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1. 发明申请

US20050185169A1 Method and system to measure characteristics of a film disposed on a substrate 有权
标题翻译：测量设置在基板上的膜的特性的方法和系统
公开(公告)号：US20050185169A1
公开(公告)日：2005-08-25
申请号：US10782187
申请日：2004-02-19
申请人： Ian McMackin , Philip Schumaker , Byung-Jin Choi , Sidlgata Sreenivasan , Michael Watts
发明人： Ian McMackin , Philip Schumaker , Byung-Jin Choi , Sidlgata Sreenivasan , Michael Watts
IPC分类号： B81C1/00 , B81C99/00 , G01N21/84 , G03F7/00 , G03F7/20 , G01N21/88
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B81C1/0046 , B81C99/004 , B82Y10/00 , B82Y40/00 , G01N21/8422 , G03F7/70625 , G03F7/7065
摘要： The present invention is directed to providing a method and system to measure characteristics of a film disposed on a substrate. The method includes identifying a plurality of processing regions on the film; measuring characteristics of a subset of the plurality of processing regions, defining measured characteristics; determining a variation of one of the measured characteristics; and associating a cause of the variations based upon a comparison of the one of the measured characteristics to measured characteristics associated with the remaining processing regions of the subset. The system carries out the aforementioned method.
摘要翻译：本发明旨在提供一种测量设置在基底上的膜的特性的方法和系统。该方法包括识别胶片上的多个处理区域; 测量所述多个处理区域的子集的特征，定义测量的特征; 确定测量特征之一的变化; 并且基于所测量的特征之一与与所述子集的剩余处理区域相关联的测量特征的比较来将所述变化的原因相关联。系统执行上述方法。

2. 发明申请

US20060062867A1 Formation of discontinuous films during an imprint lithography process 有权
标题翻译：在压印光刻过程中形成不连续膜
公开(公告)号：US20060062867A1
公开(公告)日：2006-03-23
申请号：US11126946
申请日：2005-05-11
申请人： Byung Jin Choi , Mario Meissl , Sidlgata Sreenivasan , Michael Watts
发明人： Byung Jin Choi , Mario Meissl , Sidlgata Sreenivasan , Michael Watts
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B29C35/0888 , B29C59/022 , B29C59/026 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , H01L21/0271
摘要： The present invention is directed to a template having a body including a surface with first and second regions. The first region has first wetting characteristics for a given material and the second region has second wetting characteristics for the given material. The first wetting characteristics differ from the second wetting characteristics. Specifically, the first region is formed from a surface treatment layer with a first surface energy to provide the first wetting characteristics. The second region is exposed portions of the body, typically quartz of fused silica, having a second surface energy associated therewith. The second surface energy is greater than the first surface energy to provide the second region with the second wetting characteristics.
摘要翻译：本发明涉及一种具有主体的模板，该主体包括具有第一和第二区域的表面。第一区域对于给定材料具有第一润湿特性，并且第二区域对于给定材料具有第二润湿特性。第一润湿特性与第二润湿特性不同。具体地说，第一区域由具有第一表面能的表面处理层形成，以提供第一润湿特性。第二区域是具有与其相关联的第二表面能的身体的暴露部分，通常为熔融石英的石英。第二表面能大于第一表面能量，以向第二区域提供第二润湿特性。

3. 发明申请

US20050061773A1 Capillary imprinting technique 有权
标题翻译：毛细管压印技术
公开(公告)号：US20050061773A1
公开(公告)日：2005-03-24
申请号：US10645306
申请日：2003-08-21
申请人： Byung-Jin Choi , Sidlgata Sreenivasan , Michael Watts
发明人： Byung-Jin Choi , Sidlgata Sreenivasan , Michael Watts
IPC分类号： B81C99/00 , B01L20060101 , B29C35/08 , B29C59/02 , C23F1/00 , C23F1/08 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/08
摘要： The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, spontaneous capillary filling of the volume between the mold and the substrate occurs.
摘要翻译：本发明提供了一种用模板图案化模板的方法，该模板具有在基板和模具之间具有定位适形材料的模具，并且通过适形材料之间的毛细管作用在适形材料之间填充限定在模具和基板之间的体积，模具和基材之一。此后，使适形材料固化。具体地说，模具和基板之间的距离被控制到足够的程度以减小模具和基板之间的压缩力（如果不是避免的话）。结果，在模具与适形材料初次接触时，发生模具和基板之间的体积的自发毛细管填充。

