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1. 发明授权

US07902521B2 Method for focusing electron beam in electron column 有权
标题翻译：电子束聚焦电子束的方法
公开(公告)号：US07902521B2
公开(公告)日：2011-03-08
申请号：US12096095
申请日：2006-12-05
申请人： Ho Seob Kim , Seung Joon Ahn , Dae Wook Kim , Young Chul Kim
发明人： Ho Seob Kim , Seung Joon Ahn , Dae Wook Kim , Young Chul Kim
IPC分类号： H01J37/06 , H01J37/12
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to the present invention reduces the spot size of the electron beam when the electron beam reaches a specimen, so that resolution can be increased and the line width of a pattern in a semiconductor lithography process can be reduced, with the result that the performance of the electron can be improved.
摘要翻译：本发明涉及一种改善产生电子束的电子束聚焦的方法。根据本发明的用于控制电子束的聚焦的方法当电子束到达样本时减小了电子束的光斑尺寸，从而可以提高分辨率，并且半导体光刻工艺中的图案的线宽可以减少，结果可以提高电子的性能。

2. 发明申请

US20090200482A1 Method for Focusing Electron Beam in Electron Column 有权
标题翻译：电子束聚焦电子束的方法
公开(公告)号：US20090200482A1
公开(公告)日：2009-08-13
申请号：US12096095
申请日：2006-12-05
申请人： Ho Seob Kim , Seung Joon Ahn , Dae Wook Kim , Young Chul Kim
发明人： Ho Seob Kim , Seung Joon Ahn , Dae Wook Kim , Young Chul Kim
IPC分类号： H01J3/14
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to the present invention reduces the spot size of the electron beam when the electron beam reaches a specimen, so that resolution can be increased and the line width of a pattern in a semiconductor lithography process can be reduced, with the result that the performance of the electron can be improved.
摘要翻译：本发明涉及一种改善产生电子束的电子束聚焦的方法。根据本发明的用于控制电子束的聚焦的方法当电子束到达样本时减小了电子束的光斑尺寸，从而可以提高分辨率，并且半导体光刻工艺中的图案的线宽可以减少，结果可以提高电子的性能。

3. 发明授权

US09666407B2 Electrostatic quadrupole deflector for microcolumn 有权
公开(公告)号：US09666407B2
公开(公告)日：2017-05-30
申请号：US14631330
申请日：2015-02-25
申请人： Tae Sik Oh , Ho Seob Kim , Dae Wook Kim
发明人： Tae Sik Oh , Ho Seob Kim , Dae Wook Kim
IPC分类号： H01J37/147 , H01J37/073 , H01J37/26 , H01J9/02
CPC分类号： H01J37/1477 , H01J9/02 , H01J37/073 , H01J37/26 , H01J2237/04924 , H01J2237/1516
摘要： Disclosed is an electrostatic quadrupole deflector for a microcolumn. The deflector includes an electron beam passage hole, deflecting electrodes to which a deflection voltage is applied, and floating electrodes to which the deflection voltage is not applied. The deflector is structurally stable and has a simple driving system. The deflector has good performance and characteristics.

4. 发明申请

US20140209813A1 MULTI-PARTICLE BEAM COLUMN HAVING AN ELECTRODE LAYER INCLUDING AN ECCENTRIC APERTURE 有权
标题翻译：具有电极层的多颗粒束柱，包括偏心孔
公开(公告)号：US20140209813A1
公开(公告)日：2014-07-31
申请号：US13752040
申请日：2013-01-28
申请人： Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
发明人： Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
IPC分类号： G21K1/08
CPC分类号： G21K5/04 , H01J37/045 , H01J37/28 , H01J2237/045 , H01J2237/15 , H01J2237/30483
摘要： Disclosed herein is a multi-particle beam column including electrode layer with eccentric apertures. The multi-particle beam column includes two or more particle beam columns each comprising a particle beam emission source, a deflector, and two or more electrode layers. The multi-particle beam column includes at least one electrode layer having one or more apertures that are eccentric from respective beam optical axes of the particle beam columns.
摘要翻译：本文公开了包括具有偏心孔的电极层的多粒子束柱。多粒子束柱包括两个或更多个粒子束柱，每个粒子束柱包括粒子束发射源，偏转器和两个或更多个电极层。多粒子束柱包括至少一个具有一个或多个孔的至少一个电极层，所述孔径与颗粒束柱的各个光束轴线偏心。

