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1. 发明申请

US20070272356A1 MULTIPE ZONE CARRIER HEAD WITH FLEXIBLE MEMBRANE 有权
标题翻译：带有柔性膜的多区域载体头
公开(公告)号：US20070272356A1
公开(公告)日：2007-11-29
申请号：US11837412
申请日：2007-08-10
申请人： Hung Chen , Jeonghoon Oh , Tsz-Sin Siu , Thomas Brezoczky , Steven Zuniga
发明人： Hung Chen , Jeonghoon Oh , Tsz-Sin Siu , Thomas Brezoczky , Steven Zuniga
IPC分类号： C23F1/00
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.
摘要翻译：用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。

2. 发明申请

US20070202785A1 MULTI-CHAMBER CARRIER HEAD WITH A TEXTURED MEMBRANE 有权
标题翻译：带有纹理膜的多层车载头
公开(公告)号：US20070202785A1
公开(公告)日：2007-08-30
申请号：US11614940
申请日：2006-12-21
申请人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chen , Andrew Nagengast , Steven Zuniga , Thomas Brezoczky
发明人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chen , Andrew Nagengast , Steven Zuniga , Thomas Brezoczky
IPC分类号： B24B41/06
CPC分类号： B24B37/30 , B24B41/06 , B29C33/424 , B29C35/02 , B29K2023/00 , B29K2083/00 , B29K2995/0074 , B29L2031/755
摘要： A flexible membrane for use in a carrier head has a generally circular main portion with a lower surface, an annular outer portion for connection to a base assembly, and an annular flap extending from the main portion on a side opposite the lower surface for connection to the base assembly. At least one surface of the flap has a surface texture to prevent adhesion.
摘要翻译：用于载体头部的柔性膜具有大致圆形的主要部分，具有下表面，用于连接到基座组件的环形外部部分和从主体部分在与下表面相对的一侧延伸的环形挡片，用于连接到基座组件。翼片的至少一个表面具有表面纹理以防止粘附。

3. 发明申请

US20050211377A1 Multiple zone carrier head with flexible membrane 有权
标题翻译：带有柔性膜的多区域载体头
公开(公告)号：US20050211377A1
公开(公告)日：2005-09-29
申请号：US10810784
申请日：2004-03-26
申请人： Hung Chen , Jeonghoon Oh , Tsz-Sin Siu , Thomas Brezoczky , Steven Zuniga
发明人： Hung Chen , Jeonghoon Oh , Tsz-Sin Siu , Thomas Brezoczky , Steven Zuniga
IPC分类号： B24B37/04 , B44C1/22 , C23F1/00 , H01L21/68
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.
摘要翻译：用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。

4. 发明申请

US20060019582A1 Substrate removal from polishing tool 有权
标题翻译：抛光工具的基材去除
公开(公告)号：US20060019582A1
公开(公告)日：2006-01-26
申请号：US11004223
申请日：2004-12-02
申请人： Hung Chen , Steven Zuniga , Tsz-Sin Siu
发明人： Hung Chen , Steven Zuniga , Tsz-Sin Siu
IPC分类号： B24B1/00
CPC分类号： B24B37/345 , B24B37/30
摘要： Techniques for removing a substrate from a polishing pad are described. A substrate is pulled away from the polishing pad such that the edges of the substrate are pulled away from the polishing pad before the center of the substrate is pulled from the polishing pad.
摘要翻译：描述了从抛光垫去除衬底的技术。将衬底从抛光垫拉出，使得在从抛光垫拉出衬底的中心之前将衬底的边缘从抛光垫拉出。

5. 发明申请

US20070141954A1 Paired pivot arm 有权
标题翻译：配对枢轴臂
公开(公告)号：US20070141954A1
公开(公告)日：2007-06-21
申请号：US11438497
申请日：2006-05-22
申请人： Hung Chen , Steven Zuniga
发明人： Hung Chen , Steven Zuniga
IPC分类号： B24B51/00 , B24B7/30 , B24B29/00
CPC分类号： B24B37/345 , B24B41/005
摘要： The present invention relates to an apparatus and method for polishing semiconductor substrates. In one embodiment, two polishing heads are mounted on two independent pivoting arms that share one pivot point. Each of the pivoting arms enable the corresponding polishing head direct access to two polishing stations. The polishing system of the present invention provides flexibility and improves throughput.
摘要翻译：本发明涉及一种用于抛光半导体衬底的设备和方法。在一个实施例中，两个抛光头安装在共享一个枢转点的两个独立的旋转臂上。每个枢转臂使相应的抛光头可直接进入两个抛光台。本发明的抛光系统提供灵活性并提高生产量。

