H01J37/32256 , H01J37/32266 , H01J2237/3321 , H01P5/20 , H01P5/222
摘要： (EN): A microwave power delivery system for supplying microwave power to a plurality of microwave plasma reactors (8), the microwave power delivery system comprising: a tuner (14) configured to be coupled to a microwave source (4) and configured to match impedance of the plurality of microwave plasma reactors to that of the microwave source; and a waveguide junction (18) coupled to the tuner and configured to guide microwaves to and from the plurality of microwave plasma reactors, wherein the waveguide junction comprises four waveguide ports including a first port coupled to the tuner, second and third ports configured to be coupled to respective microwave plasma reactors, and a fourth port coupled to a microwave sink (20), wherein the waveguide junction is configured to evenly split microwave power input from the tuner through the first port between the second and third ports for providing microwave power to respective microwave plasma reactors, wherein the waveguide junction is configured to decouple the second and third ports thereby preventing any reflected microwaves from one of the microwave plasma reactors from feeding across the waveguide junction directly into another microwave plasma reactor causing an imbalance, wherein the waveguide junction is further configured to feed reflected microwaves received back through the second and third ports which are balanced in terms of magnitude and phase to the tuner such that they can be reflected by the tuner and re-used, and wherein the waveguide junction is further configured to feed excess reflected power which is not balanced through the fourth port into the microwave sink.
摘要翻译：（EN）：一种用于向多个微波等离子体反应器（8）提供微波功率的微波功率输送系统，所述微波功率输送系统包括：调谐器（14），被配置为耦合到微波源（4）并被配置为所述多个微波等离子体反应器与所述微波源的阻抗匹配; 以及波导结（18），其耦合到所述调谐器并且被配置为向所述多个微波等离子体反应器引导微波，其中所述波导结包括四个波导端口，所述波导端口包括耦合到所述调谐器的第一端口，所述第二端口和所述第三端口被配置为耦合到相应的微波等离子体反应器，以及耦合到微波吸收器（20）的第四端口，其中所述波导结被配置为将从所述调谐器输入的微波功率均匀地分开通过所述第二和第三端口之间的第一端口，以提供微波功率相应的微波等离子体反应器，其中波导结被配置为使第二和第三端口去耦，从而防止来自微波等离子体反应器之一的任何反射的微波直接通过波导接头进入另一个引起不平衡的微波等离子体反应器，其中波导结进一步构造成供给反向收回的反射的微波 gh第二和第三端口，其在幅度和相位方面与调谐器平衡，使得它们可以被调谐器反射并重新使用，并且其中波导结还被配置为馈送不平衡的多余的反射功率第四口进入微波槽。

8. 发明授权

US11371147B2 Microwave plasma reactor for manufacturing synthetic diamond material 有权
公开(公告)号：US11371147B2
公开(公告)日：2022-06-28
申请号：US13994903
申请日：2011-12-14
申请人： Steven Edward Coe , Jonathan James Wilman , Daniel James Twitchen , Geoffrey Alan Scarsbrook , John Robert Brandon , Christopher John Howard Wort
发明人： Steven Edward Coe , Jonathan James Wilman , Daniel James Twitchen , Geoffrey Alan Scarsbrook , John Robert Brandon , Christopher John Howard Wort
IPC分类号： C23C16/27 , C23C16/455 , C23C16/511 , H01J37/32 , C30B29/04 , C30B25/10
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor includes a plasma chamber, a substrate holder, a microwave coupling configuration for feeding microwaves into the plasma chamber, and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom. The gas flow system includes a gas inlet array having a plurality of gas inlets for directing the process gases towards the substrate holder. The gas inlet array includes at least six gas inlets disposed in a substantially parallel or divergent orientation relative to a central axis of the plasma chamber.

