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1. 发明申请

US20080022172A1 Apparatus for testing system-on-chip 失效
标题翻译：片上系统测试装置
公开(公告)号：US20080022172A1
公开(公告)日：2008-01-24
申请号：US11727572
申请日：2007-03-27
申请人： Hyun-Bean Yi , Jae-Hoon Song , Pil-Jae Min , Jin-Kyu Kim , Sung-Ju Park
发明人： Hyun-Bean Yi , Jae-Hoon Song , Pil-Jae Min , Jin-Kyu Kim , Sung-Ju Park
IPC分类号： G01R31/28
CPC分类号： G01R31/318563 , G06F11/2236
摘要： A system-on-chip (SoC) test apparatus is disclosed. The system-on-chip (SoC) testing apparatus reduces a test time due to a small amount of overhead in the case of testing an AMBA-based system-on-chip (SoC) using a TIC, an EBI, and a Test Harness, and maintains AMBA- or TIC- compatibility simultaneously while performing scan input/output operations.
摘要翻译：公开了片上系统（SoC）测试装置。在使用TIC，EBI和测试线路测试基于AMBA的片上系统（SoC）的情况下，片上系统（SoC）测试设备减少了由于少量开销的测试时间并且在执行扫描输入/输出操作时同时维持AMBA或TIC兼容性。

2. 发明授权

US07624320B2 Apparatus for testing system-on-chip 失效
标题翻译：片上系统测试装置
公开(公告)号：US07624320B2
公开(公告)日：2009-11-24
申请号：US11727572
申请日：2007-03-27
申请人： Hyun-Bean Yi , Jae-Hoon Song , Pil-Jae Min , Jin-Kyu Kim , Sung-Ju Park
发明人： Hyun-Bean Yi , Jae-Hoon Song , Pil-Jae Min , Jin-Kyu Kim , Sung-Ju Park
IPC分类号： G01R31/28
CPC分类号： G01R31/318563 , G06F11/2236
摘要： A system-on-chip (SoC) test apparatus is disclosed. The system-on-chip (SoC) testing apparatus reduces a test time due to a small amount of overhead in the case of testing an AMBA-based system-on-chip (SoC) using a TIC, an EBI, and a Test Harness, and maintains AMBA- or TIC- compatibility simultaneously while performing scan input/output operations.
摘要翻译：公开了片上系统（SoC）测试装置。在使用TIC，EBI和测试线路测试基于AMBA的片上系统（SoC）的情况下，片上系统（SoC）测试设备减少了由于少量开销的测试时间并且在执行扫描输入/输出操作时同时维持AMBA或TIC兼容性。

3. 发明申请

US20140185050A1 READER FOR URINE ANALYSIS 有权
标题翻译：阅读尿液分析
公开(公告)号：US20140185050A1
公开(公告)日：2014-07-03
申请号：US14119240
申请日：2011-09-08
申请人： Kyu-Dae Lee , Jae-Hoon Song , In-Hyuk Cha
发明人： Kyu-Dae Lee , Jae-Hoon Song , In-Hyuk Cha
IPC分类号： G01N21/17 , G01N33/493
CPC分类号： G01N21/17 , G01N21/4738 , G01N21/55 , G01N21/8483 , G01N33/493
摘要： A urine analysis device includes a light emitting part, a light receiving part and a control part. The light emitting part includes a plurality of light emitting diodes. The light emitting diodes provide a light to an inspected object. The inspected object has a plurality of inspected areas. The light receiving part receives the light reflected by the inspected object. The control part drives the light emitting part and receives an electric signal from the light receiving part.
摘要翻译：尿液分析装置包括发光部，受光部和控制部。发光部分包括多个发光二极管。发光二极管向被检查物体提供光。检查对象具有多个检查区域。光接收部接收被检查物体反射的光。控制部分驱动发光部分并从光接收部分接收电信号。

