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1. 发明申请

US20190103250A1 Charged Particle Beam Device 审中-公开
公开(公告)号：US20190103250A1
公开(公告)日：2019-04-04
申请号：US16136534
申请日：2018-09-20
申请人： Hitachi High-Technologies Corporation
发明人： Toshiyuki YOKOSUKA , Chahn LEE , Hideyuki KAZUMI , Hajime KAWANO
IPC分类号： H01J37/28 , H01J37/26
摘要： There is proposed a charged particle beam device that generates a first signal waveform on the basis of scanning, the number of scanning lines of which is one or more, the scanning intersecting an edge of a pattern on a sample, generates a second signal waveform for a first area that is wider than the one scanning line on the basis of scanning, the number of scanning lines of which is larger than that of scanning for generating the first signal waveform, then determines a deviation between the generated first and second signal waveforms, and thereby determines, from the deviation, correction data used at the time of dimensional measurement.

2. 发明申请

US20150357153A1 CHARGED PARTICLE BEAM DEVICE 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20150357153A1
公开(公告)日：2015-12-10
申请号：US14410999
申请日：2013-06-10
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Hiroshi MAKINO , Hideyuki KAZUMI , Minoru YAMAZAKI , Yuzuru MIZUHARA , Miki ISAWA
IPC分类号： H01J37/147 , H01J37/28
CPC分类号： H01J37/147 , H01J37/244 , H01J37/28 , H01J2237/24485 , H01J2237/2449 , H01J2237/2806 , H01J2237/281
摘要： An objective of the present invention is to provide a charged particle beam device with which information based on a charged particle which is discharged from a bottom part of high-aspect structure is revealed more than with previous technology. To achieve the objective, proposed is a charged particle beam device comprising: a first orthogonal electromagnetic field generator which deflects charged particles which are discharged from a material; a second orthogonal electromagnetic field generator which further deflects the charged particles which are deflected by the first orthogonal electromagnetic field generator; an aperture forming member having a charged particle beam pass-through aperture; and a third orthogonal electromagnetic field generator which deflects the charged particles which have passed through the aperture forming member.
摘要翻译：本发明的目的是提供一种带电粒子束装置，与先前的技术相比，显示出从高方面结构的底部排出的基于带电粒子的信息。为了实现该目的，提出了一种带电粒子束装置，包括：第一正交电磁场发生器，其偏转从材料排出的带电粒子; 第二正交电磁场发生器，其进一步偏转由第一正交电磁场发生器偏转的带电粒子; 具有带电粒子束直通孔的孔形成构件; 以及第三正交电磁场发生器，其使穿过孔形成构件的带电粒子偏转。

3. 发明申请

US20140014836A1 CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20140014836A1
公开(公告)日：2014-01-16
申请号：US13939767
申请日：2013-07-11
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Miki ISAWA , Minoru YAMAZAKI , Yuzuru MIZUHARA , Hiroshi MAKINO , Hideyuki KAZUMI
IPC分类号： G01N23/225
CPC分类号： G01N23/2258 , G01B2210/56 , H01J37/244 , H01J37/28 , H01J2237/1508 , H01J2237/2448 , H01J2237/281 , H01J2237/2816
摘要： The charged particle beam apparatus having an opening formation member formed with an opening for passage of a charged particle beam emitted from a charged particle source, and either a detector adapted to detect charged particles having passed through the passage opening or a detector adapted to detect charged particles resulting from bombardment on another member of the charged particles having passed through the opening, comprises an aligner for aligning charged particles discharged from the sample and a control unit for controlling the aligner, wherein the control unit controls the aligner to cause it to shift trajectories of the charged particles discharged from the sample so that length measurement may be executed on the basis of detection signals before and after the alignment by the aligner.
摘要翻译：带电粒子束装置具有开口形成构件，该开口形成构件形成有用于通过从带电粒子源发射的带电粒子束的开口，以及适于检测通过通道开口的带电粒子的检测器或适于检测带电粒子的检测器通过对通过开口的带电粒子的另一个部件进行轰击而产生的粒子包括用于对准从样品排出的带电粒子的对准器和用于控制对准器的控制单元，其中控制单元控制对准器使其移动轨迹从样品排出的带电粒子可以根据校准器对准前后的检测信号进行长度测量。

4. 发明申请

US20200294756A1 CHARGED PARTICLE RAY DEVICE AND CROSS-SECTIONAL SHAPE ESTIMATION PROGRAM 审中-公开
公开(公告)号：US20200294756A1
公开(公告)日：2020-09-17
申请号：US16645511
申请日：2018-08-24
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Toshiyuki YOKOSUKA , Hajime KAWANO , Kouichi KUROSAWA , Hideyuki KAZUMI , Chahn LEE
IPC分类号： H01J37/05 , H01J37/22 , H01J37/244 , H01J37/28
摘要： The purpose of the present invention is to provide a charged particle ray device which is capable of simply estimating the cross-sectional shape of a pattern. The charged particle ray device according to the present invention acquires a detection signal for each different discrimination condition of an energy discriminator, and estimates the cross-sectional shape of a sample by comparing the detection signal for each discrimination condition with a reference pattern (see FIG. 5).

