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1. 发明申请

US20200156946A1 GRAPHENE AND HEXAGONAL BORON NITRIDE PLANES AND ASSOCIATED METHODS 审中-公开
公开(公告)号：US20200156946A1
公开(公告)日：2020-05-21
申请号：US16573804
申请日：2019-09-17
申请人： Chien-Min Sung , Shao Chung Hu , I-Chiao Lin , Chien-Pei Yu
发明人： Chien-Min Sung , Shao Chung Hu , I-Chiao Lin , Chien-Pei Yu
IPC分类号： C01B32/184 , B82Y30/00 , B82Y40/00 , C04B35/583 , C04B35/622 , C04B35/653 , H01L21/02 , C01B32/20 , C23C14/06
摘要： Graphene layers made of primarily sp2 bonded atoms and associated methods are disclosed. In one aspect, for example, a method of forming a graphite film can include heating a solid substrate under vacuum to a solubilizing temperature that is less than a melting point of the solid substrate, solubilizing carbon atoms from a graphite source into the heated solid substrate, and cooling the heated solid substrate at a rate sufficient to form a graphite film from the solubilized carbon atoms on at least one surface of the solid substrate. The graphite film is formed to be substantially free of lattice defects.

2. 发明申请

US20130052838A1 ANNEALING METHOD TO REDUCE DEFECTS OF EPITAXIAL FILMS AND EPITAXIAL FILMS FORMED THEREWITH 审中-公开
标题翻译：减少形成外源膜和外源膜的缺陷的退火方法
公开(公告)号：US20130052838A1
公开(公告)日：2013-02-28
申请号：US13336757
申请日：2011-12-23
申请人： I-Chiao Lin , Chien-Min Sung
发明人： I-Chiao Lin , Chien-Min Sung
IPC分类号： H01L21/26
CPC分类号： H01L21/3245
摘要： An annealing method to reduce defects of epitaxial films and epitaxial films formed therewith. The annealing method includes features as follows: apply a pressure ranged from 10 MPa to 6,000 MPa to an epitaxial film grown on a substrate through a vapor phase deposition process and heat the epitaxial film at a temperature lower than the melting temperature of the epitaxial film. Through applying pressure to the epitaxial film, the lattice strain of the epitaxial film is alleviated, and therefore the defect density of the epitaxial film also decreases.
摘要翻译：一种减少外延膜和由其形成的外延膜的缺陷的退火方法。退火方法的特征如下：通过气相沉积工艺将从10MPa至6,000MPa的压力施加到在基板上生长的外延膜，并在低于外延膜的熔融温度的温度下加热外延膜。通过对外延膜施加压力，可以减轻外延膜的晶格应变，因此外延膜的缺陷密度也降低。

3. 发明申请

US20180044185A1 GRAPHENE AND HEXAGONAL BORON NITRIDE PLANES AND ASSOCIATED METHODS 审中-公开
公开(公告)号：US20180044185A1
公开(公告)日：2018-02-15
申请号：US15444226
申请日：2017-02-27
申请人： Chien-Min Sung , Shao Chung Hu , I-Chiao Lin , Chien-Pei Yu
发明人： Chien-Min Sung , Shao Chung Hu , I-Chiao Lin , Chien-Pei Yu
IPC分类号： H01L21/02 , B82Y40/00 , C04B35/653 , C04B35/622 , C23C14/06 , B82Y30/00 , C04B35/583
CPC分类号： C01B32/184 , B82Y30/00 , B82Y40/00 , C01B32/20 , C04B35/583 , C04B35/62218 , C04B35/653 , C04B2235/3203 , C23C14/0605 , H01L21/0242 , H01L21/02425 , H01L21/02491 , H01L21/02527 , H01L21/0254 , H01L21/02573 , H01L21/02612 , H01L21/02625 , Y10S977/734 , Y10S977/842 , Y10S977/932 , Y10T428/24612 , Y10T428/31678
摘要： Graphene layers made of primarily sp2 bonded atoms and associated methods are disclosed. In one aspect, for example, a method of forming a graphite film can include heating a solid substrate under vacuum to a solubilizing temperature that is less than a melting point of the solid substrate, solubilizing carbon atoms from a graphite source into the heated solid substrate, and cooling the heated solid substrate at a rate sufficient to form a graphite film from the solubilized carbon atoms on at least one surface of the solid substrate. The graphite film is formed to be substantially free of lattice defects.

