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1. 发明申请

US20050286029A1 Lithographic apparatus and patterning device transport 有权
标题翻译：平版印刷设备和图案形成装置运输
公开(公告)号：US20050286029A1
公开(公告)日：2005-12-29
申请号：US10972755
申请日：2004-10-26
申请人： Erik Ham , Gert-Jan Heerens , Robert Lansbergen , Ellard Meijer , Hendricus Meijer , Hans Meiling , Bastiaan Mertens , Johannes Moors
发明人： Erik Ham , Gert-Jan Heerens , Robert Lansbergen , Ellard Meijer , Hendricus Meijer , Hans Meiling , Bastiaan Mertens , Johannes Moors
IPC分类号： G03B27/52 , G03B27/62
CPC分类号： G03B27/52 , G03F7/70741
摘要： According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.
摘要翻译：根据实施例，用于传送平版印刷图案形成装置的盒被布置成与光刻设备配合。运输箱可以设置有具有内部空间的容器部分，该内部空间具有用于存储图案形成装置的存储位置和用于图案形成装置的传送的开口。在将图案形成装置从内部空间传送到装置之前，内部空间被加压。箱子还可以包括用于关闭开口的封闭部分和/或用于将气体从箱体的内部空间排出和/或进气的通道系统。其他实施例包括包括和/或配置为与这种盒配合的光刻设备。

2. 发明申请

US20050286041A1 Lithographic apparatus and patterning device transport 有权
标题翻译：平版印刷设备和图案形成装置运输
公开(公告)号：US20050286041A1
公开(公告)日：2005-12-29
申请号：US10874690
申请日：2004-06-24
申请人： Erik Ham , Robert Gabriel Lansbergen , Ellart Meijer , Hendricus Johannes Meijer , Hans Meiling , Bastiaan Mertens , Johannes Hubertus Moors , Gert-Jan Heerens
发明人： Erik Ham , Robert Gabriel Lansbergen , Ellart Meijer , Hendricus Johannes Meijer , Hans Meiling , Bastiaan Mertens , Johannes Hubertus Moors , Gert-Jan Heerens
IPC分类号： G03B27/52 , G03B27/62
CPC分类号： G03B27/52 , G03F7/70741
摘要： The invention relates to a box for transporting lithographic patterning device, the box being arranged to cooperate with a lithographic apparatus. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also comprises a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box. The invention also relates to a lithographic apparatus configured to cooperate with the transport box.
摘要翻译：本发明涉及一种用于输送平版印刷图案形成装置的盒子，该盒子被布置为与光刻设备配合。输送箱设置有具有用于存储图案形成装置的存储位置的内部空间和用于传送图案形成装置的开口的容器部分。该箱还包括用于封闭开口的封闭部分，以及用于将气体从盒子内部空间排出和/或送入箱体的内部空间的通道系统。本发明还涉及一种被配置为与传送箱配合的光刻设备。

3. 发明申请

US20070139855A1 Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus 审中-公开
标题翻译：用于光刻设备的静电夹具的平版印刷设备和方法
公开(公告)号：US20070139855A1
公开(公告)日：2007-06-21
申请号：US11312651
申请日：2005-12-21
申请人： Hubert Van Mierlo , Erik Ham , Hendricus Meijer , Hendrik Neerhof , Joost Ottens , Johannes Leijtens , Marco Kluse , Jan Hopman , Johannes Moors
发明人： Hubert Van Mierlo , Erik Ham , Hendricus Meijer , Hendrik Neerhof , Joost Ottens , Johannes Leijtens , Marco Kluse , Jan Hopman , Johannes Moors
IPC分类号： H01B13/00 , H01L21/683 , G03C5/00 , G21G5/00
CPC分类号： H01L21/6831 , G03F7/70708 , Y10T29/49117
摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
摘要翻译：本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

