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1. 发明申请

US20080026314A1 Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition 审中-公开
标题翻译：硅烷化合物，聚硅氧烷和辐射敏感性树脂组合物
公开(公告)号：US20080026314A1
公开(公告)日：2008-01-31
申请号：US10576075
申请日：2004-10-14
申请人： Isao Nishimura , Noboru Yamahara , Masato Tanaka , Tsutomu Shimokawa
发明人： Isao Nishimura , Noboru Yamahara , Masato Tanaka , Tsutomu Shimokawa
IPC分类号： G03C5/00
CPC分类号： G03F7/0757 , C07F7/0838 , C07F7/1804 , C08G77/14 , C08G77/24 , G03F7/0045
摘要： A novel polysiloxane suitable as a resin component of a chemically-amplified resist exhibiting particularly excellent I-D bias, depth of focus (DOF), and the like, a novel silane compound useful as a raw material for synthesizing the polysiloxane, and a radiation-sensitive resin composition comprising the polysiloxane are provided.The silane compound is shown by the following formula (I), and the polysiloxane has a structural unit shown by the following formula (1), wherein R is an alkyl group, R1 and R2 individually represent a fluorine atom, lower alkyl group, or lower fluoroalkyl group, n is 0 or 1, k is 1 or 2, and i is an integer of 0 to 10.The radiation-sensitive resin composition comprises the polysiloxane and a photoacid generator.
摘要翻译：适用作为具有特别优异的ID偏压，深度聚焦（DOF）等的化学增幅抗蚀剂的树脂组分的新型聚硅氧烷，可用作合成聚硅氧烷的原料的新型硅烷化合物和辐射敏感性提供了包含聚硅氧烷的树脂组合物。硅烷化合物由下式（I）表示，聚硅氧烷具有下述式（1）所示的结构单元，式中，R为烷基，R 1，R 2， 2个独立地表示氟原子，低级烷基或低级氟代烷基，n为0或1，k为1或2，i为0至10的整数。该辐射敏感性树脂组合物包含聚硅氧烷和光致酸发生剂。

2. 发明授权

US06964840B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06964840B2
公开(公告)日：2005-11-15
申请号：US10867892
申请日：2004-06-16
申请人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
发明人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
IPC分类号： C08K5/00 , C08L33/06 , C08L35/00 , C08L45/00 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0233 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.
摘要翻译：公开了一种包含含酸不稳定基团的树脂和光致酸发生剂的辐射敏感性树脂组合物。树脂具有式（1）的结构，其中R 1表示氢原子，一价酸不稳定基团，具有1-6个碳原子的烷基，其不具有酸 - 不稳定基团或不具有酸不稳定基团的具有2-7个碳原子的烷基羰基，X 1表示具有1-4个碳原子的直链或支链氟代烷基， SUP> 2表示氢原子，具有1-10个碳原子的直链或支链烷基或具有1-10个碳原子的直链或支链氟代烷基。树脂组合物表现出高的透射率，高灵敏度，分辨率和图案形状，并且可以以高产率制造半导体的化学放大抗蚀剂。

3. 发明授权

US06800414B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06800414B2
公开(公告)日：2004-10-05
申请号：US09879894
申请日：2001-06-14
申请人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
发明人： Yukio Nishimura , Noboru Yamahara , Masafumi Yamamoto , Toru Kajita , Tsutomu Shimokawa , Hiroshi Ito
IPC分类号： G03F7004
CPC分类号： G03F7/0046 , G03F7/0233 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.
摘要翻译：公开了一种包含含酸不稳定基团的树脂和光致酸发生剂的辐射敏感性树脂组合物。该树脂具有式（1）的结构，其中R 1表示氢原子，一价酸不稳定基团，不具有酸不稳定基团的具有1-6个碳原子的烷基，或不具有酸不稳定基团的具有2-7个碳原子的烷基羰基，X 1表示具有1-4个碳原子的直链或支链氟代烷基，R 2表示氢原子，直链或具有1-10个碳原子的支链烷基或具有1-10个碳原子的直链或支链氟代烷基。树脂组合物表现出高的透射率，高灵敏度，分辨率和图案形状，并且可以以高产率制造半导体的化学放大抗蚀剂。

