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1. 发明申请

US20070082589A1 CARRIER HEAD WITH MULTIPLE CHAMBERS 有权
标题翻译：带有多个座椅的承载头
公开(公告)号：US20070082589A1
公开(公告)日：2007-04-12
申请号：US11245867
申请日：2005-10-06
申请人： Steven Zuniga , Hung Chen , Thomas Brezoczky , Steven Mear
发明人： Steven Zuniga , Hung Chen , Thomas Brezoczky , Steven Mear
IPC分类号： B24B29/00
CPC分类号： B24B37/30 , B24B49/16
摘要： A system for chemical mechanical polishing having a carrier head with pressurizeable chambers that can be configured into pressure zones is described. The system includes a carrier head with a membrane for contacting a substrate during polishing. Pressurizeable chambers behind the membrane are in communication with pressure inputs. The pressure inputs can each supply a different pressure to the pressurizeable chambers. Some of the pressurizeable chambers can be in communication with more than one pressure input. Zones of pressure can be arranged, where each zone includes one or more pressurizeable chambers. The zones can be configurable by altering the pressurizeable chambers that make up each zone.
摘要翻译：描述了一种用于化学机械抛光的系统，该系统具有可被构造成压力区的具有可加压室的载体头。该系统包括具有用于在抛光期间接触基底的膜的载体头部。膜后面的可加压室与压力输入连通。压力输入可以为可加压室提供不同的压力。一些可加压室可以与多于一个的压力输入连通。可以布置压力区域，其中每个区域包括一个或多个可加压室。这些区域可以通过改变构成每个区域的可加压室来配置。

2. 发明申请

US20070068552A1 Ozonation for elimination of bacteria for wet processing systems 审中-公开
标题翻译：用于消除湿处理系统的细菌的臭氧化
公开(公告)号：US20070068552A1
公开(公告)日：2007-03-29
申请号：US11525532
申请日：2006-09-22
申请人： Bruce Willing , Daniel Forster , David Huo , Robert Tolles , Christopher Haynes , Steven Mear , David Paul , William Evans
发明人： Bruce Willing , Daniel Forster , David Huo , Robert Tolles , Christopher Haynes , Steven Mear , David Paul , William Evans
IPC分类号： B08B7/04 , B08B3/00 , B08B3/12
CPC分类号： B08B3/04 , B08B3/08 , B08B2203/005 , C02F1/78 , C02F9/005 , C02F2103/02 , C02F2201/782 , C11D11/0047 , G03F7/423 , H01L21/6704
摘要： In a first aspect, an apparatus adapted to clean a semiconductor device manufacturing component is provided. The apparatus includes an ozone module adapted to (1) obtain Ozone; (2) combine the Ozone with a fluid to generate ozonated fluid; and (3) deliver the ozonated fluid to the semiconductor device manufacturing component so as to clean the semiconductor device manufacturing component. Numerous other aspects are provided.
摘要翻译：在第一方面，提供一种适于清洁半导体器件制造部件的装置。该装置包括适于（1）获得臭氧的臭氧模块; （2）将臭氧与流体混合以产生臭氧化流体; 和（3）将臭氧化流体输送到半导体器件制造部件以清洁半导体器件制造部件。提供了许多其他方面。

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