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1. 发明申请

US20130160948A1 Plasma Processing Devices With Corrosion Resistant Components 审中-公开
标题翻译：具有耐腐蚀组件的等离子体处理装置
公开(公告)号：US20130160948A1
公开(公告)日：2013-06-27
申请号：US13370765
申请日：2012-02-10
申请人： Hong Shih , Lin Xu , Rajinder Dhindsa , John Daugherty , Yan Fang , Siwen Li
发明人： Hong Shih , Lin Xu , Rajinder Dhindsa , John Daugherty , Yan Fang , Siwen Li
IPC分类号： B05C5/02 , C23C16/50
CPC分类号： C23C16/50 , C23C16/06 , C23C16/56
摘要： In one embodiment, a plasma processing device may include a plasma processing chamber, a plasma region, an energy source, and a corrosion resistant component. The plasma processing chamber can be maintained at a vacuum pressure and can confine a plasma processing gas. The energy source can transmit energy into the plasma processing chamber and transform at least a portion of the plasma processing gas into plasma within the plasma region. The corrosion resistant component can be located within the plasma processing chamber. The corrosion resistant component can be exposed to the plasma processing gas and is not coincident with the plasma region. The corrosion resistant component may include an inner layer of stainless steel that is coated with an outer layer of Tantalum (Ta).
摘要翻译：在一个实施例中，等离子体处理装置可以包括等离子体处理室，等离子体区域，能量源和耐腐蚀部件。等离子体处理室可以保持在真空压力并且可以限制等离子体处理气体。能量源可以将能量传输到等离子体处理室中，并将至少一部分等离子体处理气体转化成等离子体区域内的等离子体。耐腐蚀组分可位于等离子体处理室内。耐腐蚀成分可暴露于等离子体处理气体中，与等离子体区域不一致。耐腐蚀部件可以包括涂覆有钽（Ta）的外层的不锈钢内层。

2. 发明授权

US08545639B2 Method of cleaning aluminum plasma chamber parts 有权
标题翻译：铝等离子体室部件的清洗方法
公开(公告)号：US08545639B2
公开(公告)日：2013-10-01
申请号：US13285203
申请日：2011-10-31
申请人： Hong Shih , John Daugherty , Dean J. Larson , Tuochuan Huang , Armen Avoyan , Jeremy Chang , Sivakami Ramanathan , Robert Anderson , Yan Fang , Duane Outka , Paul Mulgrew
发明人： Hong Shih , John Daugherty , Dean J. Larson , Tuochuan Huang , Armen Avoyan , Jeremy Chang , Sivakami Ramanathan , Robert Anderson , Yan Fang , Duane Outka , Paul Mulgrew
IPC分类号： C23G1/00 , C23G1/02 , B08B3/00
CPC分类号： H01J37/32853 , C11D7/08 , C11D11/0047 , H01J37/32862
摘要： A method of cleaning a surface of a component of a plasma chamber, wherein the component has an aluminum or anodized aluminum surface, the method including the steps of: soaking the surface of the component in a diluted sulfuric peroxide (DSP) solution; spray rinsing the surface with water following removal of the surface from the DSP solution; soaking the surface in a dilute nitric acid (HNO3) solution; spray rinsing the surface with water following removal of the surface from the dilute nitric acid solution; and repeating at least twice the steps of soaking the surface in dilute nitric acid followed by spray rinsing the surface.
摘要翻译：一种清洁等离子体室的部件的表面的方法，其中所述部件具有铝或阳极氧化的铝表面，所述方法包括以下步骤：将所述部件的表面浸入稀释的硫酸过氧化物（DSP）溶液中; 在从DSP溶液中除去表面后，用水冲洗表面; 将表面浸入稀硝酸（HNO3）溶液中; 在从稀硝酸溶液中除去表面后，用水冲洗表面; 并重复至少两次将表面浸入稀硝酸的步骤，然后喷淋冲洗该表面。