5. 发明授权

US08890092B2 Multi-particle beam column having an electrode layer including an eccentric aperture 有权
标题翻译：多粒子束柱具有包括偏心孔的电极层
公开(公告)号：US08890092B2
公开(公告)日：2014-11-18
申请号：US13752040
申请日：2013-01-28
申请人： Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
发明人： Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
IPC分类号： G21K5/00 , G21K1/08 , G21K5/04
CPC分类号： G21K5/04 , H01J37/045 , H01J37/28 , H01J2237/045 , H01J2237/15 , H01J2237/30483
摘要： Disclosed herein is a multi-particle beam column including electrode layer with eccentric apertures. The multi-particle beam column includes two or more particle beam columns each comprising a particle beam emission source, a deflector, and two or more electrode layers. The multi-particle beam column includes at least one electrode layer having one or more apertures that are eccentric from respective beam optical axes of the particle beam columns.
摘要翻译：本文公开了包括具有偏心孔的电极层的多粒子束柱。多粒子束柱包括两个或更多个粒子束柱，每个粒子束柱包括粒子束发射源，偏转器和两个或更多个电极层。多粒子束柱包括至少一个具有一个或多个孔的至少一个电极层，所述孔径与颗粒束柱的各个光束轴线偏心。

6. 发明授权

US08071955B2 Magnetic deflector for an electron column 有权
标题翻译：用于电子柱的磁偏转器
公开(公告)号：US08071955B2
公开(公告)日：2011-12-06
申请号：US12600266
申请日：2008-05-15
申请人： Ho Seob Kim , Young Chul Kim
发明人： Ho Seob Kim , Young Chul Kim
IPC分类号： H01J3/26 , H01J37/14 , H01J37/147
CPC分类号： H01J37/147 , H01J37/153 , H01J37/28 , H01J2237/1205 , H01J2237/152 , H01J2237/1532
摘要： The present invention relates, in general, to a deflector for microcolumns for generating electron beams, and, more particularly, to a deflector capable of scanning or shifting electron beams or functioning as a stigmator using a magnetic field. The deflector (100) according to the present invention includes one or more deflector electrodes. Each of the deflector electrodes includes a core (12) made of a conductor or a semiconductor, and a coil (11) wound around the core (12).
摘要翻译：本发明一般涉及用于产生电子束的微柱偏转器，更具体地，涉及一种能够扫描或移动电子束或用作使用磁场的标称器的偏转器。根据本发明的偏转器（100）包括一个或多个偏转器电极。每个偏转器电极包括由导体或半导体制成的芯体（12）和缠绕在芯部（12）上的线圈（11）。

7. 发明申请

US20100148086A1 MAGNETIC DEFLECTOR FOR AN ELECTRON COLUMN 有权
标题翻译：用于电子柱的磁性偏转器
公开(公告)号：US20100148086A1
公开(公告)日：2010-06-17
申请号：US12600266
申请日：2008-05-15
申请人： Ho Seob Kim , Young Chul Kim
发明人： Ho Seob Kim , Young Chul Kim
IPC分类号： H01J3/26 , H01F7/00
CPC分类号： H01J37/147 , H01J37/153 , H01J37/28 , H01J2237/1205 , H01J2237/152 , H01J2237/1532
摘要： The present invention relates, in general, to a deflector for microcolumns for generating electron beams, and, more particularly, to a deflector capable of scanning or shifting electron beams or functioning as a stigmator using a magnetic field. The deflector (100) according to the present invention includes one or more deflector electrodes. Each of the deflector electrodes includes a core (12) made of a conductor or a semiconductor, and a coil (11) wound around the core (12).
摘要翻译：本发明一般涉及用于产生电子束的微柱偏转器，更具体地，涉及一种能够扫描或移动电子束或用作使用磁场的标称器的偏转器。根据本发明的偏转器（100）包括一个或多个偏转器电极。每个偏转器电极包括由导体或半导体制成的芯体（12）和缠绕在芯部（12）上的线圈（11）。

