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1. 发明申请

US20060131682A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060131682A1
公开(公告)日：2006-06-22
申请号：US11015770
申请日：2004-12-20
申请人： Johannes Hubertus Moors , Erik Ham , Gert-Jan Heerens , Paulus Martinus Liebregts , Erik Loopstra , Henri Gerard Werij
发明人： Johannes Hubertus Moors , Erik Ham , Gert-Jan Heerens , Paulus Martinus Liebregts , Erik Loopstra , Henri Gerard Werij
IPC分类号： H01L31/0232
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.
摘要翻译：公开了一种布置成将图案从图案形成装置转印到基底上的光刻设备。该装置包括光学隔室，其包含图案形成装置的图案化表面和光学元件，以及通过布置成将图案化的辐射束从光学元件传递到衬底的连接部连接到光学隔室的衬底隔室。该装置还包括第一冲洗气体入口，其布置成将第一冲洗气体供应到连接中，第二冲洗气体入口与图案化表面相邻，并且布置成将第二冲洗气体供应到光学隔室中并且产生邻近图案化的区域表面，其中第二冲洗气体沿具有垂直于和远离图案化表面的部件的方向流动;以及气泵，其布置成泵送来自光学隔室的冲洗气体。

2. 发明申请

US20050286041A1 Lithographic apparatus and patterning device transport 有权
标题翻译：平版印刷设备和图案形成装置运输
公开(公告)号：US20050286041A1
公开(公告)日：2005-12-29
申请号：US10874690
申请日：2004-06-24
申请人： Erik Ham , Robert Gabriel Lansbergen , Ellart Meijer , Hendricus Johannes Meijer , Hans Meiling , Bastiaan Mertens , Johannes Hubertus Moors , Gert-Jan Heerens
发明人： Erik Ham , Robert Gabriel Lansbergen , Ellart Meijer , Hendricus Johannes Meijer , Hans Meiling , Bastiaan Mertens , Johannes Hubertus Moors , Gert-Jan Heerens
IPC分类号： G03B27/52 , G03B27/62
CPC分类号： G03B27/52 , G03F7/70741
摘要： The invention relates to a box for transporting lithographic patterning device, the box being arranged to cooperate with a lithographic apparatus. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also comprises a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box. The invention also relates to a lithographic apparatus configured to cooperate with the transport box.
摘要翻译：本发明涉及一种用于输送平版印刷图案形成装置的盒子，该盒子被布置为与光刻设备配合。输送箱设置有具有用于存储图案形成装置的存储位置的内部空间和用于传送图案形成装置的开口的容器部分。该箱还包括用于封闭开口的封闭部分，以及用于将气体从盒子内部空间排出和/或送入箱体的内部空间的通道系统。本发明还涉及一种被配置为与传送箱配合的光刻设备。

3. 发明申请

US20070159616A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20070159616A1
公开(公告)日：2007-07-12
申请号：US10894367
申请日：2004-07-20
申请人： Bastiaan Lambertus Van De Ven , Gert-Jan Heerens , Robert Lansbergen , Martinus Leenders , Erik Loopstra
发明人： Bastiaan Lambertus Van De Ven , Gert-Jan Heerens , Robert Lansbergen , Martinus Leenders , Erik Loopstra
IPC分类号： G03B27/62
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70741 , G03F7/70783 , G03F7/70825 , G03F7/709
摘要： The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.
摘要翻译：本发明涉及一种光刻设备，其包括用于相对于标线片台定位图案形成装置（例如掩模版）的对接系统。光刻投影设备具有包括投影相的操作周期，其中标线片载物台承载图案形成装置和交换相，其中图案形成装置被更换，并且对接系统相对于掩模版台定位图案形成装置。对接系统被配置为在投影阶段与图案形成装置间隔开，以便确保获得更高的投影图像精度。