3. 发明申请

US20130104930A1 METHOD OF CLEANING ALUMINUM PLASMA CHAMBER PARTS 有权
标题翻译：清洁铝等离子体室部件的方法
公开(公告)号：US20130104930A1
公开(公告)日：2013-05-02
申请号：US13285203
申请日：2011-10-31
申请人： Hong Shih , John Daugherty , Dean J. Larson , Tuochuan Huang , Armen Avoyan , Jeremy Chang , Sivakami Ramanathan , Robert Anderson , Yan Fang , Duane Outka , Paul Mulgrew
发明人： Hong Shih , John Daugherty , Dean J. Larson , Tuochuan Huang , Armen Avoyan , Jeremy Chang , Sivakami Ramanathan , Robert Anderson , Yan Fang , Duane Outka , Paul Mulgrew
IPC分类号： C23G1/02
CPC分类号： H01J37/32853 , C11D7/08 , C11D11/0047 , H01J37/32862
摘要： A method of cleaning a surface of a component of a plasma chamber, wherein the component has an aluminum or anodized aluminum surface, the method including the steps of: soaking the surface of the component in a diluted sulfuric peroxide (DSP) solution; spray rinsing the surface with water following removal of the surface from the DSP solution; soaking the surface in a dilute nitric acid (HNO3) solution; spray rinsing the surface with water following removal of the surface from the dilute nitric acid solution; and repeating at least twice the steps of soaking the surface in dilute nitric acid followed by spray rinsing the surface.
摘要翻译：一种清洁等离子体室的部件的表面的方法，其中所述部件具有铝或阳极氧化的铝表面，所述方法包括以下步骤：将所述部件的表面浸入稀释的硫酸过氧化物（DSP）溶液中; 在从DSP溶液中除去表面后，用水冲洗表面; 将表面浸入稀硝酸（HNO3）溶液中; 在从稀硝酸溶液中除去表面后，用水冲洗表面; 并重复至少两次将表面浸入稀硝酸的步骤，然后喷淋冲洗该表面。

4. 发明授权

US09293305B2 Mixed acid cleaning assemblies 有权
标题翻译：混合酸洗组件
公开(公告)号：US09293305B2
公开(公告)日：2016-03-22
申请号：US13483566
申请日：2012-05-30
申请人： Armen Avoyan , Cliff La Croix , Hong Shih , John Daugherty
发明人： Armen Avoyan , Cliff La Croix , Hong Shih , John Daugherty
IPC分类号： B08B3/08 , H01J37/32 , B08B9/032 , B08B3/04 , C23C16/44
CPC分类号： H01J37/3288 , B08B3/04 , B08B3/08 , B08B9/0323 , B08B9/0328 , C23C16/4407 , H01J37/3244 , H01J37/32889
摘要： In one embodiment, a cleaning assembly may include a modular electrode sealing housing, an acid injection inlet, and a fluid injection inlet. The modular electrode sealing housing may include a high pressure closure member that contains a first cleaning volume and a low pressure closure member that contains a second cleaning volume. The acid injection inlet can be in fluid communication with the first cleaning volume of the high pressure closure member. The fluid injection inlet can be in fluid communication with the second cleaning volume of the low pressure closure member. During normal operation, a showerhead electrode can be sealed within the modular electrode sealing housing such that the first cleaning volume is located on a first side and the second cleaning volume is located on a second side of the showerhead electrode.
摘要翻译：在一个实施例中，清洁组件可以包括模块化电极密封壳体，酸注射入口和流体注射入口。模块化电极密封壳体可以包括包含第一清洁体积的高压关闭构件和包含第二清洁体积的低压关闭构件。酸注入口可以与高压关闭构件的第一清洁体积流体连通。流体注射入口可以与低压关闭构件的第二清洁体积流体连通。在正常操作期间，喷头电极可以密封在模块化电极密封壳体内，使得第一清洁体积位于第一侧上，第二清洁体积位于喷头电极的第二侧。