4. 发明授权

US06403280B1 Radiation sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06403280B1
公开(公告)日：2002-06-11
申请号：US09558067
申请日：2000-04-26
申请人： Noboru Yamahara , Kiyoshi Murata , Shinichiro Iwanaga , Hiroyuki Ishii , Haruo Iwasawa
发明人： Noboru Yamahara , Kiyoshi Murata , Shinichiro Iwanaga , Hiroyuki Ishii , Haruo Iwasawa
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： The present invention provides a radiation sensitive resin composition which comprises (A) a resin represented by a copolymer comprising recurring units represented by the general formulae (1) or (2) as shown below, and (B) a radiation sensitive acid-generator. The radiation sensitive resin composition has an excellent storage stability and the resist produced from the composition is a chemically amplifiable type sensitive to radiations represented by fartificial ultraviolet rays. The resist has a high transparency to radiations and it is excellent in basic physical properties for resist such as durability to dry etching, sensitivity, resolution, and pattern configuration:
摘要翻译：本发明提供一种辐射敏感性树脂组合物，其包含（A）由下述通式（1）或（2）表示的重复单元的共聚物所表示的树脂，（B）辐射敏感性酸发生剂。辐射敏感性树脂组合物具有优异的储存稳定性，并且由该组合物制备的抗蚀剂是对由人造紫外线表示的辐射敏感的化学可扩增型。抗蚀剂对于辐射具有高透明度，并且对于抗蚀剂的基本物理性质如干蚀刻耐久性，灵敏度，分辨率和图案构型是优异的：

5. 发明授权

US4048147A Carboxylic acid of cyclopentadiene derivative, salt thereof, or ester thereof and process for producing these compositions 失效
标题翻译：环戊二烯衍生物的羧酸，其盐或其酯和制备这些组合物的方法
公开(公告)号：US4048147A
公开(公告)日：1977-09-13
申请号：US635630
申请日：1975-11-26
申请人： Masatoshi Arakawa , Ryotaro Ohno , Katuhiro Ishikawa , Noboru Yamahara , Hisashi Matsui
发明人： Masatoshi Arakawa , Ryotaro Ohno , Katuhiro Ishikawa , Noboru Yamahara , Hisashi Matsui
IPC分类号： C07C69/753 , B01F17/34 , C07C45/50 , C07C51/00 , C07C61/39 , C07C67/00 , C08G2/00 , C08G2/18 , C08G10/00
CPC分类号： C07C61/39 , C07C45/50
摘要： A novel compound represented by the formula, ##STR1## WHEREIN R is a hydrogen or an alkyl group having 1 to 3 carbon atoms, said four R's being the same or different; R.sup.1 is hydrogen, an alkali metal, an ammonium group, a mono-to tetra-hydric aliphatic alcohol moiety having 1 to 12 carbon atoms, or an organic amine residue; n is an integer of 1 to 4; and R.sup.2, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are independently hydrogen or alkyl groups having 1 to 6 carbon atoms or R.sup.2 and R.sup.3 may form a ring when taken together. Said novel compound has properties similar to those of natural rosin or a disproportionated rosin, and is useful as a vehicle for coating compositions and printing inks, as an emulsifier for emulsion polymerization, and as a sizing agent.
摘要翻译：由式表示的新化合物，其中R是氢或具有1至3个碳原子的烷基，所述四个R相同或不同; R1是氢，碱金属，铵基，具有1至12个碳原子的单 - 四 - 脂肪醇部分或有机胺残基; n为1〜4的整数，并且R 2，R 3，R 4，R 5和R 6独立地为氢或具有1至6个碳原子的烷基，或者当R 3和R 3可以一起形成时，R 2和R 3可以形成环。所述新型化合物具有与天然松香或歧化松香类似的性质，可用作涂料组合物和印刷油墨，乳液聚合乳化剂和上胶剂的载体。

