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1. 发明申请

US20090004873A1 HYBRID ETCH CHAMBER WITH DECOUPLED PLASMA CONTROLS 审中-公开
标题翻译：具有解压等离子体控制的混合隔离室
公开(公告)号：US20090004873A1
公开(公告)日：2009-01-01
申请号：US11749069
申请日：2007-06-26
申请人： Jang Gyoo Yang , Michael Barnes , Terry Bluck
发明人： Jang Gyoo Yang , Michael Barnes , Terry Bluck
IPC分类号： H01L21/461 , H01L21/306
CPC分类号： H01J37/321 , H01J37/32091 , H01J37/32165
摘要： A dielectric etch chamber and method for improved control of plasma parameters. The plasma chamber comprises dual-frequency bias source that capacitively couples the RF energy to the plasma, and a single or dual frequency source that inductively couples the RF energy to the plasma. The inductive source may be modulated for improved etch uniformity.
摘要翻译：一种用于改进等离子体参数控制的电介质蚀刻室和方法。等离子体室包括将RF能量电容耦合到等离子体的双频偏置源，以及将RF能量感应耦合到等离子体的单频或双频源。感应源可以被调制以提高蚀刻均匀性。

2. 发明授权

US09524896B2 Apparatus and methods for transporting and processing substrates 有权
标题翻译：用于运输和处理基板的装置和方法
公开(公告)号：US09524896B2
公开(公告)日：2016-12-20
申请号：US12368241
申请日：2009-02-09
申请人： Terry Bluck , Kevin P. Fairbairn , Michael S. Barnes , Christopher T. Lane
发明人： Terry Bluck , Kevin P. Fairbairn , Michael S. Barnes , Christopher T. Lane
IPC分类号： H01L21/677 , C23C14/56 , C23C16/54 , H01L21/67
CPC分类号： H01L21/67745 , C23C14/568 , C23C16/54 , C23C16/545 , H01L21/67167 , H01L21/67173 , H01L21/67184 , H01L21/67196 , H01L21/67201 , H01L21/67709
摘要： There is described apparatus and methods for transporting and processing substrates including wafers as to efficiently produce at reasonable costs improved throughput as compared to systems in use today. A linear transport chamber includes linear tracks and robot arms riding on the linear tracks to linearly transfer substrates along the sides of processing chambers for feeding substrates into a controlled atmosphere through a load lock and then along a transport chamber as a way of reaching processing chambers.
摘要翻译：描述了与目前使用的系统相比，用于运输和处理包括晶片的基板以便以合理的成本有效地生产提高的生产量的装置和方法。线性传送室包括线性轨道和机器人手臂，该线性轨道和机器人臂骑在线性轨道上，以沿着处理室的侧面线性地传送衬底，用于通过负载锁定将衬底馈送到受控气氛中，然后沿着运送室作为到达处理室的方式。

3. 发明授权

US08419341B2 Linear vacuum robot with Z motion and articulated arm 有权
标题翻译：具有Z形运动和铰接臂的线性真空机器人
公开(公告)号：US08419341B2
公开(公告)日：2013-04-16
申请号：US12875414
申请日：2010-09-03
申请人： Gee Sun Hoey , Terry Bluck , Hoang Huy Vu , Jimin Ryu
发明人： Gee Sun Hoey , Terry Bluck , Hoang Huy Vu , Jimin Ryu
IPC分类号： B65G1/133 , C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/677 , H01L21/67173 , H01L21/67184 , H01L21/67196 , H01L21/67201 , H01L21/67742 , H01L21/67745 , Y10T74/20317 , Y10T74/20323
摘要： There is described apparatus and methods for transporting and processing substrates including wafers as to efficiently produce at reasonable costs improved throughput as compared to systems in use today. A linear transport chamber includes linear tracks and robot arms riding on the linear tracks to linearly transfer substrates along the sides of processing chambers for feeding substrates into a controlled atmosphere through a load lock and then along a transport chamber as a way of reaching processing chambers. A four-axis robot arm is disclosed, capable of linear translation, rotation and articulation, and z-motion.
摘要翻译：描述了与目前使用的系统相比，用于运输和处理包括晶片的基板以便以合理的成本有效地生产提高的生产量的装置和方法。线性传送室包括线性轨道和机器人手臂，该线性轨道和机器人臂骑在线性轨道上，以沿着处理室的侧面线性地传送衬底，用于通过负载锁定将衬底馈送到受控气氛中，然后沿着运送室作为到达处理室的方式。公开了能够进行线性平移，旋转和关节运动以及z运动的四轴机器人臂。