5. 发明授权

US08097105B2 Extending lifetime of yttrium oxide as a plasma chamber material 有权
标题翻译：延长氧化钇的寿命作为等离子体室材料
公开(公告)号：US08097105B2
公开(公告)日：2012-01-17
申请号：US11652048
申请日：2007-01-11
申请人： Hong Shih , Duane Outka , Shenjian Liu , John Daugherty
发明人： Hong Shih , Duane Outka , Shenjian Liu , John Daugherty
IPC分类号： C03B29/00
CPC分类号： H01J9/24 , H01J37/32467 , H01J37/32495 , Y10T29/4973
摘要： Two methods of extending the lifetime of yttrium oxide as a plasma chamber material are provided. One method comprises making a three-layer component of a plasma processing chamber by co-sintering a dual-layer green body where one layer comprises ceramic particles and a second layer comprises yttria particles. The two layers are in intimate contact during the sintering process. In a preferred embodiment, the three layer component comprises an outer layer of yttria, an intermediate layer of YAG, and a second outer layer of alumina. Optionally, the disks are pressed together during the sintering process. The resulting three-layer component is very low in porosity. Preferably, the porosity of any of the outer layer of yttria, the intermediate layer of YAG, and the second outer layer of alumina, is less than 3%. The second method comprises sealing an yttria plasma spray coated component by applying a liquid anaerobic sealant with a room temperature viscosity of less than 50 cP to the component by brushing the sealant on all yttria surfaces of the component, wet cleaning the component, curing the wet cleaned component for over 2 hours at a temperature of at least 150° C. in an N2 environment; and, applying a second sealant coat to the cured substrate by repeating the procedure used to apply the first coat.
摘要翻译：提供延长作为等离子体室材料的氧化钇的寿命的两种方法。一种方法包括通过共同烧结双层生坯，制造等离子体处理室的三层组分，其中一层包含陶瓷颗粒，第二层包含氧化钇颗粒。两层在烧结过程中紧密接触。在优选的实施方案中，三层组分包括氧化钇的外层，YAG的中间层和氧化铝的第二外层。可选地，在烧结过程中将盘压在一起。所得到的三层组分的孔隙率非常低。优选地，氧化钇的外层，YAG的中间层和氧化铝的第二外层中的任一个的孔隙率小于3％。第二种方法包括通过将组分的所有氧化钇表面上的密封剂刷刷，将零件的室温粘度低于50cP的液体厌氧密封剂施加到组分上来密封氧化钇等离子喷涂组分，湿清洗组分，固化湿在N2环境中在至少150℃的温度下清洁组分超过2小时; 并且通过重复用于施加第一涂层的程序将第二密封剂涂层施加到固化的基底上。

6. 发明授权

US09623449B2 Dielectric window cleaning apparatuses 有权
公开(公告)号：US09623449B2
公开(公告)日：2017-04-18
申请号：US13442223
申请日：2012-04-09
申请人： Armen Avoyan , Hong Shih , Cliff LaCroix , John Daugherty
发明人： Armen Avoyan , Hong Shih , Cliff LaCroix , John Daugherty
IPC分类号： B08B3/02
CPC分类号： B08B3/024 , B08B3/022
摘要： A dielectric window cleaning apparatus may be used for cleaning a dielectric window of a plasma processing device. The dielectric window cleaning apparatus may comprise a window support base, a fluid containing enclosure, a window rotating mechanism, a spray arm, and multiple fluid spraying nozzles. The fluid containing enclosure may include at least one overflow containment sidewall and may be located at least partially under and at least partially around a portion of the window support base. The window rotating mechanism may be operatively connected to the window support base and may rotate the window support base. The spray arm may be in fluid communication with a fluid source and may include a fluid flow channel. The multiple fluid spraying nozzles may each expel fluid from the fluid flow channel in a window cleansing spray.

7. 发明授权

US08585844B2 Extending lifetime of yttrium oxide as a plasma chamber material 有权
标题翻译：延长氧化钇的寿命作为等离子体室材料
公开(公告)号：US08585844B2
公开(公告)日：2013-11-19
申请号：US13324287
申请日：2011-12-13
申请人： Hong Shih , Duane Outka , Shenjian Liu , John Daugherty
发明人： Hong Shih , Duane Outka , Shenjian Liu , John Daugherty
IPC分类号： B32B17/00
CPC分类号： H01J9/24 , H01J37/32467 , H01J37/32495 , Y10T29/4973
摘要： A method of installing a component of a plasma processing chamber by replacing a used component with a component made by forming a dual-layer green body and co-sintering the dual-layer green body so as to form a three-layer component. The three layer component comprises an outer layer of yttria, an intermediate layer of YAG, and a second outer layer of alumina. The component is installed such that the outer layer of yttria is exposed to the plasma environment when the chamber is in operation.
摘要翻译：通过用通过形成双层生坯制成的部件代替使用的部件并共同烧结双层生坯以形成三层部件来安装等离子体处理室的部件的方法。三层组件包括氧化钇的外层，YAG的中间层和氧化铝的第二外层。安装该部件使得当腔室运行时，氧化钇的外层暴露于等离子体环境中。