4. 发明授权

US08453916B2 Thermal conduction device and method for fabricating the same 有权
标题翻译：导热装置及其制造方法
公开(公告)号：US08453916B2
公开(公告)日：2013-06-04
申请号：US13004437
申请日：2011-01-11
申请人： Shao-Chung Hu , Hsing Hung , Hung-Cheng Lin , I-Chiao Lin , Chien-Min Sung
发明人： Shao-Chung Hu , Hsing Hung , Hung-Cheng Lin , I-Chiao Lin , Chien-Min Sung
IPC分类号： B23K31/02 , B22F7/00
CPC分类号： C09K5/00 , B32B5/16 , B32B15/20 , B32B2264/10 , B32B2307/302 , H01L23/3732 , H01L23/3733 , H01L23/3736 , H01L2924/0002 , Y10T428/25 , H01L2924/00
摘要： A thermal conduction device and a method for fabricating the same are disclosed. Firstly, arrange a plurality of diamond particles on a plane according to a predetermined pattern to form a diamond particle monolayer. Next, apply a forming process on a metal material such that the metal material forms a metal matrix wrapping the diamond particles to form a composite body including the diamond particle monolayer embedded in the metal matrix. Next, stack a plurality of the composite bodies and perform a heating process to join the metal matrixes to each other to form the thermal conduction device. The device is characterized in arranging diamond particles on a plane to form a two-dimensional monolayer structure and manufactured via assembling the two-dimensional monolayer structures to form a three-dimensional multilayer structure. By controlling the arrangement of the diamond particles, the thermal conduction device can have superior thermal conduction performance.
摘要翻译：公开了一种导热装置及其制造方法。首先，根据预定图案在平面上布置多个金刚石颗粒以形成金刚石颗粒单层。接下来，在金属材料上施加成形工艺，使得金属材料形成包裹金刚石颗粒的金属基体，以形成包含嵌入在金属基体中的金刚石颗粒单层的复合体。接下来，堆叠多个复合体并进行加热处理以将金属基体彼此接合以形成导热装置。该装置的特征在于在平面上布置金刚石颗粒以形成二维单层结构，并通过组装二维单层结构制造以形成三维多层结构。通过控制金刚石颗粒的布置，导热装置可以具有优异的导热性能。

5. 发明申请

US20100218801A1 Graphene and Hexagonal Boron Nitride Planes and Associated Methods 审中-公开
标题翻译：石墨烯和六角氮化硼飞机及相关方法
公开(公告)号：US20100218801A1
公开(公告)日：2010-09-02
申请号：US12713004
申请日：2010-02-25
申请人： Chien-Min Sung , Shao Chung Hu , I-Chiao Lin , Chien-Pei Yu
发明人： Chien-Min Sung , Shao Chung Hu , I-Chiao Lin , Chien-Pei Yu
IPC分类号： C23C14/06 , C23C14/24 , B32B15/04 , H01L31/042
CPC分类号： C01B32/184 , B82Y30/00 , B82Y40/00 , C01B32/20 , C04B35/583 , C04B35/62218 , C04B35/653 , C04B2235/3203 , C23C14/0605 , H01L21/0242 , H01L21/02425 , H01L21/02491 , H01L21/02527 , H01L21/0254 , H01L21/02573 , H01L21/02612 , H01L21/02625 , Y10S977/734 , Y10S977/842 , Y10S977/932 , Y10T428/24612 , Y10T428/31678
摘要： Graphene layers made of primarily sp2 bonded atoms and associated methods are disclosed. In one aspect, for example, a method of forming a graphite film can include heating a solid substrate under vacuum to a solubilizing temperature that is less than a melting point of the solid substrate, solubilizing carbon atoms from a graphite source into the heated solid substrate, and cooling the heated solid substrate at a rate sufficient to form a graphite film from the solubilized carbon atoms on at least one surface of the solid substrate. The graphite film is formed to be substantially free of lattice defects.
摘要翻译：公开了主要由sp2键合的原子制成的石墨烯层及相关方法。一方面，例如，形成石墨膜的方法可以包括在真空下将固体基质加热到小于固体基质的熔点的溶解温度，将碳原子从石墨源溶解到加热的固体基质中并且以足以从固体基底的至少一个表面上溶解的碳原子形成石墨膜的速率冷却加热的固体基质。石墨膜形成为基本上没有晶格缺陷。

6. 发明申请

US20170232576A1 CMP PAD CONDITIONERS WITH MOSAIC ABRASIVE SEGMENTS AND ASSOCIATED METHODS 审中-公开
公开(公告)号：US20170232576A1
公开(公告)日：2017-08-17
申请号：US15361166
申请日：2016-11-25
申请人： Chien-Min Sung
发明人： Chien-Min Sung
IPC分类号： B24B53/017 , B24B37/34 , B24B37/20
CPC分类号： B24B53/017 , B24B37/20 , B24B37/34
摘要： A CMP pad conditioner comprises a plurality of abrasive segments. Each abrasive segment includes a segment blank and an abrasive layer attached to the segment blank, the abrasive layer including a superhard abrasive material. A pad conditioner substrate is also provided. Each of the plurality of abrasive segments is permanently affixed to the pad conditioner substrate in an orientation that enables removal of material from a CMP pad by the abrasive layer as the pad conditioner and the CMP pad are moved relative to one another.