8. 发明授权

US08912506B2 Device for sustaining differential vacuum degrees for electron column 有权
标题翻译：用于维持电子柱的差分真空度的装置
公开(公告)号：US08912506B2
公开(公告)日：2014-12-16
申请号：US12278219
申请日：2007-02-02
申请人： Ho Seob Kim
发明人： Ho Seob Kim
IPC分类号： G01F23/00 , H01J37/18
CPC分类号： H01J37/18 , H01J2237/1205 , H01J2237/188
摘要： Disclosed is a device for sustaining different vacuum degrees for an electron column, including an electron emitter, a lens part, and a housing for securing them, to maintain the electron column and a sample under different vacuum degrees. The device comprises a column housing coupling part coupled to the housing to isolate a vacuum; a hollow part defined through the center portion of the device to allow an electron beam emitted from the electron column to pass therethrough; and a vacuum isolation part having a structure of a gasket for vacuum coupling, wherein a difference of no less than 10 torr in a vacuum degree is maintained between both sides of the device by selecting an appropriate diameter of a lens electrode layer which is finally positioned in a path along which the electron beam is emitted or by using the hollow part.
摘要翻译：公开了一种用于维持用于电子柱的不同真空度的装置，包括电子发射器，透镜部分和用于固定它们的壳体，以保持电子柱和样品处于不同的真空度。该装置包括一个联接到壳体上的柱壳体联接部分以隔离真空; 通过装置的中心部分限定出允许从电子塔发射的电子束通过的中空部分; 以及具有用于真空联接的衬垫的结构的真空隔离部分，其中通过选择最终定位的透镜电极层的适当直径，在装置的两侧之间保持真空度不小于10托的差异在发射电子束的路径中或通过使用中空部分。

9. 发明申请

US20110079731A1 MULTIPOLE LENS FOR ELECTRON COLUMN 审中-公开
标题翻译：电子管多镜头
公开(公告)号：US20110079731A1
公开(公告)日：2011-04-07
申请号：US12994944
申请日：2009-05-27
申请人： Ho Seob Kim
发明人： Ho Seob Kim
IPC分类号： H01J3/18
CPC分类号： H01J37/12 , H01J37/28 , H01J2237/1205 , H01J2237/121 , H01J2237/153 , H01J2237/1532 , H01J2237/1534 , H01J2237/1536
摘要： The present invention relates to an electron lens for use in an microcolumn, and more particularly to a multipole electron lens wherein the electron lens includes two or more electrode layers, each of the electrode layers has a slit aperture extending across a central optical axis along which an electron beam passes, and the two electrode layers are aligned on an electron optical axis such that the slit apertures are staggered with each other. Further, the present invention relates to a microcolumn using the multipole lens. The multipole lens according to the present invention can be manufactured and controlled in a simple fashion, reduces the defocusing of the microcolumn, and increases an active deflection area.
摘要翻译：本发明涉及一种用于微柱的电子透镜，更具体地说，涉及一种多极电子透镜，其中电子透镜包括两个或更多个电极层，每个电极层具有沿中心光轴延伸的狭缝孔，电子束通过，并且两个电极层在电子光轴上对齐，使得狭缝孔彼此交错。此外，本发明涉及使用多极透镜的微柱。根据本发明的多极镜头可以以简单的方式制造和控制，减少了微柱的散焦，并增加了主动偏转面积。

10. 发明申请

US20100200766A1 ELECTRON EMITTER HAVING NANO-STRUCTURE TIP AND ELECTRON COLUMN USING THE SAME 审中-公开
标题翻译：具有纳米结构提示的电子发射器和使用其的电子柱
公开(公告)号：US20100200766A1
公开(公告)日：2010-08-12
申请号：US12670703
申请日：2008-07-28
申请人： Ho Seob Kim
发明人： Ho Seob Kim
IPC分类号： H01J31/00 , H01J3/14 , H01J3/26 , H01J1/02
CPC分类号： H01J37/065 , H01J37/073 , H01J2237/0492 , H01J2237/06341 , H01J2237/1205 , H01J2237/28 , H01J2237/3175
摘要： The present invention relates to an electron emitter having a nanostructure tip and an electron column using the same, and, more particularly, to an electron emitter which includes a nanostructure tip which can easily emit electrons, composed of carbon nanotube (CNT), zinc oxide nanotube (ZnO nanotube), zinc oxide nanorod, zinc oxide nanopillar, zinc oxide nanowire, zinc oxide nanoparticle or the like, and an electron column using the same.
摘要翻译：本发明涉及一种具有纳米结构的电子发射体和使用该电子发射体的电子发射体，更具体地说，涉及包含能够容易地发射电子的纳米结构尖端的电子发射体，其由碳纳米管（CNT），氧化锌纳米管（ZnO纳米管），氧化锌纳米棒，氧化锌纳米柱，氧化锌纳米线，氧化锌纳米颗粒等，以及使用该纳米管的电子柱。

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