4. 发明申请

US20120291955A1 LARGE AREA ICP SOURCE FOR PLASMA APPLICATION 审中-公开
标题翻译：用于等离子体应用的大面积ICP源
公开(公告)号：US20120291955A1
公开(公告)日：2012-11-22
申请号：US13473541
申请日：2012-05-16
申请人： Young Kyu Cho , Terry Bluck , Karthik Janakiraman
发明人： Young Kyu Cho , Terry Bluck , Karthik Janakiraman
IPC分类号： H01L21/3065
CPC分类号： H01J37/321 , H01J37/3211 , H01J37/32119 , H01J37/32522
摘要： An arrangement for coupling RF energy for inductively coupled plasma chamber. The RF coil or radiator is embedded within a groove made in the ceiling of the chamber and an insulating filler covers the coil within the groove. The ceiling may be made of two plates: an upper plate made of conductive material and a bottom plate made of dielectric material. The two plates are in physical contact. A magnetic shield may be provided over the coil to control the spread of the magnetic field from the coil. Fluid channels may be made in the conductive plate to provide thermal control. Also, fluid conduits may be provided to allow injecting gas into the pace between the metal and dielectric plates.
摘要翻译：用于耦合感应耦合等离子体室的RF能量的装置。 RF线圈或散热器嵌入在室的天花板内形成的凹槽中，绝缘填料覆盖槽内的线圈。天花板可以由两块板制成：由导电材料制成的上板和由电介质材料制成的底板。两块板材物理接触。可以在线圈上提供磁屏蔽来控制来自线圈的磁场的扩展。可以在导电板中制造流体通道以提供热控制。而且，可以提供流体管道以允许将气体注入金属和电介质板之间的步调。

5. 发明授权

US08303764B2 Apparatus and methods for transporting and processing substrates 有权
公开(公告)号：US08303764B2
公开(公告)日：2012-11-06
申请号：US13042407
申请日：2011-03-07
申请人： Terry Bluck , Kevin P. Fairbairn , Michael S. Barnes , Christopher T. Lane
发明人： Terry Bluck , Kevin P. Fairbairn , Michael S. Barnes , Christopher T. Lane
IPC分类号： C23F1/00 , H01L21/306 , H01L21/677 , C23C16/00 , C23C14/00
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67196 , H01L21/67201 , H01L21/67745
摘要： There is described apparatus and methods for transporting and processing substrates including wafers as to efficiently produce at reasonable costs improved throughput as compared to systems in use today. A key element is the use of a transport chamber along the sides of processing chambers for feeding substrates into a controlled atmosphere through a load lock and then along a transport chamber as a way of reaching processing chambers and then out of the controlled atmosphere following processing in the processing chambers.

6. 发明授权

US08206551B2 Processing thin wafers 有权
标题翻译：加工薄晶圆
公开(公告)号：US08206551B2
公开(公告)日：2012-06-26
申请号：US12485808
申请日：2009-06-16
申请人： Terry Bluck , Stuart Scollay , Edric Tong
发明人： Terry Bluck , Stuart Scollay , Edric Tong
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： H01L21/67751 , H01L21/67161 , H01L21/67173 , H01L21/6719 , H01L21/67201 , H01L21/67745 , H01L21/6831 , Y10S414/135 , Y10S414/136 , Y10S414/139 , Y10S414/141
摘要： There is described a wafer processing system for thinned wafers that are easily broken during handling. The system protects against breakage during handling and provides for temperature controls during processing.
摘要翻译：描述了在处理过程中容易破碎的薄化晶片的晶片处理系统。该系统在处理过程中防止破损，并在加工过程中提供温度控制。

7. 发明申请

US20090324369A1 SYSTEM AND METHOD FOR SUBSTRATE TRANSPORT 有权
标题翻译：基板运输系统及方法
公开(公告)号：US20090324369A1
公开(公告)日：2009-12-31
申请号：US12495740
申请日：2009-06-30
申请人： Stuart SCOLLAY , Terry Bluck , Xiang Chen
发明人： Stuart SCOLLAY , Terry Bluck , Xiang Chen
IPC分类号： H01L21/677
CPC分类号： H01L21/67173 , H01L21/67313 , H01L21/67775 , H01L21/67781 , Y10S414/14
摘要： Introduction of substrates into vacuum environment is accomplish by gradually reducing the number of substrates being transferred simultaneously as the clean and evacuated environment is progressed. Cassettes are maintained in clean atmospheric environment and do not enter the vacuum environment. Several vacuum locks are linearly staggered so as to introduce progressively higher level of vacuum environment. The number of substrates transported through this arrangement is a portion of the number of substrates present in each cassette. The staggered vacuum locks lead to a series of processing chambers, wherein a yet smaller number of substrates, e.g., one or two, are transported.
摘要翻译：将衬底引入真空环境中，通过在清洁和抽空的环境进行时，逐渐减少同时转移的衬底数量来实现。纸盒保持在清洁的大气环境中，不要进入真空环境。几个真空锁线性交错，以便逐渐引入更高水平的真空环境。通过该布置传送的基板的数量是每个盒中存在的基板数量的一部分。交错的真空锁导致一系列的处理室，其中传输了更少数量的基板，例如一个或两个。

