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    • 1. 发明申请
    • METHOD OF COMPENSATING FOR CHANNEL INTERFERENCE OF DISPLAY APPARATUS AND DEVICE FOR CONTROLLING DRIVING OF DATA SIGNAL
    • 用于显示设备的通道干扰的补偿方法和用于控制数据信号驱动的设备
    • US20070279323A1
    • 2007-12-06
    • US11697160
    • 2007-04-05
    • Jin ParkJoon-Seok LeeDae Young Jung
    • Jin ParkJoon-Seok LeeDae Young Jung
    • G09G3/20
    • G09G3/3283G09G3/3216G09G2310/0248G09G2310/0251G09G2310/08G09G2320/0223G09G2360/16
    • A method of compensating for channel interference of a display apparatus and a device for controlling driving of a data signal are provided. The method of compensating for the channel interference of the display apparatus includes: receiving pixel data of a scan line selected from an external screen memory; summing up the received pixel data and detecting a compensation time for compensating for channel interference which occurs in the selected scan line by using the sum of the pixel data; and adjusting at least one of a discharge time and a peak boost time of a driving current that is output to each data line according to the detected compensation time. Accordingly, it is possible to solve problems such as an increase of the circuit size caused by the existing compensation for the channel interference by controlling the discharge period or peak boost period with respect to each scan line and compensating for the channel interference phenomenon.
    • 提供了补偿显示装置和控制数据信号驱动装置的信道干扰的方法。 补偿显示装置的信道干扰的方法包括:接收从外部屏幕存储器中选择的扫描线的像素数据; 对所接收的像素数据求和,并通过使用像素数据的和来检测在所选择的扫描行中发生的信道干扰的补偿时间; 以及根据检测到的补偿时间来调整输出到每个数据线的驱动电流的放电时间和峰值升高时间中的至少一个。 因此,可以通过控制相对于每个扫描线的放电周期或峰值升高周期并补偿信道干扰现象来解决由现有的信道干扰补偿引起的电路尺寸增加的问题。
    • 9. 发明申请
    • VIA STACK STRUCTURES
    • 通过堆叠结构
    • US20080029898A1
    • 2008-02-07
    • US11461511
    • 2006-08-01
    • Mukta G. FarooqRobert HannonDae Young JungIan D. MelvilleDonna S. Zupanski-Nielsen
    • Mukta G. FarooqRobert HannonDae Young JungIan D. MelvilleDonna S. Zupanski-Nielsen
    • H01L23/48
    • H01L23/5226H01L2924/0002H01L2924/00
    • Via stack structures are disclosed. In one embodiment, a structure includes a via stack including: a first substantially cross-shaped line in a first dielectric layer; a second substantially cross-shaped line set in a second dielectric layer, and a via stud coupling the first substantially cross-shaped line to the second substantially cross-shaped line. In another embodiment, a structure includes a first via stack, and a second via stack, wherein the first via stack and the second via stack extend in a divergent manner from one another. Each via stack structure is useful for support, for example, in under wire bond applications. The via stack structures can be mixed with other via stack structures and selectively placed within a layout to replace conventional metal plate and via stud array configurations.
    • 公开了通过堆叠结构。 在一个实施例中,结构包括通孔堆叠,其包括:第一介电层中的第一基本十字形的线; 设置在第二电介质层中的第二基本上十字形的线,以及将第一基本上十字形的线耦合到第二基本十字形线的通孔柱。 在另一个实施例中,结构包括第一通孔堆叠和第二通孔堆叠,其中第一通孔堆叠和第二通孔堆叠以彼此发散的方式延伸。 每个通孔堆叠结构可用于支持,例如在引线键合应用中。 通孔堆叠结构可以与其它通孔堆叠结构混合并且选择性地放置在布局内以代替传统的金属板和经由螺柱阵列配置。