4. 发明授权

US07846825B2 Method of forming a contact hole and method of manufacturing a semiconductor device having the same 失效
标题翻译：形成接触孔的方法和制造具有该接触孔的半导体器件的方法
公开(公告)号：US07846825B2
公开(公告)日：2010-12-07
申请号：US12319406
申请日：2009-01-07
申请人： Nam-Jung Kang , Jae-Hoon Song , So-Hyun Ryu , Dong-Kwan Yang
发明人： Nam-Jung Kang , Jae-Hoon Song , So-Hyun Ryu , Dong-Kwan Yang
IPC分类号： H01L21/3205 , H01L21/4763
CPC分类号： H01L21/76816 , H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/76897 , H01L27/10855 , H01L27/10876 , H01L27/10888 , H01L27/10891 , H01L27/10894 , Y10S438/95
摘要： In a method of forming a contact hole and a method of manufacturing a semiconductor device having the same, a first insulation interlayer is formed on a substrate. A dummy pattern is formed on the first insulation interlayer. A second insulation interlayer is formed to cover the dummy pattern. A photoresist pattern is formed on the second insulation interlayer. The photoresist pattern has an exposed portion. The dummy pattern under the photoresist pattern is arranged to cross over the exposed portion of the photoresist pattern. The first and second insulation interlayers are etched using the photoresist pattern and the dummy pattern as an etching mask, to form a plurality of contact holes on both sides of the dummy pattern. Accordingly, the contact holes may be formed to have a smaller width.
摘要翻译：在形成接触孔的方法和制造具有该接触孔的半导体器件的方法中，在衬底上形成第一绝缘中间层。在第一绝缘中间层上形成虚拟图案。形成第二绝缘中间层以覆盖虚设图案。在第二绝缘中间层上形成光致抗蚀剂图案。光致抗蚀剂图案具有暴露部分。光致抗蚀剂图案下面的虚设图案被布置成与光致抗蚀剂图案的暴露部分交叉。使用光致抗蚀剂图案和伪图案作为蚀刻掩模来蚀刻第一和第二绝缘夹层，以在虚设图案的两侧上形成多个接触孔。因此，接触孔可以形成为具有较小的宽度。

5. 发明授权

US09250177B2 Reader for urine analysis 有权
标题翻译：尿液分析读者
公开(公告)号：US09250177B2
公开(公告)日：2016-02-02
申请号：US14119240
申请日：2011-09-08
申请人： Kyu-Dae Lee , Jae-Hoon Song , In-Hyuk Cha
发明人： Kyu-Dae Lee , Jae-Hoon Song , In-Hyuk Cha
IPC分类号： G01N21/55 , G01N21/17 , G01N21/47 , G01N33/493 , G01N21/84
CPC分类号： G01N21/17 , G01N21/4738 , G01N21/55 , G01N21/8483 , G01N33/493
摘要： A urine analysis device includes a light emitting part, a light receiving part and a control part. The light emitting part includes a plurality of light emitting diodes. The light emitting diodes provide a light to an inspected object. The inspected object has a plurality of inspected areas. The light receiving part receives the light reflected by the inspected object. The control part drives the light emitting part and receives an electric signal from the light receiving part.
摘要翻译：尿液分析装置包括发光部，受光部和控制部。发光部分包括多个发光二极管。发光二极管向被检查物体提供光。检查对象具有多个检查区域。光接收部接收被检查物体反射的光。控制部分驱动发光部分并从光接收部分接收电信号。

6. 发明申请

US20100237394A1 Semiconductor memory device 审中-公开
标题翻译：半导体存储器件
公开(公告)号：US20100237394A1
公开(公告)日：2010-09-23
申请号：US12659735
申请日：2010-03-19
申请人： Jai-Kyun Park , Hyeong-Sun Hong , Jong-Seop Lee , Yong-Il Kim , Yun-Sung Lee , Nam-Jung Kang , Jae-Hoon Song , Gil-Sub Kim
发明人： Jai-Kyun Park , Hyeong-Sun Hong , Jong-Seop Lee , Yong-Il Kim , Yun-Sung Lee , Nam-Jung Kang , Jae-Hoon Song , Gil-Sub Kim
IPC分类号： H01L27/108
CPC分类号： H01L27/0207 , H01L27/10855
摘要： A semiconductor memory device includes unit active regions, word lines extending in a first direction over the unit active region, bit lines extending on the word lines in a second direction substantially perpendicularly to the first direction, first pad contacts in contact with central portions of the unit active regions, the first pad contacts being arranged between the word lines, direct contacts electrically connected between the first pad contacts and the bit lines, second pad contacts in contact with edge portions of the unit active regions, the second pad contacts being arranged between the word lines and between the bit lines, buried contacts electrically connected to the second pad contacts, and capacitors electrically connected to the buried contacts.
摘要翻译：半导体存储器件包括单元有源区域，在单元有源区域上沿第一方向延伸的字线，沿着基本垂直于第一方向的第二方向在字线上延伸的位线，与第一方向的中心部分接触的第一焊盘触点所述第一焊盘触点布置在所述字线之间，直接触点电连接在所述第一焊盘触点和所述位线之间，所述第二焊盘触点与所述单元有源区域的边缘部分接触，所述第二焊盘触点布置在字线和位线之间，电连接到第二焊盘触点的埋入触点，以及电连接到埋入触点的电容器。