4. 发明申请

US20070117028A1 Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby 审中-公开
标题翻译：掩模处理方法，以及包括其夹持器的掩模和装置或装置，由此制造的装置制造方法和装置
公开(公告)号：US20070117028A1
公开(公告)日：2007-05-24
申请号：US11599585
申请日：2006-11-15
申请人： Gert-Jan Heerens , Erik Ham , Bastiaan Wilhelmus Marinus Van De Ven
发明人： Gert-Jan Heerens , Erik Ham , Bastiaan Wilhelmus Marinus Van De Ven
IPC分类号： G03F1/00 , G03B27/62
CPC分类号： G03F7/707 , G03F7/70741
摘要： A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary point and are intend to cooperate with three pins provided on a mask gripper present in a mask handling apparatus or device. Preferably, the pins are provided with a rounded top for insertion in associated grooves of the brackets to provide a kinematically-determined mechanical position of the mask on the gripper.
摘要翻译：用于光刻投影装置的掩模包括布置在掩模的圆周上的三个托架。托架设置有指向共同虚拟点的凹槽，并且旨在与设置在掩模处理装置或装置中的掩模夹具上的三个销配合。优选地，销设置有圆形顶部，用于插入到支架的相关联的凹槽中，以在面罩上提供运动学确定的机械位置。

5. 发明申请

US20060131682A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060131682A1
公开(公告)日：2006-06-22
申请号：US11015770
申请日：2004-12-20
申请人： Johannes Hubertus Moors , Erik Ham , Gert-Jan Heerens , Paulus Martinus Liebregts , Erik Loopstra , Henri Gerard Werij
发明人： Johannes Hubertus Moors , Erik Ham , Gert-Jan Heerens , Paulus Martinus Liebregts , Erik Loopstra , Henri Gerard Werij
IPC分类号： H01L31/0232
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.
摘要翻译：公开了一种布置成将图案从图案形成装置转印到基底上的光刻设备。该装置包括光学隔室，其包含图案形成装置的图案化表面和光学元件，以及通过布置成将图案化的辐射束从光学元件传递到衬底的连接部连接到光学隔室的衬底隔室。该装置还包括第一冲洗气体入口，其布置成将第一冲洗气体供应到连接中，第二冲洗气体入口与图案化表面相邻，并且布置成将第二冲洗气体供应到光学隔室中并且产生邻近图案化的区域表面，其中第二冲洗气体沿具有垂直于和远离图案化表面的部件的方向流动;以及气泵，其布置成泵送来自光学隔室的冲洗气体。

6. 发明申请

US20050078284A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050078284A1
公开(公告)日：2005-04-14
申请号：US10671588
申请日：2003-09-29
申请人： Bastiaan Wilhelmus Marinus L. Van De Ven , Erik Ham
发明人： Bastiaan Wilhelmus Marinus L. Van De Ven , Erik Ham
IPC分类号： B65G49/00 , G03F7/20 , H01L21/027 , H01L21/677 , G03B27/00
CPC分类号： G03F7/70741
摘要： The invention relates to a lithographic apparatus including an illumination system for providing a projection beam of radiation, a support structure for supporting patterning means, the patterning means serving to impart the projection beam with a pattern in its cross-section, a dust-right storage container defining a storage space for storing patterning structures, wherein the storage container is arranged to be coupled with a transfer container such that the transfer container for exchanging patterning structures between the transfer container and the lithographic apparatus through a closeable passage between the transfer container and the storage container, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. Furthermore, the invention relates to a method of using such an apparatus.
摘要翻译：本发明涉及一种光刻设备，其包括用于提供投影辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于使投影光束在其横截面上具有图案的图案形成装置，灰尘存储容器限定用于存储图案形成结构的存储空间，其中所述存储容器布置成与转移容器联接，使得所述转移容器通过所述转移容器和所述转印容器之间的可关闭通道在所述转印容器和所述光刻设备之间交换图案形成结构，存储容器，用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。此外，本发明涉及使用这种装置的方法。

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