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    • 3. 发明授权
    • Deflection method and system for use in a charged particle beam column
    • 用于带电粒子束柱的偏转方法和系统
    • US06825475B2
    • 2004-11-30
    • US10247104
    • 2002-09-19
    • Igor PetrovIgor KrivtsZvika RosenbergPavel Adamec
    • Igor PetrovIgor KrivtsZvika RosenbergPavel Adamec
    • H01J3710
    • H01J37/1475
    • A deflection system is presented for use in a lens arrangement of a charged particle beam column for inspecting a sample. The system comprises a magnetic deflector operable to create a magnetic field, and a pole piece assembly at least partly accommodated within the magnetic field. The pole piece assembly has a portion made of a soft magnetic material and is formed with an opening for a charged particle beam propagation therethrough. The deflection system allows for conducting the magnetic field created by the magnetic deflector through the pole piece assembly towards the opening in the pole piece assembly. This enables to increase the magnetic field value in the vicinity of the sample at the optical axis of the lens arrangement at a given electric current through the excitation coils of the magnetic deflector, without a need to increase a working distance.
    • 呈现偏转系统用于带电粒子束柱的透镜布置,用于检查样品。 该系统包括可操作以产生磁场的磁偏转器和至少部分地容纳在磁场内的极片组件。 极片组件具有由软磁材料制成的部分,并且形成有用于带电粒子束传播的开口。 偏转系统允许通过磁极组件朝磁极组件的开口传导由磁偏转器产生的磁场。 这样就能够使透镜装置的光轴附近的样品在通过磁导流板的激励线圈的给定电流上增加磁场值,而不需要增加工作距离。
    • 10. 发明申请
    • HIGH THROUGHPUT SEM TOOL
    • 高通量扫描仪刀具
    • US20100320382A1
    • 2010-12-23
    • US12528307
    • 2008-02-22
    • Gilad AlmogyAvishai BartovJürgen FrosienPavel AdamecHelmut Banzhof
    • Gilad AlmogyAvishai BartovJürgen FrosienPavel AdamecHelmut Banzhof
    • G01N23/00H01J37/147
    • H01J37/05H01J37/10H01J37/147H01J37/28H01J2237/0635H01J2237/1508H01J2237/2449H01J2237/2817
    • A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.
    • 描述了多光束扫描电子束装置(100)。 具有列的多头扫描电子束装置包括用于发射多个电子束(12,13,14)的多光束发射器(110),至少一个共同的电子束光学元件(130) 用于多个电子束中的至少两个的开口,并适用于共同影响多个电子束中的至少两个,用于单独影响多个电子束的至少一个单独的电子束光学元件(140),共同的目标 透镜组件(150),用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束,并且适于将多个电子束聚焦到样本(20)上以产生多个信号 光束(121,131,141)和检测组件(170),用于分别检测相应检测元件上的每个信号光束。