6. 发明授权

US5164469A Transparent resin material 失效
标题翻译：透明树脂材料
公开(公告)号：US5164469A
公开(公告)日：1992-11-17
申请号：US648237
申请日：1991-01-31
申请人： Kohei Goto , Zen Komiya , Noboru Yamahara , Akira Iio , Masao Hisatomi , Hiroshi Oka
发明人： Kohei Goto , Zen Komiya , Noboru Yamahara , Akira Iio , Masao Hisatomi , Hiroshi Oka
IPC分类号： C08G61/08 , C08L65/00
CPC分类号： C08L65/00 , C08G61/08
摘要： A transparent resin material consisting of a hydrogenation product of a (co)polymer obtained by subjecting at least one compound represented by general formula (I) or a combination of at least 5% by weight of said compound and 95% by weight or less of other copolymerizable cyclic olefin monomer to metathesis polymerization: ##STR1## wherein A and B are independently hydrogen atoms or C.sub.1-10 hydrocarbon groups; and X and Y are independently hydrogen atoms, C.sub.1-10 hydrocarbon groups, --C(CH.sub.2).sub.n COOR.sup.1 groups or --(CH.sub.2).sub.n OCOR.sup.1 groups [R.sup.1 is a C.sub.1-20 hydrocarbon group and n is 0 or an integer of 1-10] with the proviso that at least one of X and Y is selected from the above --(CH.sub.2).sub.n COOR.sup.1 and --(CH.sub.2).sub.n OCOR.sup.1 groups. Said transparent resin material is moldable and has sufficient optical properties, low hygroscopicity, good heat resistance and excellent adhesion to recording layer.
摘要翻译：将由通式（I）表示的至少一种化合物或至少5重量％的所述化合物的组合和95重量％以下的化合物所得的（共）聚合物的氢化产物组成的透明树脂材料其它可共聚的环烯烃单体进行复分解聚合反应：其中A和B独立地为氢原子或C 1-10烃基; 并且X和Y独立地是氢原子，C 1-10烃基，-C（CH 2）n COOR 1基团或 - （CH 2）nOCOR 1基团[R 1是C 1-20烃基，n是0或1-10的整数] 条件是X和Y中的至少一个选自上述 - （CH 2）n COOR 1和 - （CH 2）nOCOR 1基团。所述透明树脂材料是可模塑的并且具有足够的光学性能，低吸湿性，良好的耐热性和对记录层的优异粘合性。

7. 发明授权

US5053471A Transparent resin material 失效
标题翻译：透明树脂材料
公开(公告)号：US5053471A
公开(公告)日：1991-10-01
申请号：US613939
申请日：1990-11-13
申请人： Kohei Goto , Zen Komiya , Noboru Yamahara , Akira Iio
发明人： Kohei Goto , Zen Komiya , Noboru Yamahara , Akira Iio
IPC分类号： C08G61/08 , C08L65/00
CPC分类号： C08L65/00 , C08G61/08 , G11B7/2538
摘要： A transparent resin material consisting of a (co)polymer obtained by subjecting at least one compound represented by the general formula (I) or a combination of said compound and other copolymerizable monomer to metathesis polymerization, or a hydrogenation product of the (co)polymer: ##STR1## wherein A and B are independently hydrogen atoms or C.sub.1-10 hydrocarbon groups; X and Y are independently hydrogen atoms, C.sub.1-10 hydrocarbon groups, halogen atoms, halogen-substituted C.sub.1-10 hydrocarbon groups, --(CH.sub.2).sub.n COOR.sup.1, --(CH.sub.2).sub.n OCOR.sup.1, --(CH.sub.2).sub.n OR.sup.1, --(CH.sub.2).sub.n CN, --(CH.sub.2).sub.n CONR.sup.2 R.sup.3, --(CH.sub.2).sub.n COOZ, --(CH.sub.2).sub.n OCOZ, --(CH.sub.2).sub.n OZ or --(CH.sub.2).sub.n W [R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are independently C.sub.1-20 hydrocarbon groups, Z is a halogen-substituted hydrocarbon group, W is SiR.sub.p.sup.5 D.sub.3-p (R.sup.5 is a C.sub.1-10 hydrocarbon group, D is a halogen atom, --OCOR.sup.5 or --OR.sup.5, p is 0 or an integer of 1-3), n is 0 or an integer of 1-10] with the proviso that at least one of X and Y is selected from the above groups other than the hydrogen atom and the hydrocarbon groups, or X and Y may form together ##STR2## and m is 0 or 1. Said transparent resin material is moldable and has sufficient optical properties, low hygroscopicity, good heat resistance and excellent adhesion to recording layer.

