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    • 3. 发明申请
    • CHEMICAL-MECHANICAL POLISHING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES
    • 用于制造半导体器件的化学机械抛光装置
    • US20110171882A1
    • 2011-07-14
    • US12985048
    • 2011-01-05
    • Jong-sun AhnIn-seak HwangSoo-young TakShin KimOne-moon Chang
    • Jong-sun AhnIn-seak HwangSoo-young TakShin KimOne-moon Chang
    • B24B41/06B24B49/00
    • B24B37/10B24B49/12
    • A chemical-mechanical polishing (CMP) apparatus for manufacturing a semiconductor device. The apparatus includes: a spin chuck for supporting and rotating a semiconductor wafer; a polisher comprising a polishing pad for planarizing a surface of the semiconductor wafer, the polisher moving along the surface of the semiconductor wafer by a polishing arm; and a polisher supporting device for supporting the polisher and maintaining the polisher in a horizontal state, while polishing an edge part of the surface of the semiconductor wafer, in order to improve polishing uniformity of a center part and the edge part of the semiconductor wafer. Accordingly, polishing uniformity of the center part and edge part of the semiconductor wafer may be improved, and a height of the polisher supporting device may be optimized according to a polishing degree. Also, the polisher may be easily supported, wear and tear of the support head may be minimized, and the support head may function as a conditioner.
    • 一种用于制造半导体器件的化学机械抛光(CMP)装置。 该装置包括:用于支撑和旋转半导体晶片的旋转卡盘; 抛光机,包括用于平坦化半导体晶片的表面的抛光垫,抛光机通过抛光臂沿着半导体晶片的表面移动; 以及用于在抛光半导体晶片的表面的边缘部分的同时在支撑抛光机并将抛光机保持在水平状态的抛光机支撑装置,以便改善半导体晶片的中心部分和边缘部分的抛光均匀性。 因此,可以提高半导体晶片的中心部分和边缘部分的抛光均匀性,并且可以根据抛光度来优化抛光机支撑装置的高度。 此外,可以容易地支撑抛光机,可以使支撑头的磨损和撕裂最小化,并且支撑头可用作调节器。
    • 6. 发明申请
    • Diamond tool with metal plate inserted therein
    • 镶嵌有金属板的金刚石工具
    • US20050249560A1
    • 2005-11-10
    • US11118165
    • 2005-04-28
    • Hwan LeeSeo PyunSang LeeByung JinSang LeeTae UmYong ShimShin Kim
    • Hwan LeeSeo PyunSang LeeByung JinSang LeeTae UmYong ShimShin Kim
    • B23D61/00B23D61/04B28D1/12
    • B23D61/04B28D1/121Y10T407/26
    • Disclosed is a diamond tool having a metal plate inserted therein. Between abrasive layers containing diamond particles is inserted a ferrous or non-ferrous metal plate having a wear resistance lower than that of the abrasive layers such that a concave groove is spontaneously formed during a cutting process, thereby reducing the contact load with a workpiece to thereby avoid vibration (wobbling) of a shank, and providing a discharge path for smoothly removing cutting chips and the cooling water. In addition, the content of abrasives and the wear resistance of bonding material are uniformly constituted so that the shrinkage rate does not need to be considered during sintering and the manufacturing process can be simplified, thereby reducing the manufacturing cost and improving the productivity therefor. Furthermore, the area of the metal plate can be controlled, thereby enabling an easy design conforming to the working conditions with a workpiece.
    • 公开了一种金刚石工具,其中插入有金属板。 在含有金刚石颗粒的研磨层之间插入耐磨性低于研磨层的耐磨性的铁或非铁金属板,使得在切割过程中自发形成凹槽,从而减少与工件的接触载荷 避免柄的振动(摆动),并且提供用于平滑地去除切屑和冷却水的排出路径。 此外,研磨剂的含量和接合材料的耐磨性均匀地构成,使得在烧结期间不需要考虑收缩率,并且可以简化制造过程,从而降低制造成本并提高其生产率。 此外,可以控制金属板的面积,从而能够使与工件的工作条件相一致的简单设计。
    • 9. 发明申请
    • System and method for grid MPI job allocation using file-based MPI initialization in grid computing system
    • 在网格计算系统中使用基于文件的MPI初始化的网格MPI作业分配的系统和方法
    • US20050198104A1
    • 2005-09-08
    • US11044557
    • 2005-01-27
    • Oh KwonJae HahmSang KimJong LeeHyung ParkKyung ParkShin KimKwang Koh
    • Oh KwonJae HahmSang KimJong LeeHyung ParkKyung ParkShin KimKwang Koh
    • G06F15/163G06F15/16
    • G06F9/5072
    • Disclosed is a file-based grid MPI job allocation system for a middleware-based grid computing system in which computers having a plurality of resources including an MPI program are distributed and connected to each other through a network, wherein the grid MPI job allocation system differentiates functions of a middleware and the MPI program, thereby achieving MPI initialization without intervention of a separate arbitration process. The job submission service module generates a file containing an address, a port number, etc. of each node, which are necessary for the MPI initialization, and sends the file to the job execution service module of the corresponding node. Each job execution service module executes the MPI job, and the MPI program waits for the generation of the file and then performs initialization by using the information in the file. The present invention clearly differentiates the jobs to be done by the MPI program and by the job submission service module in the middleware, thereby enabling the MPI program to be executed in the grid computing system regardless of the design of the middleware.
    • 公开了一种用于基于中间件的网格计算系统的基于文件的网格MPI作业分配系统,其中包括MPI程序的多个资源的计算机通过网络分布并彼此连接,其中网格MPI作业分配系统区分 中间件和MPI程序的功能,从而实现MPI初始化,而不需要单独的仲裁过程。 作业提交服务模块生成包含MPI初始化所需的每个节点的地址,端口号等的文件,并将该文件发送到相应节点的作业执行服务模块。 每个作业执行服务模块执行MPI作业,并且MPI程序等待文件的生成,然后使用文件中的信息执行初始化。 本发明明确区分由MPI程序和作业提交服务模块在中间件中完成的作业,从而使得能够在网格计算系统中执行MPI程序,而不管中间件的设计如何。