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1. 发明授权

US06721340B1 Bandwidth control technique for a laser 有权
公开(公告)号：US06721340B1
公开(公告)日：2004-04-13
申请号：US09608543
申请日：2000-06-30
申请人： Igor V. Fomenkov , Armen Kroyan , Jesse D. Buck , Palash P. Das , Richard L. Sandstrom , Frederick G. Erie , John M. Algots , Gamaralalage G. Padmabandu
发明人： Igor V. Fomenkov , Armen Kroyan , Jesse D. Buck , Palash P. Das , Richard L. Sandstrom , Frederick G. Erie , John M. Algots , Gamaralalage G. Padmabandu
IPC分类号： H01S310
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.

2. 发明授权

US07079556B2 Bandwidth control technique for a laser 失效
标题翻译：激光带宽控制技术
公开(公告)号：US07079556B2
公开(公告)日：2006-07-18
申请号：US10670406
申请日：2003-09-24
申请人： Igor V. Fomenkov , Armen Kroyan , Jesse D. Buck , Palash P. Das , Richard L. Sandstrom , Frederick G. Erie , John Martin Algots , Gamaralalage G. Padmabandu
发明人： Igor V. Fomenkov , Armen Kroyan , Jesse D. Buck , Palash P. Das , Richard L. Sandstrom , Frederick G. Erie , John Martin Algots , Gamaralalage G. Padmabandu
IPC分类号： H01S3/09 , H01S3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1.0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.
摘要翻译：一种用于放电激光器带宽控制的技术。提供线窄设备具有至少一个压电驱动器和快速带宽检测装置以及具有小于约1.0毫秒的时间响应的带宽控制。在优选实施例中，波长调谐镜在非常窄的转角范围内以每秒超过500次抖动的抖动速率抖动，以使标称波长值的抖动产生期望的一系列激光脉冲的有效带宽。

3. 发明授权

US07139301B2 Laser spectral engineering for lithographic process 有权
公开(公告)号：US07139301B2
公开(公告)日：2006-11-21
申请号：US10701280
申请日：2003-11-03
申请人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
发明人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

4. 发明授权

US06671294B2 Laser spectral engineering for lithographic process 有权
公开(公告)号：US06671294B2
公开(公告)日：2003-12-30
申请号：US09918773
申请日：2001-07-27
申请人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
发明人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
IPC分类号： H01S310
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

5. 发明授权

US07382815B2 Laser spectral engineering for lithographic process 有权
标题翻译：激光光谱工程用于光刻工艺
公开(公告)号：US07382815B2
公开(公告)日：2008-06-03
申请号：US10915517
申请日：2004-08-09
申请人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
发明人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
IPC分类号： H01S5/00
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要翻译：一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。其它优选实施例利用三个独立的波长调谐位置，产生具有三个独立峰值的光谱。

6. 发明授权

US07298770B2 Laser spectral engineering for lithographic process 有权
标题翻译：激光光谱工程用于光刻工艺
公开(公告)号：US07298770B2
公开(公告)日：2007-11-20
申请号：US10912933
申请日：2004-08-05
申请人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
发明人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
IPC分类号： H01S3/22 , H01S3/223 , H01S3/10 , H01S3/13
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要翻译：一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。其它优选实施例利用三个独立的波长调谐位置，产生具有三个独立峰值的光谱。

7. 发明授权

US06853653B2 Laser spectral engineering for lithographic process 有权
公开(公告)号：US06853653B2
公开(公告)日：2005-02-08
申请号：US10036925
申请日：2001-12-21
申请人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
发明人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
IPC分类号： B41C20060101 , B41C1/00 , G03F7/20 , H01L21/027 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/10 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01J3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