7. 发明授权

US09724802B2 CMP pad dressers having leveled tips and associated methods 有权
公开(公告)号：US09724802B2
公开(公告)日：2017-08-08
申请号：US14506476
申请日：2014-10-03
申请人： Chien-Min Sung
发明人： Chien-Min Sung
IPC分类号： B24B53/00 , B24B53/017 , B24B53/12 , B24D3/00
CPC分类号： B24B53/017 , B24B53/12 , B24D3/00
摘要： CMP pad dressers having leveled tips and associated methods are provided. In one aspect, for example, a CMP pad dresser can include a support substrate and a plurality of superabrasive particles secured to the support substrate with each superabrasive particle extending away from the support substrate to a protrusion distance, where a highest protruding tip of each of the plurality of superabrasive particles align along a designated profile with a tip variation of from about 5 microns to about 100 microns.

8. 发明授权

US09475169B2 System for evaluating and/or improving performance of a CMP pad dresser 有权
标题翻译：用于评估和/或改善CMP抛光垫修整器性能的系统
公开(公告)号：US09475169B2
公开(公告)日：2016-10-25
申请号：US14223726
申请日：2014-03-24
申请人： Chien-Min Sung
发明人： Chien-Min Sung
IPC分类号： B24B49/00 , B24D18/00 , B24B53/02 , B24B1/00 , B24B49/18 , B24B53/017 , B24D3/28
CPC分类号： B24B49/186 , B24B53/017 , B24D3/28
摘要： Methods and systems for evaluating and/or increasing CMP pad dresser performance are provided. In one aspect, for example, a method of identifying overly-aggressive superabrasive particles in a CMP pad dresser can include positioning a CMP pad dresser having a plurality of superabrasive particles on an indicator substrate such that at least a portion of the plurality of superabrasive particles of the CMP pad dresser contact the indicator substrate, and moving the CMP pad dresser across the indicator substrate in a first direction such that the portion of the plurality of superabrasive particles create a first marking pattern on the substrate, wherein the first marking pattern identifies a plurality of working superabrasive particles from among the plurality of superabrasive particles.
摘要翻译：提供了用于评估和/或增加CMP垫修整器性能的方法和系统。在一个方面，例如，在CMP抛光修整器中识别过度侵蚀性超研磨颗粒的方法可以包括将具有多个超研磨颗粒的CMP抛光垫修整器定位在指示剂基底上，使得多个超研磨颗粒的至少一部分所述CMP抛光修整器与所述指示器基板接触，并且沿着第一方向移动所述CMP抛光垫修整器穿过所述指示器基板，使得所述多个超级磨料颗粒的所述部分在所述基板上形成第一标记图案，其中所述第一标记图案标识多个超研磨颗粒中的多个工作超研磨颗粒。

9. 发明授权

US09370856B2 Brazed diamond tools and methods for making the same 有权
公开(公告)号：US09370856B2
公开(公告)日：2016-06-21
申请号：US13416201
申请日：2012-03-09
申请人： Chien-Min Sung
发明人： Chien-Min Sung
IPC分类号： B24D18/00 , B28D1/12 , B01J3/06 , B24D3/06
摘要： Superabrasive tools and methods for the making thereof are disclosed and described. In one aspect, superabrasive particles are chemically bonded to a matrix support material according to a predetermined pattern by a braze alloy. The brazing alloy may be provided as a powder, thin sheet, or sheet of amorphous alloy. A template having a plurality of apertures arranged in a predetermined pattern may be used to place the superabrasive particles on a given substrate or matrix support material.

10. 发明授权

US09138862B2 CMP pad dresser having leveled tips and associated methods 有权
标题翻译：具有调平技巧和相关方法的CMP抛光垫修整器
公开(公告)号：US09138862B2
公开(公告)日：2015-09-22
申请号：US13802112
申请日：2013-03-13
申请人： Chien-Min Sung
发明人： Chien-Min Sung
IPC分类号： B24B53/017
CPC分类号： B24B53/017 , B24B37/044 , H01L21/31055 , H01L21/3212
摘要： CMP pad dressers having leveled tips and associated methods are provided. In one aspect, for example, a method can include pressing a CMP pad dresser against a CMP pad, where the dresser includes a monolayer of a plurality of superabrasive particles protruding from a matrix layer. The difference in protrusion distance between the highest protruding tip and the second highest protruding tip of the monolayer of superabrasive particles is less than or equal to about 10 microns and the difference in protrusion distance between the highest 10 protruding tips of the monolayer of superabrasive particles are within about 20 microns or less. The method can further include rotating the dresser against the CMP pad such that asperities are cut into the CMP pad having a maximum cutting depth of about 60 microns.
摘要翻译：提供具有调平尖端和相关方法的CMP抛光垫修整器。在一个方面，例如，一种方法可以包括将CMP垫修整器压靠在CMP垫上，其中修整器包括从矩阵层突出的多个超级磨料颗粒的单层。超级磨料颗粒单层的最高突出尖端和第二高突出尖端之间的突出距离的差异小于或等于约10微米，并且超级磨料颗粒单层的最高10个突出尖端之间的突出距离的差异为在约20微米以内。该方法还可以包括将修整器旋转抵靠在CMP垫上，使得粗糙度被切割成具有大约60微米的最大切割深度的CMP垫。

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