6. 发明申请

US20050245181A1 Vibration damping during chemical mechanical polishing 有权
标题翻译：化学机械抛光时的振动阻尼
公开(公告)号：US20050245181A1
公开(公告)日：2005-11-03
申请号：US11046189
申请日：2005-01-28
申请人： Hung Chen , Shijian Li , John White , Ramin Emami , Fred Redeker , Steven Zuniga , Ramakrishna Cheboli
发明人： Hung Chen , Shijian Li , John White , Ramin Emami , Fred Redeker , Steven Zuniga , Ramakrishna Cheboli
IPC分类号： B24B5/00 , B24B37/04 , B24B41/06
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing is described. The carrier head includes a backing assembly, a housing and a damping material. The backing assembly includes a substrate support surface. The housing is connectable to a drive shaft to rotate with the drive shaft about a rotation axis. In one implementation, the damping material is in a load path between the backing assembly and the housing to reduce transmission of vibrations from the backing assembly to the housing.
摘要翻译：描述了用于化学机械抛光的载体头。载体头包括背衬组件，壳体和阻尼材料。背衬组件包括基板支撑表面。壳体可连接到驱动轴，以驱动轴绕旋转轴线旋转。在一个实施方案中，阻尼材料位于背衬组件和壳体之间的负载路径中，以减少振动从背衬组件传递到壳体。

7. 发明申请

US20050191947A1 Retaining ring with shaped surface 有权
标题翻译：带环形表面的保持环
公开(公告)号：US20050191947A1
公开(公告)日：2005-09-01
申请号：US10988211
申请日：2004-11-12
申请人： Hung Chen , Steven Zuniga , Charles Garretson , Douglas McAllister , Jian Lin , Stacy Meyer , Sidney Huey , Jeonghoon Oh , Trung Doan , Jeffrey Schmidt , Martin Wohlert , Kerry Hughes , James Wang , Danny Cam Lu , Romain Beau De Lamenie , Venkata Balagani , Aden Allen , Michael Fong
发明人： Hung Chen , Steven Zuniga , Charles Garretson , Douglas McAllister , Jian Lin , Stacy Meyer , Sidney Huey , Jeonghoon Oh , Trung Doan , Jeffrey Schmidt , Martin Wohlert , Kerry Hughes , James Wang , Danny Cam Lu , Romain Beau De Lamenie , Venkata Balagani , Aden Allen , Michael Fong
IPC分类号： B24B37/32 , B24B1/00
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
摘要翻译：保持环可以通过机械加工或研磨环的底部表面而在底面形成成形轮廓。保持环的底面可以包括平坦的，倾斜的和弯曲的部分。可以使用专用于研磨保持环底面的机器进行研磨。在研磨期间，可以允许环围绕环的轴线自由旋转。保持环的底面可以具有弯曲或平坦的部分。