4. 发明申请

US20050286029A1 Lithographic apparatus and patterning device transport 有权
标题翻译：平版印刷设备和图案形成装置运输
公开(公告)号：US20050286029A1
公开(公告)日：2005-12-29
申请号：US10972755
申请日：2004-10-26
申请人： Erik Ham , Gert-Jan Heerens , Robert Lansbergen , Ellard Meijer , Hendricus Meijer , Hans Meiling , Bastiaan Mertens , Johannes Moors
发明人： Erik Ham , Gert-Jan Heerens , Robert Lansbergen , Ellard Meijer , Hendricus Meijer , Hans Meiling , Bastiaan Mertens , Johannes Moors
IPC分类号： G03B27/52 , G03B27/62
CPC分类号： G03B27/52 , G03F7/70741
摘要： According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.
摘要翻译：根据实施例，用于传送平版印刷图案形成装置的盒被布置成与光刻设备配合。运输箱可以设置有具有内部空间的容器部分，该内部空间具有用于存储图案形成装置的存储位置和用于图案形成装置的传送的开口。在将图案形成装置从内部空间传送到装置之前，内部空间被加压。箱子还可以包括用于关闭开口的封闭部分和/或用于将气体从箱体的内部空间排出和/或进气的通道系统。其他实施例包括包括和/或配置为与这种盒配合的光刻设备。

5. 发明申请

US20070117028A1 Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby 审中-公开
标题翻译：掩模处理方法，以及包括其夹持器的掩模和装置或装置，由此制造的装置制造方法和装置
公开(公告)号：US20070117028A1
公开(公告)日：2007-05-24
申请号：US11599585
申请日：2006-11-15
申请人： Gert-Jan Heerens , Erik Ham , Bastiaan Wilhelmus Marinus Van De Ven
发明人： Gert-Jan Heerens , Erik Ham , Bastiaan Wilhelmus Marinus Van De Ven
IPC分类号： G03F1/00 , G03B27/62
CPC分类号： G03F7/707 , G03F7/70741
摘要： A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.
摘要翻译：用于光刻投影装置的掩模包括布置在掩模的圆周上的三个托架。托架设置有指向共同虚拟点的凹槽，并且旨在与设置在掩模处理装置或装置中的掩模夹具上的三个销配合。优选地，销设置有圆形顶部，用于插入到支架的相关联的凹槽中，以在面罩上提供运动学确定的机械位置。

6. 发明授权

US08235212B2 Mask transport system configured to transport a mask into and out of a lithographic apparatus 有权
标题翻译：掩模传送系统被配置为将掩模传送到光刻设备中和从光刻设备传出
公开(公告)号：US08235212B2
公开(公告)日：2012-08-07
申请号：US12483940
申请日：2009-06-12
申请人： Gert-Jan Heerens
发明人： Gert-Jan Heerens
IPC分类号： B65D85/00 , B65D85/48
CPC分类号： G03F1/66 , G03F7/707 , G03F7/70741 , G03F7/70808 , G03F7/70916 , G03F7/70983
摘要： A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container. The mask transport system also includes a second container configured to enclose the first container. The second container includes a first part defining a first opening and an openable cover that covers the first opening. The cover is configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.
摘要翻译：掩模传送系统被配置为将掩模传送到光刻设备中和从光刻设备传出。掩模传送系统包括被配置为屏蔽掩模的顶侧和底侧的第一容器。当掩模被第一容器遮蔽时，用于具有预定波长的辐射的至少一部分至少部分是半透明的，用于检测掩模的顶侧或底侧上的污染物。掩模传送系统还包括构造成封闭第一容器的第二容器。第二容器包括限定第一开口的第一部分和覆盖第一开口的可打开盖。盖被配置为打开和释放光刻设备内的第一容器或与光刻设备的界面处。

7. 发明授权

US07423733B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件具有用于定位图案形成装置的对接系统
公开(公告)号：US07423733B2
公开(公告)日：2008-09-09
申请号：US10894367
申请日：2004-07-20
申请人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Gert-Jan Heerens , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra
发明人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Gert-Jan Heerens , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra
IPC分类号： G03B27/62
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70741 , G03F7/70783 , G03F7/70825 , G03F7/709
摘要： The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.
摘要翻译：本发明涉及一种光刻设备，其包括用于相对于标线片台定位图案形成装置（例如掩模版）的对接系统。光刻投影设备具有包括投影相的操作周期，其中标线片载物台承载图案形成装置和交换相，其中图案形成装置被更换，并且对接系统相对于掩模版台定位图案形成装置。对接系统被配置为在投影阶段与图案形成装置间隔开，以便确保获得更高的投影图像精度。