8. 发明授权

US08032845B2 Correcting 3D effects in phase shifting masks using sub-resolution features 有权
标题翻译：使用子分辨率特征校正相移掩模中的3D效果
公开(公告)号：US08032845B2
公开(公告)日：2011-10-04
申请号：US12360694
申请日：2009-01-27
申请人： Vishnu G. Kamat , Armen Kroyan
发明人： Vishnu G. Kamat , Armen Kroyan
IPC分类号： G06F17/50 , G03F1/00 , G06K9/00
CPC分类号： G03F1/30 , G03F1/36
摘要： Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an intensity imbalance between 0 degree and 180 degree phase shifters on the mask. An improved method of designing an alternating PSM to minimize this intensity imbalance is provided. Sub-resolution features, called “blockers”, can be incorporated in the alternating PSM design. Specifically, blockers can be formed in the 0 degree phase shifters. In this configuration, the intensity associated with the 0 degree phase shifters approximates the intensity associated with the corresponding 180 degree phase shifters. Intensity balancing using blockers retains image contrast, thereby ensuring printed feature quality.
摘要翻译：使用掩模上的相移可以有利地提高晶片上的印刷特征分辨率，从而允许集成电路上的更大的特征密度。相移可能在掩模上产生0度和180度移相器之间的强度不平衡。提供了一种设计交替PSM以最小化该强度不平衡的改进方法。称为“阻塞剂”的亚分辨率特征可以并入交替的PSM设计中。具体地，可以在0度移相器中形成阻挡剂。在该配置中，与0度移相器相关联的强度近似于与相应的180度移相器相关联的强度。使用阻滞剂的强度平衡保留了图像对比度，从而确保打印的特征质量。

9. 发明申请

US20090136857A1 Correcting 3D Effects In Phase Shifting Masks Using Sub-Resolution Features 有权
标题翻译：使用子分辨率功能校正相移掩码中的3D效果
公开(公告)号：US20090136857A1
公开(公告)日：2009-05-28
申请号：US12360694
申请日：2009-01-27
申请人： Vishnu G. Kamat , Armen Kroyan
发明人： Vishnu G. Kamat , Armen Kroyan
IPC分类号： G03F1/00 , G06F17/50
CPC分类号： G03F1/30 , G03F1/36
摘要： Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an intensity imbalance between 0 degree and 180 degree phase shifters on the mask. An improved method of designing an alternating PSM to minimize this intensity imbalance is provided. Sub-resolution features, called “blockers”, can be incorporated in the alternating PSM design. Specifically, blockers can be formed in the 0 degree phase shifters. In this configuration, the intensity associated with the 0 degree phase shifters approximates the intensity associated with the corresponding 180 degree phase shifters. Intensity balancing using blockers retains image contrast, thereby ensuring printed feature quality.
摘要翻译：使用掩模上的相移可以有利地提高晶片上的印刷特征分辨率，从而允许集成电路上的更大的特征密度。相移可能在掩模上产生0度和180度移相器之间的强度不平衡。提供了一种设计交替PSM以最小化该强度不平衡的改进方法。称为“阻塞剂”的亚分辨率特征可以并入交替的PSM设计中。具体地，可以在0度移相器中形成阻挡剂。在该配置中，与0度移相器相关联的强度近似于与相应的180度移相器相关联的强度。使用阻滞剂的强度平衡保留了图像对比度，从而确保打印的特征质量。

10. 发明申请

US20070160917A1 Correcting 3D Effects In Phase Shifting Masks Using Sub-Resolution Features 有权
标题翻译：使用子分辨率功能校正相移掩码中的3D效果
公开(公告)号：US20070160917A1
公开(公告)日：2007-07-12
申请号：US11462686
申请日：2006-08-04
申请人： Vishnu Kamat , Armen Kroyan
发明人： Vishnu Kamat , Armen Kroyan
IPC分类号： G06F17/50 , G03F1/00
CPC分类号： G03F1/30 , G03F1/36
摘要： Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an intensity imbalance between 0 degree and 180 degree phase shifters on the mask. An improved method of designing an alternating PSM to minimize this intensity imbalance is provided. Sub-resolution features, called “blockers”, can be incorporated in the alternating PSM design. Specifically, blockers can be formed in the 0 degree phase shifters. In this configuration, the intensity associated with the 0 degree phase shifters approximates the intensity associated with the corresponding 180 degree phase shifters. Intensity balancing using blockers retains image contrast, thereby ensuring printed feature quality.
摘要翻译：使用掩模上的相移可以有利地提高晶片上的印刷特征分辨率，从而允许集成电路上的更大的特征密度。相移可能在掩模上产生0度和180度移相器之间的强度不平衡。提供了一种设计交替PSM以最小化该强度不平衡的改进方法。称为“阻塞剂”的亚分辨率特征可以并入交替的PSM设计中。具体地，可以在0度移相器中形成阻挡剂。在该配置中，与0度移相器相关联的强度近似于与相应的180度移相器相关联的强度。使用阻滞剂的强度平衡保留了图像对比度，从而确保打印的特征质量。

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