8. 发明授权

US06575825B2 CMP polishing pad 有权
标题翻译： CMP抛光垫
公开(公告)号：US06575825B2
公开(公告)日：2003-06-10
申请号：US09759858
申请日：2001-01-12
申请人： Robert D. Tolles , Steven T. Mear , Gopalakrishna B. Prabhu , Steven Zuniga , Hung Chen
发明人： Robert D. Tolles , Steven T. Mear , Gopalakrishna B. Prabhu , Steven Zuniga , Hung Chen
IPC分类号： B24D1102
CPC分类号： B24B37/26 , B24B37/16 , Y10S451/921
摘要： A polishing pad for use in a chemical mechanical polishing system is provided. The pad is mounted to a rotatable platen and comprises a polishing surface and a deflection surface which provides a desired degree of rigidity and compliance to the pad when brought into contact with a substrate. The deflection surface may comprise one or more passageways extending through the pad which vent to atmosphere. In one embodiment, the deflection area defines a raised area and a recessed area. The raised area provides a mounting surface for the platen while the recessed area allows for compliance of the pad. In another embodiment, the deflection area comprises a plurality of channels defining a plurality of slanted protrusions. The channels may be non-intersecting such that the slanted protrusions are elongated portions disposed on the pad. Alternatively, the channels may be intersecting such that the slanted protrusions are isolated from one another and are disposed on the pad in spaced relation.
摘要翻译：提供了一种用于化学机械抛光系统的抛光垫。衬垫安装到可旋转的压板上并且包括抛光表面和偏转表面，当与衬底接触时，该抛光表面和偏转表面提供期望的刚度和顺应性。偏转表面可以包括延伸穿过垫的一个或多个通道，其通向大气。在一个实施例中，偏转区域限定凸起区域和凹陷区域。凸起区域为压板提供安装表面，而凹陷区域允许焊盘的顺应性。在另一个实施例中，偏转区域包括限定多个倾斜突起的多个通道。通道可以不相交，使得倾斜突起是设置在垫上的细长部分。或者，通道可以相交，使得倾斜的突起彼此隔离并且以间隔的关系设置在垫上。

9. 发明申请

US20070082589A1 CARRIER HEAD WITH MULTIPLE CHAMBERS 有权
标题翻译：带有多个座椅的承载头
公开(公告)号：US20070082589A1
公开(公告)日：2007-04-12
申请号：US11245867
申请日：2005-10-06
申请人： Steven Zuniga , Hung Chen , Thomas Brezoczky , Steven Mear
发明人： Steven Zuniga , Hung Chen , Thomas Brezoczky , Steven Mear
IPC分类号： B24B29/00
CPC分类号： B24B37/30 , B24B49/16
摘要： A system for chemical mechanical polishing having a carrier head with pressurizeable chambers that can be configured into pressure zones is described. The system includes a carrier head with a membrane for contacting a substrate during polishing. Pressurizeable chambers behind the membrane are in communication with pressure inputs. The pressure inputs can each supply a different pressure to the pressurizeable chambers. Some of the pressurizeable chambers can be in communication with more than one pressure input. Zones of pressure can be arranged, where each zone includes one or more pressurizeable chambers. The zones can be configurable by altering the pressurizeable chambers that make up each zone.
摘要翻译：描述了一种用于化学机械抛光的系统，该系统具有可被构造成压力区的具有可加压室的载体头。该系统包括具有用于在抛光期间接触基底的膜的载体头部。膜后面的可加压室与压力输入连通。压力输入可以为可加压室提供不同的压力。一些可加压室可以与多于一个的压力输入连通。可以布置压力区域，其中每个区域包括一个或多个可加压室。这些区域可以通过改变构成每个区域的可加压室来配置。

10. 发明申请

US20060154580A1 Flexible membrane for multi-chamber carrier head 有权
标题翻译：多室载体头柔性膜
公开(公告)号：US20060154580A1
公开(公告)日：2006-07-13
申请号：US11321006
申请日：2005-12-28
申请人： Hung Chen , Jeonghoon Oh , Steven Zuniga
发明人： Hung Chen , Jeonghoon Oh , Steven Zuniga
IPC分类号： B24B29/00
CPC分类号： B24B37/30
摘要： A flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus has a central portion with an outer surface providing a substrate receiving surface, a perimeter portion for connecting the central portion to a base of the carrier head, and at least one flap extending from an inner surface of the central portion. The flap includes a laterally extending first section and a vertically extending second section connecting the laterally extending first section to the central portion.
摘要翻译：用于与基底化学机械抛光装置的载体头一起使用的柔性膜具有中心部分，其外表面提供基底接收表面，周边部分用于将中心部分连接到载体头部的基部，以及至少一个翼片从中心部分的内表面延伸。翼片包括横向延伸的第一部分和将横向延伸的第一部分连接到中心部分的垂直延伸的第二部分。

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