8. 发明申请

US20070247609A1 Assembly of a reticle holder and a reticle 有权
标题翻译：一个标线架和一个掩模版
公开(公告)号：US20070247609A1
公开(公告)日：2007-10-25
申请号：US11812166
申请日：2007-06-15
申请人： Gert-Jan Heerens , Bastiaan Lambertus Van De Ven
发明人： Gert-Jan Heerens , Bastiaan Lambertus Van De Ven
IPC分类号： G03B27/42 , G03B27/62
CPC分类号： G03B27/42 , G03B27/62 , G03F7/707 , G03F7/70741 , G03F9/7003 , G03F9/7011 , G03F9/7088 , G03F9/7096
摘要： A system for use in a lithographic apparatus includes an assembly of a reticle and a reticle holder. The reticle includes a marker. The system also includes a position detector arranged to detect the reticle marker to position the reticle with respect to the reticle holder, and a storage container constructed and arranged to store the assembly during the positioning of the reticle with respect to the reticle holder. The reticle holder and the detector are arranged to be kinematically aligned with respect to each other.
摘要翻译：用于光刻设备的系统包括光罩和光罩保持器的组件。标线包括标记。该系统还包括位置检测器，其布置成检测掩模版标记物以相对于光罩保持器定位光罩;以及存储容器，其被构造和布置成在掩模版相对于光罩保持器定位期间存储组件。掩模版保持器和检测器被布置成相对于彼此以运动方式对准。

9. 发明授权

US07119346B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07119346B2
公开(公告)日：2006-10-10
申请号：US10986181
申请日：2004-11-12
申请人： Hendrik Antony Johannes Neerhof , Gert-Jan Heerens
发明人： Hendrik Antony Johannes Neerhof , Gert-Jan Heerens
IPC分类号： A61N5/00
CPC分类号： G03F7/70858 , G03F7/70916 , G03F7/7095 , G03F7/70983
摘要： A lithographic apparatus is provided. The apparatus includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a high voltage conductor in a part of the apparatus that is evacuated or at a low pressure during normal use of the apparatus. The conductor is coated by an isolation layer having a conductivity that is high enough to prevent charge build-up on the outside thereof during use of the apparatus, and low enough to limit peak current flow during a breakdown.
摘要翻译：提供光刻设备。该装置包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑件。图案形成装置用于使辐射束在其横截面上具有图案。该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及在正常使用期间被抽空或处于低压的装置的一部分中的高压导体的装置。导体由具有足够高的导电性的隔离层涂覆，以防止在使用该装置期间其外部的电荷积聚，并且足够低以限制击穿期间的峰值电流流动。

10. 发明申请

US20060007442A1 Alignment marker and lithographic apparatus and device manufacturing method using the same 有权
标题翻译：对准标记和光刻设备及使用其的器件制造方法
公开(公告)号：US20060007442A1
公开(公告)日：2006-01-12
申请号：US11147114
申请日：2005-06-08
申请人： Gert-Jan Heerens , Anastasius Bruinsma , Jacob Klinkhamer , Bastiaan Lambertus Van De Ven , Hubert Van Mierlo , Willem Vliegenthart
发明人： Gert-Jan Heerens , Anastasius Bruinsma , Jacob Klinkhamer , Bastiaan Lambertus Van De Ven , Hubert Van Mierlo , Willem Vliegenthart
IPC分类号： G01B11/00
CPC分类号： G03F9/7065 , G03F9/7076 , G03F9/7088
摘要： An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.
摘要翻译：一种装置包括：第一支撑结构，其构造成支撑具有设置有至少一个高度差的对准标记的元件。该装置还包括对准传感器，该对准传感器包括被配置为提供照射对准标记的光束的光源; 以及至少一个检测器，被配置为通过分析由所述对准标记物反射的光束来检测所述对准标记的所述至少一个高度差。可以使用这样的装置来相对于第一支撑结构对准元件。

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