8. 发明授权

US4511683A Sulfonic acid compound having cyclopentadiene skeleton and composition comprising same and cement 失效
标题翻译：具有环戊二烯骨架的磺酸化合物和包含其的组合物和水泥
公开(公告)号：US4511683A
公开(公告)日：1985-04-16
申请号：US471671
申请日：1983-03-03
申请人： Hironobu Shinohara , Noboru Yamahara , Yoshinori Yoshida
发明人： Hironobu Shinohara , Noboru Yamahara , Yoshinori Yoshida
IPC分类号： B01F17/00 , C04B24/16 , C07C309/25 , C07C309/38 , C08F8/36 , C08F32/06 , C08F32/08 , C08F232/00 , C08G10/04 , C08G61/02 , C08J3/02 , C08K5/42 , C08L45/00 , C08K3/00
CPC分类号： C07C309/00 , C04B24/16
摘要： Compounds having a cyclopentadiene skeleton and at least one sulfonic acid group are novel, and produced by subjecting cyclopentadiene, dicyclopentadiene and/or hydroxydicyclopentadiene to sulfonation, and subjecting the same, before or after the sulfonation, to reaction with alkylbenzene, polymerization and/or condensation through an aldehyde. The aforesaid compounds are useful as dispersants for cement.By incorporating a polymer emulsion into a slurry composition comprising a powder and a dispersant having at least one sulfonic acid group the proportion of said polymer emulsion being 0.05 to 50 parts by weight per 100 parts by weight of said dispersant, the dispersing effect of said dispersant is improved, the fluidizing effect of the dispersant is further enhanced, the slump loss is made very small, and the workability becomes good.
摘要翻译：具有环戊二烯骨架和至少一个磺酸基的化合物是新的，并且通过使环戊二烯，二环戊二烯和/或羟基二环戊二烯进行磺化来制备，并在磺化之前或之后使其与烷基苯反应，聚合和/或缩合通过醛。上述化合物可用作水泥分散剂。通过将聚合物乳液掺入到包含粉末和具有至少一个磺酸基团的分散剂的浆料组合物中，所述聚合物乳液的比例为每100重量份所述分散剂0.05至50重量份，所述分散剂的分散作用改善了分散剂的流化作用，进一步提高了坍落度损失，加工性变好。

9. 发明授权

US4138419A Cyclopentadiene derivative 失效
标题翻译：环戊二烯衍生物
公开(公告)号：US4138419A
公开(公告)日：1979-02-06
申请号：US792225
申请日：1977-04-29
申请人： Masatoshi Arakawa , Ryotaro Ohno , Katuhiro Ishikawa , Noboru Yamahara , Hisashi Matsui
发明人： Masatoshi Arakawa , Ryotaro Ohno , Katuhiro Ishikawa , Noboru Yamahara , Hisashi Matsui
IPC分类号： C07C69/753 , B01F17/34 , C07C17/08 , C07C51/00 , C07C61/39 , C07C67/00 , D21H17/00 , D21H17/14 , C07C63/36 , C07C63/44 , C07C69/76
CPC分类号： D21H17/14 , C07C17/08 , D21H17/00 , Y10S516/06
摘要： A novel cyclopentadiene derivative of the general formula: ##STR1## wherein R.sup.1 is hydrogen, a mono- to tetra-hydric alcohol moiety having 1 to 12 carbon atoms, a metal of Groups Ia, IIa and IIb of the Periodic Table, an ammonium group or an organic amine residue; R.sup.2, R.sup.3, and R.sup.4 are independently hydrogen or alkyl groups having 1 to 6 carbon atoms; R.sup.a, R.sup.b, and R.sup.c are independently hydrogen or alkyl groups having 1 to 3 carbon atoms; m is 0 or 1; and n is an integer of 1 to 4. This cyclopentadiene derivative is comparable or even superior to natural rosin in effectiveness as an emulsifier for use in the production of SBR and ABS resins or as a sizing agent in paper making.
摘要翻译：一种新的环戊二烯衍生物，其通式如下：其中R1是氢，具有1至12个碳原子的一至四醇部分，元素周期表中的Ia，IIa和IIb族金属，铵基或有机胺残基; R2，R3和R4独立地是氢或具有1至6个碳原子的烷基; Ra，Rb和Rc独立地是氢或具有1至3个碳原子的烷基; m为0或1; 并且n为1〜4的整数。该环戊二烯衍生物作为用于制备SBR和ABS树脂的乳化剂或作为造纸中的施胶剂的有效性与天然松香相当或甚至优于天然松香。

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