5. 发明申请

US20180012725A1 Charged Particle Beam Device 审中-公开
公开(公告)号：US20180012725A1
公开(公告)日：2018-01-11
申请号：US15545550
申请日：2015-01-28
申请人： Hitachi High-Technologies Corporation
发明人： Toshiyuki YOKOSUKA , Hideyuki KAZUMI , Yuzuru MIZUHARA , Hajime KAWANO
IPC分类号： H01J37/05 , H01J37/29 , H01J37/26
CPC分类号： H01J37/05 , H01J37/265 , H01J37/28 , H01J37/292 , H01J2237/24592 , H01J2237/2487 , H01J2237/2814 , H01J2237/2817
摘要： Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for detecting charged particles obtained on the basis of scanning, over a sample, a charged particle beam emitted from a charged particle source, and an energy filter for filtering by energy the charged particles emitted from the sample. Index values are determined for the plurality of regions contained within the scanning region of the charged particle beam, and, for each of a plurality of energy filter conditions, differences are calculated between the plurality of index values and the reference index values that have been set for each of the plurality of regions.

6. 发明申请

US20160300690A1 Charged-Particle-Beam Device 有权
标题翻译：带电粒子束装置
公开(公告)号：US20160300690A1
公开(公告)日：2016-10-13
申请号：US15035265
申请日：2014-11-05
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Akira IKEGAMI , Hideto DOHI , Hideyuki KAZUMI , Yoichi OSE , Naomasa SUZUKI , Momoyo ENYAMA , Ryuji NISHI , Akio TAKAOKA
IPC分类号： H01J37/28 , H01J37/153 , H01J3/12 , H01J37/14
CPC分类号： H01J37/28 , H01J3/12 , H01J37/14 , H01J37/147 , H01J37/153 , H01J2237/15 , H01J2237/2611 , H01J2237/2814
摘要： Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.
摘要翻译：提供一种带电粒子束装置，其能够同时消除由打开角度的非均匀分布和带电粒子束的能量引起的多个像差。带电粒子束装置设有像差产生透镜，用于产生由于穿过离轴的带电粒子束造成的像差，以及校正透镜，用于使带电粒子束的轨迹会聚在物镜不管带电粒子束的能量如何。校正透镜的主表面设置在交叉位置，在该交叉位置处，具有不同开口角度的多个带电粒子束在通过像差产生透镜之后会聚。

7. 发明申请

US20160225583A1 Charged Particle Beam Device and Charged Particle Beam Measurement Method 审中-公开
标题翻译：带电粒子束装置和带电粒子束测量方法
公开(公告)号：US20160225583A1
公开(公告)日：2016-08-04
申请号：US15021039
申请日：2014-05-30
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Natsuki TSUNO , Yoshinobu KIMURA , Hideyuki KAZUMI , Hajime KAWANO , Junichiro TOMIZAWA
IPC分类号： H01J37/28 , H01J37/244
CPC分类号： H01J37/28 , H01J37/244 , H01J37/265 , H01J2237/043
摘要： An object of the present invention is to realize both of the accuracy of measuring the amount of secondary electron emissions and the stability of a charged particle beam image in a charged particle beam device. In a charged particle beam device, extraction of detected signals is started by a first trigger signal, the extraction of the detected signals is completed by a second trigger signal, the detected signals are sampled N times using N (N is a natural number) third trigger signals that equally divide an interval time T between the first trigger signal and the second trigger signal, secondary charged particles are measured by integrating and averaging the signals sampled in respective division times ΔT obtained by equally dividing the interval time T, and the division time ΔT is controlled in such a manner that the measured number of secondary charged particles becomes larger than the minimum number of charged particles satisfying ergodicity.
摘要翻译：本发明的目的在于实现测量二次电子发射量的精度和带电粒子束装置中的带电粒子束图像的稳定性。在带电粒子束装置中，通过第一触发信号开始检测到的信号的提取，通过第二触发信号完成检测信号的提取，使用N（N是自然数）第三触发信号，将第一触发信号和第二触发信号之间的间隔时间T均等地分开，通过对通过等分间隔时间T获得的各个分割时间ΔT中采样的信号进行积分和平均来测量次级带电粒子，以这样的方式控制ΔT，使得测量的二次带电粒子的数量变得大于满足遍遍性的带电粒子的最小数量。