7. 发明申请

US20090181529A1 Method of forming a contact hole and method of manufacturing a semiconductor device having the same 失效
标题翻译：形成接触孔的方法和制造具有该接触孔的半导体器件的方法
公开(公告)号：US20090181529A1
公开(公告)日：2009-07-16
申请号：US12319406
申请日：2009-01-07
申请人： Nam-Jung Kang , Jae-Hoon Song , So-Hyun Ryu , Dong-Kwan Yang
发明人： Nam-Jung Kang , Jae-Hoon Song , So-Hyun Ryu , Dong-Kwan Yang
IPC分类号： H01L21/4763 , H01L21/3205
CPC分类号： H01L21/76816 , H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/76897 , H01L27/10855 , H01L27/10876 , H01L27/10888 , H01L27/10891 , H01L27/10894 , Y10S438/95
摘要： In a method of forming a contact hole and a method of manufacturing a semiconductor device having the same, a first insulation interlayer is formed on a substrate. A dummy pattern is formed on the first insulation interlayer. A second insulation interlayer is formed to cover the dummy pattern. A photoresist pattern is formed on the second insulation interlayer. The photoresist pattern has an exposed portion. The dummy pattern under the photoresist pattern is arranged to cross over the exposed portion of the photoresist pattern. The first and second insulation interlayers are etched using the photoresist pattern and the dummy pattern as an etching mask, to form a plurality of contact holes on both sides of the dummy pattern. Accordingly, the contact holes may be formed to have a smaller width.
摘要翻译：在形成接触孔的方法和制造具有该接触孔的半导体器件的方法中，在衬底上形成第一绝缘中间层。在第一绝缘中间层上形成虚拟图案。形成第二绝缘中间层以覆盖虚设图案。在第二绝缘中间层上形成光致抗蚀剂图案。光致抗蚀剂图案具有暴露部分。光致抗蚀剂图案下面的虚设图案被布置成与光致抗蚀剂图案的暴露部分交叉。使用光致抗蚀剂图案和伪图案作为蚀刻掩模来蚀刻第一和第二绝缘夹层，以在虚设图案的两侧上形成多个接触孔。因此，接触孔可以形成为具有较小的宽度。

8. 发明申请

US20060157671A1 Slurry for use in metal-chemical mechanical polishing and preparation method thereof 审中-公开
标题翻译：用于金属化学机械抛光的浆料及其制备方法
公开(公告)号：US20060157671A1
公开(公告)日：2006-07-20
申请号：US11326369
申请日：2006-01-06
申请人： Jin-Goo Park , Young-Jae Kang , Jae-Hoon Song , Jung-Soo Jang , Suk-Jo Jung , Jung-Hwan Byeon , Cheol-Jin Park , Seon-Yun Bae , Moon-Sung Kim
发明人： Jin-Goo Park , Young-Jae Kang , Jae-Hoon Song , Jung-Soo Jang , Suk-Jo Jung , Jung-Hwan Byeon , Cheol-Jin Park , Seon-Yun Bae , Moon-Sung Kim
IPC分类号： C09K13/00
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/3212
摘要： The present invention relates to a slurry for use in metal chemical-mechanical polishing (CMP) and a preparation method thereof. More particularly, the invention relates to a slurry for use in metal CMP, in which iron ions or divalent or higher valent metal ions are physico-chemically adsorbed on colloidal silica particles in the form of particles by a reduction, hydrolysis, impregnation or precipitation method, as well as a preparation method thereof. The slurry useful for metal CMP prepared according to the present invention has a uniform particle size distribution, and shows increased efficiencies as an oxidation catalyst and polishing slurry chemically adsorbed with metal particles, as compared to the prior metal CMP slurry distributed with metal ions. Also, the inventive slurry has long-term storage stability, since it does not show coagulation and precipitation phenomena even after it is stored for more than one year without a dispersant or a dispersion stabilizer. Furthermore, the prior fumed silica contains a large amount of environment-harmful substances for distribution stabilization, such as surfactants and amine compounds, whereas the inventive colloidal silica contains no environment-harmful substances as described above, and thus, is eco-friendly.
摘要翻译：本发明涉及一种用于金属化学机械抛光（CMP）的浆料及其制备方法。更具体地说，本发明涉及一种用于金属CMP的浆料，其中铁离子或二价或更高价金属离子通过还原，水解，浸渍或沉淀法物理化学吸附在颗粒形式的胶体二氧化硅颗粒上，以及其制备方法。与用金属离子分布的现有金属CMP浆料相比，用于根据本发明制备的金属CMP的浆料具有均匀的粒度分布，并且显示出作为氧化催化剂和与金属颗粒化学吸附的抛光浆料的效率提高。此外，本发明的浆料具有长期的储存稳定性，因为即使在没有分散剂或分散稳定剂的情况下储存一年以上也不会出现凝结和沉淀现象。此外，现有的热解法二氧化硅含有大量用于分布稳定化的环境有害物质，例如表面活性剂和胺化合物，而本发明的胶态二氧化硅不含有如上所述的环境有害物质，因此是环保的。

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