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    • 1. 发明申请
    • Diamond tool with metal plate inserted therein
    • 镶嵌有金属板的金刚石工具
    • US20050249560A1
    • 2005-11-10
    • US11118165
    • 2005-04-28
    • Hwan LeeSeo PyunSang LeeByung JinSang LeeTae UmYong ShimShin Kim
    • Hwan LeeSeo PyunSang LeeByung JinSang LeeTae UmYong ShimShin Kim
    • B23D61/00B23D61/04B28D1/12
    • B23D61/04B28D1/121Y10T407/26
    • Disclosed is a diamond tool having a metal plate inserted therein. Between abrasive layers containing diamond particles is inserted a ferrous or non-ferrous metal plate having a wear resistance lower than that of the abrasive layers such that a concave groove is spontaneously formed during a cutting process, thereby reducing the contact load with a workpiece to thereby avoid vibration (wobbling) of a shank, and providing a discharge path for smoothly removing cutting chips and the cooling water. In addition, the content of abrasives and the wear resistance of bonding material are uniformly constituted so that the shrinkage rate does not need to be considered during sintering and the manufacturing process can be simplified, thereby reducing the manufacturing cost and improving the productivity therefor. Furthermore, the area of the metal plate can be controlled, thereby enabling an easy design conforming to the working conditions with a workpiece.
    • 公开了一种金刚石工具,其中插入有金属板。 在含有金刚石颗粒的研磨层之间插入耐磨性低于研磨层的耐磨性的铁或非铁金属板,使得在切割过程中自发形成凹槽,从而减少与工件的接触载荷 避免柄的振动(摆动),并且提供用于平滑地去除切屑和冷却水的排出路径。 此外,研磨剂的含量和接合材料的耐磨性均匀地构成,使得在烧结期间不需要考虑收缩率,并且可以简化制造过程,从而降低制造成本并提高其生产率。 此外,可以控制金属板的面积,从而能够使与工件的工作条件相一致的简单设计。
    • 6. 发明申请
    • CHEMICAL-MECHANICAL POLISHING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES
    • 用于制造半导体器件的化学机械抛光装置
    • US20110171882A1
    • 2011-07-14
    • US12985048
    • 2011-01-05
    • Jong-sun AhnIn-seak HwangSoo-young TakShin KimOne-moon Chang
    • Jong-sun AhnIn-seak HwangSoo-young TakShin KimOne-moon Chang
    • B24B41/06B24B49/00
    • B24B37/10B24B49/12
    • A chemical-mechanical polishing (CMP) apparatus for manufacturing a semiconductor device. The apparatus includes: a spin chuck for supporting and rotating a semiconductor wafer; a polisher comprising a polishing pad for planarizing a surface of the semiconductor wafer, the polisher moving along the surface of the semiconductor wafer by a polishing arm; and a polisher supporting device for supporting the polisher and maintaining the polisher in a horizontal state, while polishing an edge part of the surface of the semiconductor wafer, in order to improve polishing uniformity of a center part and the edge part of the semiconductor wafer. Accordingly, polishing uniformity of the center part and edge part of the semiconductor wafer may be improved, and a height of the polisher supporting device may be optimized according to a polishing degree. Also, the polisher may be easily supported, wear and tear of the support head may be minimized, and the support head may function as a conditioner.
    • 一种用于制造半导体器件的化学机械抛光(CMP)装置。 该装置包括:用于支撑和旋转半导体晶片的旋转卡盘; 抛光机,包括用于平坦化半导体晶片的表面的抛光垫,抛光机通过抛光臂沿着半导体晶片的表面移动; 以及用于在抛光半导体晶片的表面的边缘部分的同时在支撑抛光机并将抛光机保持在水平状态的抛光机支撑装置,以便改善半导体晶片的中心部分和边缘部分的抛光均匀性。 因此,可以提高半导体晶片的中心部分和边缘部分的抛光均匀性,并且可以根据抛光度来优化抛光机支撑装置的高度。 此外,可以容易地支撑抛光机,可以使支撑头的磨损和撕裂最小化,并且支撑头可用作调节器。