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    • 3. 发明申请
    • Vertically-structured gan-based light emitting diode and method of manufacturing the same
    • 垂直结构的基于发光二极管的发光二极管及其制造方法
    • US20060273341A1
    • 2006-12-07
    • US11430990
    • 2006-05-10
    • Jae LeeHee ChoiJeong OhSu Lee
    • Jae LeeHee ChoiJeong OhSu Lee
    • H01L33/00
    • H01L33/20H01L33/0079H01L33/22H01L2933/0083
    • The present invention relates to a method of manufacturing a vertically-structured GaN-based light emitting diode. The method of manufacturing a vertically-structured GaN-based light emitting diode includes forming a GaN layer on a substrate; patterning the compound layer in a predetermined shape; forming an n-type GaN layer on the patterned compound layer through the epitaxial lateral over-growth process and sequentially forming an active layer and a p-type GaN layer on the n-type GaN layer; forming a structure supporting layer on the p-type GaN layer; sequentially removing the substrate and the GaN layer formed on the substrate after forming the structure supporting layer; removing the patterned compound layer exposed after removing the GaN layer so as to form an n-type GaN layer patterned in a concave shape; and forming an n-type electrode on the n-type GaN layer patterned in a concave shape.
    • 本发明涉及一种垂直构造的GaN基发光二极管的制造方法。 制造垂直结构的GaN基发光二极管的方法包括在衬底上形成GaN层; 将化合物层图案化成预定的形状; 通过外延横向过度生长工艺在图案化的化合物层上形成n型GaN层,并在n型GaN层上依次形成有源层和p型GaN层; 在p型GaN层上形成结构支撑层; 在形成结构支撑层之后,依次去除衬底和形成在衬底上的GaN层; 去除在去除GaN层之后暴露的图案化合物层,以形成图案化为凹形的n型GaN层; 在形成凹形的n型GaN层上形成n型电极。
    • 4. 发明申请
    • Vertical GaN-based LED and method of manfacturing the same
    • 垂直GaN基LED及其制造方法
    • US20070018187A1
    • 2007-01-25
    • US11490254
    • 2006-07-21
    • Jae LeeBang OhHee ChoiJeong OhSeok ChoiSu Lee
    • Jae LeeBang OhHee ChoiJeong OhSeok ChoiSu Lee
    • H01L33/00H01L21/00
    • H01L33/22H01L33/14
    • A vertical GaN-based LED and a method of manufacturing the same are provided. The vertical GaN-based LED includes an n-electrode, a first n-type GaN layer, a first AlGaN layer, a GaN layer, a second AlGaN layer, a second n-type GaN layer, an active layer, a p-type GaN layer, and a structure support layer. The first n-type GaN layer has uneven patterns having a plurality of protuberances. The first AlGaN layer is formed under the first n-type GaN layer, and the GaN layer is formed under the first AlGaN layer. The active layer is formed under the second n-type GaN layer, and the p-type GaN layer is formed under the active layer. A p-electrode is formed under the p-type GaN layer, and the structure support layer is formed under the p-electrode.
    • 提供了一种垂直GaN基LED及其制造方法。 垂直GaN基LED包括n电极,第一n型GaN层,第一AlGaN层,GaN层,第二AlGaN层,第二n型GaN层,有源层,p型 GaN层和结构支撑层。 第一n型GaN层具有具有多个突起的不均匀图案。 第一AlGaN层形成在第一n型GaN层下方,并且GaN层形成在第一AlGaN层的下方。 有源层形成在第二n型GaN层下面,p型GaN层形成在有源层下面。 在p型GaN层的下方形成有p电极,在p电极的下方形成有结构支撑层。
    • 6. 发明申请
    • Method of manufacturing vertical GaN-based light emitting diode
    • 制造垂直GaN基发光二极管的方法
    • US20070042520A1
    • 2007-02-22
    • US11503944
    • 2006-08-15
    • Jeong OhJae LeeSeok Choi
    • Jeong OhJae LeeSeok Choi
    • H01L21/00
    • H01L33/0079H01L33/007
    • The present invention relates to a method of manufacturing a vertical GaN-based LED. The method includes forming an insulating pattern on a substrate to define LED regions having a predetermined size; sequentially stacking an n-type GaN-based semiconductor layer, an active layer, and a p-type GaN-based semiconductor layer on the substrate except for the insulating pattern to form a light emitting structure; removing the insulating pattern to divide the light emitting structure into LED sections having a predetermined size; forming p-electrodes on the LED sections, respectively; forming a structure support layer on the p-electrodes; removing the substrate to expose the divided n-type GaN-based semiconductor layer; and forming n-electrodes on the exposed n-type GaN-based semiconductor layer.
    • 本发明涉及一种制造垂直GaN基LED的方法。 该方法包括在基板上形成绝缘图案以限定具有预定尺寸的LED区域; 在除了绝缘图案之外的衬底上依次堆叠n型GaN基半导体层,有源层和p型GaN基半导体层以形成发光结构; 去除绝缘图案以将发光结构分成具有预定尺寸的LED部分; 分别在LED部分上形成p电极; 在p电极上形成结构支撑层; 去除衬底以暴露分开的n型GaN基半导体层; 在暴露的n型GaN基半导体层上形成n电极。
    • 7. 发明申请
    • Nitride semiconductor light emitting device and method of manufacturing the same
    • 氮化物半导体发光器件及其制造方法
    • US20060054917A1
    • 2006-03-16
    • US10998922
    • 2004-11-30
    • Jae LeeJeong OhJin Park
    • Jae LeeJeong OhJin Park
    • H01L33/00
    • H01L33/32H01L33/14
    • A nitride semiconductor light emitting device and a method of manufacturing the same are disclosed. The nitride semiconductor light emitting device comprises an n-type nitride semiconductor layer formed on a substrate, an active layer formed on the n-type nitride semiconductor layer, a p-type nitride semiconductor layer formed on the active layer, an undoped GaN layer formed on the p-type nitride semiconductor layer, an AlGaN layer formed on the undoped GaN layer to form a two-dimensional electron gas (2DEG) layer at a bonding interface between the AlGaN layer and the undoped GaN layer, and an n-side electrode and a p-side electrode respectively formed on the n-type nitride semiconductor layer and the AlGaN layer to be connected to each other. As a hetero-junction structure of GaN/AlGaN is formed on the p-type nitride semiconductor layer, contact resistance between the p-type nitride semiconductor layer and the p-side electrode is enhanced by virtue of tunneling effect through the 2DEG layer.
    • 公开了一种氮化物半导体发光器件及其制造方法。 氮化物半导体发光器件包括形成在衬底上的n型氮化物半导体层,形成在n型氮化物半导体层上的有源层,形成在有源层上的p型氮化物半导体层,形成的未掺杂的GaN层 在p型氮化物半导体层上,形成在未掺杂的GaN层上的AlGaN层,以在AlGaN层和未掺杂的GaN层之间的键合界面处形成二维电子气(2DEG)层,以及n侧电极 以及分别形成在相互连接的n型氮化物半导体层和AlGaN层上的p侧电极。 由于在p型氮化物半导体层上形成GaN / AlGaN的异质结结构,因此通过2DEG层的隧道效应,p型氮化物半导体层与p侧电极之间的接触电阻增强。