9. 发明申请

US20150030786A1 MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL 审中-公开
标题翻译：用于制造合成金刚石材料的微波等离子体反应器
公开(公告)号：US20150030786A1
公开(公告)日：2015-01-29
申请号：US13994903
申请日：2011-12-14
申请人： Steven Edward Coe , Jonathan James Wilman , Daniel James Twitchen , Geoffrey Alan Scarsbrook , John Robert Brandon , Christopher John Howard Wort
发明人： Steven Edward Coe , Jonathan James Wilman , Daniel James Twitchen , Geoffrey Alan Scarsbrook , John Robert Brandon , Christopher John Howard Wort
IPC分类号： C23C16/455 , C23C16/511 , C23C16/27
CPC分类号： C23C16/45563 , C23C16/274 , C23C16/45504 , C23C16/45565 , C23C16/511 , C30B25/105 , C30B29/04 , H01J37/32192 , H01J37/32238 , H01J37/3244 , H01J37/32449
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber; a substrate holder disposed in the plasma chamber for supporting a substrate on which the synthetic diamond material is to be deposited in use; a microwave coupling configuration for feeding microwaves from a microwave generator into the plasma chamber; and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; wherein the gas flow system comprises a gas inlet nozzle array comprising a plurality of gas inlet nozzles disposed opposite the substrate holder for directing process gases towards the substrate holder, the gas inlet nozzle array comprising: at least six gas inlet nozzles disposed in a substantially parallel or divergent orientation relative to a central axis of the plasma chamber; a gas inlet nozzle number density equal to or greater than 0.1 nozzles/cm2, wherein the gas inlet nozzle number density is measured by projecting the nozzles onto a plane whose normal lies parallel to the central axis of the plasma chamber and measuring the gas inlet number density on said plane; and a nozzle area ratio of equal to or greater than 10, wherein the nozzle area ratio is measured by projecting the nozzles onto a plane whose normal lies parallel to the central axis of the plasma chamber, measuring the total area of the gas inlet nozzle area on said plane, dividing by the total number of nozzles to give an area associated with each nozzle, and dividing the area associated with each nozzle by an actual area of each nozzle.
摘要翻译：一种通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：等离子体室; 设置在等离子体室中的衬底保持器，用于支撑在使用中沉积合成金刚石材料的衬底; 用于将微波从微波发生器馈入等离子体室的微波耦合配置; 以及用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 其中所述气体流动系统包括气体入口喷嘴阵列，所述气体入口喷嘴阵列包括与所述衬底保持器相对设置的多个气体入口喷嘴，用于将工艺气体引向所述衬底保持器，所述气体入口喷嘴阵列包括：至少六个气体入口喷嘴，或相对于等离子体室的中心轴线的发散取向; 气体入口喷嘴数密度等于或大于0.1喷嘴/ cm2，其中气体入口喷嘴数密度通过将喷嘴投影到平行于等离子体室的中心轴线的平面上并测量气体入口数所述平面上的密度; 并且喷嘴面积比等于或大于10，其中通过将喷嘴投影到平行于等离子体室的中心轴的平面的平面上来测量喷嘴面积比，测量气体入口喷嘴面积的总面积在所述平面上除以总喷嘴数量以给出与每个喷嘴相关联的区域，并且将与每个喷嘴相关联的区域除以每个喷嘴的实际面积。

10. 发明申请

US20090208666A1 DIAMOND COATED SURFACES 审中-公开
标题翻译：钻石涂层表面
公开(公告)号：US20090208666A1
公开(公告)日：2009-08-20
申请号：US11577766
申请日：2005-10-20
申请人： Christopher John Howard Wort , Geoffrey Alan Scarsbrook , Timothy Peter Mollart
发明人： Christopher John Howard Wort , Geoffrey Alan Scarsbrook , Timothy Peter Mollart
IPC分类号： B05D3/06
CPC分类号： C23C16/274 , C23C16/0263
摘要： A method of producing a diamond coated surface on a substrate. A surface of the substrate is prepared by exposing it to a power beam, such as an electron beam, to increase the surface area and surface roughness. Such preparation may also provide the surface with three dimensional features onto which a diamond layer can adhere and mechanically lock. Adhesion of a diamond layer applied to the prepared surface is increased.
摘要翻译：一种在基材上制备金刚石涂层表面的方法。通过将其暴露于诸如电子束的功率束来制备衬底的表面，以增加表面积和表面粗糙度。这种制备还可以为表面提供三维特征，金刚石层可以粘附到其上并机械地锁定。施加到制备的表面上的金刚石层的粘附性增加。

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