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    • 10. 发明申请
    • Method for fabricating a liquid crystal display device and an LCD device thereby
    • 由此制造液晶显示装置和LCD装置的方法
    • US20080123044A1
    • 2008-05-29
    • US11812949
    • 2007-06-22
    • Jae Young OhYoung Seung JeeJeong Oh KimSoopool Kim
    • Jae Young OhYoung Seung JeeJeong Oh KimSoopool Kim
    • G02F1/13
    • G02F1/136227G02F1/134363G02F2001/134372G02F2201/40
    • A method for fabricating a LCD having enhanced aperture ratio and brightness includes: forming a gate line, a gate electrode, a common electrode and a common line in a first mask process; depositing a gate insulating layer covering the gate line, the gate electrode and the common electrode; forming an active layer on the gate insulating layer, and an ohmic contact layer on the active layer in a second mask process; forming a data line, a source electrode, and a drain electrode facing the source electrode in a third mask process; depositing a protective layer over the data line, the source electrode and the drain electrode; forming a pixel contact hole in a fourth mask process; and forming a pixel electrode, wherein the pixel electrode is connected to the drain electrode through the pixel contact hole in a fifth mask process using a reverse tapered photo-resist pattern.
    • 一种制造具有增强的开口率和亮度的LCD的方法包括:在第一掩模处理中形成栅极线,栅电极,公共电极和公共线; 沉积覆盖栅极线,栅电极和公共电极的栅极绝缘层; 在栅极绝缘层上形成有源层,在第二掩模工艺中在有源层上形成欧姆接触层; 在第三掩模工艺中形成面对源电极的数据线,源电极和漏电极; 在数据线,源电极和漏电极上沉积保护层; 在第四掩模处理中形成像素接触孔; 以及形成像素电极,其中,在使用倒锥形光刻胶图案的第五掩模工艺中,像素电极通过像素接触孔连接到漏电极。