8. 发明申请

US20170278671A1 Charged Particle Beam Device 审中-公开
公开(公告)号：US20170278671A1
公开(公告)日：2017-09-28
申请号：US15618203
申请日：2017-06-09
申请人： Hitachi High-Technologies Corporation
发明人： Toshiyuki YOKOSUKA , Chahn LEE , Hideyuki KAZUMI , Hajime KAWANO , Shahedul HOQUE , Kumiko SHIMIZU , Hiroyuki TAKAHASHI
IPC分类号： H01J37/28 , H01J37/20 , H01J37/22 , H01J37/147
CPC分类号： H01J37/28 , H01J37/147 , H01J37/20 , H01J37/22 , H01J2237/2803 , H01J2237/2806 , H01J2237/2817 , H01J2237/2826 , H01J2237/3045
摘要： The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

9. 发明申请

US20170186583A1 SCANNING ELECTRON MICROSCOPE AND METHOD FOR CONTROLLING SAME 有权
公开(公告)号：US20170186583A1
公开(公告)日：2017-06-29
申请号：US15304869
申请日：2015-04-20
申请人： Hitachi High-Technologies Corporation
发明人： Kaori SHIRAHATA , Daisuke BIZEN , Makoto SAKAKIBARA , Yasunari SOHDA , Hajime KAWANO , Hideyuki KAZUMI
IPC分类号： H01J37/28 , G01N23/225 , H01J37/26
CPC分类号： H01J37/28 , G01N23/2251 , H01J37/252 , H01J37/263 , H01J49/48 , H01J2237/2602 , H01J2237/28 , H01J2237/2801 , H01J2237/2806
摘要： The scanning electron microscope includes: an electron source; a first deflector for deflecting a primary electron beam emitted from the electron source; a second deflector for focusing the primary electron beam deflected by the first deflector and deflecting a second electron from a sample, which is generated the focused primary electron beam, to the outside of the optical axis; a voltage applying unit for applying a negative voltage to the sample to decelerate the primary electron beam; a spectrometer for dispersing the secondary electron; a detector for detecting the secondary electron passing through the spectrometer; an electrostatic lens provided between the second deflector and the spectrometer; and a voltage control unit that controls the voltage applied to the electrostatic lens based on the negative voltage applied to the sample. The electrostatic lens allows the deflecting action to be overlapped with the converging action.

10. 发明申请

US20150364290A1 CHARGED PARTICLE BEAM APPLICATION DEVICE 有权
标题翻译：充电颗粒光束应用器件
公开(公告)号：US20150364290A1
公开(公告)日：2015-12-17
申请号：US14741324
申请日：2015-06-16
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Momoyo ENYAMA , Akira IKEGAMI , Hideto DOHI , Hideyuki KAZUMI , Naomasa SUZUKI
IPC分类号： H01J37/147 , H01J37/06 , H01J37/141
CPC分类号： H01J37/1478 , H01J37/153 , H01J37/28 , H01J2237/1534
摘要： The charged particle beam application device is provided with a charged particle source and an objective lens that converges charged particle beam generated by the charged particle source onto a sample. In this case, the charged particle beam application device is further provided with an aberration generating element installed between the charged particle beam source and the objective lens, a tilt-use deflector installed between the aberration generating element and the objective lens, a deflection aberration control unit for controlling the aberration generating element, a first electromagnetic field superposing multipole installed between the aberration generating element and the objective lens, and an electromagnetic field superposing multipole control unit for controlling the first electromagnetic field superposing multipole. The aberration generating element has such a function that when the charged particle beam is tilted relative to the sample by the tilt-use deflector, a plurality of resulting aberrations are cancelled with one another. Moreover, the first electromagnetic field superposing multipole has a function to change the orbit of a charged particle beam having energy different from that of the main charged particle beam in the charged particle beam.
摘要翻译：带电粒子束施加装置设置有带电粒子源和将由带电粒子源产生的带电粒子束会聚到样本上的物镜。在这种情况下，带电粒子束施加装置还设置有安装在带电粒子束源和物镜之间的像差产生元件，安装在像差产生元件和物镜之间的倾斜用偏转器，偏转像差控制用于控制像差产生元件的单元，安装在像差产生元件和物镜之间的第一电磁场叠加多极，以及用于控制第一电磁场叠加多极的电磁场叠加多极控制单元。像差产生元件具有这样的功能：当通过倾斜使用偏转器使带电粒子束相对于样本倾斜时，多个得到的像差彼此抵消。此外，第一电磁场叠加多极具有改变具有与带电粒子束中的主带电粒子束的能量不同的能量的带电粒子束的轨道的功能。

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