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    • 10. 发明授权
    • Micro electro mechanical system device and method of manufacturing the same
    • 微机电系统装置及其制造方法
    • US08282196B2
    • 2012-10-09
    • US12058946
    • 2008-03-31
    • Il Woo KimByung Ha ParkMoon Chul LeeDong Sik ShimKyong Il Kim
    • Il Woo KimByung Ha ParkMoon Chul LeeDong Sik ShimKyong Il Kim
    • B41J2/05
    • B41J2/1601B33Y80/00B41J2/1628B41J2/1631B41J2/1632B41J2/1639
    • A MEMS (Micro Electro Mechanical System) device and a method of manufacturing the same, in which an detection indicator is formed on a chamber layer stacked on a substrate such that a user easily inspects whether the chamber layer has a required thickness. The MEMS device can include two detection indicators that are formed on the chamber layer and have different depth from each other, or an detection indicator which is formed on the chamber layer and has a tapered sectional shape in which an upper surface of the detection indicator is gradually narrowed in a downward direction such that a user can easily inspect whether the chamber layer has a required thickness. The user can precisely determine whether the chamber layer is planarized to a required thickness by planarizing the detection indicator formed on the chamber layer, and inspecting the detection indicator by using an optical microscope, thereby facilitating inspection for a thickness of the chamber layer.
    • 一种MEMS(微机电系统)装置及其制造方法,其中在层叠在基板上的室层上形成检测指示器,使得用户容易地检查室层是否具有所需的厚度。 MEMS器件可以包括形成在室层上并具有彼此不同深度的两个检测指示器,或者形成在腔室层上并具有锥形截面形状的检测指示器,其中检测指示器的上表面是 在向下的方向上逐渐变窄,使得使用者可以容易地检查腔室层是否具有所需的厚度。 用户可以通过平坦化形成在室层上的检测指示器,并且通过使用光学显微镜检查检测指示器来精确地确定室层是否被平坦化到所需厚度,从而便于检查室层的厚度。