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    • 7. 发明授权
    • 3,7-Disubstituted-2 or 3-cephem-4-carboxylic acid compounds
    • 3,7-二取代-2或3-头孢烯-4-羧酸化合物
    • US4327093A
    • 1982-04-27
    • US85684
    • 1979-10-17
    • Ikuo UedaMasakazu KobayashiHisashi YamadaHiroki Ono
    • Ikuo UedaMasakazu KobayashiHisashi YamadaHiroki Ono
    • A61K31/545A61K31/546A61P31/04C07D501/14C07D501/18C07D501/20C07D501/26C07D501/28C07D501/30C07D501/34C07D501/38C07D501/60
    • C07D501/14
    • 3,7-Disubstituted-2 or 3-cephem-4-carboxylic acid compounds of the formula: ##STR1## wherein R.sup.1 is acylamino or ar(lower)alkylamino; R.sup.2 is carboxy or carboxy protected by a pharmaceutically acceptable group; --N--R.sup.3, R.sup.4 is di(lower)alkylamino(lower)alkylamino, an unsaturated or saturated 3 to 8 membered heteromonocyclic (lower)alkylamino group containing 1 to 4 nitrogen atoms, an unsaturated or saturated 3 to 8 membered heteromonocyclic (lower)alkylamino group containing 1 to 4 nitrogen atoms substituted by lower alkyl or hydroxy(lower) alkyl, an unsaturated or saturated 5 to 6 membered heteromonocyclic group containing 2 to 4 nitrogen atoms, an unsaturated or saturated 5 to 6 membered heteromonocyclic group containing 2 to 4 nitrogen atoms substituted by lower alkyl or hydroxy(lower)alkyl or hydroxypiperidino, and X is --S-- or ##STR2## and pharmaceutically acceptable salts thereof. The present compounds are useful for the treatment of infectious diseases in animals and human beings.
    • 3,7-二取代的2-或3-头孢烯-4-羧酸化合物,其结构式如下:其中R 1是酰氨基或芳(低级)烷基氨基; R2是被药学上可接受的基团保护的羧基或羧基; -N-R3,R4是二(低级)烷基氨基(低级)烷基氨基,含有1-4个氮原子的不饱和或饱和的3至8元杂单环(低级)烷基氨基,不饱和或饱和的3至8元杂单环(低级) 由低级烷基或羟基(低级)烷基取代的含有1至4个氮原子的烷基氨基,含2-4个氮原子的不饱和或饱和5至6元杂单环基团,含有2至4个不饱和或饱和的5至6元杂单环基团 被低级烷基或羟基(低级)烷基或羟基哌啶子基取代的氮原子,X是-S-或其药学上可接受的盐。 本发明化合物可用于治疗动物和人类的感染性疾病。
    • 9. 发明授权
    • Industrial two-layer fabric
    • 工业双层面料
    • US08205644B2
    • 2012-06-26
    • US12733482
    • 2008-10-06
    • Ikuo Ueda
    • Ikuo Ueda
    • D21F1/10D21F7/08D03D25/00
    • D21F1/0036Y10T428/24612
    • An industrial two-layer fabric constituted by at least one upper surface side warp to be woven with at least one upper surface side weft, at least one lower surface side warp to be woven with at least one lower surface side weft, and at least one warp binding yarn to be woven with the at least one upper surface side weft and the at least one lower surface side weft having at least one pair of upper and lower warps in which the upper and lower surface side warps are located to be upper and lower, respectively, and at least one pair of warp binding yarns in which at least one yarn constitutes a warp binding yarn.
    • 一种工业双层织物,由至少一个上表面侧经纱与至少一个上表面侧纬纱组成,至少一个下表面侧经纱与至少一个下表面侧纬纱织造,至少一个 具有至少一个上表面侧纬纱和至少一个下表面侧纬纱的经编结合纱线具有至少一对上下翘曲,其中上表面侧经线和下表面侧经线位于其上下 以及至少一对经纱结合纱线,其中至少一根纱线构成经纱结合纱线。
    • 10. 发明申请
    • INDUSTRIAL TWO-LAYER FABRIC
    • 工业两层织物
    • US20100252137A1
    • 2010-10-07
    • US12591704
    • 2009-11-30
    • Ikuo Ueda
    • Ikuo Ueda
    • D03D11/00
    • D21F1/0036
    • A two layer fabric has first, second, third and fourth upper side wefts contiguously and repeatedly arranged. Each of three contiguously arranged warps forms a knuckle over second, over third, and over second upper side wefts respectively to form a separation portion. At both sides of the separation portion, both the second and third upper side wefts form a float portion by passing over two or more warps. Adjacent to the float portion, one warp passes over the second and third upper side wefts successively and one or two warps adjacent thereto pass over the second or the third upper side weft to form an approach portion where the second and third upper side wefts approach. Crimp portions are formed to sandwich the separation portion where the first and fourth upper side wefts pass over warps which are common to those of the separation portion.
    • 双层织物具有连续重复布置的第一,第二,第三和第四上侧纬纱。 三个连续布置的经纱中的每一个分别在第二,第三和第二上侧纬纱上形成转向节,以形成分离部分。 在分离部分的两侧,第二和第三上侧纬纱都经过两个或多个经纱而形成浮子部分。 相邻于浮子部分,一个经纱依次穿过第二和第三上侧纬纱,并且与其相邻的一个或两个经纱穿过第二或第三上侧纬纱,以形成第二和第三上侧纬纱接近的接近部分。 压接部形成为夹着第一和第四上侧纬纱经过与分离部的纬纱共同的经纱的分离部。