8. 发明申请

US20130104938A1 Methods For Mixed Acid Cleaning Of Showerhead Electrodes 有权
标题翻译：淋浴头电极混合酸洗方法
公开(公告)号：US20130104938A1
公开(公告)日：2013-05-02
申请号：US13483597
申请日：2012-05-30
申请人： Armen Avoyan , Cliff La Croix , Hong Shih , John Daugherty
发明人： Armen Avoyan , Cliff La Croix , Hong Shih , John Daugherty
IPC分类号： B08B9/00
CPC分类号： H01J37/3288 , B08B3/04 , B08B3/08 , B08B9/0323 , B08B9/0328 , C23C16/4407 , H01J37/3244 , H01J37/32889
摘要： In one embodiment, a method for cleaning a showerhead electrode my include sealing a showerhead electrode within a cleaning assembly such that a first cleaning volume is formed on a first side of the showerhead electrode and a second cleaning volume is formed on a second side of the showerhead electrode. An acidic solution can be loaded into the first cleaning volume on the first side of the showerhead electrode. The first cleaning volume on the first side of the showerhead electrode can be pressurized such that at least a portion of the acidic solution flows through one or more of the plurality of gas passages of the showerhead electrode. An amount of purified water can be propelled through the second cleaning volume on the second side of the showerhead electrode, and into contact with the second side of the showerhead electrode.
摘要翻译：在一个实施例中，一种用于清洁喷头电极的方法包括将喷头电极密封在清洁组件内，使得在喷头电极的第一侧上形成第一清洁体积，并且在第二侧面上形成第二清洁体积喷头电极酸性溶液可以装载到喷头电极的第一侧上的第一清洁体积中。可以对喷头电极的第一侧上的第一清洁体积进行加压，使得至少一部分酸性溶液流过喷头电极的多个气体通道中的一个或多个。净化水的量可以通过喷头电极第二侧上的第二清洁体积推进，并与喷头电极的第二侧接触。

9. 发明申请

US20130100278A1 AUTOMATED BUBBLE DETECTION APPARATUS AND METHOD 有权
标题翻译：自动气泡检测装置及方法
公开(公告)号：US20130100278A1
公开(公告)日：2013-04-25
申请号：US13276837
申请日：2011-10-19
申请人： Josh Cormier , Fangli Hao , Hong Shih , Tuochuan Huang , John Daugherty , Allan Ronne , Fred Dennis Egley
发明人： Josh Cormier , Fangli Hao , Hong Shih , Tuochuan Huang , John Daugherty , Allan Ronne , Fred Dennis Egley
IPC分类号： H04N7/18
CPC分类号： G01N17/02 , C25D11/04 , G01N21/272 , G06T2200/28
摘要： An automated hydrogen bubble detection apparatus includes a horizontal support surface on which a test coupon can be supported, a transparent tube having an open top and an open bottom and operable to contain a test solution when positioned on a test coupon, a camera arranged to view a test solution in the transparent tube, and a controller in communication with the camera and effective to operate the camera such that at least one video segment is recorded by the camera and analyzed to detect first bubble and continuous bubble generation. A method of evaluating corrosion resistance of coatings on aluminum and steel in acidic solution is also included.
摘要翻译：自动化氢气泡检测装置包括水平支撑表面，在该水平支撑表面上可以支撑试样，具有开口顶部和开口底部的透明管，并且可操作地在测试试样上放置测试溶液时，可以将相机布置成观察在透明管中的测试解决方案，以及与相机通信并且有效地操作相机的控制器，使得至少一个视频段由相机记录并分析以检测第一个气泡和连续的气泡产生。也包括评估铝和钢在酸性溶液中的涂层耐腐蚀性的方法。

10. 发明授权

US08022718B2 Method for inspecting electrostatic chucks with Kelvin probe analysis 有权
标题翻译：用开尔文探头分析检查静电卡盘的方法
公开(公告)号：US08022718B2
公开(公告)日：2011-09-20
申请号：US12392498
申请日：2009-02-25
申请人： Armen Avoyan , Hong Shih , John Daugherty
发明人： Armen Avoyan , Hong Shih , John Daugherty
IPC分类号： G01R31/20
CPC分类号： H01L21/6833 , H01L21/67069 , H01L21/67253
摘要： A method of inspecting an electrostatic chuck (ESC) is provided. The ESC has a dielectric support surface for a semiconductor wafer. The dielectric support surface is scanned with a Kelvin probe to obtain a surface potential map. The surface potential map is compared with a reference Kelvin probe surface potential map to determine if the ESC passes inspection.
摘要翻译：提供了一种检查静电卡盘（ESC）的方法。 ESC具有用于半导体晶片的电介质支撑表面。用开尔文探针扫描电介质支撑表面以获得表面电位图。将表面电位图与参考开尔文探针表面电位图进行比较，以确定ESC是否通过检查。

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