4. 发明申请

US20060176466A1 Chucking system for modulating shapes of substrates 有权
公开(公告)号：US20060176466A1
公开(公告)日：2006-08-10
申请号：US11389731
申请日：2006-03-27
申请人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
发明人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
IPC分类号： G03B27/58
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.

5. 发明申请

US20060077374A1 Step and repeat imprint lithography systems 审中-公开
标题翻译：步骤和重复刻印光刻系统
公开(公告)号：US20060077374A1
公开(公告)日：2006-04-13
申请号：US11127060
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
发明人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
IPC分类号： G03B27/58
CPC分类号： B82Y10/00 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y40/00 , G03F7/0002 , H01L21/0271
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
摘要翻译：描述的是通过压印光刻来图案化衬底的系统。压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。该系统包括施加激活光以固化活化光可固化液体的光源。

6. 发明申请

US20060076717A1 Step and repeat imprint lithography processes 有权
公开(公告)号：US20060076717A1
公开(公告)日：2006-04-13
申请号：US11127041
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
发明人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
IPC分类号： B29C35/08 , B29C41/02 , B29C41/12
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.

7. 发明申请

US20060096949A1 Method of forming a compliant template for UV imprinting 有权
标题翻译：形成用于UV印记的兼容模板的方法
公开(公告)号：US20060096949A1
公开(公告)日：2006-05-11
申请号：US11298244
申请日：2005-12-09
申请人： Michael Watts , Ronald Voisin , Sidlgata Sreenivasan
发明人： Michael Watts , Ronald Voisin , Sidlgata Sreenivasan
IPC分类号： C23F1/00 , B44C1/22 , G03C5/00
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： In an embodiment of the present invention, the template is formed by forming a masking layer on a substrate; forming a pattern in the masking layer such that a portion of the substrate is exposed; etching one or more of the exposed portions of the substrate such that a relief image is formed in the substrate; removing the masking layer; coating the relief image with a release agent; depositing a conformal layer upon the substrate such that a portion of the conformal layer is arranged within the relief image formed in the substrate; arranging an elastomer layer on the conformal layer; arranging a substrate such that the elastomer layer is bonded between the conformal layer and the rigid substrate; and removing from the substrate the lithography template, where the lithography template includes the elastomer layer bonded between the rigid substrate and the conformal layer. In an exemplary embodiment, the template is formed by sequentially forming at least one elastomer layer on a substrate; forming an imprinting layer on the elastomer layer; forming a sacrificial layer on the imprinting layer; forming a masking layer on the sacrificial layer such that a portion of the sacrificial layer is exposed through the masking layer; etching one or more of the exposed portions of the sacrificial layer such that a portion of the imprinting layer is exposed through the masking layer; etching one or more of the exposed portions of the imprinting layer such that a relief image is formed; and removing the entire masking and sacrificial layers.
摘要翻译：在本发明的实施例中，通过在基板上形成掩模层来形成模板; 在所述掩蔽层中形成图案，使得所述基板的一部分露出; 蚀刻衬底的一个或多个暴露部分，使得在衬底中形成浮雕图像; 去除掩蔽层; 用脱模剂涂覆浮雕图像; 在所述基板上沉积共形层，使得所述共形层的一部分布置在形成在所述基板中的所述浮雕图像内; 在保形层上布置弹性体层; 布置基板，使得弹性体层结合在共形层和刚性基板之间; 以及从基板去除光刻模板，其中光刻模板包括结合在刚性基板和保形层之间的弹性体层。在一个示例性实施例中，模板通过在衬底上顺序地形成至少一个弹性体层而形成; 在弹性体层上形成压印层; 在压印层上形成牺牲层; 在所述牺牲层上形成掩模层，使得所述牺牲层的一部分通过所述掩模层露出; 蚀刻牺牲层的一个或多个暴露部分，使得压印层的一部分通过掩模层曝光; 蚀刻压印层的一个或多个曝光部分，使得形成浮雕图像; 并去除整个掩蔽层和牺牲层。