8. 发明申请

US20090145879A1 SYSTEM AND METHOD FOR COMMERCIAL FABRICATION OF PATTERNED MEDIA 有权
标题翻译：用于商业制图的制图和方法
公开(公告)号：US20090145879A1
公开(公告)日：2009-06-11
申请号：US12329462
申请日：2008-12-05
申请人： Kevin P. Fairbairn , Michael S. Barnes , Terry Bluck , Ren Xu , Charles Liu , Ralph Kerns
发明人： Kevin P. Fairbairn , Michael S. Barnes , Terry Bluck , Ren Xu , Charles Liu , Ralph Kerns
IPC分类号： C23F1/00
CPC分类号： G11B5/84 , G11B5/855 , H01J37/3438
摘要： A system is provided for etching patterned media disks for hard drive. The modular system may be tailored to perform specific processes sequences so that a patterned media disk is fabricated without removing the disk from vacuum environment. In some sequence the magnetic stack is etched while in other the etch is performed prior to forming the magnetic stack. In a further sequence ion implantation is used without etching steps. For etching a movable non-contact electrode is utilized to perform sputter etch. The cathode moves to near contact distance to, but not contacting, the substrate so as to couple RF energy to the disk. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched.
摘要翻译：提供了用于蚀刻用于硬盘驱动器的图案化介质盘的系统。模块化系统可以被定制以执行特定的处理顺序，使得图案化的介质盘被制造而不从真空环境中移除盘。在一些顺序中，磁性堆叠被蚀刻，而另一些蚀刻则在形成磁性堆叠之前进行。在另外的序列中，使用离子注入而没有蚀刻步骤。为了蚀刻可移动的非接触电极用于进行溅射蚀刻。阴极移动到与衬底接近但不接触的接近距离，以将RF能量耦合到盘。衬底垂直地保持在载体中，并且两侧被连续蚀刻。也就是说，在一个室中蚀刻一面，然后在下一个室中蚀刻第二面。

9. 发明申请

US20090086401A1 ELECTROSTATIC CHUCK APPARATUS 审中-公开
标题翻译：静电卡装置
公开(公告)号：US20090086401A1
公开(公告)日：2009-04-02
申请号：US11864288
申请日：2007-09-28
申请人： Tugrul Samir , Terry Bluck , Dennis Grimard
发明人： Tugrul Samir , Terry Bluck , Dennis Grimard
IPC分类号： H01L21/683 , H01L21/67 , H02N13/00
CPC分类号： H01L21/6831
摘要： An electrostatic chuck includes an angled conduit, or an angled laser drilled passage, through which a heat transfer gas is provided. A segment of the angled conduit and/or the angled laser drilled passage extends along an axis different from an axis of the electric field generated to hold a substrate to the chuck, thereby minimizing plasma arcing and backside gas ionization. A first plug may be inserted into the conduit, wherein a segment of a first exterior channel thereof extends along an axis different from an axis of the electric field. A first and second plug may be inserted into a ceramic sleeve which extends through at least one of the dielectric member and the electrode. Finally, the surface of the dielectric member may comprise embossments arranged at radial distances from the center of the dielectric member so as to improve heat transfer and gas distribution.
摘要翻译：静电卡盘包括成角度的导管或成角度的激光钻孔通道，通过该通道提供传热气体。成角度的管道和/或成角度的激光钻孔通道的一段沿着不同于将基板保持在卡盘上的电场的轴线不同的轴线延伸，从而最小化等离子体电弧放电和背侧气体电离。第一塞子可以插入导管中，其中第一外部通道的一段沿着不同于电场的轴线的轴线延伸。第一和第二插头可以插入延伸穿过电介质构件和电极中的至少一个的陶瓷套管中。最后，电介质构件的表面可以包括布置在离电介质构件的中心的径向距离处的凸起，以便改善传热和气体分布。

10. 发明授权

US09165587B2 System and method for dual-sided sputter etch of substrates 有权
标题翻译：用于衬底双面溅射蚀刻的系统和方法
公开(公告)号：US09165587B2
公开(公告)日：2015-10-20
申请号：US12329457
申请日：2008-12-05
申请人： Michael S. Barnes , Terry Bluck
发明人： Michael S. Barnes , Terry Bluck
IPC分类号： C23F1/00 , H01L21/306 , C23C14/00 , C25B11/00 , C25B13/00 , G11B5/84 , G11B5/855 , H01J37/34
CPC分类号： G11B5/84 , G11B5/855 , H01J37/3438
摘要： A system is provided for etching patterned media disks. A movable electrode is utilized to perform sputter etch. The electrode moves to near or at slight contact to the substrate so as to couple RF energy to the disk. The material to be etched may be metal, e.g., Co/Pt/Cr or similar metals. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched. An isolation valve is disposed between the two chambers and the disk carrier moves the disks between the chambers. The carrier may be a linear drive carrier, using, e.g., magnetized wheels and linear motors.
摘要翻译：提供用于蚀刻图案化介质盘的系统。利用可动电极进行溅射蚀刻。电极移动到接近或稍微接触到衬底，以将RF能量耦合到盘。待蚀刻的材料可以是金属，例如Co / Pt / Cr或类似的金属。衬底垂直地保持在载体中，并且两侧被连续蚀刻。也就是说，在一个室中蚀刻一面，然后在下一个室中蚀刻第二面。隔离阀设置在两个腔室之间，圆盘托架使腔室间移动。载体可以是线性驱动载体，使用例如磁化轮和线性马达。

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