8. 发明申请

US20050236360A1 Compliant hard template for UV imprinting 有权
标题翻译：适用于UV印记的硬模板
公开(公告)号：US20050236360A1
公开(公告)日：2005-10-27
申请号：US10833240
申请日：2004-04-27
申请人： Michael Watts , Ronald Voisin , Sidlgata Sreenivasan
发明人： Michael Watts , Ronald Voisin , Sidlgata Sreenivasan
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： A compliant UV imprint lithography template, which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image and an elastomer adapted to adjust the relief image. In an embodiment, the relief image is arranged in a compliant imprinting layer where the elastomer is arranged between the imprinting layer and a rigid transparent substrate. In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer and an imprinting layer on a substrate and patterning a relief image into the imprinting layer, form the template.
摘要翻译：还可以充当热植入模板的兼容UV压印光刻模板及其制造方法。模板基本上包括浮雕图像和适于调整浮雕图像的弹性体。在一个实施例中，浮雕图像被布置在柔性压印层中，其中弹性体布置在压印层和刚性透明衬底之间。在一个实施例中，模板符合晶片表面。在一个实施例中，在基底上层叠弹性体和压印层并将浮雕图案图案化成压印层，形成模板。

9. 发明申请

US20060158651A1 Scatterometry alignment for imprint lithography 有权
标题翻译：刻印光刻的散射对准
公开(公告)号：US20060158651A1
公开(公告)日：2006-07-20
申请号：US11347198
申请日：2006-02-03
申请人： Michael Watts , Ian McMackin
发明人： Michael Watts , Ian McMackin
IPC分类号： G01B11/00
CPC分类号： B29C35/0888 , B29C59/022 , B29C59/026 , B29C2035/0827 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00
摘要： Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with a previously formed layer on a substrate, in one embodiment, is accomplished by using scatterometry.
摘要翻译：描述了通过压印光刻图案化衬底的方法。压印光刻是将液体分配到基板上的过程。使模板与液体接触并且液体被固化。固化液体包括在模板中形成的任何图案的印记。在一个实施例中，模板与衬底上预先形成的层的对准通过使用散射测量来实现。

10. 发明申请

US20070126150A1 Bifurcated contact printing technique 有权
标题翻译：分叉接触印刷技术
公开(公告)号：US20070126150A1
公开(公告)日：2007-06-07
申请号：US11303777
申请日：2005-12-16
申请人： Mahadevan GanapathiSubramanian , Byung-Jin Choi , Michael Miller , Nicholas Stacey , Michael Watts
发明人： Mahadevan GanapathiSubramanian , Byung-Jin Choi , Michael Miller , Nicholas Stacey , Michael Watts
IPC分类号： B29C43/02
CPC分类号： B29C43/021 , B29C33/444 , B29C43/003 , B29C43/50 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T156/10
摘要： A method for spreading a conformable material between a substrate and a template having a mold. The method comprises positioning the mold to be in superimposition with the substrate defining a volume therebetween. A first sub-portion of the volume is charged with the conformable material through capillary action between the conformable material and one of the mold and the substrate. A second sub-portion of the volume is filled with the conformable material by creating a deformation in the mold.
摘要翻译：一种在基材和具有模具的模板之间铺展适形材料的方法。所述方法包括将所述模具定位成与所述基板重叠以限定其间的体积。体积的第一子部分通过适形材料和模具和基底之一中的毛细管作用装入适形材料。通过在模具中产生变形，体积的第二子部分由适形材料填充。

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